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    • 3. 发明授权
    • Device for processing wafer
    • 晶圆处理装置
    • US06589386B1
    • 2003-07-08
    • US09601993
    • 2000-08-11
    • Norio MaedaMasao OonoHiroshi Aihara
    • Norio MaedaMasao OonoHiroshi Aihara
    • H01L2168
    • H01L21/67057
    • A device for processing a substrate comprises a processing vessel (1), an outer vessel (2) for surrounding the processing vessel (1) which outer vessel (2) can be sealed, a first supporting member (4) for bringing the substrate (3) into and out from the processing vessel (1) which first supporting member (4) supports the substrate (3) in a standing manner, and a second supporting member (5) for transferring the substrate (3) between the first supporting member (4) which second supporting member (5) is movable up and down within the processing vessel (1). The device processes the entire surface of the substrate (3) uniformly and prevents varying in processing from occurrence.
    • 一种用于处理衬底的装置包括处理容器(1),用于包围可容纳外容器(2)的处理容器(1)的外容器(2),用于将衬底(2)的第一支撑构件(4) 3)从第一支撑构件(4)以立式方式支撑基板(3)的处理容器(1)和用于在第一支撑构件(3)之间传送基板(3)的第二支撑构件 (4)所述第二支撑构件(5)能够在处理容器(1)内上下移动。 该装置均匀地处理基板(3)的整个表面,并防止处理中发生变化。
    • 6. 发明授权
    • Method and apparatus for drying substrate
    • 干燥基材的方法和装置
    • US06904702B2
    • 2005-06-14
    • US10438002
    • 2003-05-15
    • Takazo SotojimaNorio Maeda
    • Takazo SotojimaNorio Maeda
    • B08B3/04H01L21/00H01L21/304F26B3/00
    • H01L21/67034
    • The substrate drying apparatus has a substrate processing vessel 1, a substrate supporting section for supporting plural substrates 2 in a standing condition and lined up condition in the interior of the substrate processing vessel 1, fluid reservoir section 3 for drying provided at an upward predetermined position of the substrate processing vessel 1, a first inert gas supplying section 4 for blowing inert gas against the drying fluid 6 pooled in the fluid reservoir section 3 for drying so as to generate droplet of the drying fluid, and for guiding the droplet towards the center of the substrate processing vessel 1, and a second inert gas supplying section 5 for supplying inert gas vertically and downwardly so as to supply the generated droplet of the drying fluid towards the substrates 2, consequently safety is improved without providing special safety device, and sufficient amount of drying fluid is supplied to the dipping boundary face of the substrate and the cleaning liquid.
    • 基板干燥装置具有基板处理容器1,基板支承部,其在基板处理容器1的内部以立式状态排列状态支撑多个基板2,在上部规定位置设置用于干燥的流体收容部3 基板处理容器1的第一惰性气体供给部4,用于将积存在流体容纳部3中的干燥流体6吹入惰性气体进行干燥,从而产生干燥流体的液滴,并将液滴向中心 的第二惰性气体供给部5,用于向上下方向供给惰性气体,从而将生成的干燥流体液滴供给到基板2,从而在不设置特殊的安全装置的情况下提高安全性,并且足够 将干燥流体的量供给到基板和清洗液的浸渍边界面。