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1. 发明申请

US20120160206A1 Piston of Internal Combustion Engine, Producing Method of Piston, and Sliding Member 审中-公开
标题翻译：内燃机活塞，活塞生产方法和滑动构件
公开(公告)号：US20120160206A1
公开(公告)日：2012-06-28
申请号：US13337352
申请日：2011-12-27
申请人： Norikazu Takahashi , Masato Sasaki , Takanori Sato
发明人： Norikazu Takahashi , Masato Sasaki , Takanori Sato
IPC分类号： F02F3/00 , B05D3/10 , B05D3/12
CPC分类号： B22D19/0027 , B22D15/02 , B22F3/23 , B22F5/008 , B23K35/0244 , C22C1/1015 , C22C1/1036 , C22C21/06 , F16J1/01 , F16J1/09 , F16J9/22 , Y10T428/24983
摘要： A piston of an internal combustion engine, having a crown section. A wear-resistant ring is formed in the crown section to be used for forming a piston ring groove. The wear-resistant ring includes a porous formed body formed of a first material higher in hardness and larger in specific gravity than a base material of the piston, and a second material infiltrated in pores of the porous formed body and containing 20 weight % or more of magnesium.
摘要翻译：内燃机的活塞，具有冠部。在用于形成活塞环槽的冠部中形成耐磨环。所述耐磨环包括多孔成形体，所述多孔成形体由比所述活塞的基材高的硬度和比重大的第一材料形成，并且所述第二材料渗入所述多孔成形体的孔中并且含有20重量％以上的镁。

2. 发明授权

US08735299B2 Semiconductor device manufacturing method and computer-readable storage medium 有权
标题翻译：半导体器件制造方法和计算机可读存储介质
公开(公告)号：US08735299B2
公开(公告)日：2014-05-27
申请号：US13410512
申请日：2012-03-02
申请人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
发明人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
IPC分类号： H01L21/302
CPC分类号： H01L21/31116 , H01J37/32091 , H01J37/32669 , H01L21/0206 , H01L21/0273 , H01L21/31138 , H01L21/31144 , H01L21/32137 , H01L21/32139 , H01L27/11556 , H01L27/11582
摘要： There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence.
摘要翻译：提供了一种半导体器件制造方法，用于通过在多层膜上蚀刻其上具有多层膜的基板和光致抗蚀剂膜并用作蚀刻掩模，在基板中形成阶梯形结构。通过交替层叠具有第一介电常数的第一膜和具有不同于第一介电常数的第二介电常数的第二膜形成多层膜。该方法包括通过使用光致抗蚀剂膜作为掩模来等离子体蚀刻第一膜的第一工艺; 用于将光致抗蚀剂膜暴露于含氢等离子体的第二种方法; 用于修整光致抗蚀剂膜的第三工艺; 以及通过使用修整的光致抗蚀剂膜和等离子体蚀刻的第一膜作为掩模来蚀刻第二膜的第四工艺。通过以该顺序反复进行第四工序的第一工序，在多层膜中形成阶梯状结构。

3. 发明授权

US08625072B2 Exposure apparatus, exposure method, and method of manufacturing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08625072B2
公开(公告)日：2014-01-07
申请号：US13099686
申请日：2011-05-03
申请人： Takanori Sato
发明人： Takanori Sato
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70775 , G03B27/42 , G03B27/53 , G03B27/58 , G03F9/7034 , G03F9/7096
摘要： A scanning exposure apparatus measures levels of a substrate at a predetermined position on the substrate at a first measurement point during the acceleration period and a second measurement point during the constant velocity period, obtains a correction value for a measurement error due to factors associated with acceleration based on the measurement results, corrects the measured level using the obtained correction value and exposes the substrate so that the level at a given position on the substrate becomes equal to the corrected level, when the substrate is exposed at the given position after the level is measured while the stage accelerates, and exposes the substrate so that the level at a given position on the substrate becomes equal to the measured level measured, when the substrate is exposed after the level of the substrate at the given position is measured while the stage moves at a constant velocity.
摘要翻译：扫描曝光装置测量在加速期间的第一测量点处的基板上的预定位置处的基板的水平和在恒定速度周期期间的第二测量点，获得由于与加速度相关联的因素引起的测量误差的校正值基于测量结果，使用所获得的校正值来校正测量水平，并且暴露衬底，使得当衬底在水平面之后在给定位置处暴露时，衬底上的给定位置处的水平等于校正水平在阶段加速时测量，并且暴露衬底，使得当衬底在给定位置处的衬底的水平被测量之后，当衬底被移动时，衬底被暴露时，衬底上给定位置处的水平变得等于测量的测量水平以恒定的速度。

4. 发明申请

US20120225561A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：半导体器件制造方法和计算机可读存储介质
公开(公告)号：US20120225561A1
公开(公告)日：2012-09-06
申请号：US13410512
申请日：2012-03-02
申请人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
发明人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
IPC分类号： H01L21/3065 , B05C21/00
CPC分类号： H01L21/31116 , H01J37/32091 , H01J37/32669 , H01L21/0206 , H01L21/0273 , H01L21/31138 , H01L21/31144 , H01L21/32137 , H01L21/32139 , H01L27/11556 , H01L27/11582
摘要： There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence.
摘要翻译：提供了一种半导体器件制造方法，用于通过在多层膜上蚀刻其上具有多层膜的基板和光致抗蚀剂膜并用作蚀刻掩模，在基板中形成阶梯形结构。通过交替层叠具有第一介电常数的第一膜和具有不同于第一介电常数的第二介电常数的第二膜形成多层膜。该方法包括通过使用光致抗蚀剂膜作为掩模来等离子体蚀刻第一膜的第一工艺; 用于将光致抗蚀剂膜暴露于含氢等离子体的第二种方法; 用于修整光致抗蚀剂膜的第三工艺; 以及通过使用修整的光致抗蚀剂膜和等离子体蚀刻的第一膜作为掩模来蚀刻第二膜的第四工艺。通过以该顺序反复进行第四工序的第一工序，在多层膜中形成阶梯状结构。

5. 发明授权

US08135051B2 Gas laser oscillator 有权
标题翻译：气体激光振荡器
公开(公告)号：US08135051B2
公开(公告)日：2012-03-13
申请号：US12502390
申请日：2009-07-14
申请人： Takanori Sato , Takafumi Murakami , Yuji Nishikawa
发明人： Takanori Sato , Takafumi Murakami , Yuji Nishikawa
IPC分类号： H01S3/03
CPC分类号： H01S3/03 , H01S3/036 , H01S3/041 , H01S3/076
摘要： A gas laser oscillator includes a plurality of discharge tube arrays, each discharge tube array including a plurality of electrical discharge tubes, a support mechanism supporting the plurality of discharge tube arrays, and an optical part optically connecting the plurality of discharge tube arrays. The support mechanism includes a discharge tube linking holder and an elastic member. The elastic member joins the discharge tube linking holder to a first support rod arranged at an upper side as seen in a direction of gravity.
摘要翻译：气体激光振荡器包括多个放电管阵列，每个放电管阵列包括多个放电管，支撑多个放电管阵列的支撑机构和光学连接多个放电管阵列的光学部件。支撑机构包括放电管连接保持器和弹性构件。弹性构件将放电管连接保持器连接到在重力方向观察时设置在上侧的第一支撑杆。

6. 发明授权

US07738064B2 Retardation plate and its manufacturing method, circularly polarizing plate and 1/2 wave plate using same, and a reflective liquid crystal display 失效
标题翻译：延迟板及其制造方法，圆偏振板和使用其的1/2波片，以及反射型液晶显示器
公开(公告)号：US07738064B2
公开(公告)日：2010-06-15
申请号：US11627722
申请日：2007-01-26
申请人： Masaaki Otoshi , Takanori Sato , Tadashi Ueda , Fumitaka Terai
发明人： Masaaki Otoshi , Takanori Sato , Tadashi Ueda , Fumitaka Terai
IPC分类号： G02F1/1335 , B29D11/00 , B29D7/01 , B29C55/00
CPC分类号： G02B5/3083
摘要： A method is provided for manufacturing a wide band retardation plate which gives uniform phase difference characteristics to incident light over the whole visible wavelength region, and which, as it permits selection of raw materials regardless of whether they have a positive or negative intrinsic double refraction value, allows a wide selection of raw materials. For this purpose, the method comprises a machine direction-stretched film-forming step for transporting and stretching in an identical direction to the transport direction, a Material A of two or more materials having different positive intrinsic double refraction values to form a machine direction-stretched film, a transverse direction-stretched film-forming step for transporting and stretching in a perpendicular direction to the transport direction, a Material B of the aforesaid two or more materials to form a transverse direction-stretched film, and a lamination step for laminating the machine direction-stretched film and the transverse direction-stretched film.
摘要翻译：提供一种用于制造宽带延迟板的方法，其对整个可见光波长区域的入射光提供均匀的相位差特性，并且由于其允许选择原材料，而不管其是否具有正或负的固有双折射值，允许广泛选择原材料。为此，该方法包括用于沿与输送方向相同的方向输送和拉伸的机器方向拉伸成膜步骤，具有不同的正本征双重折射值的两种或更多种材料的材料A以形成机器方向 - 拉伸膜，横向拉伸膜形成步骤，用于沿与输送方向垂直的方向输送和拉伸;上述两种或更多种材料的材料B以形成横向拉伸膜;层压步骤，用于层压机器方向拉伸膜和横向拉伸膜。

7. 发明申请

US20100045798A1 ELECTRONIC CAMERA 审中-公开
标题翻译：电子相机
公开(公告)号：US20100045798A1
公开(公告)日：2010-02-25
申请号：US12540838
申请日：2009-08-13
申请人： Hiroshi Sugimoto , Takanori Sato
发明人： Hiroshi Sugimoto , Takanori Sato
IPC分类号： H04N5/228 , H04N7/18
CPC分类号： H04N5/23212 , H04N5/144 , H04N5/23245 , H04N5/2351
摘要： An electronic camera includes an imaging device. The imaging device has an imaging surface on which an object scene is captured and repeatedly outputs an object scene image. To the object scene, a plurality of evaluation groups are allocated. Moreover, each of the plurality of evaluation groups is formed by a plurality of evaluation areas. A CPU calculates an evaluation coefficient representing a motion of an object in each of the plurality of evaluation areas, based on the object scene image outputted from the imaging device. The CPU also specifies one of more evaluation groups to which an evaluation area corresponding to an evaluation coefficient exceeding a reference value belongs, and compares a pattern of the specified evaluation groups with a plurality of predetermined patterns. An imaging parameter is adjusted based on a comparison result.
摘要翻译：电子照相机包括成像装置。成像装置具有拍摄对象场景的成像面，并重复地输出对象场景图像。对于对象场景，分配多个评估组。此外，多个评价组中的每一个由多个评估区域形成。 CPU基于从成像装置输出的对象场景图像，计算表示多个评价区域中的每一个中的对象的运动的评价系数。 CPU还指定与超过参考值的评估系数相对应的评估区域属于的评估组中的一个，并且将指定的评估组的模式与多个预定模式进行比较。基于比较结果调整成像参数。

8. 发明授权

US07484361B2 Exhaust gas purifying apparatus of motorcycle 失效
标题翻译：摩托车废气净化装置
公开(公告)号：US07484361B2
公开(公告)日：2009-02-03
申请号：US11159309
申请日：2005-06-23
申请人： Takashi Yamaguchi , Akinori Hirano , Takanori Sato
发明人： Takashi Yamaguchi , Akinori Hirano , Takanori Sato
IPC分类号： F02B27/02
CPC分类号： F01N3/20 , F01N3/2839 , F01N13/009 , Y02A50/2322
摘要： An exhaust gas purifying apparatus is provided for a motorcycle, configured to minimize engine output characteristics, and to raise the temperature of a catalyst to an activation temperature rapidly after a start of the engine, while not increasing a vehicle body size. The motorcycle includes an engine in which a cylinder block is extended upward on a crankcase. An exhaust port is provided on a front portion of the engine; an exhaust pipe extends forward of the engine from the exhaust port, then extends downward once, and thereafter, extends toward the rear of a vehicle body. A catalyst is placed in the exhaust pipe. The exhaust pipe passes along a side of the cylinder block, and the catalyst is placed in the exhaust pipe in a position located on the side of the cylinder block.
摘要翻译：一种用于摩托车的排气净化装置，其特征在于，尽可能减小发动机的输出特性，并且在不增加车身尺寸的情况下，在发动机起动之后迅速地将催化剂的温度升高到活化温度。摩托车包括其中气缸体在曲轴箱上向上延伸的发动机。排气口设置在发动机的前部; 排气管从排气口向前延伸到发动机的前方，然后向下延伸一次，然后向车体的后方延伸。催化剂被放置在排气管中。排气管沿气缸体的一侧通过，催化剂位于排气管中位于气缸体侧面的位置。

9. 发明申请

US20070057286A1 Solid-state imaging device and method for producing the same 审中-公开
标题翻译：固态成像装置及其制造方法
公开(公告)号：US20070057286A1
公开(公告)日：2007-03-15
申请号：US11517487
申请日：2006-09-08
申请人： Takanori Sato
发明人： Takanori Sato
IPC分类号： H01L31/00
CPC分类号： H01L27/14685 , H01L27/1462 , H01L27/14623
摘要： A method for producing a solid-state imaging device, which including: a photoelectric conversion section; a charge transfer section having a charge transfer electrode; and an antireflection film covering a light-receiving region in the photoelectric conversion section, wherein forming the antireflection film includes: forming a sidewall on a lateral wall of the charge transfer electrode after forming the charge transfer electrode; forming an antireflection film on a substrate surface where the sidewall is formed; forming a resist on the antireflection film; melting and flattening the resist to expose the antireflection film on the charge transfer electrode; removing the antireflection film by using the resist as the mask; removing the sidewall; covering the charge transfer electrode with an insulating film; and forming a light-shielding film that reaches a level lower than the top surface of the antireflection film, and that surrounds the periphery of the antireflection film.
摘要翻译：一种固态成像装置的制造方法，其特征在于，包括：光电转换部; 具有电荷转移电极的电荷转移部分; 以及覆盖所述光电转换部中的光接收区域的防反射膜，其中形成所述抗反射膜包括：在形成所述电荷转移电极之后，在所述电荷转移电极的侧壁上形成侧壁; 在形成侧壁的基板表面上形成抗反射膜; 在抗反射膜上形成抗蚀剂; 使抗蚀剂熔化并变平，使电荷转移电极上的抗反射膜露出; 通过使用抗蚀剂作为掩模去除抗反射膜; 去除侧壁; 用绝缘膜覆盖电荷转移电极; 并且形成达到比防反射膜的上表面低的水平并且包围防反射膜的周边的遮光膜。

10. 发明授权

US07085598B2 Biological electrode and connector for the same 有权
标题翻译：生物电极和连接器相同
公开(公告)号：US07085598B2
公开(公告)日：2006-08-01
申请号：US10638331
申请日：2003-08-12
申请人： Takanori Sato , Yasuyuki Nonaka , Hirohito Igarashi
发明人： Takanori Sato , Yasuyuki Nonaka , Hirohito Igarashi
IPC分类号： A61B5/04
CPC分类号： A61B5/0408 , Y10S439/909
摘要： A conductive member is adapted to be attached onto a living tissue to detect a bioelectrical signal. A retainer retains the conductive member on the living tissue. A lead member is partly brought into contact with the conductive member to lead out the bioelectrical signal to a connector. A waterproof sheet covers the lead member in a watertight manner, while exposing a portion of the lead member from which the biological signal is led out.
摘要翻译：导电构件适于附接到生物体组织上以检测生物电信号。保持器将导电构件保持在活体组织上。引导部件部分地与导电部件接触以将生物电信号引出到连接器。防水片以水密的方式覆盖引线部件，同时暴露引出部件的生物信号被引出的部分。

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