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1. 发明授权

US07903700B2 Narrow-spectrum laser device 有权
标题翻译：窄谱激光装置
公开(公告)号：US07903700B2
公开(公告)日：2011-03-08
申请号：US11631463
申请日：2005-07-07
申请人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
发明人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
IPC分类号： H01S3/10 , H01S3/22
CPC分类号： H01S3/2366 , H01S3/134 , H01S3/225
摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.
摘要翻译：通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E95）。为了使测得的光谱纯度范围（E95）在目标光谱纯度范围（E950）的允许范围E950±dE95内，从通过振荡激光装置（100）开始放电的时间到放电为止的放电时间由放大激光装置（300）开始的光谱纯度范围（E95）被控制为稳定。

2. 发明申请

US20080285602A1 Narrow-Spectrum Laser Device 有权
标题翻译：窄谱激光装置
公开(公告)号：US20080285602A1
公开(公告)日：2008-11-20
申请号：US11631463
申请日：2005-07-07
申请人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
发明人： Shinji Nagai , Osamu Wakabayashi , Koji Kakizaki , Takayuki Yabu , Takahito Kumazaki
IPC分类号： H01S3/10 , H01S3/13
CPC分类号： H01S3/2366 , H01S3/134 , H01S3/225
摘要： A spectral purity range (E95) of a laser beam output from an amplifying laser device (300) is measured by spectral purity range measuring means. To have the measured spectral purity range (E95) within an allowable range E950±dE95 of a target spectral purity range (E950), discharge timing from a time when discharge is started by an oscillating laser device (100) to a time when discharge is started by the amplifying laser device (300) is controlled, and the spectral purity range (E95) is controlled to be stabilized.
摘要翻译：通过光谱纯度范围测量装置测量从放大激光器件（300）输出的激光束的光谱纯度范围（E 95）。为了使测量的光谱纯度范围（E 95）在目标光谱纯度范围（E 950）的允许范围E 950±dE 95内，从通过振荡激光装置（100）开始放电的时间到由放大激光装置（300）开始放电的时间被控制，光谱纯度范围（E 95）被控制为稳定。

3. 发明申请

US20130134326A1 EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, TARGET COLLECTION DEVICE, AND TARGET COLLECTION METHOD 审中-公开
标题翻译：极光紫外线发光装置，目标收集装置和目标收集方法
公开(公告)号：US20130134326A1
公开(公告)日：2013-05-30
申请号：US13595312
申请日：2012-08-27
申请人： Takayuki Yabu , Youichi Sasaki , Yulaka Shiraishi , Shinji Nagai , Osamu Wakabayashi
发明人： Takayuki Yabu , Youichi Sasaki , Yulaka Shiraishi , Shinji Nagai , Osamu Wakabayashi
IPC分类号： G21K5/02 , B65B63/08
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/005 , H05G2/006
摘要： A target collection device may include a collection container having an opening through which a target material is collected into the collection container, and a temperature adjuster configured to adjust a temperature of the collection container to a temperature that is equal to or higher than a melting point of the target material. The target collection device may be part of an extreme ultraviolet light generation apparatus. Methods of target collection are also provided.
摘要翻译：目标收集装置可以包括具有开口的收集容器，目标材料通过该开口被收集到收集容器中;温度调节器，被配置为将收集容器的温度调节到等于或高于熔点的温度的目标材料。目标收集装置可以是极紫外光发生装置的一部分。还提供目标收集方法。

4. 发明申请

US20100176310A1 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US20100176310A1
公开(公告)日：2010-07-15
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： H01J99/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

5. 发明授权

US08294129B2 Extreme ultraviolet light source apparatus 有权
标题翻译：极紫外光源设备
公开(公告)号：US08294129B2
公开(公告)日：2012-10-23
申请号：US13081899
申请日：2011-04-07
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.
摘要翻译： EUV光源装置可以可靠地检测并准确地判断设置在EUV光产生室内的激光束聚焦光学元件中的光学元件的劣化。该EUV光源装置包括：EUV光产生室; 目标材料供应单位; EUV集光镜; 驱动激光器一个窗口; 抛物面镜，其通过反射聚焦准直激光束并设置在EUV光产生室内; 能量检测器，当不产生EUV光时，检测在被激光束聚焦光学器件聚焦之后不会施加到目标材料上的激光束的能量扩散; 以及处理单元，用于根据由能量检测器检测的激光束能量来判断窗口和抛物面镜的劣化。

6. 发明授权

US08173984B2 Extreme ultraviolet light source apparatus 有权
公开(公告)号：US08173984B2
公开(公告)日：2012-05-08
申请号：US12382964
申请日：2009-03-27
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： A61N5/06 , G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An EUV light source apparatus can reliably detect and accurately judge deterioration of an optical element in a laser beam focusing optics disposed within an EUV light generation chamber. This EUV light source apparatus includes: the EUV light generation chamber; a target material supply unit; an EUV light collector mirror; a driver laser; a window; a parabolic mirror which focuses collimated laser beam by reflection and is disposed within the EUV light generation chamber; an energy detector detecting energy of the laser beam diffused without being applied to a target material after being focused by the laser beam focusing optics when the EUV light is not generated; and a processing unit for judging the deterioration of the window and the parabolic mirror according to the laser beam energy detected by the energy detector.

7. 发明授权

US08497489B2 Chamber apparatus and method of maintaining target supply unit 有权
标题翻译：维护目标供应单位的室内设备和方法
公开(公告)号：US08497489B2
公开(公告)日：2013-07-30
申请号：US13051649
申请日：2011-03-18
申请人： Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Yukio Watanabe , Osamu Wakabayashi
IPC分类号： G01K5/00
CPC分类号： G03F7/70033 , H05G2/005 , H05G2/006 , H05G2/008
摘要： A chamber apparatus used with a laser apparatus may include: a chamber provided with at least one inlet for introducing thereinto a laser beam outputted from the laser apparatus; a target supply unit provided to the chamber for supplying a target material to a predetermined region in the chamber; a recovery control unit for instructing the target supply unit to execute recovery operation if a predetermined condition is met; a recovery unit for executing the recovery operation in response to the instruction from the recovery control unit; and a position measuring unit for measuring a position of the target material supplied from the target supply unit into the chamber.
摘要翻译：与激光装置一起使用的室装置可以包括：设置有至少一个入口的室，用于将从激光装置输出的激光束引入其中; 目标供给单元，其设置在所述室中，用于将目标材料供应到所述室中的预定区域; 恢复控制单元，用于在满足预定条件时指示目标供应单元执行恢复操作; 恢复单元，用于响应于来自恢复控制单元的指令执行恢复操作; 以及位置测量单元，用于测量从目标供应单元供应到室中的目标材料的位置。

8. 发明授权

US08698112B2 Extreme ultraviolet light generation apparatus 有权
标题翻译：极紫外光发生装置
公开(公告)号：US08698112B2
公开(公告)日：2014-04-15
申请号：US13396289
申请日：2012-02-14
申请人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
发明人： Takayuki Yabu , Kouji Kakizaki , Takanobu Ishihara , Tamotsu Abe , Osamu Wakabayashi
IPC分类号： H01J35/20
CPC分类号： H05G2/006 , G03F7/70033 , H05G2/008
摘要： An apparatus, configured to generate extreme ultraviolet light by irradiating a target material by a laser beam from a laser apparatus to turn the target material into plasma, includes a chamber with an inlet for introducing the laser beam into the chamber, the chamber including an electrically conductive structural member; and a target generator including an electrode having a first through-hole through which a charged target passes, an electrical insulator for holding the electrode, and a shielding member having a second through-hole, through which the charged target passes, the shielding member being positioned between a plasma generation region and at least the electrical insulator. The target generator generates the charged target of a liquid target material and output the charged target toward the plasma generation region inside the chamber, and the shielding member has electrically conductive properties and is connected electrically to the electrically conductive structural member of the chamber.
摘要翻译：一种被配置为通过用来自激光装置的激光束照射目标材料以将目标材料转换成等离子体而产生极紫外光的装置包括具有用于将激光束引入腔室的入口的腔室，该腔室包括电导电结构件; 以及目标发生器，其包括具有带电对象通过的第一通孔的电极，用于保持电极的电绝缘体和具有第二通孔的屏蔽部件，被充电对象通过该屏蔽部件，所述屏蔽部件为位于等离子体产生区域和至少电绝缘体之间。目标发生器产生液体目标材料的充电目标，并将该充电目标输送到室内的等离子体产生区域，并且该屏蔽部件具有导电性能并且与该腔室的导电结构部件电连接。

9. 发明授权

US07923705B2 Extreme ultra violet light source apparatus 有权
标题翻译：极紫外光源装置
公开(公告)号：US07923705B2
公开(公告)日：2011-04-12
申请号：US12385835
申请日：2009-04-21
申请人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
发明人： Masato Moriya , Tamotsu Abe , Takashi Suganuma , Hiroshi Someya , Takayuki Yabu , Akira Sumitani , Osamu Wakabayashi
IPC分类号： G21G4/00
CPC分类号： G03F7/70891 , G03F7/70033 , G03F7/7085 , G03F7/70883 , H05G2/008
摘要： An EUV light source apparatus capable of easily detecting deterioration etc. of a window of an EUV light generating chamber. The EUV light source apparatus includes a driver laser, an EUV light generating chamber, a window which passes the laser beam into the EUV light generating chamber, an EUV light collector mirror, laser beam focusing optics which focuses a laser beam onto a trajectory of a target material, a temperature sensor which detects a temperature of the window, and a laser beam optics deterioration determination processing unit which determines deterioration of the window based on the temperature of the window detected by the temperature sensor when extreme ultra violet light is generated.
摘要翻译： EUV光源装置，能够容易地检测EUV光产生室的窗口的劣化等。 EUV光源装置包括驱动激光器，EUV光产生室，将激光束通入EUV光产生室的窗口，EUV聚光镜，激光束聚焦光学器件，其将激光束聚焦到目标材料，检测窗口的温度的温度传感器，以及激光束光学劣化判定处理单元，其基于当产生极紫外光时由温度传感器检测到的窗口的温度来确定窗口的劣化。

10. 发明申请

US20100200776A1 EXTREME ULTRAVIOLET LIGHT SOURCE DEVICE 有权
标题翻译：极致超紫外光源设备
公开(公告)号：US20100200776A1
公开(公告)日：2010-08-12
申请号：US12695630
申请日：2010-01-28
申请人： Takayuki Yabu , Takeshi Asayama , Fumika Yoshida , Osamu Wakabayashi
发明人： Takayuki Yabu , Takeshi Asayama , Fumika Yoshida , Osamu Wakabayashi
IPC分类号： G01J3/10
CPC分类号： H05G2/003 , H05G2/005 , H05G2/006 , H05G2/008
摘要： [Problem] An extreme ultraviolet light source device in accordance with the present invention suppresses a surface that comes into contact with a target material in a molten state from being eroded by the target material, being reacted with the target material, and being cut by the target material.[Means for Resolution] A target generating unit 120 injects molten tin in a droplet shape as a target 201 into a chamber 101. A protective coating provided with an erosion resistance property to tin is configured on a section that comes into contact with tin in a molten state for each face of a nozzle part 121 and a tank part 122. Alternatively, a part that comes into contact with tin in a molten state is made of a material provided with an erosion resistance property and a heat resistance property.
摘要翻译：本发明的极紫外光源装置抑制与熔融状态的目标材料接触的表面被目标材料侵蚀，与目标材料反应，并被目标材料 [解决方法]目标产生单元120将作为目标201的液滴形状的熔融锡注入到室101中。对锡进行耐蚀性的保护涂层被配置在与锡接触的部分上喷嘴部分121和罐部分122的每个面的熔融状态。或者，与熔融状态的锡接触的部分由具有耐腐蚀性和耐热性的材料制成。

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