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1. 发明授权

US08221579B2 Method of reusing a consumable part for use in a plasma processing apparatus 有权
标题翻译：重复使用等离子体处理装置中的消耗部件的方法
公开(公告)号：US08221579B2
公开(公告)日：2012-07-17
申请号：US12813819
申请日：2010-06-11
申请人： Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
发明人： Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/465 , C23C16/0227 , C23C16/325 , C23C16/4418 , H01J37/32467 , H01J37/32862
摘要： In a method of reusing a consumable part for use in a plasma processing apparatus, a silicon carbide (SiC) lump is formed by depositing SiC by chemical vapor deposition (CVD), and a consumable part for the plasma processing apparatus is manufactured by processing the SiC lump, the consumable part having a predetermined shape. A first plasma process is performed on a substrate by using the manufactured consumable part. A surface of the consumable part that has been eroded by the plasma process is subjected to a clean process for a specific period of time. SiC is deposited on the cleaned surface of the eroded consumable part by CVD. A consumable part having the predetermined shape is remanufactured by processing the eroded consumable part having the surface on which the SiC is deposited. A second plasma process is performed on a substrate by using the remanufactured consumable part.
摘要翻译：在重新使用等离子体处理装置中的消耗部件的方法中，通过化学气相沉积（CVD）沉积SiC形成碳化硅（SiC）块，并且通过将等离子体处理装置的消耗部件 SiC块，该消耗部件具有预定的形状。通过使用制造的消耗部件在基板上进行第一等离子体处理。已经被等离子体处理侵蚀的可消耗部件的表面经过一段干净的处理一段时间。通过CVD将SiC沉积在被腐蚀的消耗部件的清洁表面上。具有预定形状的消耗部件通过处理具有沉积SiC的表面的侵蚀的消耗部件来再制造。通过使用再制造的消耗部件在基板上进行第二等离子体处理。

2. 发明申请

US20100314356A1 METHOD OF REUSING A CONSUMABLE PART FOR USE IN A PLASMA PROCESSING APPARATUS 有权
标题翻译：在等离子体加工设备中使用消耗部件的方法
公开(公告)号：US20100314356A1
公开(公告)日：2010-12-16
申请号：US12813819
申请日：2010-06-11
申请人： Nobuyuki NAGAYAMA , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
发明人： Nobuyuki NAGAYAMA , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
IPC分类号： B44C1/22
CPC分类号： H01L21/465 , C23C16/0227 , C23C16/325 , C23C16/4418 , H01J37/32467 , H01J37/32862
摘要： In a method of reusing a consumable part for use in a plasma processing apparatus, a silicon carbide (SiC) lump is formed by depositing SiC by chemical vapor deposition (CVD), and a consumable part for the plasma processing apparatus is manufactured by processing the SiC lump, the consumable part having a predetermined shape. A first plasma process is performed on a substrate by using the manufactured consumable part. A surface of the consumable part that has been eroded by the plasma process is subjected to a clean process for a specific period of time. SiC is deposited on the cleaned surface of the eroded consumable part by CVD. A consumable part having the predetermined shape is remanufactured by processing the eroded consumable part having the surface on which the SiC is deposited. A second plasma process is performed on a substrate by using the remanufactured consumable part.
摘要翻译：在重新使用等离子体处理装置中的消耗部件的方法中，通过化学气相沉积（CVD）沉积SiC形成碳化硅（SiC）块，并且通过将等离子体处理装置的消耗部件 SiC块，该消耗部件具有预定的形状。通过使用制造的消耗部件在基板上进行第一等离子体处理。已经被等离子体处理侵蚀的可消耗部件的表面经过一段干净的处理一段时间。通过CVD将SiC沉积在被腐蚀的消耗部件的清洁表面上。具有预定形状的消耗部件通过处理具有沉积SiC的表面的侵蚀的消耗部件来再制造。通过使用再制造的消耗部件在基板上进行第二等离子体处理。

3. 发明授权

US08475622B2 Method of reusing a consumable part for use in a plasma processing apparatus 有权
标题翻译：重复使用等离子体处理装置中的消耗部件的方法
公开(公告)号：US08475622B2
公开(公告)日：2013-07-02
申请号：US13524895
申请日：2012-06-15
申请人： Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
发明人： Nobuyuki Nagayama , Naoyuki Satoh , Keiichi Nagakubo , Kazuya Nagaseki
IPC分类号： C23F1/00 , H01L21/306
CPC分类号： H01L21/465 , C23C16/0227 , C23C16/325 , C23C16/4418 , H01J37/32467 , H01J37/32862
摘要： A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.
摘要翻译：重复使用等离子体处理装置中的消耗部件的方法包括清洁由特定时间段内进行的第一等离子体处理而被SiC腐蚀的消耗部件的表面。该方法还包括通过CVD在被蚀刻的消耗部件的清洁表面上沉积SiC。该方法还包括通过使用再制造的可消耗部件对基板上的第二等离子体处理进行第二等离子体处理，对其上沉积有SiC的侵蚀的消耗部件进行加工，从而重新制造具有预定形状的消耗部件。

4. 发明授权

US08318034B2 Surface processing method 有权
标题翻译：表面处理方法
公开(公告)号：US08318034B2
公开(公告)日：2012-11-27
申请号：US12833406
申请日：2010-07-09
申请人： Naoyuki Satoh , Nobuyuki Nagayama , Keiichi Nagakubo
发明人： Naoyuki Satoh , Nobuyuki Nagayama , Keiichi Nagakubo
IPC分类号： B44C1/22
CPC分类号： C23C8/36 , C23C8/80 , C23C16/325 , C23C16/4404 , C23C16/56 , H01J2237/31
摘要： In a surface processing method for processing a surface of a member made of silicon carbide (SiC) and having a fragmental layer on a surface thereof, the surface of the member having the fragmental layer is modified into a dense layer to reduce the number of particles generated from the surface of the member when the member is applied to a plasma processing apparatus. Here, the SiC of the surface of the member is recrystallized by heating the fragmental layer.
摘要翻译：在用于处理由碳化硅（SiC）制成的并且在其表面上具有碎裂层的构件的表面的表面处理方法中，具有碎裂层的构件的表面被修改为致密层以减少颗粒的数量当构件被施加到等离子体处理装置时从构件的表面产生。这里，通过加热碎片层使构件表面的SiC再结晶。

5. 发明授权

US09117635B2 Electrode plate for plasma etching and plasma etching apparatus 有权
标题翻译：用于等离子体蚀刻的电极板和等离子体蚀刻装置
公开(公告)号：US09117635B2
公开(公告)日：2015-08-25
申请号：US13245194
申请日：2011-09-26
申请人： Naoyuki Satoh , Nobuyuki Nagayama , Keiichi Nagakubo
发明人： Naoyuki Satoh , Nobuyuki Nagayama , Keiichi Nagakubo
IPC分类号： C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509 , C23C16/455 , C23F1/00 , H01L21/306 , H01J37/32 , C23C16/06 , C23C16/22
CPC分类号： H01J37/32449 , C23C16/455 , C23C16/45561 , C23C16/45563 , C23C16/45565 , C23C16/505 , C23C16/509 , H01J37/32009 , H01J37/3244 , H01J37/32541
摘要： An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.
摘要翻译：将等离子体蚀刻用电极板形成为具有规定厚度的盘状，在多个同心圆的不同圆周上设置贯穿电极板表面垂直的表面的多个气孔，电极板为在电极板的径向方向分成两个或更多个区域，设置在两个或更多个区域中的气孔的类型通过区域彼此不同。

6. 发明授权

US07641806B2 Manufacturing method for membrane member 有权
标题翻译：膜构件的制造方法
公开(公告)号：US07641806B2
公开(公告)日：2010-01-05
申请号：US10864374
申请日：2004-06-10
申请人： Katsuya Okumura , Kazuya Nagaseki , Naoyuki Satoh , Koji Maruyama
发明人： Katsuya Okumura , Kazuya Nagaseki , Naoyuki Satoh , Koji Maruyama
IPC分类号： H01L21/302 , H01J33/00
CPC分类号： H01J33/04 , B81B3/007 , B81B2203/0127 , B81C1/00158 , B81C2201/0198 , B81C2203/051 , G03F1/22 , G21K1/10 , H01J9/24 , H01J2237/31788
摘要： By steps of forming first masks 13, 14 each having a first pattern on a first surface of a substrate 11 on which a membrane is to be formed, etching the first surface of the substrate 11 by using the first masks 13, 14 to forming first support beams 15, positioning a second surface of the substrate 11 on the basis of the first pattern on the first surface, forming a second mask 17 having a second pattern on the second surface of the substrate 11 based on the alignment and etching the second surface of the substrate 11 in dry by using the second mask 17 to form the second support beams 20, a membrane member 22a where the first and second support beams 15, 20 are formed on both surfaces of the membrane 12 is manufactured. Consequently, it is possible to provide the membrane member that is sufficient in strength and is hard to be deformed by heat.
摘要翻译：通过形成第一掩模13,14的步骤，每个第一掩模13,14具有在其上将要形成膜的基板11的第一表面上的第一图案，通过使用第一掩模13,14蚀刻基板11的第一表面以形成第一支撑梁15，基于第一图案在第一表面上定位基板11的第二表面，基于对准并蚀刻第二表面，在基板11的第二表面上形成具有第二图案的第二掩模17 通过使用第二掩模17来形成第二支撑梁20的基板11干燥的膜构件22a，其中在膜12的两个表面上形成有第一和第二支撑梁15,20的膜构件22a。因此，可以提供足够强度并且难以被热变形的膜部件。

7. 发明授权

US07862959B2 Transfer mask for exposure and pattern exchanging method of the same 有权
标题翻译：转印掩模的曝光和图案交换方法相同
公开(公告)号：US07862959B2
公开(公告)日：2011-01-04
申请号：US11030963
申请日：2005-01-10
申请人： Katsuya Okumura , Kazuya Nagaseki , Naoyuki Satoh
发明人： Katsuya Okumura , Kazuya Nagaseki , Naoyuki Satoh
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： B82Y10/00 , B82Y40/00 , G03F1/20 , G03F1/50 , H01J37/3174 , H01J2237/31788 , H01J2237/31794
摘要： The present invention is a transfer mask for exposure comprising a mask portion having a plurality of cells, each of which an opening of a predetermined pattern is formed in. When one side of the plurality of cells is exposed to a charged particle beam, each of the plurality of cells is adapted to make the charged particle beam pass through itself to the other side thereof based on the pattern of the opening formed in the cell. Thus, when a substrate to be processed is arranged on the other side of the cell, the pattern of the opening formed in the cell is transferred to the substrate to be processed and hence an exposure pattern is formed on the substrate to be processed. The feature of the present invention is that a part of or all the plurality of cells can be exchanged at the mask portion.
摘要翻译：本发明是用于曝光的转印掩模，其包括具有多个单元的掩模部分，每个单元都形成有预定图案的开口。当多个单元的一侧暴露于带电粒子束时，多个单元适于基于形成在单元中的开口的图案使带电粒子束自身通过其自身的另一侧。因此，当待处理基板布置在单元的另一侧时，形成在单元中的开口的图案被转移到待处理的基板，因此在待处理的基板上形成曝光图案。本发明的特征在于，可以在掩模部分更换多个单元的一部分或全部。

8. 发明授权

US08149239B2 Image processing apparatus, image processing method, and storage medium storing a program for causing an image processing apparatus to execute an image processing method 有权
标题翻译：图像处理装置，图像处理方法以及存储用于使图像处理装置执行图像处理方法的程序的存储介质
公开(公告)号：US08149239B2
公开(公告)日：2012-04-03
申请号：US12358421
申请日：2009-01-23
申请人： Naoyuki Satoh
发明人： Naoyuki Satoh
IPC分类号： G06T15/10 , G06T15/00 , G06T17/00 , G06F17/00 , G06F19/00 , G06Q10/00 , A01K5/02
CPC分类号： G06T15/10 , G06F17/50 , G06F2217/02 , G06Q10/087 , G06Q10/0875 , G06T19/00 , G06T2219/016 , G06T2219/2008
摘要： In an image processing apparatus, when an output image generator generates an output image in which an individual image of each part of a product model is arranged around a parts assembly image of the entire product model with a specific part highlighted, a boundary information calculator calculates boundary information for each part highlighted. An individual image arrangement calculator obtains a center position of the highlighted part on the parts assembly image based on the boundary information, obtains a straight line dividing the parts assembly image to equally distribute the parts into respective areas, and calculates a position of arrangement of the individual image of each part corresponding to the highlighted part distributed in each of the areas. The output image generated by the output image generator includes a leading line extending from the individual image of each part to the corresponding part on the parts assembly image.
摘要翻译：在图像处理装置中，当输出图像生成器生成其中产品模型的每个部分的单独图像被布置在具有突出显示的特定部分的整个产品模型的部件组装图像周围的输出图像时，边界信息计算器计算每个部分的边界信息突出显示。单独图像排列计算器基于边界信息获取突出部分在零件组装图像上的中心位置，获得将零件组装图像分割成各个区域的直线，并将其计算出对应于分布在每个区域中的突出显示部分的每个部分的单独图像。由输出图像生成器生成的输出图像包括从各部分的各个图像延伸到零件装配图像上的对应部分的前导线。

9. 发明授权

US06674633B2 Process for producing a strontium ruthenium oxide protective layer on a top electrode 有权
标题翻译：在顶部电极上生产锶氧化钌保护层的方法
公开(公告)号：US06674633B2
公开(公告)日：2004-01-06
申请号：US09797005
申请日：2001-02-28
申请人： Shan Sun , George Hickert , Katsuyoshi Matsuura , Takeyasu Saito , Soichiro Ozawa , Naoyuki Satoh , Mitsushi Fujiki , Satoru Mihara , Jeffrey S. Cross , Yoshimasa Horii
发明人： Shan Sun , George Hickert , Katsuyoshi Matsuura , Takeyasu Saito , Soichiro Ozawa , Naoyuki Satoh , Mitsushi Fujiki , Satoru Mihara , Jeffrey S. Cross , Yoshimasa Horii
IPC分类号： H01G406
CPC分类号： H01L28/75 , H01L28/55
摘要： A method for the fabrication of a cap layer on a top electrode layer of a ferroelectric capacitor includes the steps of depositing an amorphous layer, usually made of Sr(x)Ru(y)O3, on the top electrode and then annealing the amorphous layer in two stages in order convert the amorphous layer into the cap layer. The first anneal is performed at 500° C. to 700° C. in a non-oxidizing atmosphere, such as nitrogen, and converts the amorphous layer into a crystallized layer of Sr(x)Ru(y)O3. The second anneal is performed at 300° C. to 500° C. in an oxidizing atmosphere, such as oxygen, and converts the crystallized layer into the cap layer. The method is applied to the formation of a ferroelectric capacitor element of an integrated semiconductor device.
摘要翻译：在强电介质电容器的顶部电极层上制造覆盖层的方法包括以下步骤：在顶部电极上沉积通常由Sr（x）Ru（y）O 3制成的非晶层，然后退火非晶层在两个阶段中，为了将非晶层转化成盖层。在非氧化性气氛如氮气中，在500〜700℃下进行第一退火，并将非晶层转化为Sr（x）Ru（y）O 3的结晶层。第二次退火在氧化气氛如氧气中在300℃至500℃下进行，并将结晶层转化成盖层。该方法适用于集成半导体器件的铁电电容器元件的形成。

10. 发明申请

US20090060393A1 IMAGE SEARCHING DEVICE, IMAGE SEARCHING METHOD, IMAGE SEARCHING PROGRAM, AND RECORDING MEDIUM RECORDING THE IMAGE SEARCHING PROGRAM 有权
标题翻译：图像搜索设备，图像搜索方法，图像搜索程序和记录媒体记录图像搜索程序
公开(公告)号：US20090060393A1
公开(公告)日：2009-03-05
申请号：US12200200
申请日：2008-08-28
申请人： Naoyuki Satoh
发明人： Naoyuki Satoh
IPC分类号： G06K9/54
CPC分类号： G06K9/00476
摘要： An image searching device including a database, a user interface, a search unit, and an output unit. The search unit includes a data management unit configured to manage data on a model to be searched and acquired from the database and create an image to be displayed on a screen of the user interface; a determination unit configured to determine and extract parts each having a boundary included in a closed region as candidate parts; a part selection unit configured to display single images of the candidate parts on the screen of the user interface to enable selection of a target part; and an image switching unit configured to create data on a part emphasis frame and switch the screen displayed on the user interface from the single images of the candidate parts to a full image in which the target part is highlighted with the part emphasis frame.
摘要翻译：图像搜索装置，包括数据库，用户接口，搜索单元和输出单元。搜索单元包括数据管理单元，被配置为管理要从数据库搜索和获取的模型的数据，并创建要在用户界面的屏幕上显示的图像; 确定单元，被配置为确定和提取每个具有包含在封闭区域中的边界的部分作为候选部分; 部件选择单元，被配置为在用户界面的屏幕上显示候选部分的单个图像，以使得能够选择目标部分; 以及图像切换单元，被配置为在部分加重帧上创建数据，并且将用户界面上显示的屏幕从候选部分的单个图像切换到目标部分以部分加重帧突出显示的完整图像。

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