专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100181288A1 Method of fabrication of micro- and nanofilters 审中-公开
标题翻译：微型和纳米过滤器的制造方法
公开(公告)号：US20100181288A1
公开(公告)日：2010-07-22
申请号：US12691407
申请日：2010-01-21
申请人： Cha-Mei Tang , Olga V. Makarova , Mark A. Hoffbauer , Todd L. Williamson , Platte T. Amstutz
发明人： Cha-Mei Tang , Olga V. Makarova , Mark A. Hoffbauer , Todd L. Williamson , Platte T. Amstutz
IPC分类号： B44C1/22
CPC分类号： B01D67/0062 , B01D67/0034 , B01D67/0093 , B01D69/02 , B01D2323/38 , B01D2325/028 , B01D2325/26
摘要： Micro- and nanofilters have a wide range of applications in many fields, including medical diagnostics, drug delivery, medical implants, and hemodialysis. Some issues that limit commercial application of current nanofilters in medicine are low pore density, non-uniform pore size, and the use of materials that are not biocompatible. A method is described to fabricate high porosity polymer and diamond micro- and nanofilters producing smooth, uniform and straight pores of high aspect ratio. Pore size, density, and shape can be predetermined with a high degree of precision by masks and controlled etch. The method combines energetic neutral atom beam lithography and a mask. This technology allows etching polymeric materials in a clean, well-controlled, and charge-free environment, making it very suitable for fabricating nanofilters and other components for biomedical applications.
摘要翻译：微型和纳米过滤器在许多领域有广泛的应用，包括医疗诊断，药物输送，医疗植入物和血液透析。限制当前纳米过滤器在医药中的商业应用的一些问题是低孔密度，不均匀孔径以及不能生物相容的材料的使用。描述了一种制造高孔隙率聚合物和金刚石微米和纳米过滤器的方法，其产生高纵横比的光滑，均匀和直孔。孔径，密度和形状可以通过掩模和受控蚀刻以高精确度预先确定。该方法结合了高能中性原子束光刻和掩模。该技术允许在干净，良好控制和无电荷环境中蚀刻聚合物材料，使其非常适合制造用于生物医学应用的纳米过滤器和其他部件。

2. 发明申请

US20130059308A1 POLYMER MICROFILTERS AND METHODS OF MANUFACTURING THE SAME 审中-公开
标题翻译：聚合物微粉碎机及其制造方法
公开(公告)号：US20130059308A1
公开(公告)日：2013-03-07
申请号：US13696139
申请日：2011-04-01
申请人： Olga V. Makarova , Cha-Mei Tang , Platte T. Amstutz
发明人： Olga V. Makarova , Cha-Mei Tang , Platte T. Amstutz
IPC分类号： B01D39/16 , C12N5/09 , G03F7/20 , C12Q1/68 , G01N33/574 , B32B38/00 , C12Q1/24
CPC分类号： B41F33/0081 , B31B50/006 , B31B50/88 , B31B2100/0022 , B41F33/0036
摘要： A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defmed by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.
摘要翻译：一种包含由环氧基可光定影干膜形成的聚合物层的微过滤器，以及遍及聚合物层的多个孔。还公开了一种形成微过滤器的方法。该方法包括提供设置在基底上的第一层环氧基光可定义干膜，通过掩模将第一层暴露于能量以形成在第一层干膜中由掩模定义的图案，从曝光的第一层干膜，具有延伸穿过其中的多个孔的聚合物层，所述多个孔具有由图案限定的分布，以及从基底去除聚合物层。

3. 发明授权

US07922923B2 Anti-scatter grid and collimator designs, and their motion, fabrication and assembly 有权
标题翻译：防散射网格和准直器设计，以及它们的运动，制造和组装
公开(公告)号：US07922923B2
公开(公告)日：2011-04-12
申请号：US11984634
申请日：2007-11-20
申请人： Cha-Mei Tang , Olga V. Makarova , Platte T. Amstutz, III , Guohua Yang
发明人： Cha-Mei Tang , Olga V. Makarova , Platte T. Amstutz, III , Guohua Yang
IPC分类号： B44C1/22 , C03C15/00 , C03C25/68
CPC分类号： G21K1/025
摘要： Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls. The projections can be of various shapes and sizes, and are arranged so that a total amount of wall material intersected by a line propagating in a direction along an edge of the grid is substantially the same as another total amount of wall material intersected by another line propagating in another direction substantially parallel to the edge of the grid at any distance from the edge. Methods to fabricate these grids using copper, lead, nickel, gold, any other electroplating/electroforming materials, metal composites or low melting temperature metals are described.
摘要翻译：用于电磁能发射装置的网格和准直器至少包括通过例如电镀/电铸或铸造形成的金属层。金属层包括顶表面和底表面，以及多个固体整体壁。每个固体一体化壁从顶部到底部表面延伸并且具有多个侧表面。固体一体化壁的侧表面布置成限定完全延伸穿过该层的多个开口。至少一些壁还可以包括延伸到由壁形成的相应开口中的突起。突起可以是各种形状和尺寸，并且被布置成使得沿着沿着栅格的边缘的方向传播的线相交的壁材的总量基本上与另一个与另一条线相交的壁材料的总量相同在距离边缘任何距离处基本上平行于栅格的边缘的另一方向上传播。描述了使用铜，铅，镍，金，任何其它电镀/电铸材料，金属复合材料或低熔点金属制造这些栅极的方法。

4. 发明授权

US11613115B2 Polymer microfilters and methods of manufacturing the same 有权
公开(公告)号：US11613115B2
公开(公告)日：2023-03-28
申请号：US13696139
申请日：2011-04-01
申请人： Olga V. Makarova , Cha-Mei Tang , Platte T Amstutz
发明人： Olga V. Makarova , Cha-Mei Tang , Platte T Amstutz
IPC分类号： G01N1/40 , G01N33/50 , B01L3/00 , B01D29/00 , B01D39/16 , B01D71/46 , B01L9/00 , B41F33/00 , B31B50/00 , B31B100/00 , B31B50/88
摘要： A microfilter comprising a polymer layer formed from epoxy-based photo-definable dry film, and a plurality of apertures each extending through the polymer layer. A method of forming a microfilter is also disclosed. The method includes providing a first layer of epoxy-based photo-definable dry film disposed on a substrate, exposing the first layer to energy through a mask to form a pattern, defined by the mask, in the first layer of dry film, forming, from the exposed first layer of dry film, a polymer layer having a plurality of apertures extending therethrough, the plurality of apertures having a distribution defined by the pattern, and removing the polymer layer from the substrate.

5. 发明授权

US07310411B2 Anti-scatter grids and collimator designs, and their motion, fabrication and assembly 有权
标题翻译：反散射网格和准直器设计，以及它们的运动，制造和组装
公开(公告)号：US07310411B2
公开(公告)日：2007-12-18
申请号：US11188210
申请日：2005-07-25
申请人： Cha-Mei Tang , Olga V. Makarova
发明人： Cha-Mei Tang , Olga V. Makarova
IPC分类号： G21K1/00 , G21K1/02
CPC分类号： G21K1/025
摘要： Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls. The projections can be of various shapes and sizes, and are arranged so that a total amount of wall material intersected by a line propagating in a direction along an edge of the grid is substantially the same as another total amount of wall material intersected by another line propagating in another direction substantially parallel to the edge of the grid at any distance from the edge. Methods to fabricate these grids using copper, lead, nickel, gold, any other electroplating/electroforming materials or low melting temperature metals are described.
摘要翻译：用于电磁能发射装置的栅格和准直器至少包括通过例如电镀/电铸或铸造形成的金属层。金属层包括顶表面和底表面，以及多个固体整体壁。每个固体一体化壁从顶部到底部表面延伸并且具有多个侧表面。固体一体化壁的侧表面布置成限定完全延伸穿过该层的多个开口。至少一些壁还可以包括延伸到由壁形成的相应开口中的突起。突起可以是各种形状和尺寸，并且被布置成使得沿着沿着栅格的边缘的方向传播的线相交的壁材的总量基本上与另一个与另一条线相交的壁材料的总量相同在距离边缘任何距离处基本上平行于栅格的边缘的另一方向上传播。描述了使用铜，铅，镍，金，任何其它电镀/电铸材料或低熔点金属制造这些栅格的方法。

6. 发明授权

US06987836B2 Anti-scatter grids and collimator designs, and their motion, fabrication and assembly 有权
公开(公告)号：US06987836B2
公开(公告)日：2006-01-17
申请号：US10060399
申请日：2002-02-01
申请人： Cha-Mei Tang , Olga V. Makarova
发明人： Cha-Mei Tang , Olga V. Makarova
IPC分类号： G21K1/00
CPC分类号： G21K1/025
摘要： Grids and collimators, for use with electromagnetic energy emitting devices, include at least a metal layer that is formed, for example, by electroplating/electroforming or casting. The metal layer includes top and bottom surfaces, and a plurality of solid integrated walls. Each of the solid integrated walls extends from the top to bottom surface and has a plurality of side surfaces. The side surfaces of the solid integrated walls are arranged to define a plurality of openings extending entirely through the layer. At least some of the walls also can include projections extending into the respective openings formed by the walls. The projections can be of various shapes and sizes, and are arranged so that a total amount of wall material intersected by a line propagating in a direction along an edge of the grid is substantially the same as another total amount of wall material intersected by another line propagating in another direction substantially parallel to the edge of the grid at any distance from the edge. Methods to fabricate these grids using copper, lead, nickel, gold, any other electroplating/electroforming materials or low melting temperature metals are described.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式