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1. 发明申请

US20060258128A1 Methods and apparatus for enabling multiple process steps on a single substrate 审中-公开
标题翻译：用于在单个基板上实现多个工艺步骤的方法和装置
公开(公告)号：US20060258128A1
公开(公告)日：2006-11-16
申请号：US11329761
申请日：2006-01-11
申请人： Peter Nunan , Anthony Renau , Alan Sheng , Paul Murphy , Kyu-Ha Shim , Charles Teodorczyk , Steven Anella , Samuel Barsky , Lawrence Ficarra , Richard Hertel
发明人： Peter Nunan , Anthony Renau , Alan Sheng , Paul Murphy , Kyu-Ha Shim , Charles Teodorczyk , Steven Anella , Samuel Barsky , Lawrence Ficarra , Richard Hertel
IPC分类号： H01L21/677 , H01L21/04
CPC分类号： H01L21/67745 , H01J37/09 , H01J2237/31701 , H01J2237/3171 , H01J2237/31711 , H01L21/67213 , H01L21/68707
摘要： Substrate masking apparatus includes a platen assembly to support a substrate for processing, a mask having an aperture, a retaining mechanism to retain the mask in a masking position, and a positioning mechanism to change the relative positions of the mask and the substrate so that different areas of the substrate are exposed through the aperture in the mask. The apparatus may further include a mask loading mechanism to transfer the mask to and between the masking position and a non-masking position. The processing may include ion implantation of the substrate with different implant parameter values in different areas. In other embodiments, an area of the substrate to be processed is selectable by a mask, a shutter or a beam modifier in front of the substrate.
摘要翻译：基板掩蔽装置包括支撑用于处理的基板的压板组件，具有孔的掩模，将掩模保持在遮蔽位置的保持机构以及改变掩模和基板的相对位置的定位机构，使得不同衬底的区域通过掩模中的孔露出。该装置还可以包括掩模加载机构，用于将掩模传送到掩蔽位置和非掩蔽位置之间。该处理可以包括在不同区域中具有不同植入参数值的衬底的离子注入。在其他实施例中，待处理的基板的区域可以通过基板前面的掩模，快门或光束修正器来选择。

2. 发明授权

US08216923B2 Integrated shadow mask/carrier for patterned ion implantation 失效
标题翻译：用于图案化离子注入的集成阴影掩模/载体
公开(公告)号：US08216923B2
公开(公告)日：2012-07-10
申请号：US12895927
申请日：2010-10-01
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/425
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

3. 发明申请

US20100062589A1 IMPLANTING A SOLAR CELL SUBSTRATE USING A MASK 失效
标题翻译：使用掩模贴合太阳能电池基板
公开(公告)号：US20100062589A1
公开(公告)日：2010-03-11
申请号：US12555005
申请日：2009-09-08
申请人： Steven Anella , William Weaver
发明人： Steven Anella , William Weaver
IPC分类号： H01L21/266 , G21F3/00
CPC分类号： H01J37/3171 , G03F1/20 , H01J2237/31711 , H01L21/266 , H01L31/022441 , H01L31/028 , H01L31/068 , Y02E10/547
摘要： Various masks for use with ion implantation equipment are disclosed. In one embodiment, the masks are formed by assembling a collection of segments and spacers to create a mask having the desired configuration. This collection of parts is held together with a carrier of frame. In another embodiment, a panel is formed by machining open-ended slots into a substrate, so as to form a comb-shaped device. Two such panels may be connected together to form a mask. In other embodiments, the panels may be used sequentially in an ion implantation process to create interdigitated back contacts. In another embodiment, multiple masks are overlaid so as to create implant patterns that cannot be created effectively using a single mask.
摘要翻译：公开了用于离子注入设备的各种掩模。在一个实施例中，通过组合段和间隔物的集合来形成掩模以产生具有所需构造的掩模。这些零件的集合与框架的承载架一起保持。在另一个实施例中，通过将开口槽加工成衬底形成面板，以便形成梳状装置。两个这样的面板可以连接在一起以形成掩模。在其他实施例中，可以在离子注入工艺中依次使用面板以产生交叉指向的后接触。在另一个实施例中，覆盖多个掩模以便产生不能使用单个掩模有效地产生的植入图案。

4. 发明申请

US20100059362A1 TECHNIQUES FOR MANUFACTURING SOLAR CELLS 失效
标题翻译：制造太阳能电池的技术
公开(公告)号：US20100059362A1
公开(公告)日：2010-03-11
申请号：US12555917
申请日：2009-09-09
申请人： Steven Anella
发明人： Steven Anella
IPC分类号： C23C14/46 , B32B3/10
CPC分类号： C23C14/042 , C23C14/48 , H01J37/3171 , H01J2237/31711 , Y10T428/24273 , Y10T428/24298
摘要： Techniques for manufacturing solar cells are disclosed. In one particular exemplary embodiment, the technique may be comprise disposing the solar cell downstream of an ion source; disposing a mask between the ion source and the solar cell, the mask including a front surface, a back surface, and at least one aperture extending in an aperture direction from the front surface to the back surface; and directing ions from the ion source to the solar cell along an ion beam path and through the at least one aperture of the mask, where the ion beam path may be non-parallel relative to the aperture direction.
摘要翻译：公开了制造太阳能电池的技术。在一个特定的示例性实施例中，该技术可以包括将太阳能电池设置在离子源的下游; 在所述离子源和太阳能电池之间设置掩模，所述掩模包括前表面，后表面和从所述前表面到所述后表面在孔径方向上延伸的至少一个孔; 并且将离子从离子源引导到太阳能电池沿着离子束路径并通过掩模的至少一个孔，其中离子束路径可以相对于孔径方向不平行。

5. 发明申请

US20120083102A1 Integrated Shadow Mask/Carrier for Pattern Ion Implantation 失效
标题翻译：用于图案离子植入的集成阴影掩模/载体
公开(公告)号：US20120083102A1
公开(公告)日：2012-04-05
申请号：US12895927
申请日：2010-10-01
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/71 , H01J37/20
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

6. 发明申请

US20120244692A1 INTEGRATED SHADOW MASK/CARRIER FOR PATTERN ION IMPLANTATION 审中-公开
标题翻译：集成阴影掩模/载体为模式离子植入
公开(公告)号：US20120244692A1
公开(公告)日：2012-09-27
申请号：US13489031
申请日：2012-06-05
申请人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
发明人： Nicholas Bateman , Kevin Daniels , Atul Gupta , Russell Low , Benjamin Riordon , Robert Mitchell , Steven Anella
IPC分类号： H01L21/266
CPC分类号： H01L21/677 , H01J37/3171 , H01J2237/31711 , H01L21/68735 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： An improved, lower cost method of processing substrates, such as to create solar cells is disclosed. In addition, a modified substrate carrier is disclosed. The carriers typically used to carry the substrates are modified so as to serve as shadow masks for a patterned implant. In some embodiments, various patterns can be created using the carriers such that different process steps can be performed on the substrate by changing the carrier or the position with the carrier. In addition, since the alignment of the substrate to the carrier is critical, the carrier may contain alignment features to insure that the substrate is positioned properly on the carrier. In some embodiments, gravity is used to hold the substrate on the carrier, and therefore, the ions are directed so that the ion beam travels upward toward the bottom side of the carrier.
摘要翻译：公开了一种改进的，低成本的处理衬底的方法，例如制造太阳能电池。此外，公开了改进的基板载体。通常用于承载衬底的载体被修改为用作图案化植入物的荫罩。在一些实施例中，可以使用载体创建各种图案，使得可以通过用载体改变载体或位置来在基板上执行不同的工艺步骤。此外，由于基板与载体的对准是关键的，所以载体可以包含对准特征以确保基板正确地定位在载体上。在一些实施例中，使用重力来将衬底保持在载体上，因此，引导离子使得离子束朝向载体的底侧向上移动。

7. 发明申请

US20110320030A1 Thermal Control of a Proximity Mask and Wafer During Ion Implantation 审中-公开
标题翻译：离子注入过程中接近面罩和晶圆的热控制
公开(公告)号：US20110320030A1
公开(公告)日：2011-12-29
申请号：US12823531
申请日：2010-06-25
申请人： Benjamin Riordon , Steven Anella
发明人： Benjamin Riordon , Steven Anella
IPC分类号： G05D23/00 , G05D16/00 , G05D7/00
CPC分类号： H01J37/3171 , H01J2237/002 , H01J2237/2001 , H01J2237/31711
摘要： An improved method of processing substrates, such as to create solar cells, is disclosed. The use of shadow masks may cause alignment errors associated with the differing thermal expansion characteristics of the shadow mask and the substrate. To counteract this error, mechanisms are used to insure that the thermal expansion of the shadow mask and the substrate are equal or substantially equal. In some embodiments, the shadow mask is produced with a type and quantity of material so that its thermal expansion matches that of the substrate. In other embodiments, heating and cooling mechanisms are applied to the shadow mask so that its thermal expansion matches that of the substrate. In other embodiments, heating and cooling mechanisms are applied to the substrate so that its thermal expansion matches that of the shadow mask. Furthermore, both the mask and substrate can be heated and/or cooled simultaneously.
摘要翻译：公开了一种改进的处理衬底的方法，例如制造太阳能电池。阴影掩模的使用可能导致与荫罩和基板的不同热膨胀特性相关联的对准误差。为了抵消该误差，使用机构来确保荫罩和衬底的热膨胀相等或基本相等。在一些实施例中，荫罩产生类型和数量的材料，使得其热膨胀与基底的热膨胀相匹配。在其他实施例中，将加热和冷却机构施加到荫罩，使得其热膨胀与基板的热膨胀相匹配。在其他实施例中，将加热和冷却机构施加到基板上，使得其热膨胀与荫罩的热膨胀相匹配。此外，掩模和基底可以同时被加热和/或冷却。

8. 发明授权

US5996206A Method and apparatus for installing and aligning punches in an imaging system 失效
标题翻译：用于在成像系统中安装和对准冲头的方法和装置
公开(公告)号：US5996206A
公开(公告)日：1999-12-07
申请号：US28734
申请日：1998-02-24
申请人： Richard J. Lynch , Robert P. Flanagan, Jr. , Libor Krupica , Steven Anella , James D. Waterman
发明人： Richard J. Lynch , Robert P. Flanagan, Jr. , Libor Krupica , Steven Anella , James D. Waterman
IPC分类号： B26D7/01 , B26F1/06 , B41B21/34 , H04N1/06 , B23Q3/00
CPC分类号： H04N1/0607 , B41B21/34 , Y10T29/49895 , Y10T83/0596 , Y10T83/883
摘要： A method and apparatus for facilitating the installation and alignment of side punches onto the internal drum of an imaging system. A side of the internal drum is provided with a T-shaped slot for movably positioning a plurality of side punches about the cylindrically shaped imaging surface of the internal drum. The proper radial alignment of the side punches along the T-slot is achieved using a unique band template. The band template includes a plurality of notches, each of which indicates the correct positioning of the pin of a side punch to be installed on the internal drum.
摘要翻译：一种用于促进侧冲头安装和对准成像系统的内鼓上的方法和装置。内筒的一侧设置有T形槽，用于围绕内筒的圆柱形成像表面可移动地定位多个侧冲头。使用独特的带模板实现侧冲头沿着T形槽的适当的径向对准。带模板包括多个凹口，每个凹口指示要安装在内鼓上的侧冲头的销的正确定位。

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