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1. 发明授权

US08470616B2 Patterned assembly for manufacturing a solar cell and a method thereof 有权
标题翻译：用于制造太阳能电池的图案化组件及其方法
公开(公告)号：US08470616B2
公开(公告)日：2013-06-25
申请号：US13529702
申请日：2012-06-21
申请人： Paul Sullivan , Peter Nunan , Steven R. Walther
发明人： Paul Sullivan , Peter Nunan , Steven R. Walther
IPC分类号： H01L21/00 , G01T1/36
CPC分类号： H01L31/022425 , H01L31/03529 , H01L31/068 , H01L31/0682 , Y02E10/547
摘要： Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.
摘要翻译：公开了用于制造太阳能电池的装置和方法。在特定实施例中，太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件，其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中，同时最小化将所述第一类型掺杂剂引入所述第一区域外的区域。

2. 发明授权

US07939424B2 Wafer bonding activated by ion implantation 有权
标题翻译：通过离子注入激活的晶片键合
公开(公告)号：US07939424B2
公开(公告)日：2011-05-10
申请号：US12212386
申请日：2008-09-17
申请人： Yuri Erokhin , Paul Sullivan , Steven R. Walther , Peter Nunan
发明人： Yuri Erokhin , Paul Sullivan , Steven R. Walther , Peter Nunan
IPC分类号： H01L21/30 , H01L21/46
CPC分类号： H01L21/76251 , H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/202 , H01L21/26506 , H01L21/6835 , H01L2221/68359 , H01L2924/30105
摘要： A method for wafer bonding two substrates activated by ion implantation is disclosed. An in situ ion bonding chamber allows ion activation and bonding to occur within an existing process tool utilized in a manufacturing process line. Ion activation of at least one of the substrates is performed at low implant energies to ensure that the wafer material below the thin surface layers remains unaffected by the ion activation.
摘要翻译：公开了一种通过离子注入激活的晶片接合两个基板的方法。原位离子键合室允许离子激活和结合发生在制造工艺线中使用的现有工艺工具中。在低注入能量下进行至少一个衬底的离子激活，以确保薄表面层下面的晶片材料不受离子激活的影响。

3. 发明申请

US20090209084A1 CLEAVE INITIATION USING VARYING ION IMPLANT DOSE 有权
标题翻译：使用变化的离子植入剂进行清洁启动
公开(公告)号：US20090209084A1
公开(公告)日：2009-08-20
申请号：US12119170
申请日：2008-05-12
申请人： Peter Nunan , Steven R. Walther , Yuri Erokhin , Paul J. Sullivan
发明人： Peter Nunan , Steven R. Walther , Yuri Erokhin , Paul J. Sullivan
IPC分类号： H01L21/30
CPC分类号： H01L21/76254
摘要： An approach for providing a cleave initiation using a varying ion implant dose is described. In one embodiment, there is a method of forming a substrate. In this embodiment, a semiconductor material is provided and implanted with a spatially varying dose of one or more ion species. A handler substrate is attached to the implanted semiconductor material. A cleave of the implanted semiconductor material is initiated from the handler substrate at a preferential location that is a function of a dose gradient that develops from the spatially varying dose of one or more ion species implanted into the semiconductor material
摘要翻译：描述了使用变化的离子注入剂量提供切割引发的方法。在一个实施例中，存在形成衬底的方法。在该实施例中，提供半导体材料并且注入空间变化的一种或多种离子种类的剂量。处理衬底附着到植入的半导体材料上。植入的半导体材料的切割在优先位置从处理器基底开始，该优先位置是从注入到半导体材料中的一种或多种离子种类的空间变化剂量形成的剂量梯度的函数

4. 发明申请

US20090181492A1 NANO-CLEAVE A THIN-FILM OF SILICON FOR SOLAR CELL FABRICATION 审中-公开
标题翻译： NANO-CLEAVE用于太阳能电池制造的硅薄膜
公开(公告)号：US20090181492A1
公开(公告)日：2009-07-16
申请号：US12013064
申请日：2008-01-11
申请人： Peter Nunan , Steven R. Walther , Yuri Erokhin
发明人： Peter Nunan , Steven R. Walther , Yuri Erokhin
IPC分类号： H01L31/18
CPC分类号： H01L31/1804 , H01L21/02532 , H01L21/0262 , H01L21/76254 , H01L31/1896 , Y02E10/547 , Y02P70/521
摘要： An approach for nano-cleaving a thin-film of silicon for solar cell fabrication is described. In one embodiment, there is a method of forming a substrate for use as a solar cell substrate. In this embodiment, a substrate of silicon is provided and implanted with an ion flux. A non-silicon substrate is attached to the thin-film of silicon to form a solar cell substrate.
摘要翻译：描述了用于太阳能电池制造的用于纳米切割硅薄膜的方法。在一个实施例中，存在形成用作太阳能电池基板的基板的方法。在本实施例中，提供硅衬底并注入离子通量。将非硅衬底附着到硅的薄膜上以形成太阳能电池衬底。

5. 发明申请

US20090227062A1 PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF 有权
标题翻译：用于制造太阳能电池的图案组件及其方法
公开(公告)号：US20090227062A1
公开(公告)日：2009-09-10
申请号：US12205514
申请日：2008-09-05
申请人： Paul Sullivan , Peter Nunan , Steven R. Walther
发明人： Paul Sullivan , Peter Nunan , Steven R. Walther
IPC分类号： H01L31/18 , G21G4/00
CPC分类号： H01L31/022425 , H01L31/03529 , H01L31/068 , H01L31/0682 , Y02E10/547
摘要： Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.
摘要翻译：公开了用于制造太阳能电池的装置和方法。在特定实施例中，太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件，其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中，同时最小化将所述第一类型掺杂剂引入所述第一区域外的区域。

6. 发明申请

US20090081848A1 WAFER BONDING ACTIVATED BY ION IMPLANTATION 有权
标题翻译：离子植入激活的波形粘结
公开(公告)号：US20090081848A1
公开(公告)日：2009-03-26
申请号：US12212386
申请日：2008-09-17
申请人： Yuri EROKHIN , Paul SULLIVAN , Steven R. WALTHER , Peter NUNAN
发明人： Yuri EROKHIN , Paul SULLIVAN , Steven R. WALTHER , Peter NUNAN
IPC分类号： H01L21/46 , H01J37/08
CPC分类号： H01L21/76251 , H01J37/20 , H01J37/3171 , H01J2237/201 , H01J2237/202 , H01L21/26506 , H01L21/6835 , H01L2221/68359 , H01L2924/30105
摘要： A method for wafer bonding two substrates activated by ion implantation is disclosed. An in situ ion bonding chamber allows ion activation and bonding to occur within an existing process tool utilized in a manufacturing process line. Ion activation of at least one of the substrates is performed at low implant energies to ensure that the wafer material below the thin surface layers remains unaffected by the ion activation.
摘要翻译：公开了一种通过离子注入激活的晶片接合两个基板的方法。原位离子键合室允许离子激活和结合发生在制造工艺线中使用的现有工艺工具中。在低注入能量下进行至少一个衬底的离子激活，以确保薄表面层下面的晶片材料不受离子激活的影响。

7. 发明申请

US20120276684A1 PATTERNED ASSEMBLY FOR MANUFACTURING A SOLAR CELL AND A METHOD THEREOF 有权
标题翻译：用于制造太阳能电池的图案组件及其方法
公开(公告)号：US20120276684A1
公开(公告)日：2012-11-01
申请号：US13529702
申请日：2012-06-21
申请人： Paul Sullivan , Peter Nunan , Steven R. Walther
发明人： Paul Sullivan , Peter Nunan , Steven R. Walther
IPC分类号： H01L31/18
CPC分类号： H01L31/022425 , H01L31/03529 , H01L31/068 , H01L31/0682 , Y02E10/547
摘要： Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.
摘要翻译：公开了用于制造太阳能电池的装置和方法。在特定实施例中，太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件，其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中，同时最小化将所述第一类型掺杂剂引入所述第一区域外的区域。

8. 发明申请

US20110049359A1 ACTIVE PARTICLE TRAPPING FOR PROCESS CONTROL 失效
标题翻译：用于过程控制的主动粒子捕获
公开(公告)号：US20110049359A1
公开(公告)日：2011-03-03
申请号：US12943694
申请日：2010-11-10
申请人： Peter NUNAN , Gregory Redinbo , Julian Blake , Paul S. Buccos
发明人： Peter NUNAN , Gregory Redinbo , Julian Blake , Paul S. Buccos
IPC分类号： H01J49/00
CPC分类号： H01L21/67213 , C23C14/48 , C23C14/564 , H01L21/67017
摘要： A particle isolation system includes a semiconductor process chamber; at least one member within the semiconductor process chamber wherein the member has at least a first position and a second position; and at least one isolation compartment having a plurality of walls, the isolation compartment defined by the plurality of walls, at least one of the plurality of walls of the isolation compartment defining at least one opening wherein the member in the first position permits particles to enter the isolation compartment from the semiconductor process chamber through the opening, and wherein the member in the second position substantially encloses the isolation compartment thereby substantially retaining the particles in the isolation compartment and substantially limiting movement of the particles between the semiconductor process chamber and the isolation compartment through the opening. An ion implant system is also provided.
摘要翻译：粒子隔离系统包括半导体处理室; 所述半导体处理室内的至少一个构件，其中所述构件具有至少第一位置和第二位置; 以及至少一个具有多个壁的隔离室，隔离室由多个壁限定，隔离隔室的多个壁中的至少一个限定了至少一个开口，其中第一位置的构件允许颗粒进入所述隔离室通过所述开口与所述半导体处理室隔离，并且其中所述第二位置中的所述构件基本上包围所述隔离隔室，从而将所述颗粒基本上保持在所述隔离室中，并且基本上限制所述颗粒在所述半导体处理室和所述隔离室之间的运动通过开放。还提供离子注入系统。

9. 发明申请

US20080157007A1 Active particle trapping for process control 审中-公开
标题翻译：用于过程控制的活性颗粒捕集
公开(公告)号：US20080157007A1
公开(公告)日：2008-07-03
申请号：US11646155
申请日：2006-12-27
申请人： Peter Nunan , Gregory Redinbo , Julian Blake , Paul S. Buccos
发明人： Peter Nunan , Gregory Redinbo , Julian Blake , Paul S. Buccos
IPC分类号： H01J37/09
CPC分类号： H01L21/67213 , C23C14/48 , C23C14/564 , H01L21/67017
摘要： A particle isolation system includes a semiconductor process chamber; at least one member within the semiconductor process chamber wherein the member has at least a first position and a second position; and at least one isolation compartment having a plurality of walls, the isolation compartment defined by the plurality of walls, at least one of the plurality of walls of the isolation compartment defining at least one opening wherein the member in the first position permits particles to enter the isolation compartment from the semiconductor process chamber through the opening, and wherein the member in the second position substantially encloses the isolation compartment thereby substantially retaining the particles in the isolation compartment and substantially limiting movement of the particles between the semiconductor process chamber and the isolation compartment through the opening. An ion implant system is also provided.
摘要翻译：粒子隔离系统包括半导体处理室; 所述半导体处理室内的至少一个构件，其中所述构件具有至少第一位置和第二位置; 以及至少一个具有多个壁的隔离室，隔离室由多个壁限定，隔离隔室的多个壁中的至少一个限定了至少一个开口，其中第一位置的构件允许颗粒进入所述隔离室通过所述开口与所述半导体处理室隔离，并且其中所述第二位置中的所述构件基本上包围所述隔离隔室，从而将所述颗粒基本上保持在所述隔离室中，并且基本上限制所述颗粒在所述半导体处理室和所述隔离室之间的运动通过开放。还提供离子注入系统。

10. 发明授权

US07820460B2 Patterned assembly for manufacturing a solar cell and a method thereof 有权
标题翻译：用于制造太阳能电池的图案化组件及其方法
公开(公告)号：US07820460B2
公开(公告)日：2010-10-26
申请号：US12205514
申请日：2008-09-05
申请人： Paul Sullivan , Peter Nunan , Steven R. Walther
发明人： Paul Sullivan , Peter Nunan , Steven R. Walther
IPC分类号： H01L21/00 , H01L31/00 , C23C16/00
CPC分类号： H01L31/022425 , H01L31/03529 , H01L31/068 , H01L31/0682 , Y02E10/547
摘要： Apparatuses and methods for manufacturing a solar cell are disclosed. In a particular embodiment, the solar cell may be manufactured by disposing a solar cell in a chamber having a particle source; disposing a patterned assembly comprising an aperture and an assembly segment between the particle source and the solar cell; and selectively implanting first type dopants traveling through the aperture into a first region of the solar cell while minimizing introduction of the first type dopants into a region outside of the first region.
摘要翻译：公开了用于制造太阳能电池的装置和方法。在特定实施例中，太阳能电池可以通过在具有粒子源的室中设置太阳能电池来制造; 布置图案化组件，其包括孔和在所述颗粒源和所述太阳能电池之间的组件段; 以及将穿过所述孔的第一类型掺杂剂选择性地注入到所述太阳能电池的第一区域中，同时最小化将所述第一类型掺杂剂引入所述第一区域外的区域。

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