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1. 发明申请

US20060192151A1 SYSTEMS FOR PROTECTING INTERNAL COMPONENTS OF AN EUV LIGHT SOURCE FROM PLASMA-GENERATED DEBRIS 有权
标题翻译：用于保护来自等离子体生物反应器的EUV光源的内部组分的系统
公开(公告)号：US20060192151A1
公开(公告)日：2006-08-31
申请号：US11067099
申请日：2005-02-25
申请人： Norbert Bowering , Bjorn Hansson , Alexander Bykanov , Oleh Khodykin , Alexander Ershov , William Partlo
发明人： Norbert Bowering , Bjorn Hansson , Alexander Bykanov , Oleh Khodykin , Alexander Ershov , William Partlo
IPC分类号： G01J1/00
CPC分类号： G03F7/70925 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70916 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for protecting an EUV light source plasma production chamber optical element surface from debris generated by plasma formation. In one aspect of an embodiment of the present invention, a shield is disclosed which comprises at least one hollow tube positioned between the optical element and a plasma formation site. The tube is oriented to capture debris while allowing light to pass through the tube's lumen via reflection at relatively small angles of grazing incidence. In another aspect of an embodiment of the present invention, a shield is disclosed which is heated to a temperature sufficient to remove one or more species of debris material that has deposited on the shield. In yet another aspect of an embodiment of the present invention, a system is disclosed which a shield is moved from a light source plasma chamber to a cleaning chamber where the shield is cleaned.
摘要翻译：公开了用于保护EUV光源等离子体生产室光学元件表面免受等离子体形成产生的碎片的系统和方法。在本发明的实施例的一个方面，公开了一种屏蔽件，其包括位于光学元件和等离子体形成部位之间的至少一个中空管。管被定向以捕获碎片，同时允许光以相对较小的掠入射角度的反射通过管的内腔。在本发明的一个实施例的另一方面，公开了一种屏蔽件，其被加热到足以去除沉积在屏蔽上的一种或多种碎屑材料的温度。在本发明的一个实施例的另一方面，公开了一种系统，其将屏蔽件从光源等离子体室移动到清洁室，其中屏蔽件被清洁。

2. 发明申请

US20050269529A1 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
标题翻译：用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法
公开(公告)号：US20050269529A1
公开(公告)日：2005-12-08
申请号：US11174442
申请日：2005-06-29
申请人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov , William Partlo
发明人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov , William Partlo
IPC分类号： G03F7/20 , G01J1/00
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

3. 发明申请

US20080179548A1 Laser produced plasma EUV light source 有权
标题翻译：激光产生等离子体EUV光源
公开(公告)号：US20080179548A1
公开(公告)日：2008-07-31
申请号：US11786145
申请日：2007-04-10
申请人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
发明人： Alexander Bykanov , Norbert Bowering , Igor Fomenkov , David Brandt , Alexander Ershov , Oleh Khodykin , William Partlo
IPC分类号： H05H1/24
CPC分类号： G03F7/70916 , B82Y10/00 , G03F7/70033 , G03F7/70908 , G03F7/70983 , H05G2/003 , H05G2/008
摘要： A device is disclosed which may comprise a system generating a plasma at a plasma site, the plasma producing EUV radiation and ions exiting the plasma. The device may also include an optic, e.g., a multi-layer mirror, distanced from the site by a distance, d, and a flowing gas disposed between the plasma and optic, the gas establishing a gas pressure sufficient to operate over the distance, d, to reduce ion energy below a pre-selected value before the ions reach the optic. In one embodiment, the gas may comprise hydrogen and in a particular embodiment, the gas may comprise greater than 50 percent hydrogen by volume.
摘要翻译：公开了一种可以包括在等离子体位置处产生等离子体的系统，等离子体产生EUV辐射和离开等离子体的离子的装置。该装置还可以包括一个光学元件，例如多个远离现场的多层反射镜，以及设置在等离子体和光学元件之间的流动气体，该气体建立足以在该距离上操作的气体压力， d，在离子到达光学器件之前，将离子能量降低到预先选定的值以下。在一个实施方案中，气体可以包含氢气，并且在一个具体实施方案中，气体可以包含大于50体积％的氢气。

4. 发明申请

US20070187627A1 Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
标题翻译：用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法
公开(公告)号：US20070187627A1
公开(公告)日：2007-08-16
申请号：US11705954
申请日：2007-02-13
申请人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov
发明人： Alexander Ershov , William Marx , Norbert Bowering , Bjorn Hansson , Oleh Khodykin , Igor Fomenkov
IPC分类号： G01J3/10
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70175 , G03F7/7085 , G03F7/70916 , G21K1/06 , G21K2201/06 , H05G2/001
摘要： Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.
摘要翻译：公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

5. 发明申请

US20060249699A1 Alternative fuels for EUV light source 失效
标题翻译： EUV光源的替代燃料
公开(公告)号：US20060249699A1
公开(公告)日：2006-11-09
申请号：US11406216
申请日：2006-04-17
申请人： Norbert Bowering , Oleh Khodykin , Alexander Bykanov , Igor Fomenkov
发明人： Norbert Bowering , Oleh Khodykin , Alexander Bykanov , Igor Fomenkov
IPC分类号： G01J3/10
CPC分类号： H05G2/006 , B82Y10/00 , G21K2201/061 , H05G2/003 , H05G2/005 , H05G2/008
摘要： An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.
摘要翻译：公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素元素表面。锡化合物可以包括SnBr 4，SnBr 2和SnH 4。另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

6. 发明申请

US20070001131A1 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US20070001131A1
公开(公告)日：2007-01-04
申请号：US11174299
申请日：2005-06-29
申请人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
发明人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头。驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

7. 发明申请

US20080023657A1 Extreme ultraviolet light source 有权
公开(公告)号：US20080023657A1
公开(公告)日：2008-01-31
申请号：US11880319
申请日：2007-07-20
申请人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephen Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： H01L31/18
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

8. 发明申请

US20060192152A1 LPP EUV light source drive laser system 有权
标题翻译： LPP EUV光源驱动激光系统
公开(公告)号：US20060192152A1
公开(公告)日：2006-08-31
申请号：US11217161
申请日：2005-08-31
申请人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
发明人： Alexander Ershov , Alexander Bykanov , Oleh Khodykin , Igor Fomenkov
IPC分类号： G01J1/00
CPC分类号： H05G2/003 , H05G2/005 , H05G2/008
摘要： An apparatus and method is disclosed which may comprise a laser produced plasma EUV system which may comprise a drive laser producing a drive laser beam; a drive laser beam first path having a first axis; a drive laser redirecting mechanism transferring the drive laser beam from the first path to a second path, the second path having a second axis; an EUV collector optical element having a centrally located aperture; and a focusing mirror in the second path and positioned within the aperture and focusing the drive laser beam onto a plasma initiation site located along the second axis. The apparatus and method may comprise the drive laser beam is produced by a drive laser having a wavelength such that focusing on an EUV target droplet of less than about 100 μm at an effective plasma producing energy if not practical in the constraints of the geometries involved utilizing a focusing lens. The drive laser may comprise a CO2 laser. The drive laser redirecting mechanism may comprise a mirror.
摘要翻译：公开了一种可以包括激光产生等离子体EUV系统的装置和方法，其可以包括产生驱动激光束的驱动激光器; 具有第一轴的驱动激光束第一路径; 驱动激光重定向机构，其将所述驱动激光束从所述第一路径传递到第二路径，所述第二路径具有第二轴线; 具有中心定位的孔的EUV收集器光学元件; 以及在第二路径中的聚焦反射镜并且定位在孔内并将驱动激光束聚焦到沿着第二轴线定位的等离子体起始位置。该装置和方法可以包括驱动激光束由具有波长的驱动激光器产生，该激光器具有在有效等离子体产生能量的情况下聚焦在小于约100mum的EUV目标液滴上，如果在所涉及的几何形状的约束条件下聚焦镜头。驱动激光器可以包括CO 2激光器。驱动激光重定向机构可以包括镜子。

9. 发明申请

US20050230645A1 Extreme ultraviolet light source 失效
公开(公告)号：US20050230645A1
公开(公告)日：2005-10-20
申请号：US11107535
申请日：2005-04-14
申请人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
发明人： Stephan Melnychuk , William Partlo , Igor Fomenkov , I. Oliver , Richard Ness , Norbert Bowering , Oleh Khodykin , Curtis Rettig , Gerry Blumenstock , Timothy Dyer , Rodney Simmons , Jerzy Hoffman , R. Johnson
IPC分类号： G21K5/00 , G01J1/00 , G03F7/20 , G21K5/02 , H01L21/027 , H01S3/00 , H05G2/00 , H05H1/06 , H05H1/24
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70033 , G03F7/70166 , G03F7/70175 , G03F7/70916 , H01S3/005 , H05G2/005 , H05G2/008 , H05H1/06
摘要： The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.

10. 发明申请

US20070023705A1 EUV light source collector lifetime improvements 有权
标题翻译： EUV光源收集器寿命改善
公开(公告)号：US20070023705A1
公开(公告)日：2007-02-01
申请号：US11168190
申请日：2005-06-27
申请人： William Partlo , Alexander Ershov , Igor Fomenkov , Oleh Khodykin
发明人： William Partlo , Alexander Ershov , Igor Fomenkov , Oleh Khodykin
IPC分类号： G01J3/10 , H05G2/00
CPC分类号： H05G2/003 , B82Y10/00 , G03F7/70925 , G21K1/062 , H05G2/005
摘要： An apparatus and method for cleaning a plasma source material compound from a plasma produced EUV light source collector optic which may comprise reacting the plasma source material compound with hydrogen to form a hydride of the plasma source material from the plasma source material contained in the plasma source material compound on the collector optic. The method may further comprise initiating the reacting by introducing hydrogen into a plasma formation chamber containing the collector optic, and may further comprise removing the hydride from the collector optic, e.g., by cleaning plasma action and/or plasma source material sputtering, or other means as may be determined to be effective. An apparatus and method of extending the useful life of a plasma produced EUV light source collector coating layer may comprise in situ replacement of the material of the coating layer by deposition of the coating layer material onto the coating layer.
摘要翻译：一种用于从等离子体产生的EUV光源收集器光学元件清洗等离子体源材料化合物的装置和方法，其可以包括使等离子体源材料化合物与氢反应以从等离子体源中包含的等离子体源材料形成等离子体源材料的氢化物收集器光学元件上的材料化合物。该方法还可以包括通过将氢引入到包含收集器光学元件的等离子体形成室中来引发反应，并且还可以包括例如通过清洗等离子体作用和/或等离子体源材料溅射或其它方法从收集器光学元件中去除氢化物可能被确定为有效。延长等离子体产生的EUV光源集电器涂层的使用寿命的装置和方法可包括通过将涂层材料沉积到涂层上来原位置换涂层的材料。

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