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    • 4. 发明授权
    • Wavelength converting material and use of same
    • 波长转换材料及其用途
    • US08026659B2
    • 2011-09-27
    • US12453014
    • 2009-04-28
    • Yu-Sheng TangRu-Shi LiuShu-Fen HuChien-Yuan Wang
    • Yu-Sheng TangRu-Shi LiuShu-Fen HuChien-Yuan Wang
    • H05B33/14
    • C09K11/7734C01F7/002C09K11/7739Y02B20/181
    • This invention discloses a wavelength converting material. The wavelength converting material comprises a metal haloaluminate compound phosphor with a chemical formula Mw-pAlyOzXq:Rp, wherein M is at least one element selected from the group of Be, Mg, Ca, Sr, Ba and Zn; X is at least one element selected from the group of F, Cl, Br, and I; R is one or more elements selected from the group of the transition metals and at least one element selected from the lanthanide series. Because the emitting wavelength of the metal haloaluminate compound phosphor is 550˜650 nm which is from the green to the red light spectrum, the white light mixed by the converted light of the metal haloaluminate phosphor and the blue light has better color rendering index. Besides, this invention also discloses the optoelectronic devices comprising the metal haloaluminate compound phosphor.
    • 本发明公开了一种波长转换材料。 波长转换材料包括化学式为Mw-pAlyOzXq:Rp的卤化铝酸盐化合物荧光体,其中M为选自Be,Mg,Ca,Sr,Ba和Zn中的至少一种元素; X是选自F,Cl,Br和I的至少一种元素; R是选自过渡金属和至少一种选自镧系元素的元素中的一种或多种元素。 由于金属卤化铝化合物荧光体的发光波长为从绿色到红色光谱的550〜650nm,所以通过金属卤化铝酸盐荧光体和蓝色光的转换光混合的白色光具有更好的显色指数。 此外,本发明还公开了包含金属卤代铝酸盐化合物荧光体的光电器件。
    • 5. 发明申请
    • Wavelength converting material and use of same
    • 波长转换材料及其用途
    • US20090267488A1
    • 2009-10-29
    • US12453014
    • 2009-04-28
    • Yu-Sheng TangRu-Shi LiuShu-Fen HuChien-Yuan Wang
    • Yu-Sheng TangRu-Shi LiuShu-Fen HuChien-Yuan Wang
    • H01J1/62C09K11/55C09K11/61C01F7/50
    • C09K11/7734C01F7/002C09K11/7739Y02B20/181
    • This invention discloses a wavelength converting material. The wavelength converting material comprises a metal haloaluminate compound phosphor with a chemical formula Mw-pAlyOzXq:Rp, wherein M is at least one element selected from the group of Be, Mg, Ca, Sr, Ba and Zn; X is at least one element selected from the group of F, Cl, Br, and I; R is one or more elements selected from the group of the transition metals and at least one element selected from the lanthanide series. Because the emitting wavelength of the metal haloaluminate compound phosphor is 550˜650 nm which is from the green to the red light spectrum, the white light mixed by the converted light of the metal haloaluminate phosphor and the blue light has better color rendering index. Besides, this invention also discloses the optoelectronic devices comprising the metal haloaluminate compound phosphor.
    • 本发明公开了一种波长转换材料。 波长转换材料包括化学式为Mw-pAlyOzXq:Rp的卤化铝酸盐化合物荧光体,其中M为选自Be,Mg,Ca,Sr,Ba和Zn中的至少一种元素; X是选自F,Cl,Br和I的至少一种元素; R是选自过渡金属和至少一种选自镧系元素的元素中的一种或多种元素。 由于卤化铝酸盐化合物的荧光体的发光波长为从绿色到红色光谱的550〜650nm,由卤化铝酸盐荧光体和蓝色光的转换光混合的白色光具有更好的显色指数。 此外,本发明还公开了包含金属卤代铝酸盐化合物荧光体的光电器件。
    • 6. 发明授权
    • Single-electron transistor and fabrication method thereof
    • 单电子晶体管及其制造方法
    • US06894352B2
    • 2005-05-17
    • US10602890
    • 2003-06-25
    • Shu-Fen HuYung-Chun WuWen-Tai LuShiue-Shin LiuTiao-Yuan HuangTien-Sheng Chao
    • Shu-Fen HuYung-Chun WuWen-Tai LuShiue-Shin LiuTiao-Yuan HuangTien-Sheng Chao
    • H01L21/335H01L29/76H01L27/01
    • B82Y10/00H01L29/66439H01L29/7613Y10S438/947Y10S977/937
    • A method for fabricating a single-electron transistor (SET). A one dimensional channel is formed between source and drain on a silicon-on-insulator substrate, and the separated polysilicon sidewall spacer gates are formed by electron-beam lithographically etching process in a self-aligned manner. Operation of the single-electron transistor with self-aligned polysilicon sidewall spacer gates is achieved by applying external bias to the self-aligned polysilicon sidewall spacer gates to form two potential barriers and a quantum dot capable of storage charges between the two potential barriers. A metal upper gate is finally formed and biased to induce a two-dimensional electron gas (2DEG) and control the energy level of the quantum well. Accordingly, the method of the invention comprises a combination of electron beam (E-beam) lithography with multilayer-aligned direct writing technology, oxidation, and wet etching to form a nanoscale one-dimensional channel between source and drain on a silicon-on-insulator substrate.
    • 一种用于制造单电子晶体管(SET)的方法。 在绝缘体上硅衬底上的源极和漏极之间形成一维沟道,并且以自对准方式通过电子束光刻蚀工艺形成分离的多晶硅侧壁间隔栅极。 通过将外部偏置施加到自对准多晶硅侧壁间隔栅上来形成具有自对准多晶硅侧壁间隔栅极的单电子晶体管的操作,以形成两个势垒和能够在两个势垒之间存储电荷的量子点。 金属上栅极最终形成并偏置以诱导二维电子气(2DEG)并控制量子阱的能级。 因此,本发明的方法包括电子束(E-beam)光刻与多层排列直接写入技术的组合,氧化和湿蚀刻,以在硅 - 硅上形成源极和漏极之间的纳米级一维沟道 绝缘体基板。
    • 7. 发明申请
    • Process for fabricating nanoelectronic device by intermittent exposure
    • 通过间歇曝光制造纳米电子器件的工艺
    • US20050139819A1
    • 2005-06-30
    • US10998603
    • 2004-11-30
    • Gwo-Jen HwangYi-Pin FangYa-Chang ChouShu-Fen Hu
    • Gwo-Jen HwangYi-Pin FangYa-Chang ChouShu-Fen Hu
    • H01L21/335H01L29/76H01L49/00H01L31/062
    • B82Y10/00H01L29/66439H01L29/7613H01L49/006
    • A process for fabricating a nanoelectronic device by intermittent exposure is disclosed, consisting the steps of: providing a substrate on which a conductor or semiconductor thin film having a photoresist layer coated is formed; exposing the photoresist layer by lithography with a lithographic pattern which includes at least one noncontinuous quantum dot, a first electrode and a second electrode, in which the noncontinuous quantum dots are linearly arranged and sandwiched between the first electrode and the second electrode; and etching the thin film to form a quantum island group of linked quantum islands having both ends connected to the first electrode and the second electrode respectively so that the width of the quantum island is larger than the width of tunnel barriers positioned on the both sides of the quantum islands. A nanoelectronic device constructed according to the process is also disclosed.
    • 公开了一种通过间歇曝光制造纳米电子器件的方法,包括以下步骤:提供其上形成具有涂覆有光致抗蚀剂层的导体或半导体薄膜的基板; 通过光刻图案曝光光致抗蚀剂层,该平版印刷图案包括至少一个非连续量子点,第一电极和第二电极,其中非连续量子点线性排列并夹在第一电极和第二电极之间; 并且蚀刻该薄膜以形成一个连接的量子岛的量子岛群,其两端分别连接到第一电极和第二电极,使得量子岛的宽度大于位于第二电极两侧的隧道屏障的宽度 量子岛。 还公开了根据该方法构造的纳米电子器件。