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1. 发明申请

US20120224600A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US20120224600A1
公开(公告)日：2012-09-06
申请号：US13468817
申请日：2012-05-10
申请人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
发明人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
IPC分类号： H01S3/22
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

2. 发明申请

US20140369373A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 审中-公开
标题翻译：对准器的两级激光系统
公开(公告)号：US20140369373A1
公开(公告)日：2014-12-18
申请号：US14245371
申请日：2014-04-04
申请人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
发明人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
IPC分类号： H01S3/23 , H01S3/083
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

3. 发明申请

US20110216800A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 审中-公开
标题翻译：对准器的两级激光系统
公开(公告)号：US20110216800A1
公开(公告)日：2011-09-08
申请号：US13107247
申请日：2011-05-13
申请人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
发明人： Osamu WAKABAYASHI , Tatsuya Ariga , Takahito Kumazaki , Kotaro Sasano
IPC分类号： H01S5/50
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

4. 发明申请

US20070297483A1 TWO-STAGE LASER SYSTEM FOR ALIGNERS 有权
标题翻译：对准器的两级激光系统
公开(公告)号：US20070297483A1
公开(公告)日：2007-12-27
申请号：US11566235
申请日：2006-12-03
申请人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
发明人： Osamu WAKABAYASHI , Tatsuya ARIGA , Takahito KUMAZAKI , Kotaro SASANO
IPC分类号： H01S3/082
CPC分类号： H01S3/2308 , G03F7/70025 , H01S3/083
摘要： The invention relates to a two-stage laser system well fit for semiconductor aligners, which is reduced in terms of spatial coherence while taking advantage of the high stability, high output efficiency and fine line width of the MOPO mode. The two-stage laser system for aligners comprises an oscillation-stage laser (50) and an amplification-stage laser (60). Oscillation laser light having divergence is used as the oscillation-stage laser (50), and the amplification-stage laser (60) comprises a Fabry-Perot etalon resonator made up of an input side mirror (1) and an output side mirror (2). The resonator is configured as a stable resonator.
摘要翻译：本发明涉及一种适用于半导体对准器的两级激光系统，其在利用MOPO模式的高稳定性，高输出效率和细线宽度的同时，在空间相干性方面被减少。用于对准器的两级激光系统包括振荡级激光器（50）和放大级激光器（60）。具有发散的振荡激光用作振荡级激光器（50），放大级激光器（60）包括由输入侧反射镜（1）和输出侧反射镜（2）构成的法布里 - 珀罗标准具共振器）。谐振器被配置为稳定谐振器。

5. 发明申请

US20120236884A1 LASER APPARATUS 有权
标题翻译：激光装置
公开(公告)号：US20120236884A1
公开(公告)日：2012-09-20
申请号：US13421116
申请日：2012-03-15
申请人： Junichi FUJIMOTO , Takahito KUMAZAKI , Toru SUZUKI , Satoshi TANAKA , Osamu WAKABAYASHI
发明人： Junichi FUJIMOTO , Takahito KUMAZAKI , Toru SUZUKI , Satoshi TANAKA , Osamu WAKABAYASHI
IPC分类号： H01S3/10
CPC分类号： H01S3/106 , H01S3/005 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0971 , H01S3/2316 , H01S3/2333
摘要： This disclosure is directed to widen an adjustable range of the spectral linewidth of laser light output from a laser apparatus. This laser apparatus may include: (1) an excitation source configured to excite a laser medium in a laser gain space, (2) an optical resonator including an output coupler arranged on one side of an optical path through the laser gain space and a wavelength dispersion element arranged on the other side of the optical path through the laser gain space, and (3) a switching mechanism configured to switch a beam-width magnification or reduction factor by placing or removing at least one beam-width change optical system for expanding or reducing a beam width in or from an optical path between the laser gain space and the wavelength dispersion element or by inverting orientation of the at least one beam-width change optical system in the optical path.
摘要翻译：本公开旨在扩大从激光设备输出的激光的谱线宽度的可调范围。该激光装置可以包括：（1）激励源，被配置为在激光增益空间中激发激光介质，（2）光学谐振器，包括布置在通过激光增益空间的光路的一侧上的输出耦合器，以及波长通过激光增益空间布置在光路的另一侧的色散元件，以及（3）配置为通过放置或去除至少一个用于扩展的光束宽度改变光学系统来切换光束宽度放大率或缩小因子的切换机构或者减小激光增益空间和波长色散元件之间的光路中的光束宽度，或者通过使光路中的至少一个光束宽度改变光学系统的取向反转。

6. 发明申请

US20140307244A1 METHOD FOR ADJUSTING SPECTRUM WIDTH OF NARROW-BAND LASER 审中-公开
标题翻译：调整窄带激光的光谱宽度的方法
公开(公告)号：US20140307244A1
公开(公告)日：2014-10-16
申请号：US14316904
申请日：2014-06-27
申请人： Osamu WAKABAYASHI , Takahito KUMAZAKI , Toru SUZUKI , Masashi SHINBORI , Masaya YOSHINO
发明人： Osamu WAKABAYASHI , Takahito KUMAZAKI , Toru SUZUKI , Masashi SHINBORI , Masaya YOSHINO
IPC分类号： G03F7/20
CPC分类号： G03F7/2006 , H01S3/08036 , H01S3/106 , H01S3/137 , H01S3/139 , H01S3/225
摘要： An upper limit and a lower limit are preliminarily set for a spectral line width common to a plurality of narrow-band laser devices. When delivered or subjected to maintenance, the narrow-band laser device is caused to laser oscillate to detect its spectral line width before it is used as a light source for semiconductor exposure. A spectral line width adjustment unit provided in the narrow-band laser device is adjusted so that the spectral line width assumes a value between the upper limit and the lower limit. The present invention is able to suppress the variation in spectral line width such as E95 bandwidth caused by machine differences during the manufacture of the laser device, or by replacement or maintenance of the laser device, whereby the quality of integrated circuit patterns formed by the semiconductor exposure tool can be stabilized.
摘要翻译：对于多个窄带激光装置共有的谱线宽度，预先设定上限和下限。当交付或进行维护时，使窄带激光装置激光振荡，以便在用作半导体曝光的光源之前检测其光谱线宽度。调整设置在窄带激光装置中的谱线宽度调节单元，使得谱线宽度呈现上限和下限之间的值。本发明能够抑制激光装置的制造时的机器差异引起的E95带宽等的频谱线宽度的变化，或者通过更换或维护激光装置，能够抑制由半导体形成的集成电路图案的质量曝光工具可以稳定。

7. 发明申请

US20120068091A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, LASER LIGHT SOURCE DEVICE FOR EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE, AND METHOD FOR CONTROLLING SATURABLE ABSORBER USED IN EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE 有权
标题翻译：超大型紫外线光源装置，用于超紫外线光源装置的激光光源装置，以及用于控制在极光紫外光源装置中使用的可饱和吸收体的方法
公开(公告)号：US20120068091A1
公开(公告)日：2012-03-22
申请号：US13306358
申请日：2011-11-29
申请人： Akira ENDO , Krzysztof NOWAK , Hideo HOSHINO , Tatsuya ARIGA , Masato MORIYA , Osamu WAKABAYASHI
发明人： Akira ENDO , Krzysztof NOWAK , Hideo HOSHINO , Tatsuya ARIGA , Masato MORIYA , Osamu WAKABAYASHI
IPC分类号： G21K5/00 , H01S3/04
CPC分类号： H05G2/003 , H01S3/005 , H01S3/0064 , H01S3/2316 , H05G2/008
摘要： An EUV light source of the present invention is capable of using a saturable absorber stably and continuously in a high heat load state. A saturable absorber (SA) device is disposed on a laser beam line to absorb feeble light, such as self-excited oscillation light, parasitic oscillation light or return light. SA gas from an SA gas cylinder and buffer gas from a buffer gas cylinder are mixed to be a mixed gas. The mixed gas is supplied to an SA gas cell via a supply pipeline, and absorbs the feeble light included in the laser beam. The mixed gas is exhausted via an exhaust pipeline, and is sent to a heat exchanger. The mixed gas, cooled down by a heat exchanger, is sent back to the SA gas cell by a circulation pump.
摘要翻译：本发明的EUV光源能够在高热负荷状态下稳定且连续地使用饱和吸收体。可饱和吸收体（SA）装置设置在激光束线上以吸收诸如自激振荡光，寄生振荡光或返回光的微弱光。来自SA气瓶的SA气体和来自缓冲气瓶的缓冲气体混合成混合气体。混合气体经由供给管路供给到SA气室，吸收激光束中包含的微弱光。混合气体通过排气管道排出，并被送到热交换器。由热交换器冷却的混合气体通过循环泵送回到SA气室。

8. 发明申请

US20150139258A1 LASER APPARATUS AND METHOD OF CONTROLLING LASER APPARATUS 有权
标题翻译：激光装置和控制激光装置的方法
公开(公告)号：US20150139258A1
公开(公告)日：2015-05-21
申请号：US14602208
申请日：2015-01-21
申请人： Hiroaki TSUSHIMA , Osamu WAKABAYASHI , Takashi MATSUNAGA
发明人： Hiroaki TSUSHIMA , Osamu WAKABAYASHI , Takashi MATSUNAGA
IPC分类号： H01S3/097
CPC分类号： H01S3/09702 , H01S3/0014 , H01S3/08009 , H01S3/09705 , H01S3/0971 , H01S3/2366
摘要： A laser apparatus according to embodiment may include: a laser chamber filled with a laser gain medium; a pair of electrodes disposed in the laser chamber; a charger configured to apply a charge voltage for causing a discharge to occur between the pair of the electrodes; a pulse power module configured to covert the charge voltage applied by the charger into a short pulsed voltage, and apply the short pulsed voltage between the pair of the electrodes; and a controller configured to calculate input energies Ein applied to the pair of the electrodes based on the charge voltage, calculate an integration value Einsum of the input energies Ein by integrating the calculated input energies Ein, and determine whether the integration value Einsum exceeds an integration lifetime value Einsumlife of input energy or not.
摘要翻译：根据实施例的激光装置可以包括：填充有激光增益介质的激光室; 设置在激光室中的一对电极; 充电器，被配置为施加用于在所述一对电极之间发生放电的充电电压; 脉冲功率模块，被配置为将由充电器施加的充电电压转换成短脉冲电压，并且在一对电极之间施加短脉冲电压; 以及控制器，被配置为基于所述充电电压来计算施加到所述一对电极的输入能量Ein，通过对所计算的输入能量Ein进行积分来计算输入能量Ein的积分值Einsum，并且确定积分值Einsum是否超过积分输入能量的寿命值Einsumlife。

9. 发明申请

US20130215916A1 LASER APPARATUS 有权
标题翻译：激光装置
公开(公告)号：US20130215916A1
公开(公告)日：2013-08-22
申请号：US13590558
申请日：2012-08-21
申请人： Kouji KAKIZAKI , Shinji OKAZAKI , Osamu WAKABAYASHI , Takashi ONOSE , Shinichi MATSUMOTO
发明人： Kouji KAKIZAKI , Shinji OKAZAKI , Osamu WAKABAYASHI , Takashi ONOSE , Shinichi MATSUMOTO
IPC分类号： H01S3/10 , H01S5/06
CPC分类号： H01S3/10 , H01S3/005 , H01S3/08004 , H01S3/08086 , H01S3/10092 , H01S3/1055 , H01S3/106 , H01S3/1625 , H01S3/225 , H01S3/2251 , H01S3/2325 , H01S3/235 , H01S3/2375 , H01S5/0092 , H01S5/0604 , H01S5/06216 , H01S5/4012 , H01S5/4087
摘要： A laser apparatus includes a master oscillator capable of outputting a laser beam having a spectrum that includes at least three wavelength peaks, a multi-wavelength oscillation control mechanism capable of controlling energy of each of the wavelength peaks, a spectrum detecting unit that detects the spectrum of the above-mentioned laser beam, and a controller that controls the multi-wavelength oscillation control mechanism based on a detection result detected by the spectrum detecting unit.
摘要翻译：激光装置包括能够输出具有包括至少三个波长峰值的光谱的激光束的主振荡器，能够控制每个波长峰值的能量的多波长振荡控制机构，检测频谱的频谱检测单元以及控制器，其基于由所述频谱检测单元检测到的检测结果来控制所述多波长振荡控制机构。

10. 发明申请

US20120248344A1 EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM 有权
标题翻译：极致超紫外光发生系统
公开(公告)号：US20120248344A1
公开(公告)日：2012-10-04
申请号：US13523446
申请日：2012-06-14
申请人： Osamu WAKABAYASHI , Tatsuya Yanagida
发明人： Osamu WAKABAYASHI , Tatsuya Yanagida
IPC分类号： G21K5/00
CPC分类号： H05G2/008 , H05G2/005
摘要： An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
摘要翻译：与激光装置一起使用的装置可以包括：室，用于将目标材料供应到室内的区域的目标供应源，用于将来自该区域中的激光装置的激光束聚焦的激光束聚焦光学系统，以及光学系统用于控制激光束的光束强度分布。

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