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1. 发明申请

US20120015307A1 COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备和方法以及储存介质
公开(公告)号：US20120015307A1
公开(公告)日：2012-01-19
申请号：US13182572
申请日：2011-07-14
申请人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA
发明人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： H01L21/67178 , G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021 , H01L21/67184 , H01L21/67225 , H01L21/6723
摘要： In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.
摘要翻译：在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。

2. 发明申请

US20130078059A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STORAGE MEDIUM 有权
标题翻译：基板加工设备，基板加工方法和储存介质
公开(公告)号：US20130078059A1
公开(公告)日：2013-03-28
申请号：US13611555
申请日：2012-09-12
申请人： Suguru ENOKIDA , Masahiro NAKAHARADA , Akira MIYATA , Hidekazu KIYAMA , Naruaki IIDA
发明人： Suguru ENOKIDA , Masahiro NAKAHARADA , Akira MIYATA , Hidekazu KIYAMA , Naruaki IIDA
IPC分类号： B05C13/00 , B25J9/00 , B05C11/00
CPC分类号： H01L21/67178 , H01L21/67745 , H01L21/67766 , H01L21/67769 , H01L21/67781 , H01L21/68707 , Y10S414/137 , Y10S414/139
摘要： A substrate processing apparatus includes: a carrier block including first and second carrier placement units spaced apart in a right and left direction; a processing block having a layered structure in which a plurality of layered parts are vertically arranged, the layered parts each including a substrate transport mechanism for transporting a substrate and a processing module for processing a substrate; a tower unit including plural substrate placement units located at height positions where a substrate is transferred by the substrate transport mechanism of the layered part corresponding to the substrate placement unit; a first substrate transfer mechanism configured to transfer a substrate between the carrier on the first carrier placement unit and the substrate placement unit of the tower unit; and a second substrate transfer mechanism configured to transfer a substrate between the carrier on the second substrate placement unit and the substrate placement unit of the tower unit.
摘要翻译：基板处理装置包括：载体块，其包括沿左右方向间隔开的第一和第二载体放置单元; 具有层叠结构的处理块，其中多个层叠部分垂直布置，所述层叠部分各自包括用于输送基板的基板传送机构和用于处理基板的处理模块; 塔架单元，其包括多个基板放置单元，位于基板通过与基板放置单元对应的层叠部的基板输送机构转印的高度位置; 第一基板传送机构，被配置为在第一载体放置单元上的载体和塔单元的基板放置单元之间传送基板; 以及第二基板输送机构，被配置为将基板转移到第二基板放置单元上的载体和塔单元的基板放置单元之间。

3. 发明申请

US20110014562A1 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：基板处理装置和基板处理方法
公开(公告)号：US20110014562A1
公开(公告)日：2011-01-20
申请号：US12887019
申请日：2010-09-21
申请人： Nobuaki MATSUOKA , Yoshio KIMURA , Akira MIYATA
发明人： Nobuaki MATSUOKA , Yoshio KIMURA , Akira MIYATA
IPC分类号： G03G13/16
CPC分类号： H01L21/67173 , H01L21/67178 , H01L21/67184 , H01L21/67276 , H01L21/67754
摘要： A substrate transfer system to reduce total processing time by transferring a substrate at a first delivery stage to a process block where processing can be carried out earliest. The substrate processing apparatus includes a first transfer device delivering a wafer with respect to a substrate carrier, and a second transfer device delivering a wafer between a plurality of process blocks and the first transfer device via a first delivery stage, to transfer the wafer with respect to the process blocks. The process block where there is no wafer or where processing of the last wafer within the relevant process block will be completed earliest is determined based on processing information of the wafers from the process blocks, and the wafer of the first delivery stage is transferred by the second transfer device to the relevant process block. This ensures smooth transfer of the wafer to the process block.
摘要翻译：一种基板转印系统，用于通过在第一递送阶段将基底转移到可以最早进行处理的工艺块来减少总处理时间。衬底处理设备包括相对于衬底载体传送晶片的第一传输装置和经由第一传送级在多个处理块和第一传送装置之间传送晶片的第二传送装置，以相对于到过程块。基于来自处理块的晶片的处理信息，确定最早期完成相关处理块内没有晶片或最后晶片的处理块的处理块，并且第一传送阶段的晶片由第二传输设备到相关进程块。这确保晶片平滑地转移到处理块。

4. 发明申请

US20230004332A1 PRINTING SYSTEM, NON-TRANSITORY COMPUTER-EXECUTABLE MEDIUM, AND IMAGE FORMING APPARATUS 有权
公开(公告)号：US20230004332A1
公开(公告)日：2023-01-05
申请号：US17849705
申请日：2022-06-27
申请人： Akira MIYATA
发明人： Akira MIYATA
IPC分类号： G06F3/12
摘要： A printing system that is communicable with an image management server through a network includes an information processing apparatus and an image forming apparatus. The information processing apparatus controls a display to display a print setting screen for receiving a print setting that designates printing of a specific color image superimposed on an image to be printed, transmits the specific color image corresponding to the print setting to the image management server, acquires storage location information from the image management server, and transmits print data to the image forming apparatus. The image forming apparatus includes a printer. The image forming apparatus receives the print data, acquires the specific color image from the image management server, generates image data for overprinting the specific color image on the image to be printed, and controls the printer to perform printing based on the image data.

5. 发明申请

US20080117390A1 COATING/DEVELOPING APPARATUS AND SUBSTRATE TRANSFER METHOD 有权
标题翻译：涂层/开发设备和基板传输方法
公开(公告)号：US20080117390A1
公开(公告)日：2008-05-22
申请号：US11877324
申请日：2007-10-23
申请人： Tomohiro KANEKO , Akira MIYATA
发明人： Tomohiro KANEKO , Akira MIYATA
IPC分类号： G03B27/52
CPC分类号： G03F7/7075 , H01L21/67225 , H01L21/67276 , Y10S414/135
摘要： In a coating/developing apparatus, a process section includes post-exposure baking units each having a waiting position and configured to perform a baking process on a substrate. An interface section transfer mechanism includes a first transfer mechanism configured to transfer the substrate to and from the process section and to load the substrate into the post-exposure baking units, and a second transfer mechanism configured to transfer the substrate to and from the light exposure apparatus. An interface section includes a relay position configured to place thereon the substrate transferred by the second transfer mechanism, and to allow the first transfer mechanism to receive the substrate therefrom. A control section is arranged to set the substrate on standby at the relay position and the waiting position, to make a time period constant among substrates from an end of the light exposure process to a start of a post-exposure baking process.
摘要翻译：在涂布/显影装置中，处理部分包括具有等待位置并被配置为在基板上进行烘烤处理的后曝光烘焙单元。接口部分传送机构包括第一传送机构，其被配置为将基板传送到处理部分并从处理部分传送基板并将基板装载到后曝光烘烤单元中;以及第二传送机构，其被配置为将基板传送到曝光和从曝光仪器。接口部分包括被配置为放置在其上由第二传送机构传送的基板并且允许第一传送机构从其接收基板的中继位置。控制部被配置为将基板设置在继电器位置和待机位置的待机状态，使得从曝光过程结束到曝光后烘烤处理开始之间的基板之间的时间段恒定。

6. 发明申请

US20110262623A1 COATER/DEVELOPER, METHOD OF COATING AND DEVELOPING RESIST FILM, AND COMPUTER READABLE STORING MEDIUM 有权
标题翻译：涂料/开发商，涂料和开发电阻膜的方法和计算机可读存储介质
公开(公告)号：US20110262623A1
公开(公告)日：2011-10-27
申请号：US13178299
申请日：2011-07-07
申请人： Akira MIYATA , Masanori TATEYAMA
发明人： Akira MIYATA , Masanori TATEYAMA
IPC分类号： B05D5/12
CPC分类号： H01L21/67276
摘要： A transfer flow is produced in accordance with a process recipe of a process to be carried out. In the transfer flow, a type of modules listed in accordance with a substrate transfer order is associated with a necessary staying time from when the substrate is transferred into a module by a substrate transfer unit to when the substrate is ready to be transferred back to the substrate transfer unit after the corresponding process is finished. A cycle limiting time is determined to be the longest necessary transfer cycle time among those obtained by dividing the necessary staying time by the number of the modules mounted in the coater/developer. The number of the modules to be used is determined to be a value obtained by dividing the necessary staying time by the cycle limiting time or a nearest integer to which the value is raised.
摘要翻译：根据要进行的方法的处理配方产生转移流。在转移流程中，根据衬底转移顺序列出的一种类型的模块与从衬底转移到模块中的衬底转移单元到基板准备好被转移回到基板转移顺序的必要停留时间相关联相应工艺完成后的基片转印单元。将循环限制时间确定为通过将所需的停留时间除以安装在涂布机/显影剂中的模块的数量而获得的那些中最长的必需转印周期时间。要使用的模块的数量被确定为通过将必要的停留时间除以周期限制时间或值被提升的最接近的整数而获得的值。

7. 发明申请

US20100238304A1 DIGITAL CAMERA FOR RECORDING STILL IMAGE WITH SPEECH 有权
标题翻译：用于录制静音图像的数字摄像机
公开(公告)号：US20100238304A1
公开(公告)日：2010-09-23
申请号：US12725652
申请日：2010-03-17
申请人： Akira MIYATA
发明人： Akira MIYATA
IPC分类号： H04N5/225 , G10L19/00
CPC分类号： H04N5/772 , H04N1/2112 , H04N1/2137 , H04N1/2158 , H04N1/32101 , H04N5/907 , H04N9/8047 , H04N9/8063 , H04N2101/00 , H04N2201/3264 , H04N2201/3277
摘要： An image pickup method includes determining a start timing and an end timing of obtaining the speech to have a photographing timing of the still image taken by the image pickup unit therebetween, in accordance with a period in which the speech stored in the temporary speech storing unit satisfies a predetermined condition, and cutting out the speech stored in the temporary speech storing unit for a period from the start timing to the end timing determined, and storing the cut speech in the storing unit in association with the still image taken by the image pickup unit.
摘要翻译：一种图像拾取方法，包括：根据存储在临时语音存储单元中的语音的周期，确定获取语音的开始定时和结束定时，以使其中由图像拾取单元拍摄的静止图像的拍摄定时满足预定条件，并且从确定的开始定时到结束时刻的期间，切换存储在临时语音存储单元中的语音，并将切割的语音与由图像拾取器拍摄的静止图像相关联地存储在存储单元中单元。

8. 发明申请

US20090322895A1 IMAGE SENSING APPARATUS AND STORAGE MEDIUM 有权
标题翻译：图像传感装置和存储介质
公开(公告)号：US20090322895A1
公开(公告)日：2009-12-31
申请号：US12481667
申请日：2009-06-10
申请人： Akira MIYATA
发明人： Akira MIYATA
IPC分类号： H04N5/228 , H04N5/232
CPC分类号： H04N5/23293 , H04N1/2145 , H04N1/2158 , H04N5/2621 , H04N2101/00
摘要： An image sensing apparatus according to this invention includes an image sensing unit which sequentially generates still image data, a holding unit which holds a plurality of still image data, a display unit which displays the still image data, a setting unit which sets a predetermined state as the start timing of shooting by the image sensing unit, a determination unit which determines whether the predetermined state has been obtained, a shooting control unit which causes the image sensing unit to start shooting when the determination unit determines that the predetermined state has been obtained, a display control unit which causes the display unit to sequentially display, at a display speed lower than an actual time, the still image data, a selection unit which selects one of a plurality of image data displayed on the display unit, and a recording unit which records the selected image data.
摘要翻译：根据本发明的图像感测装置包括依次产生静止图像数据的图像感测单元，保持多个静止图像数据的保持单元，显示静止图像数据的显示单元，设置预定状态的设置单元作为图像感测单元的拍摄的开始时刻，确定单元，其确定是否获得了预定状态;当确定单元确定已经获得预定状态时，使得图像感测单元开始拍摄的拍摄控制单元显示控制单元，其使显示单元以低于实际时间的显示速度顺序地显示静止图像数据;选择单元，其选择显示在显示单元上的多个图像数据中的一个，以及记录记录所选择的图像数据的单元。

9. 发明申请

US20110228129A1 IMAGE PICKUP APPARATUS PERFORMING AUTOMATIC PHOTOGRAPHING PROCESSING, IMAGE PICKUP METHOD AND COMPUTER-READABLE RECORDING MEDIUM RECORDED WITH PROGRAM THEREOF 有权
标题翻译：图像拍摄设备执行自动摄影处理，图像拍摄方法和计算机可读记录的记录程序
公开(公告)号：US20110228129A1
公开(公告)日：2011-09-22
申请号：US13152634
申请日：2011-06-03
申请人： Akira MIYATA
发明人： Akira MIYATA
IPC分类号： H04N5/225
CPC分类号： H04N5/232 , H04N5/23219 , H04N5/23222 , H04N5/772
摘要： Disclosed is an image pickup apparatus comprising: an image pickup section to pick up a subject image; and a central processing section to perform processing of arbitrarily setting at least one automatic photographing condition among a plurality of kinds of automatic photographing conditions, judging whether “the set automatic photographing condition” is satisfied or not, and instructing the image pickup section to pick up a recording subject image when “the set automatic photographing condition” is judged to be satisfied.
摘要翻译：公开了一种图像拾取装置，包括：图像拾取部分，用于拾取被摄体图像; 以及中央处理部，执行在多种自动拍摄条件中任意设定至少一个自动拍摄条件的处理，判断是否满足“设定的自动拍摄条件”，并指示图像拾取部拾取判断为“设定的自动拍摄条件”时的记录对象图像。

10. 发明申请

US20080299502A1 COATING AND DEVELOPING APPARATUS, OPERATING METHOD FOR SAME, AND STORAGE MEDIUM FOR THE METHOD 有权
标题翻译：涂料和开发设备，其操作方法和存储介质的方法
公开(公告)号：US20080299502A1
公开(公告)日：2008-12-04
申请号：US12128437
申请日：2008-05-28
申请人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
发明人： Tomonori SHIN , Kouji OKAMURA , Tomohiro KANEKO , Akira MIYATA , Syuzo FUJIMARU
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： H01L21/67225 , H01L21/67276
摘要： In a coating and developing apparatus applied to liquid-immersion light exposure, substrates without an appropriately formed protective film can be recovered without adversely affecting normal-substrate processing efficiency, and in addition, removal of protective films can be simplified. In the coating and developing apparatus of the present invention, abnormal substrates not appropriately surface-coated with a protective film during liquid-immersion light exposure are queued in a queuing module, instead of being loaded into an exposure unit, and after the immediately preceding substrate has been unloaded from the exposure unit and loaded into a designated module, for example, a pre-developing second heating module, each abnormal substrate is loaded into the designated module in order to prevent so-called “scheduled transfer” from being affected, and a protective-film removing unit is also controlled to process the abnormal substrate.
摘要翻译：在适用于液浸式曝光的涂布显影装置中，可以回收没有适当形成的保护膜的基板，而不会不利地影响正常的基板处理效率，另外可以简化保护膜的去除。在本发明的涂布和显影装置中，在液浸式曝光期间不被适当表面涂覆有保护膜的异常基板排队在排队模块中，而不是装载到曝光单元中，并且在紧接在前面的基板已经从曝光单元卸载并加载到指定的模块中，例如预先显影的第二加热模块中，每个异常基板被装载到指定模块中，以防止所谓的“计划传送”受到影响，并且还控制保护膜去除单元以处理异常衬底。

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