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1. 发明申请

US20050278049A1 Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program 失效
标题翻译：计算机中的任务的方法，机器的控制方法，监控机器控制系统，光刻设备，光刻处理单元和计算机程序
公开(公告)号：US20050278049A1
公开(公告)日：2005-12-15
申请号：US10852678
申请日：2004-05-25
申请人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Van Lierop , Robert Dumont , Jacobus Rooda
发明人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Van Lierop , Robert Dumont , Jacobus Rooda
IPC分类号： H01L21/027 , G03F7/20 , G05B19/418 , G06F19/00
CPC分类号： G05B19/41865 , G03F7/70533 , G05B2219/32298 , G05B2219/32423 , G05B2219/45028 , Y02P90/20 , Y02P90/86
摘要： A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler. In the event of a trigger, such as an order for new work or a machine exception, work can be retimed, rescheduled or replanned.
摘要翻译：计划在机器中执行的任务的方法通过将辅助任务链接到一系列关键任务来产生优先图，以创建可由自动调度器解决的调度问题。如果触发事件，例如新工作或机器异常的订单，可以重新计划，重新安排或重新启动工作。

2. 发明申请

US20060197929A1 Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program 有权
标题翻译：控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元，光刻处理单元和计算机程序
公开(公告)号：US20060197929A1
公开(公告)日：2006-09-07
申请号：US11418146
申请日：2006-05-05
申请人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
发明人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
IPC分类号： G03B27/42
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
摘要翻译：本文提出了一种控制光刻设备装置中的轨道装置的方法。光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受曝光装置

3. 发明申请

US20050185952A1 Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit lithographic processing cell, and computer program 有权
标题翻译：控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元光刻处理单元和计算机程序
公开(公告)号：US20050185952A1
公开(公告)日：2005-08-25
申请号：US10781945
申请日：2004-02-20
申请人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
发明人： Norbertus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
IPC分类号： H01L21/027 , G03D5/00
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method comprises predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
摘要翻译：本文提出了一种控制光刻设备装置中的轨道装置的方法。光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受曝光装置通过调整轨迹速率使得基板准备就绪，就像平版印刷曝光设备所需要的那样，轨迹中的缓冲器的使用可以被大大地避免甚至完全消除。

4. 发明申请

US20050102723A1 Method of operating a lithographic processing machine, control system, lithographic apparatus, lithographic processing cell, and computer program 有权
标题翻译：操作光刻处理机，控制系统，光刻设备，光刻处理单元和计算机程序的方法
公开(公告)号：US20050102723A1
公开(公告)日：2005-05-12
申请号：US10953869
申请日：2004-09-30
申请人： Norbertus Josephus Van Den Nieuwelaar , Willem Herman Gertruda Koenen , Johannes Onvlee , Henricus Petrus Van Lierop , Robert Dumont , Jacobus Rooda , Michiel Stoets
发明人： Norbertus Josephus Van Den Nieuwelaar , Willem Herman Gertruda Koenen , Johannes Onvlee , Henricus Petrus Van Lierop , Robert Dumont , Jacobus Rooda , Michiel Stoets
IPC分类号： G03F7/20 , G05B15/00 , G05B19/418 , H01L21/027
CPC分类号： G05B19/41865 , G03F7/70525 , G05B2219/32248 , G05B2219/32291 , G05B2219/45028 , G05B2219/45031 , Y02P90/20
摘要： Scheduling of tasks in a lithographic apparatus, track unit or lithocell is performed by maintaining a register of the state of the machine and a database of tasks performable by the machine, generating possible sequences of tasks based on pre- and post-conditions on the system state (rather than a precedence relation) and selecting a sequence from the generated sequences that meets a given beginning state of the machine and a desired end state. Embodiments of the invention also allow for automated recovery from exceptions.
摘要翻译：通过维护机器的状态的寄存器和机器可执行的任务的数据库来执行光刻设备，轨道单元或光栅单元中的任务的调度，基于系统上的前后条件生成可能的任务序列状态（而不是优先级关系），并且从产生的序列中选择满足机器的给定开始状态和期望结束状态的序列。本发明的实施例还允许从异常自动恢复。

5. 发明授权

US07195407B2 Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing, cell and computer program 有权
标题翻译：控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元，光刻处理，单元和计算机程序
公开(公告)号：US07195407B2
公开(公告)日：2007-03-27
申请号：US11418146
申请日：2006-05-05
申请人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
IPC分类号： G03D5/00
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus.
摘要翻译：本文提出了一种控制光刻设备装置中的轨道装置的方法。光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受曝光装置

6. 发明授权

US07184849B2 Method of planning tasks in a machine, method of controlling a machine, supervisory machine control system, lithographic apparatus, lithographic processing cell and computer program 失效
标题翻译：计算机中的任务的方法，机器的控制方法，监控机器控制系统，光刻设备，光刻处理单元和计算机程序
公开(公告)号：US07184849B2
公开(公告)日：2007-02-27
申请号：US10852678
申请日：2004-05-25
申请人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Petrus Johannus Van Lierop , Robert Jozef Dumont , Jacobus Eelkman Rooda
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen , Henricus Petrus Johannus Van Lierop , Robert Jozef Dumont , Jacobus Eelkman Rooda
IPC分类号： G06F19/00
CPC分类号： G05B19/41865 , G03F7/70533 , G05B2219/32298 , G05B2219/32423 , G05B2219/45028 , Y02P90/20 , Y02P90/86
摘要： A method of planning tasks to be performed in a machine derives a precedence graph by linking subsidiary tasks to a sequence of key tasks to create a scheduling problem that can be solved by an automated scheduler.
摘要翻译：计划在机器中执行的任务的方法通过将辅助任务链接到一系列关键任务来产生优先图，以创建可由自动调度器解决的调度问题。

7. 发明授权

US07068351B2 Method of controlling a lithographic processing cell, device manufacturing method, lithographic apparatus, track unit, lithographic processing cell, and computer program 有权
标题翻译：控制光刻处理单元的方法，器件制造方法，光刻设备，轨道单元，光刻处理单元和计算机程序
公开(公告)号：US07068351B2
公开(公告)日：2006-06-27
申请号：US10781945
申请日：2004-02-20
申请人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
发明人： Norbertus Josephus Martinus Van Den Nieuwelaar , Johannes Onvlee , Roel Boumen
IPC分类号： G03B27/42
CPC分类号： G03D5/00 , G03F7/70525 , G03F7/70991 , Y10S414/135 , Y10S414/14
摘要： A method of controlling a track apparatus in a lithocell apparatus arrangement, is presented herein. The lithocell includes a lithographic exposure apparatus configured to expose substrates and a track apparatus configured to prepare substrates before exposure and develop substrates after exposure. The method includes predicting times at which the lithographic exposure apparatus will be available to accept a prepared substrate for exposure from the track apparatus, and adjusting a rate at which the track apparatus prepares substrates so that a substrate is prepared in time for acceptance by the lithographic exposure apparatus. By adjusting the track rate so that substrates are ready just as the lithographic exposure apparatus needs them, the use of the buffer in the track can be largely avoided or even eliminated entirely.
摘要翻译：本文提出了一种控制光刻设备装置中的轨道装置的方法。光刻池包括被配置为暴露衬底的光刻曝光装置和配置成在曝光之前制备衬底并在曝光之后显影衬底的轨道装置。该方法包括预测光刻曝光装置将可用于接收用于从轨道装置曝光的准备的基板的时间，以及调整轨道装置准备基板的速率，使得基板准备在时间上被光刻接受曝光装置通过调整轨迹速率使得基板准备就绪，就像平版印刷曝光设备所需要的那样，轨迹中的缓冲器的使用可以被大大地避免甚至完全消除。

8. 发明申请

US20050137734A1 Method of operating a lithographic apparatus or lithographic processsing cell, lithographic apparatus and lithographic processing cell 审中-公开
标题翻译：操作光刻设备或光刻处理单元，光刻设备和光刻处理单元的方法
公开(公告)号：US20050137734A1
公开(公告)日：2005-06-23
申请号：US10846854
申请日：2004-05-17
申请人： Norbertus Josephus Martinus Nieuwelaar , Johannes Onvlee , Henricus Petrus Van Lierop , Niels Cornelis Wilhelmus Braspenning , Jacobus Rooda
发明人： Norbertus Josephus Martinus Nieuwelaar , Johannes Onvlee , Henricus Petrus Van Lierop , Niels Cornelis Wilhelmus Braspenning , Jacobus Rooda
IPC分类号： G03F7/20 , G05B19/418 , G06F19/00 , H01L21/027
CPC分类号： G05B19/41865 , G05B2219/32301 , Y02P90/20 , Y02P90/22 , Y02P90/26
摘要： A method of generating a schedule for operation of a machine forming at least a part of a lithographic apparatus or a lithographic processing cell is disclosed. In the method, a plurality of weight factors are received for respective ones of a plurality of qualities affecting the outcome of a lithographic process. An optimum schedule of tasks to be performed to complete said lithographic process is generated, the optimum schedule being one whose outcome has a maximum value of total quality, where total quality is the sum of the products of the values of each of said qualities and the respective weight factors.
摘要翻译：公开了一种产生用于操作形成光刻设备或光刻处理单元的至少一部分的机器的计划的方法。在该方法中，对于影响光刻处理结果的多个品质中的各个质量，接收多个加权因子。产生完成所述光刻处理的任务的最佳时间表，最佳时间表是其结果具有总质量的最大值的最佳时间表，其中总质量是每个品质的值的乘积和各自的体重因子。

9. 发明授权

US08576374B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US08576374B2
公开(公告)日：2013-11-05
申请号：US12393805
申请日：2009-02-26
申请人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
发明人： Keith Frank Best , Henricus Wilhelmus Maria Van Buel , Cheng-Qun Gui , Johannes Onvlee , Rudy Jan Maria Pellens , Remi Daniel Marie Edart , Oleg Viacheslavovich Voznyi , Pascale Anne Maury
IPC分类号： G03B27/68 , G03B27/32
CPC分类号： G03F9/7084 , G03F7/70633 , G03F9/7076 , G03F9/708 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： According to a first aspect of the invention, there is provided a lithographic method of providing an alignment mark on a layer provided on a substrate, the method including providing the alignment mark on an area of the layer which is oriented within a certain range of angles with respect to a surface of the substrate on which the layer is provided.
摘要翻译：根据本发明的第一方面，提供了一种在设置在基板上的层上提供对准标记的光刻方法，所述方法包括在所述层的一定范围内定向的区域上提供对准标记相对于其上设置有该层的基板的表面。

10. 发明授权

US07714981B2 Lithographic apparatus and method 有权
标题翻译：平版印刷设备和方法
公开(公告)号：US07714981B2
公开(公告)日：2010-05-11
申请号：US11589300
申请日：2006-10-30
申请人： Johannes Onvlee , Erik Roelof Loopstra
发明人： Johannes Onvlee , Erik Roelof Loopstra
IPC分类号： G03B27/42
CPC分类号： G03F7/70775 , G03F1/42 , G03F1/44 , G03F7/707 , G03F9/7011
摘要： In a lithographic apparatus, a slip of a patterning device relative to a support, the support being constructed to support the patterning device, may be provided by: measuring a position of the support relative to a structure of the lithographic apparatus; measuring a position of the patterning device relative to the structure of the lithographic apparatus; determining a correlation between the position of the patterning device and the position of the support; and deriving from the correlation a slip of the patterning device relative to the support. The structure may include a projection system to project a radiation beam patterned by the patterning device onto a target portion of the substrate. The projection system may be connected to a frame, such as a metrology frame of the lithographic apparatus.
摘要翻译：在光刻设备中，图案形成装置相对于支撑件的滑动可以通过以下方式来提供：测量支撑件相对于光刻设备的结构的位置; 测量所述图案形成装置相对于所述光刻设备的结构的位置; 确定图案形成装置的位置与支撑件的位置之间的相关性; 并且从相关性导出图案形成装置相对于支撑件的滑移。该结构可以包括投影系统，以将由图案形成装置图案化的辐射束投影到基板的目标部分上。投影系统可以连接到诸如光刻设备的计量框架的框架。

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