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1. 发明申请

US20130182234A1 Projection Exposure System and Projection Exposure Method 有权
标题翻译：投影曝光系统和投影曝光方法
公开(公告)号：US20130182234A1
公开(公告)日：2013-07-18
申请号：US13786134
申请日：2013-03-05
申请人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
发明人： Paul Graupner , Olaf Conradi , Christoph Zaczek , Wilhelm Ulrich , Helmut Beierl , Toralf Gruner , Volker Graeschus
IPC分类号： G03F7/20
CPC分类号： G03F7/70191 , G03F7/70308
摘要： A projection exposure system includes an illumination system configured to illuminate a mask with radiation. The projection exposure system also includes a projection objective configured to project an image of a pattern of the mask onto a radiation-sensitive substrate. The projection exposure system further includes an angle-selective filter arrangement arranged at or close to a field surface of the projection objective in a projection beam path optically downstream of the object surface. The angle-selective filter arrangement is effective to filter radiation incident on the filter arrangement according to an angle-selective filter function.
摘要翻译：投影曝光系统包括被配置为用辐射照射掩模的照明系统。投影曝光系统还包括被配置为将掩模的图案的图像投影到辐射敏感基板上的投影物镜。投影曝光系统还包括在物镜表面光学下游的投影光束路径中布置在投影物镜的场表面处或其附近的角度选择滤光器装置。角度选择滤波器装置可以根据角度选择滤波器功能对入射到滤波器装置上的辐射进行滤波。

2. 发明申请

US20060171020A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20060171020A1
公开(公告)日：2006-08-03
申请号：US11392027
申请日：2006-03-29
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/14 , G02B3/00
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

3. 发明申请

US20050122594A1 Objective with fluoride crystal lenses 有权
标题翻译：目标是氟化物晶体镜片
公开(公告)号：US20050122594A1
公开(公告)日：2005-06-09
申请号：US11029788
申请日：2005-01-05
申请人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
发明人： Daniel Krahmer , Toralf Gruner , Wilhelm Ulrich , Birgit Enkisch , Michael Gerhard , Martin Brunotte , Christian Wagner , Winfried Kaiser , Manfred Maul , Christoph Zaczek
IPC分类号： G02B13/24 , G02B1/02 , G02B5/30 , G02B17/08 , G03F7/20 , H01L21/027 , G02B27/28
CPC分类号： G03F7/70966 , G02B1/02 , G02B1/08 , G02B5/3083 , G03F7/70225 , G03F7/70241 , G03F7/70566 , G03F7/70958 , Y10S359/90
摘要： An objective for a microlithography projection system has at least one fluoride crystal lens. The effects of birefringence, which are detrimental to the image quality, are reduced if the lens axis of the crystal lens is oriented substantially perpendicular to the {100}-planes or {100}-equivalent crystallographic planes of the fluoride crystal. If two or more fluoride crystal lenses are used, they should have lens axes oriented in the (100)-, (111)-, or (110)-direction of the crystallographic structure, and they should be oriented at rotated positions relative to each other. The birefringence-related effects are further reduced by using groups of mutually rotated (100)-lenses in combination with groups of mutually rotated (111)- or (110)-lenses. A further improvement is also achieved by applying a compensation coating to at least one optical element of the objective.
摘要翻译：微光刻投影系统的目的在于至少有一个氟化物晶体透镜。如果晶体透镜的透镜轴基本上垂直于氟化物晶体的{100} - 平面或{100}等价晶面而取向，对图像质量有害的双折射效应将被降低。如果使用两个或多个氟化物晶体透镜，它们应该具有在晶体结构的（100） - ，（111） - 或（110）方向上定向的透镜轴，并且它们应当相对于每个其他。通过使用相互旋转（100） - 相互组合的组相互旋转（111） - 或（110） - 相组合来进一步减少双折射相关效应。通过对物镜的至少一个光学元件施加补偿涂层也可实现进一步的改进。

4. 发明申请

US20080291419A1 PROJECTION OBJECTIVE FOR IMMERSION LITHOGRAPHY 审中-公开
公开(公告)号：US20080291419A1
公开(公告)日：2008-11-27
申请号：US12187116
申请日：2008-08-06
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Guenter Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Sigrid Scheible
IPC分类号： G03B27/54 , G03B27/32
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

5. 发明申请

US20050225737A1 Projection objective for immersion lithography 有权
标题翻译：浸没光刻的投影目标
公开(公告)号：US20050225737A1
公开(公告)日：2005-10-13
申请号：US11015553
申请日：2004-12-20
申请人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
发明人： Karl-Stefan Weissenrieder , Alexander Hirnet , Alexandra Pazidis , Karl-Heinz Schuster , Christoph Zaczek , Michael Lill , Patrick Scheible , Harald Schink , Markus Brotsack , Ulrich Loering , Toralf Gruner , Guenter Scheible
IPC分类号： G03B27/42 , G03F7/20
CPC分类号： G03F7/70983 , G03F7/70341
摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
摘要翻译：在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

6. 发明申请

US20060132917A1 Method for making an optical system with coated optical components and optical system made by the method 审中-公开
标题翻译：用该方法制造具有涂层光学部件和光学系统的光学系统的方法
公开(公告)号：US20060132917A1
公开(公告)日：2006-06-22
申请号：US11274152
申请日：2005-11-16
申请人： Christoph Zaczek , Thomas Muelders , Toralf Gruner
发明人： Christoph Zaczek , Thomas Muelders , Toralf Gruner
IPC分类号： G02B27/28
CPC分类号： G03F7/70958 , G02B27/0012 , G02B27/283 , G03F7/705
摘要： In a method for making an optical system for imaging a radiation distribution from an input surface of the optical system into an output surface of the optical system, the optical system has a multiplicity of optical components which determine an imaging quality of the optical system, which are arranged along an optical axis of the optical system and comprise at least one optical component which has a substrate with a substrate surface which is provided for carrying an interference layer system having a layer construction that determines the optical properties of the optical component covered with the interference layer system. The method includes: predefining an optimization target for at least one imaging quality parameter that represents the imaging quality of the system; determining the imaging quality of the optical system while taking account of the layer construction of the interference layer system; and varying the layer construction for approximating the imaging quality parameter to the optimization target. In accordance with the method, the determination of the optimum layer construction is coupled directly with an assessment and of the imaging quality of the total system including the interference layer system to be optimized.
摘要翻译：在制造用于将从光学系统的输入表面的辐射分布成像到光学系统的输出表面的光学系统的方法中，光学系统具有多个光学部件，其确定光学系统的成像质量，沿着光学系统的光轴布置并且包括至少一个光学部件，该光学部件具有衬底，该衬底具有衬底表面，衬底表面被提供用于承载具有层结构的干涉层系统，所述层结构决定了被覆盖的光学部件的光学特性干涉层系统。该方法包括：为表示系统的成像质量的至少一个成像质量参数预定义优化目标; 在考虑到干涉层系统的层结构的同时确定光学系统的成像质量; 并且改变用于将成像质量参数近似到优化目标的层结构。根据该方法，最佳层结构的确定直接与包括要优化的干涉层系统的总体系统的评估和成像质量相耦合。

7. 发明授权

US10146137B2 Catadioptric projection objective including a reflective optical component and a measuring device 有权
公开(公告)号：US10146137B2
公开(公告)日：2018-12-04
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03F7/20 , G02B13/14 , G02B17/08
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.

8. 发明申请

US20120218536A1 CATADIOPTRIC PROJECTION OBJECTIVE INCLUDING A REFLECTIVE OPTICAL COMPONENT AND A MEASURING DEVICE 审中-公开
标题翻译：反射光学元件和测量装置的目标投影目标
公开(公告)号：US20120218536A1
公开(公告)日：2012-08-30
申请号：US13423344
申请日：2012-03-19
申请人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
发明人： Sascha Bleidistel , Toralf Gruner , Christoph Zaczek , Ralf Mueller
IPC分类号： G03B27/42
CPC分类号： G03F7/70258 , G02B13/143 , G02B17/0856 , G02B17/0892 , G03F7/70225 , G03F7/706
摘要： A catadioptric projection objective for images an object field onto an image field via imaging radiation. The projection objective includes at least one reflective optical component and a measuring device. The reflective optical component, during the operation of the projection objective, reflects a first part of the imaging radiation and transmits a second part of the imaging radiation. The reflected, first part of the imaging radiation at least partly contributes to the imaging of the object field. The transmitted, second part of the imaging radiation is at least partly fed to a measuring device. This allows a simultaneous exposure of the photosensitive layer at the location of the image field with the imaging radiation and monitoring of the imaging radiation with the aid of the measuring device.
摘要翻译：用于通过成像辐射将物体场映射到图像场上的反射折射投影物镜。投影物镜包括至少一个反射光学部件和测量装置。在投影物镜的操作期间，反射光学部件反射成像辐射的第一部分并透射成像辐射的第二部分。成像辐射的反射的第一部分至少部分地有助于对象场的成像。成像辐射的透射的第二部分至少部分地被馈送到测量装置。这允许在成像辐射的图像位置处的感光层同时曝光并借助测量装置监测成像辐射。

9. 发明授权

US06842294B2 Catadioptric objective 失效
标题翻译：反射折射目标
公开(公告)号：US06842294B2
公开(公告)日：2005-01-11
申请号：US10118479
申请日：2002-04-08
申请人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
发明人： Hubert Holderer , Ulrich Weber , Alexander Kohl , Toralf Gruner , Christoph Zaczek , Jens Ullmann , Martin Weiser , Bernhard Gellrich , Hartmut Muenker
IPC分类号： G02B17/08 , G03F7/20 , H01L21/027 , G02B3/00 , G02B17/00
CPC分类号： G02B17/0892 , G02B17/08 , G03F7/70225
摘要： A catadioptric objective comprises a plurality of lenses and at least two deflecting mirrors that have reflecting surfaces that are at a specific angle, in particular of 90°, to one another. The two deflecting mirrors are arranged with their reflecting surfaces on a common base member whose position in the objective can be set.
摘要翻译：反射折射物镜包括多个透镜和至少两个偏转镜，其具有彼此具有特定角度，特别是90°的反射表面。两个偏转镜被布置成其反射表面位于可以设置物镜中的位置的公共基座构件上。

10. 发明申请

US20050264884A1 Projection objective for microlithography 审中-公开
标题翻译：微光刻的投影目标
公开(公告)号：US20050264884A1
公开(公告)日：2005-12-01
申请号：US11059364
申请日：2005-02-17
申请人： Christoph Zaczek , David Shafer , Wilhelm Ulrich
发明人： Christoph Zaczek , David Shafer , Wilhelm Ulrich
IPC分类号： G02B5/30 , G02B17/08 , G02B27/28 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/045 , G02B27/283 , G03F7/70225
摘要： A projection objective (5) for microlithography for projecting a pattern arranged in an object plane (8) of the projection objective (5) has in the light path between the object plane (8) and the image plane (11) at least one beam deflecting device (19) with at least one totally reflective surface (17) that is inclined to an incidence direction of the radiation incident on the totally reflective surface (17) in such a way that substantially all the radiation coming from the object plane (8) and striking the totally reflective surface (17) is totally reflected at the totally reflective surface (17). A high reflectivity in conjunction with high angle of incidence with respect to the surface normal to the totally reflective surface (17) can be achieved with the aid of the beam deflecting device (19). In the case of catadioptric projection objectives, in particular, it is possible thereby to fashion designs that without the use of total reflection for beam deflection can be implemented only with a substantially greater outlay on construction.
摘要翻译：用于突出布置在投影物镜（5）的物平面（8）中的图案的用于微光刻的投影物镜（5）在物平面（8）和像平面（11）之间的光路中具有至少一个光束偏转装置（19）具有与入射在全反射表面（17）上的辐射的入射方向倾斜的至少一个全反射表面（17），使得基本上所有来自物平面（8）的辐射）和撞击全反射表面（17）在全反射表面（17）处被全反射。借助于光束偏转装置（19），可以实现高反射率和高入射角相对于垂直于全反射表面（17）的表面。在反射折射投影物镜的情况下，特别地，可以设计出不需要使用用于光束偏转的全反射的设计，只能在施工上实现更大的花费。

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