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1. 发明授权

US4756515A Fluid-damping vibration-isolating support device 失效
标题翻译：流体阻尼隔振支撑装置
公开(公告)号：US4756515A
公开(公告)日：1988-07-12
申请号：US18104
申请日：1987-02-20
申请人： Osamu Kuroda , Kazumasa Kuze , Zenji Nakajima , Satoshi Itoh , Shuichi Okamoto , Motoo Kunihiro , Masahiro Ishigaki
发明人： Osamu Kuroda , Kazumasa Kuze , Zenji Nakajima , Satoshi Itoh , Shuichi Okamoto , Motoo Kunihiro , Masahiro Ishigaki
IPC分类号： F16F13/26 , B60K5/12 , F16F13/00 , F16F13/10 , F16F13/18 , F16M7/00 , F16M5/00 , B60G15/04 , F16K15/14 , F16M13/00
CPC分类号： F16F13/105 , Y10T137/789
摘要： A fluid-damping vibration-isolating support device comprising a main support body having a rubber base member and a closed enclosure internally thereof; and a partition plate dividing the enclosure into two chambers which intercommunicate through an orifice and are filled with a liquid. The partition plate comprises a separator member and a stopper member. The separator member is formed of an outer peripheral thick wall portion having an orifice and an inner thin flat plate portion having at least one through-hole. The stopper member has two opposed plate sections provided so as to cover the through-hole and is captured to the separator member slightly movably to the degree that the plate sections are in contact with or separate from both faces of the flat plate portion. The stopper member serves to close upon low frequency vibration and open upon high frequency vibration, so that in the high frequency region rise of hydraulic pressure can be suppressed and dynamic spring rate can be lowered.
摘要翻译：一种流体阻尼振动隔离支撑装置，包括：主支撑体，其具有橡胶基部构件和内部的封闭壳体; 以及将外壳分隔成两个腔室的隔板，这两个腔室通过孔口相互连通并且填充有液体。隔板包括分隔件和止动件。隔板构件由具有孔口的外周厚壁部分和具有至少一个通孔的内部薄平板部分形成。止动件具有设置成覆盖通孔的两个相对的板部分，并且被轻轻地移动到捕获到分隔件部件到板部分与平板部分的两个面接触或分离的程度。止动构件用于在低频振动时闭合，并且在高频振动下打开，使得在高频区域中可以抑制液压的上升并且可以降低动态弹簧速率。

2. 发明授权

US07862680B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US07862680B2
公开(公告)日：2011-01-04
申请号：US12149829
申请日：2008-05-08
申请人： Takehiko Orii , Tatsuya Nishida , Osamu Kuroda
发明人： Takehiko Orii , Tatsuya Nishida , Osamu Kuroda
IPC分类号： H01L21/027 , H01L21/304 , B08B3/02
CPC分类号： H01L21/6708 , B08B3/02
摘要： A substrate processing apparatus is provided. The apparatus includes a plurality of fluid suppliers 61, 61, 63 for supplying different processing fluids. In processing a wafer W, the substrate processing apparatus moves the fluid suppliers 61, 62, 63 along the peripheral part of the wafer W relatively. The fluid suppliers 61, 62, 63 are arranged in a direction extending from the circumference of the wafer W to its inside. With the arrangement, the apparatus is capable of stable processing of the wafer W in spite of rotating the wafer W at a low speed. Further, it is possible to improve a throughput of the apparatus in resist processing.
摘要翻译：提供了一种基板处理装置。该装置包括用于供应不同加工流体的多个流体供应器61,61,63。在处理晶片W时，基板处理装置沿着晶片W的周边部分相对移动流体供给部61,62,63。流体供应部61,62,63沿着从晶片W的圆周向内延伸的方向配置。通过这种布置，尽管晶片W以低速旋转，该装置能够稳定地处理晶片W. 此外，可以提高抗蚀剂处理中的装置的生产量。

3. 发明授权

US07507983B2 Radiation image information reading apparatus 失效
标题翻译：辐射图像信息读取装置
公开(公告)号：US07507983B2
公开(公告)日：2009-03-24
申请号：US11225164
申请日：2005-09-14
申请人： Yoshihiro Ishikawa , Masakazu Nakajo , Osamu Kuroda , Yuzuru Ohtsuka , Hideki Suzuki , Yasunori Ohta
发明人： Yoshihiro Ishikawa , Masakazu Nakajo , Osamu Kuroda , Yuzuru Ohtsuka , Hideki Suzuki , Yasunori Ohta
IPC分类号： G01N23/04
CPC分类号： G01T1/2014 , A61B6/4494 , G01T1/2016 , G03B42/02
摘要： When cassettes are placed on a conveyor disposed in a cassette loader and detectors disposed on a support plate on the conveyor detect information of identification strips on side walls of the cassettes, the cassettes are judged as being loaded properly in the cassette loader. When the detectors fail to detect the identification strips, the cassettes are judged as not being loaded in a desired state in the cassette loader.
摘要翻译：当将盒子放置在设置在盒式装载机中的输送机上时，设置在输送机上的支撑板上的检测器检测到盒的侧壁上的识别条的信息，盒被判断为正确地装载在盒式装载机中。当检测器不能检测到识别条时，盒被判断为没有被加载到盒装载器中的期望状态。

4. 发明授权

US07493904B2 Liquid processing apparatus and liquid processing method 有权
标题翻译：液体处理装置和液体处理方法
公开(公告)号：US07493904B2
公开(公告)日：2009-02-24
申请号：US11361926
申请日：2006-02-24
申请人： Osamu Kuroda
发明人： Osamu Kuroda
IPC分类号： B08B5/00
CPC分类号： H01L21/67173 , H01L21/6704 , H01L21/67253 , H01L21/67276 , H01L21/68707
摘要： A liquid processing apparatus comprises a liquid processing section for applying a liquid processing to wafers W, a carrier delivery section for delivering the carrier housing the wafers W, a carrier stock section capable of storing a plurality of carriers, an interface section for transferring the wafers W between the carrier stock section and the liquid processing section, a carrier transfer device for transferring the carrier, a wafer inspecting device for inspecting the wafers W within the carrier, and a carrier transfer device control section for controlling the carrier transfer device. The carrier transfer device control section controls the carrier transfer device such that the carrier, which has been judged to be capable of a liquid processing on the basis of the result of the inspection of the wafers W, is stored in the carrier stock section, and the liquid processing is started after completion of the inspection of a predetermined number of carriers.
摘要翻译：一种液体处理装置，包括用于向晶片W施加液体处理的液体处理部分，用于输送容纳晶片W的载体的载体传送部分，能够存储多个载体的载体存储部分，用于传送晶片的界面部分载体储存部分和液体处理部分之间的W，用于传送载体的载体传送装置，用于检查载体内的晶片W的晶片检查装置和用于控制载体传送装置的载体传送装置控制部分。载体传送装置控制部控制载体传送装置，使得基于晶片W的检查结果判断为能够进行液体处理的载体被存储在载体存储部中，并且在完成预定数量的载体的检查之后开始液体处理。

5. 发明申请

US20080125992A1 Method For Analyzing Tone Quality Of Exhaust Sound 失效
标题翻译：分析排气声音质量的方法
公开(公告)号：US20080125992A1
公开(公告)日：2008-05-29
申请号：US11658536
申请日：2005-06-28
申请人： Osamu Kuroda
发明人： Osamu Kuroda
IPC分类号： G01H17/00
CPC分类号： G01H3/08 , F01N13/00 , G10L25/15 , G10L25/69
摘要： According to evaluation of tone quality of exhaust sound adapted to human audition, a characteristic of the tone quality of exhaust sound is objectively analyzed. There are provided a measuring process (M1) for sampling exhaust sound to be analyzed, by means of a microphone disposed in an exhaust system EX and converting the exhaust sound into an electric signal, an analyzing process (M2) for amplifying a high frequency component of the electric signal and performing a frequency analysis of the electric signal at an arbitrary time interval, a detecting process (M3) for detecting a first formant of the first peak from the low frequency side and a second formant of the second peak from the low frequency side, and a displaying process (M4) for displaying a relationship (brightness and sharpness) between the first formant and second formant in a predetermined time range.
摘要翻译：根据适合人体试听的排气声音质量评估，客观分析排气声音质量的特点。提供了一种用于通过设置在排气系统EX中的麦克风来抽取要分析的废气声音的测量过程（M 1），并将排气声音转换为电信号，用于放大高频的分析过程（M 2）并且以任意时间间隔对电信号进行频率分析，检测从低频侧检测第一峰值的第一共振峰的检测处理（M 3）和第二峰值的第二共振峰以及用于在预定时间范围内显示第一共振峰和第二共振峰之间的关系（亮度和锐度）的显示处理（M 4）。

6. 发明申请

US20070105379A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20070105379A1
公开(公告)日：2007-05-10
申请号：US11616075
申请日：2006-12-26
申请人： Takehiko Orii , Osamu Kuroda
发明人： Takehiko Orii , Osamu Kuroda
IPC分类号： H01L21/302
CPC分类号： H01L21/67051 , C03C23/0075 , H01L21/67028 , H01L21/67178 , Y10S134/901 , Y10S134/902
摘要： The substrate processing apparatus has an enclosure structure enclosing a substrate support member to define a processing space. The enclosure structure has an opening closed by a shutter. A processing fluid supply unit, which supplies processing fluid, such as chemical liquid, is accommodated in a housing. The processing fluid supply unit accommodated in the housing is advanced into the processing space through the opening of the enclosure structure to feed the processing fluid onto the substrate supported by the substrate support member.
摘要翻译：衬底处理设备具有包围衬底支撑构件以限定处理空间的封闭结构。外壳结构具有由快门关闭的开口。供给处理流体（如化学液体）的处理流体供应单元容纳在壳体中。容纳在壳体中的处理流体供应单元通过外壳结构的打开而进入处理空间，以将处理流体供给到由基板支撑构件支撑的基板上。

7. 发明授权

US07093432B2 Exhaust gas purification apparatus of internal combustion engine and catalyst for purifying exhaust gas of internal combustion engine 有权
标题翻译：内燃机废气净化装置和内燃机排气净化催化剂
公开(公告)号：US07093432B2
公开(公告)日：2006-08-22
申请号：US10119075
申请日：2002-04-10
申请人： Hiroshi Hanaoka , Osamu Kuroda , Ryouta Doi , Hidehiro Iizuka , Toshio Ogawa , Hisao Yamashita , Shigeru Azuhata , Yuichi Kitahara , Toshifumi Hiratsuka , Kojiro Okude , Norihiro Shinotsuka , Toshio Manaka
发明人： Hiroshi Hanaoka , Osamu Kuroda , Ryouta Doi , Hidehiro Iizuka , Toshio Ogawa , Hisao Yamashita , Shigeru Azuhata , Yuichi Kitahara , Toshifumi Hiratsuka , Kojiro Okude , Norihiro Shinotsuka , Toshio Manaka
IPC分类号： F01N3/10
CPC分类号： F01N11/002 , B01D53/9422 , B01D53/9495 , B01D2255/1021 , B01D2255/1023 , B01D2255/1025 , B01D2255/2022 , B01D2255/2027 , B01D2255/2047 , B01D2255/2061 , B01D2255/2063 , B01D2255/2065 , B01D2255/91 , F01N3/0814 , F01N3/0842 , F01N3/0871 , F01N3/0878 , F01N13/009 , F01N2250/12 , F01N2430/06 , F01N2510/06 , F01N2570/04 , F01N2610/03 , F02D41/027 , F02D41/0275 , F02D41/1455 , F02D41/146 , F02D41/1462 , F02D41/1463 , F02D41/1465 , F02D2200/0806 , F02D2200/0814 , Y02A50/2324 , Y02T10/22 , Y02T10/47
摘要： An exhaust gas purification apparatus for use in an internal combustion engine comprises an exhaust gas duct connected to the engine through which the exhaust gas containing NOx gas passes and a catalyst so disposed in the exhaust gas duct that it contacts with the exhaust gas.The catalyst chemically adsorbs NOx under the condition that a stoichiometric amount of a gaseous oxidizing agent present in the exhaust gas is larger than that of a gaseous reducing agent present in the exhaust gas for reducing NOx, while NOx being adsorbed is catalytically reduced in the presence of the reducing agent under the condition that the stoichiometric amount of the oxidizing agent is not larger that of the reducing agent.Thereby, NOx, the lean burn exhaust gas in the engine can be effectively made harmlessly.
摘要翻译：在内燃机中使用的废气净化装置具备：与发动机连接的排气管道，通过该排气气体使含有NOx的废气通过，排气管与排气相接触的催化剂。催化剂在排气中存在的化学计量的气态氧化剂大于存在于用于还原NOx的排气中的气态还原剂的化学计量量的条件下化学吸附NOx，而在存在下催化还原NOx 的还原剂在氧化剂的化学计量不大于还原剂的化学计量量的条件下进行。由此，能够有效地使发动机中的稀燃废气成为无害化的NOx。

8. 发明申请

US20050188684A1 Apparatus and method for purifying exhaust gas of internal combustion engine 审中-公开
标题翻译：内燃机废气净化装置及方法
公开(公告)号：US20050188684A1
公开(公告)日：2005-09-01
申请号：US11053930
申请日：2005-02-10
申请人： Norihiro Shinotsuka , Osamu Kuroda , Yuichi Kitahara , Takeshi Inoue , Toshiufumi Hiratsuka , Hiroko Watanabe , Hidehiro Iizuka
发明人： Norihiro Shinotsuka , Osamu Kuroda , Yuichi Kitahara , Takeshi Inoue , Toshiufumi Hiratsuka , Hiroko Watanabe , Hidehiro Iizuka
IPC分类号： F01N3/02 , B01D53/94 , B01J23/58 , B01J23/63 , B01J35/04 , F01N3/022 , F01N3/08 , F01N3/10 , F01N3/24 , F01N3/28 , F01N13/02 , F01N3/00
CPC分类号： F01N3/0842 , B01D53/9422 , B01D53/9431 , B01D53/944 , B01D53/9477 , B01D2255/91 , F01N3/0814 , F01N3/101 , F01N13/009 , F01N13/0093 , F01N2250/02 , F01N2330/02 , F01N2330/06 , F01N2330/10 , F01N2330/12 , F01N2570/14 , Y02A50/2344 , Y02T10/22 , Y02T10/24
摘要： In an exhaust gas purifying apparatus provided with a lean NOx catalyst supporting a catalyst layer, which contains a NOx trapping component, on a honeycomb substrate formed so as not to cause an alkali attack, the invention prevents trapped NOx from being dissociated and exhausted during the time of a rich spike. A NOx reducing catalyst with the function of reducing NOx by a reductant in a rich or stoichiometric condition, e.g., a three-way catalyst, is disposed downstream of the lean NOx catalyst. In the case of increasing the amount of the NOx trapping component in the lean NOx catalyst to enhance a NOx trapping capability, even if a part of trapped NOx is dissociated during the time of the rich spike, the dissociated NOx can be reduced by the NOx reducing catalyst disposed on the downstream side.
摘要翻译：在具有含有NOx捕获成分的催化剂层的稀薄NOx催化剂的废气净化装置中，在不会引起碱侵蚀的蜂窝状基材上形成，能够防止捕获的NOx在时间丰富的尖峰。在富NOx或化学计量条件下，例如三元催化剂的还原剂还原NOx的功能的NOx还原催化剂设置在贫NOx催化剂的下游。在增加稀NOx催化剂中的NOx捕获成分的量以提高NOx捕获能力的情况下，即使在富峰期间部分捕获的NOx离解，也可以通过NOx降低解离的NOx 配置在下游侧的还原催化剂。

9. 发明授权

US06811618B2 Liquid processing apparatus and method 有权
标题翻译：液体处理装置及方法
公开(公告)号：US06811618B2
公开(公告)日：2004-11-02
申请号：US10304749
申请日：2002-11-27
申请人： Osamu Kuroda
发明人： Osamu Kuroda
IPC分类号： B08B302
CPC分类号： H01L21/68728 , B08B3/04 , H01L21/6708 , Y10S134/902
摘要： In one embodiment of a liquid processing apparatus, a cleaning unit (CLN) 12 includes a rotary plate 61, supporting members 64a, holding members 64b, a chemical nozzle 51 for supplying a wafer W with a chemical liquid, a spring 120 and a pressing mechanism 121 both of which moves each of the holding members 64b. The pressing mechanism 121 moves the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a and conversely, the wafer W is supported by the supporting members 64a while the wafer W is apart from the holding members 64b. The spring 120 holds the corresponding holding member 64b so that the wafer W is held by the holding members 64b while the wafer W is apart from the supporting members 64a. By supplying the wafer W held by the holding members 64b with the cleaning liquid, it is possible to prevent an occurrence of unprocessed portions on the cleaned wafer W, accomplishing a uniform cleaning for the wafer W.
摘要翻译：在液体处理装置的一个实施例中，清洁单元（CLN）12包括旋转板61，支撑构件64a，保持构件64b，用于向晶片W供给化学液体的化学喷嘴51，弹簧120和按压两个机构121都移动每个保持构件64b。按压机构121移动相应的保持构件64b，使得晶片W被保持构件64b保持，同时晶片W与支撑构件64a分离，相反，晶片W由支撑构件64a支撑，同时晶片W 与保持构件64b分离。弹簧120保持相应的保持构件64b，使得晶片W被保持构件64b保持，同时晶片W与支撑构件64a分离。通过将由保持构件64b保持的晶片W供给清洁液，可以防止在清洁的晶片W上发生未处理部分，从而对晶片W进行均匀的清洁。

10. 发明授权

US06761178B2 Transferring apparatus and substrate processing apparatus 有权
标题翻译：转印装置和基板处理装置
公开(公告)号：US06761178B2
公开(公告)日：2004-07-13
申请号：US09998431
申请日：2001-11-28
申请人： Osamu Kuroda , Takayuki Ogami
发明人： Osamu Kuroda , Takayuki Ogami
IPC分类号： B08B304
CPC分类号： H01L21/67259 , B08B3/04 , Y10S134/902
摘要： A cleaning apparatus 11 includes a cleaning bath 30 for cleaning wafers W, a wafer guide 31 moving up and down to accommodate the wafers W in the cleaning bath 30, a motor 49 for moving the wafer guide 31 up and down, an absolute encoder 33 for detecting the position of the wafer guide 31, a driver 62 and a controller 63. The absolute encoder 33 detects a rotational angle of a rotating shaft 53 of the motor 49 and outputs a detection signal to the driver 62. Based on this detection signal, the driver 62 detects the position of the wafer guide 31 and further outputs the positional information of the wafer guide 31 to the controller 63. Thus, the invention provides a transferring apparatus and a substrate processing apparatus both of which allow of easy detection of the wafer guide and further facilitate their maintenance.
摘要翻译：清洁装置11包括用于清洁晶片W的清洗槽30，上下移动以容纳清洗槽30中的晶片W的晶片引导件31，用于上下移动晶片引导件31的电机49，绝对编码器33 用于检测晶片引导件31的位置，驱动器62和控制器63.绝对值编码器33检测马达49的旋转轴53的旋转角度，并向驱动器62输出检测信号。基于该检测信号驱动器62检测晶片引导件31的位置，并且进一步将晶片引导件31的位置信息输出到控制器63.因此，本发明提供了一种转移装置和基板处理装置，其能够容易地检测晶圆导板，进一步便于维护。

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