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1. 发明授权

US08735299B2 Semiconductor device manufacturing method and computer-readable storage medium 有权
标题翻译：半导体器件制造方法和计算机可读存储介质
公开(公告)号：US08735299B2
公开(公告)日：2014-05-27
申请号：US13410512
申请日：2012-03-02
申请人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
发明人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
IPC分类号： H01L21/302
CPC分类号： H01L21/31116 , H01J37/32091 , H01J37/32669 , H01L21/0206 , H01L21/0273 , H01L21/31138 , H01L21/31144 , H01L21/32137 , H01L21/32139 , H01L27/11556 , H01L27/11582
摘要： There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence.
摘要翻译：提供了一种半导体器件制造方法，用于通过在多层膜上蚀刻其上具有多层膜的基板和光致抗蚀剂膜并用作蚀刻掩模，在基板中形成阶梯形结构。通过交替层叠具有第一介电常数的第一膜和具有不同于第一介电常数的第二介电常数的第二膜形成多层膜。该方法包括通过使用光致抗蚀剂膜作为掩模来等离子体蚀刻第一膜的第一工艺; 用于将光致抗蚀剂膜暴露于含氢等离子体的第二种方法; 用于修整光致抗蚀剂膜的第三工艺; 以及通过使用修整的光致抗蚀剂膜和等离子体蚀刻的第一膜作为掩模来蚀刻第二膜的第四工艺。通过以该顺序反复进行第四工序的第一工序，在多层膜中形成阶梯状结构。

2. 发明申请

US20120225561A1 SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND COMPUTER-READABLE STORAGE MEDIUM 有权
标题翻译：半导体器件制造方法和计算机可读存储介质
公开(公告)号：US20120225561A1
公开(公告)日：2012-09-06
申请号：US13410512
申请日：2012-03-02
申请人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
发明人： Seiichi Watanabe , Manabu Sato , Kazuki Narishige , Takanori Sato , Takayuki Katsunuma
IPC分类号： H01L21/3065 , B05C21/00
CPC分类号： H01L21/31116 , H01J37/32091 , H01J37/32669 , H01L21/0206 , H01L21/0273 , H01L21/31138 , H01L21/31144 , H01L21/32137 , H01L21/32139 , H01L27/11556 , H01L27/11582
摘要： There is provided a semiconductor device manufacturing method for forming a step-shaped structure in a substrate by etching the substrate having thereon a multilayer film and a photoresist film on the multilayer film and serving as an etching mask. The multilayer film is formed by alternately layering a first film having a first permittivity and a second film having a second permittivity different from the first permittivity. The method includes a first process for plasma-etching the first film by using the photoresist film as a mask; a second process for exposing the photoresist film to hydrogen-containing plasma; a third process for trimming the photoresist film; and a fourth process for etching the second film by using the trimmed photoresist film and the plasma-etched first film as a mask. The step-shaped structure is formed in the multilayer film by repeatedly performing the first process to the fourth process in this sequence.
摘要翻译：提供了一种半导体器件制造方法，用于通过在多层膜上蚀刻其上具有多层膜的基板和光致抗蚀剂膜并用作蚀刻掩模，在基板中形成阶梯形结构。通过交替层叠具有第一介电常数的第一膜和具有不同于第一介电常数的第二介电常数的第二膜形成多层膜。该方法包括通过使用光致抗蚀剂膜作为掩模来等离子体蚀刻第一膜的第一工艺; 用于将光致抗蚀剂膜暴露于含氢等离子体的第二种方法; 用于修整光致抗蚀剂膜的第三工艺; 以及通过使用修整的光致抗蚀剂膜和等离子体蚀刻的第一膜作为掩模来蚀刻第二膜的第四工艺。通过以该顺序反复进行第四工序的第一工序，在多层膜中形成阶梯状结构。

3. 发明授权

US09034148B2 Method for producing electrically-conducting material with modified surface 有权
标题翻译：具有改性表面的导电材料的制造方法
公开(公告)号：US09034148B2
公开(公告)日：2015-05-19
申请号：US13819121
申请日：2011-08-26
申请人： Masayasu Nagoshi , Kaoru Sato , Seiichi Watanabe , Souki Yoshida
发明人： Masayasu Nagoshi , Kaoru Sato , Seiichi Watanabe , Souki Yoshida
IPC分类号： C25D5/10 , C25D5/16 , C23C26/00 , C25F1/00 , C25F3/00
CPC分类号： C25D5/16 , C23C26/00 , C25F1/00 , C25F3/00
摘要： A method to inexpensively and efficiently produce conductive materials on the surface of which a nano-level fine structure is formed includes surface modification including immersing a stable anode electrode and a workpiece as a cathode electrode, the workpiece including a conductive material with a work surface, in an electrolytic solution, then applying a voltage not less than a first voltage and less than a second voltage between the stable anode electrode and the workpiece as the cathode electrode immersed in the electrolytic solution, thereby modifying the work surface, the first voltage being a voltage corresponding to a current value that is ½ of the sum of a first maximum current value appearing first in a positive voltage region and a first minimum current value appearing first in the positive voltage region with respect to voltage-current characteristics of a surface modification treatment system, the second voltage exhibiting a complete-state plasma.
摘要翻译：在其上形成纳米级精细结构的表面上廉价有效地制造导电材料的方法包括表面改性，包括浸渍稳定的阳极电极和工件作为阴极，工件包括具有工作表面的导电材料，在电解液中，在浸渍在电解液中的阴极电极之间施加稳定的阳极和工件之间的不小于第一电压和小于第二电压的电压，从而改变工作表面，第一电压为对应于相对于表面改性处理的电压 - 电流特性，正电压区域中首先出现的第一最大电流值和正电压区域中首先出现的第一最小电流值之和的电流值的1/2的电压系统，第二电压呈现完全状态的等离子体。

4. 发明申请

US20130243975A1 METHOD FOR PRODUCING SURFACE-TREATED METALLIC MATERIAL 有权
标题翻译：生产表面处理金属材料的方法
公开(公告)号：US20130243975A1
公开(公告)日：2013-09-19
申请号：US13988848
申请日：2011-11-24
申请人： Masayasu Nagoshi , Kaoru Sato , Seiichi Watanabe , Souki Yoshida
发明人： Masayasu Nagoshi , Kaoru Sato , Seiichi Watanabe , Souki Yoshida
IPC分类号： C23C16/44
CPC分类号： C23C16/4414 , C23C26/00 , C25C7/00 , C25D9/08 , C25D9/10 , C25D11/026 , C25D11/34
摘要： There is provided a method for producing a surface-treated metallic material, by use of which a metallic material having a stable and excellent sliding characteristic can be produced with a low environmental load without covering the metallic material surface with an oxide film. The method for producing a surface-treated metallic material includes immersing an anode and a cathode in an electrolyte solution, placing a metallic material used as a material to be treated above the surface of the electrolyte solution, and applying a voltage between the anode and the cathode to treat the metallic material surface, the voltage being equal to or higher than a voltage for causing a complete plasma state.
摘要翻译：提供一种表面处理金属材料的制造方法，通过使用具有稳定且优异的滑动特性的金属材料，能够以低的环境负荷生产而不用氧化膜覆盖金属材料表面。表面处理金属材料的制造方法包括将阳极和阴极浸渍在电解液中，将用作待处理材料的金属材料放置在电解质溶液的表面之上，并在阳极和阳极之间施加电压阴极，以处理金属材料表面，电压等于或高于用于引起完全等离子体状态的电压。

5. 发明申请

US20120244579A1 PROCESS FOR PRODUCTION OF MONOSACCHARIDE 审中-公开
标题翻译：单糖生产工艺
公开(公告)号：US20120244579A1
公开(公告)日：2012-09-27
申请号：US13511742
申请日：2010-11-25
申请人： Kazuya Matsumoto , Masami Osabe , Ryota Fujii , Seiichi Watanabe , Ayako Endo , Sakurako Kimura , Tadashi Araki , Akira Nakayama
发明人： Kazuya Matsumoto , Masami Osabe , Ryota Fujii , Seiichi Watanabe , Ayako Endo , Sakurako Kimura , Tadashi Araki , Akira Nakayama
IPC分类号： C12P19/02
CPC分类号： C12P19/14 , C12P19/02 , C12P2201/00 , Y02P20/582
摘要： A monosaccharide production method of producing a monosaccharide from a lignocellulosic raw material comprising: obtaining a saccharified liquid obtained from a lignocellulosic raw material and a saccharification enzyme; recovering the saccharification enzyme from the saccharified liquid by allowing the saccharification enzyme to be adsorbed on the lignocellulosic raw material; and saccharifying the lignocellulosic raw material using the recovered saccharification enzyme.
摘要翻译：一种从木质纤维素原料制备单糖的单糖制造方法，其特征在于，包括：得到由木质纤维素原料和糖化酶得到的糖化液; 通过使糖化酶吸附在木质纤维素原料上，从糖化液中回收糖化酶; 并使用回收的糖化酶糖化木质纤维素原料。

6. 发明授权

US07919285B2 DNA encoding novel enzyme having D-serine synthase activity, method of producing the enzyme and method of producing D-serine by using the same 有权
标题翻译：编码具有D-丝氨酸合成酶活性的新型酶的DNA，该酶的制造方法及使用该酶的方法生产D-丝氨酸
公开(公告)号：US07919285B2
公开(公告)日：2011-04-05
申请号：US11665194
申请日：2005-10-07
申请人： Tadashi Araki , Tomonori Hidesaki , Seiichi Watanabe , Keita Nishida , Kiyoteru Nagahara , Mitsuo Koito
发明人： Tadashi Araki , Tomonori Hidesaki , Seiichi Watanabe , Keita Nishida , Kiyoteru Nagahara , Mitsuo Koito
IPC分类号： C12P13/06 , C12N9/00 , C07H21/04
CPC分类号： C12P13/06 , C12N9/1014
摘要： This invention relates to DNA encoding an enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme.
摘要翻译：本发明涉及编码具有从甲醛和甘氨酸合成D-丝氨酸的酶的酶的DNA，通过将这种DNA整合到载体中构建的重组DNA，用重组DNA转化的转化体和从甲醛生产D-丝氨酸的方法，以及甘氨酸与酶的使用。

7. 发明申请

US20100225013A1 METHOD FOR PRODUCING OPTICAL MEMBER AND OPTICAL MEMBER FORMED BY THE PRODUCTION PROCESS 审中-公开
标题翻译：用于生产由生产过程形成的光学部件和光学部件的方法
公开(公告)号：US20100225013A1
公开(公告)日：2010-09-09
申请号：US12675422
申请日：2008-09-18
申请人： Noriko Eiha , Seiichi Watanabe , Masato Yoshioka
发明人： Noriko Eiha , Seiichi Watanabe , Masato Yoshioka
IPC分类号： B29D11/00
CPC分类号： C08J5/005 , B29C43/021 , B29C2043/3618 , B29C2043/503 , B29D11/00 , B29L2011/0016 , B82Y30/00
摘要： A method for producing an optical member from a nanocomposite material which includes a thermoplastic resin containing inorganic fine particles is provided. The method includes: a first step of preparing in a solution the thermoplastic resin containing the inorganic fine particles; a second step of drying and solidifying the solution containing the prepared thermoplastic resin to produce the nanocomposite material having a specific surface area (surface area/volume) of 15 mm−1 or more; and a third step of heat-compressing the produced nanocomposite material to form the optical member in a desired shape.
摘要翻译：提供了一种由包含含有无机微粒的热塑性树脂的纳米复合材料制造光学部件的方法。该方法包括：在溶液中制备含有无机细颗粒的热塑性树脂的第一步骤; 干燥固化含有制备的热塑性树脂的溶液以制备具有15mm-1以上的比表面积（表面积/体积）的纳米复合材料的第二步骤; 以及对所制造的纳米复合材料进行热压缩以形成所需形状的光学部件的第三步骤。

8. 发明授权

US07679236B2 Electric actuator 有权
标题翻译：电动执行器
公开(公告)号：US07679236B2
公开(公告)日：2010-03-16
申请号：US11186439
申请日：2005-07-21
申请人： Wataru Kanou , Yukio Isomura , Takashi Kikuta , Kozo Nishimura , Harehide Sasaki , Seiichi Watanabe
发明人： Wataru Kanou , Yukio Isomura , Takashi Kikuta , Kozo Nishimura , Harehide Sasaki , Seiichi Watanabe
IPC分类号： H02K5/22
CPC分类号： H01R12/515 , H01R13/5202 , H02K5/225 , H02K7/1166 , H02K11/38
摘要： An electric actuator, which includes an exposed actuator terminal, for eliminating the need for insert molding and facilitating the manufacturing of a housing while preventing liquid from entering the housing. The actuator includes a motor. The housing is attached to the motor and includes an opening. A control circuit board accommodated in the housing controls the motor. An actuator terminal is arranged on the control circuit board and connected to an external terminal of an external connector through the opening. A terminal support arranged on the control circuit board supports the actuator terminal. A hollow fitting is attached to the terminal support and fitted into the opening so as to extend into the housing. A seal, arranged between the terminal support and the fitting, seals the housing.
摘要翻译：一种电致动器，其包括暴露的致动器端子，用于消除对嵌入成型的需要，并且有助于制造壳体同时防止液体进入壳体。致动器包括电动机。壳体附接到电动机并且包括开口。容纳在壳体中的控制电路板控制电动机。致动器端子布置在控制电路板上，并通过开口连接到外部连接器的外部端子。布置在控制电路板上的端子支架支撑致动器端子。中空配件连接到端子支撑件并装配到开口中以延伸到壳体中。布置在端子支架和配件之间的密封件密封壳体。

9. 发明申请

US20100024577A1 RESIN MATERIAL MEASURING METHOD AND RESIN MATERIAL MEASURING APPARATUS 审中-公开
标题翻译：树脂材料测量方法和树脂材料测量装置
公开(公告)号：US20100024577A1
公开(公告)日：2010-02-04
申请号：US12523182
申请日：2008-02-04
申请人： Noriko Eiha , Hidekane Ito , Seiichi Watanabe
发明人： Noriko Eiha , Hidekane Ito , Seiichi Watanabe
IPC分类号： G01N33/00
CPC分类号： B29C31/063 , B29C31/048
摘要： A resin material measuring method which obtains a prescribed amount of a resin material by measuring liquid resin material, the resin material measuring method including: charging the resin material having a fluidity into an internal space of a cylinder using a cylinder-piston mechanism which includes: the cylinder having a discharge aperture at one end and the internal space being constant in cross-sectional area; and a piston which is inserted in the internal space; determining a necessary movement stroke length of the piston corresponding to the resin material of a prescribed volume according to a relationship between the volume of the resin material and the cross-sectional area and the movement stroke length; discharging the resin material from the cylinder through the discharge aperture by moving the piston by the determined movement stroke length; and cutting the discharged resin material from the resin material located inside the cylinder.
摘要翻译：一种通过测量液体树脂材料来获得规定量的树脂材料的树脂材料测量方法，所述树脂材料测量方法包括：使用气缸活塞机构将具有流动性的具有流动性的树脂材料装入圆筒的内部空间，该气缸活塞机构包括：所述圆筒在一端具有排出孔，并且所述内部空间的横截面积恒定; 以及插入在所述内部空间中的活塞; 根据树脂材料的体积与横截面积和移动冲程长度之间的关系确定对应于规定体积的树脂材料的活塞的必要移动行程长度; 通过使活塞移动所确定的移动行程长度，通过排出孔将树脂材料从圆筒排出; 并且从位于气缸内部的树脂材料切割排出的树脂材料。

10. 发明申请

US20080293098A1 Dna Encoding Novel Enzyme Having D-Serine Synthase Activity, Method of Producing the Enzyme and Method of Producing D-Serine by Using the Same 有权
标题翻译： Dna编码具有D-丝氨酸合成酶活性的新型酶，生产酶的方法和使用该酶的方法生产D-丝氨酸
公开(公告)号：US20080293098A1
公开(公告)日：2008-11-27
申请号：US11665194
申请日：2005-10-07
申请人： Tadashi Araki , Tomonori Hidesaki , Seiichi Watanabe , Keita Nishida , Kiyoteru Nagahara , Mitsuo Koito
发明人： Tadashi Araki , Tomonori Hidesaki , Seiichi Watanabe , Keita Nishida , Kiyoteru Nagahara , Mitsuo Koito
IPC分类号： C12P21/04 , C12N15/11 , C12N15/00 , C12P13/06 , C12N1/20 , C12N9/00
CPC分类号： C12P13/06 , C12N9/1014
摘要： This invention relates to DNA encoding a novel enzyme having activity of synthesizing D-serine from formaldehyde and glycine, recombinant DNA constructed by integrating such DNA into a vector, a transformant transformed with the recombinant DNA, and a method for producing D-serine from formaldehyde and glycine with the use of the enzyme.
摘要翻译：本发明涉及编码具有从甲醛和甘氨酸合成D-丝氨酸的新型酶的DNA，通过将这种DNA整合到载体中构建的重组DNA，用重组DNA转化的转化体和从甲醛生产D-丝氨酸的方法和甘氨酸与酶的使用。

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