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1. 发明授权

US08804780B2 Method for adjusting spectral line width of narrow-band laser 有权
标题翻译：调整窄带激光光谱线宽度的方法
公开(公告)号：US08804780B2
公开(公告)日：2014-08-12
申请号：US11822126
申请日：2007-07-02
申请人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
发明人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
IPC分类号： H01S3/13 , H01S3/137
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译：对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量曝光工具可以稳定。

2. 发明申请

US20080181262A1 Method for adjusting spectral line width of narrow-band laser 有权
标题翻译：调整窄带激光光谱线宽度的方法
公开(公告)号：US20080181262A1
公开(公告)日：2008-07-31
申请号：US11822126
申请日：2007-07-02
申请人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
发明人： Osamu Wakabayashi , Takahito Kumazaki , Toru Suzuki , Masashi Shinbori , Masaya Yoshino
IPC分类号： H01S3/10
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译：对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量曝光工具可以稳定。

3. 发明授权

US08611393B2 Laser apparatus 有权
标题翻译：激光设备
公开(公告)号：US08611393B2
公开(公告)日：2013-12-17
申请号：US13421116
申请日：2012-03-15
申请人： Junichi Fujimoto , Takahito Kumazaki , Toru Suzuki , Satoshi Tanaka , Osamu Wakabayashi
发明人： Junichi Fujimoto , Takahito Kumazaki , Toru Suzuki , Satoshi Tanaka , Osamu Wakabayashi
IPC分类号： H01S3/08
CPC分类号： H01S3/106 , H01S3/005 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0971 , H01S3/2316 , H01S3/2333
摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.
摘要翻译：本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系统来切换光束宽度放大率或缩小因子的切换机构或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系统的取向反转。

4. 发明申请

US20070091968A1 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US20070091968A1
公开(公告)日：2007-04-26
申请号：US10554537
申请日：2004-04-16
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/22 , H01S3/093
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

5. 发明授权

US07903700B2 Narrow-spectrum laser device 有权
标题翻译：窄谱激光装置
公开(公告)号：US07903700B2
公开(公告)日：2011-03-08
申请号：US11631463
申请日：2005-07-07
申请人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
发明人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
IPC分类号： H01S3/10 , H01S3/22
CPC分类号： H01S3/2366 , H01S3/134 , H01S3/225
摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.
摘要翻译：通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E95）。为了使测得的光谱纯度范围（E95）在目标光谱纯度范围（E950）的允许范围E950±dE95内，从通过振荡激光装置（100）开始放电的时间到放电为止的放电时间由放大激光装置（300）开始的光谱纯度范围（E95）被控制为稳定。

6. 发明授权

US07756183B2 Line narrowed laser apparatus 有权
标题翻译：线窄激光设备
公开(公告)号：US07756183B2
公开(公告)日：2010-07-13
申请号：US11453519
申请日：2006-06-15
申请人： Osamu Wakabayashi , Takahito Kumazaki
发明人： Osamu Wakabayashi , Takahito Kumazaki
IPC分类号： H01S3/09 , H01S3/10
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/0971 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2258 , H01S3/2308
摘要： The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.
摘要翻译：光谱纯度宽度E95的控制在对中心波长的控制实际上没有影响的同时进行，光谱纯度宽度E95稳定。波前调整器32设置在光谐振器的内部的输出侧，即在输出耦合器31侧。在激光室10中产生的光从激光室10侧透射通过波前调整器32，并到达输出耦合器31.在波前调整器32中，调节凹凸透镜33和34之间的距离，使得期望的可以得到光谱纯度宽度E95。然后，当光通过波前调整器32时，光的波前被调整到期望的波前。

7. 发明申请

US20070014326A1 Line narrowed laser apparatus 有权
标题翻译：线窄激光设备
公开(公告)号：US20070014326A1
公开(公告)日：2007-01-18
申请号：US11453519
申请日：2006-06-15
申请人： Osamu Wakabayashi , Takahito Kumazaki
发明人： Osamu Wakabayashi , Takahito Kumazaki
IPC分类号： H01S3/22 , H01S3/097 , H01S3/08 , H01S3/223
CPC分类号： H01S3/08009 , H01S3/08031 , H01S3/0971 , H01S3/1055 , H01S3/137 , H01S3/225 , H01S3/2258 , H01S3/2308
摘要： The control of the spectral purity width E95 is performed while imparting practically no effect to the control of a central wavelength, and the spectral purity width E95 is stabilized. A wavefront adjuster 32 is provided on an output side of the interior of an optical resonator, i.e., on an output coupler 31 side. Light generated in a laser chamber 10 is transmitted through the wavefront adjuster 32 from the laser chamber 10 side, and reaches the output coupler 31. In the wavefront adjuster 32, the distance between concave and convex lenses 33 and 34 is adjusted so that a desired spectral purity width E95 can be obtained. Then, when the light passes through the wavefront adjuster 32, the wavefront of the light is adjusted to a desired wavefront.
摘要翻译：光谱纯度宽度E 95的控制在对中心波长的控制实际上没有影响的同时进行，光谱纯度宽度E 95稳定。波前调整器32设置在光谐振器的内部的输出侧，即在输出耦合器31侧。在激光室10中产生的光从激光室10侧透过波前调整器32，到达输出耦合器31。在波前调整器32中，调节凹凸透镜33和34之间的距离，使得可以获得期望的光谱纯度宽度E 95。然后，当光通过波前调整器32时，光的波前被调整到期望的波前。

8. 发明授权

US08817839B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US08817839B2
公开(公告)日：2014-08-26
申请号：US13468817
申请日：2012-05-10
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/083
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

9. 发明授权

US08116347B2 Two-stage laser system for aligners 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US08116347B2
公开(公告)日：2012-02-14
申请号：US10554537
申请日：2004-04-16
申请人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu Wakabayashi , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

10. 发明申请

US20110216800A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 审中-公开
标题翻译：对准器的两级激光系统
公开(公告)号：US20110216800A1
公开(公告)日：2011-09-08
申请号：US13107247
申请日：2011-05-13
申请人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S5/50
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

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