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1. 发明申请

US20120009528A1 COATING AND DEVELOPING APPARATUS AND METHOD 有权
标题翻译：涂料和开发设备和方法
公开(公告)号：US20120009528A1
公开(公告)日：2012-01-12
申请号：US13177976
申请日：2011-07-07
申请人： Nobuaki MATSUOKA , Akira Miyata , Shinichi Hayashi , Suguru Enokida
发明人： Nobuaki MATSUOKA , Akira Miyata , Shinichi Hayashi , Suguru Enokida
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： H01L21/6715 , H01L21/67178 , H01L21/67288 , H01L21/67745
摘要： In one embodiment, a coating and developing apparatus includes a processing block including a vertical stack of early-stage processing unit blocks; a vertical stack of later-stage processing unit blocks disposed laterally adjacent to respective ones of the early-stage processing unit blocks; a vertical stack of developing unit blocks stacked on the early-stage processing unit blocks; a vertical stack of auxiliary processing unit blocks disposed laterally adjacent to respective ones of the developing unit blocks; first transfer units, each of which are disposed between the laterally adjacent early-stage processing unit and later-stage processing unit; second transfer units, each of which is disposed between the laterally adjacent developing unit block and auxiliary processing unit block; and a auxiliary transfer mechanism for transferring a substrate between the first transfer units and between the second transfer units.
摘要翻译：在一个实施例中，涂层和显影装置包括处理块，其包括早期处理单元块的垂直堆叠; 垂直堆叠的后级处理单元块，其横向相邻于所述早期处理单元块中的相应处理单元块; 堆叠在早期处理单元块上的显影单元块的垂直堆叠; 辅助处理单元块的垂直堆叠，其横向邻近于相应的显影单元块设置; 第一传送单元，每个传送单元布置在横向相邻的早期处理单元和后期处理单元之间; 第二转印单元，其各自设置在横向相邻的显影单元块和辅助处理单元块之间; 以及用于在第一转印单元之间和第二转印单元之间转印衬底的辅助转印机构。

2. 发明申请

US20110032494A1 APPARATUS AND METHOD OF APPLICATION AND DEVELOPMENT 有权
标题翻译：装置和应用与开发方法
公开(公告)号：US20110032494A1
公开(公告)日：2011-02-10
申请号：US12909191
申请日：2010-10-21
申请人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
发明人： Nobuaki MATSUOKA , Shinichi Hayashi , Yasushi Hayashida , Yoshitaka Hara
IPC分类号： G03B27/32
CPC分类号： H01L21/6715 , H01L21/67225 , Y10T29/49004 , Y10T29/49126 , Y10T29/49155 , Y10T29/53174 , Y10T29/53187 , Y10T29/532
摘要： A block for coating film formation and a block for a development process are stacked. A delivery stage to effect delivery of a substrate with a transportation unit for use in a block is provided for each process block at the carrier block side to constitute a shelf-type delivery stage group. A vertical transportation unit is provided to transport a substrate between the delivery stages in the delivery stage group. A substrate inspection unit is disposed at an upper empty space of the carrier block. A substrate is input to the substrate inspection unit directly by the vertical transportation unit or via a delivery stage in the delivery stage group. The substrate inspection unit may be disposed in the delivery stage group.
摘要翻译：层叠用于涂膜成膜的块和显影处理用块。针对载体块侧的每个处理块提供了用于在块中使用的运输单元实现基板输送的输送阶段，以构成货架式输送阶段组。提供垂直运输单元以在输送台组中的输送台之间输送基底。衬底检查单元设置在承载块的上空空间。基板由垂直运输单元直接输送到基板检查单元，或通过输送台组中的输送台输入。基板检查单元可以设置在输送台组中。

3. 发明申请

US20080241402A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080241402A1
公开(公告)日：2008-10-02
申请号：US12057846
申请日：2008-03-28
申请人： Nobuaki MATSUOKA , Takahiro HASHIMOTO , Katsuhiro TSUCHIYA , Shinichi HAYASHI , Yasushi HAYASHIDA
发明人： Nobuaki MATSUOKA , Takahiro HASHIMOTO , Katsuhiro TSUCHIYA , Shinichi HAYASHI , Yasushi HAYASHIDA
IPC分类号： B05D3/00 , B05C13/00 , B05C11/00
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing system includes processing blocks S2 to S4 of the same construction each built by stacking up a plurality of unit blocks including a film forming unit block and a developing unit block in layers. The processing b locks are arranged longitudinally between a carrier block S1 and an interface block S6. The number of processing blocks like the processing blocks S2 to S4 arranged between the carrier block S1 and the interface block S6 is adjusted to adjust the throughput of the coating and developing system. thus a coating and developing system capable of achieving a desired throughput can be easily designed and manufactured.
摘要翻译：涂覆和显影系统包括具有相同构造的处理块S 2至S 4，每个构造通过堆叠多个单元块，包括成膜单元块和显影单元块。处理b锁被纵向布置在承载块S1和接口块S6之间。布置在载体块S1和接口块S6之间的处理块S 2至S 4的处理块的数量被调整以调节涂覆和显影系统的生产量。因此可以容易地设计和制造能够实现所需生产量的涂层和显影系统。

4. 发明申请

US20110211825A1 COATING AND DEVELOPING APPARATUS, SUBSTRATE PROCESSING METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备，基板加工方法和储存介质
公开(公告)号：US20110211825A1
公开(公告)日：2011-09-01
申请号：US13103290
申请日：2011-05-09
申请人： Nobuaki MATSUOKA , Yasushi Hayashida , Shinichi Hayashi
发明人： Nobuaki MATSUOKA , Yasushi Hayashida , Shinichi Hayashi
IPC分类号： G03D5/04
CPC分类号： H01L21/67745 , H01L21/67178
摘要： A coating and developing apparatus is provided which requires a smaller occupation space even when it incorporates a substrate inspection unit, while eliminating a disadvantageous layout. A coating film forming part B3 including a plurality of process units and transfer mechanisms A3 and A4, and a developing part B1 including a plurality of process units 31 and a transfer mechanism A1 are vertically arranged in a process block S2. There are disposed in the process block S2 on a side of a carrier block S1, a plurality of vertically arranged transfer units TRS for transferring a substrate W between the same and transfer mechanisms for the respective parts, and a vertically movable transfer mechanism D1 for the transfer unit for transferring a substrate between these transfer units. At least one of the coating film forming part and the developing part includes a substrate inspection unit 43 for inspecting a substrate transferred by the transfer mechanism for the corresponding part.
摘要翻译：提供了一种涂覆和显影装置，即使当其包含基板检查单元时也需要较小的占用空间，同时消除不利的布局。包括多个处理单元和转印机构A3和A4的涂膜形成部分B3和包括多个处理单元31和转印机构A1的显影部分B1垂直地布置在处理块S2中。在载体块S1的一侧设置有处理块S2，多个垂直设置的传送单元TRS，用于将基板W传送到相应部件的传送机构和用于各部件的传送机构之间，转印单元，用于在这些转印单元之间转印衬底。涂膜形成部和显影部中的至少一个包括用于检查由相应部分的转印机构转印的基板的基板检查单元43。

5. 发明申请

US20110043773A1 COATING/DEVELOPING APPARATUS AND COATING/DEVELOPING METHOD 有权
标题翻译：涂料/开发设备和涂料/开发方法
公开(公告)号：US20110043773A1
公开(公告)日：2011-02-24
申请号：US12859559
申请日：2010-08-19
申请人： Nobuaki MATSUOKA
发明人： Nobuaki MATSUOKA
IPC分类号： G03B27/52
CPC分类号： G03B27/52
摘要： Disclosed is an coating/developing apparatus and method thereof in which the processing time is shortened and the foot prints is reduced by shortening the travel distance of a wafer transfer arm. The coating/developing apparatus of the present disclosure includes, inter alia, liquid processing part (COT) that processes the substrate using a liquid, a cooling processing part (CA) provided to correspond to the liquid processing part (COT) and perform the cooling process for the substrate, a liquid processing unit (COTU) provided to correspond to the cooling processing part (CA) and equipped with a heating processing part (HP) that performs a heating processing for the substrate. The cooling processing part (CA) transfers the substrate to/from the liquid processing part (COT) and the heating processing part (HP).
摘要翻译：公开了一种涂布/显影装置及其方法，其中缩短了晶片传送臂的移动距离，从而缩短了处理时间并缩小了脚印。本公开的涂布/显影装置尤其包括使用液体处理基板的液体处理部分（COT），与液体处理部分（COT）相对应地设置的冷却处理部分（CA），并执行冷却处理基板，液体处理单元（COTU），其被设置为对应于冷却处理部分（CA）并配备有对基板执行加热处理的加热处理部分（HP）。冷却处理部（CA）将基板传送到液体处理部（COT）和加热处理部（HP）。

6. 发明申请

US20080268383A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080268383A1
公开(公告)日：2008-10-30
申请号：US12103884
申请日：2008-04-16
申请人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： G03F7/20 , G03G15/08
CPC分类号： H01L21/67178 , H01L21/67028 , H01L21/6715 , H01L21/67173 , H01L21/67709 , H01L21/6776
摘要： A coating and developing system includes two rotating members 131 and 132 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 130 extended between the rotating members 131 and 132 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 110 disposed at the upstream end of the carrying passage, a sending-out transfer unit 111 disposed at the downstream end of the carrying passage, a developer pouring nozzle 151 for pouring a developer onto the wafer W, a cleaning nozzle 152 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 154 for blowing a gas against the wafer W. The developer pouring nozzle 151, the cleaning nozzle 152 and the gas nozzle 154 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：涂层显影系统包括分别具有平行的水平旋转轴线和彼此纵向相对设置的两个旋转构件131和132，在旋转构件131和132之间延伸的承载通道形成机构130，以形成承载通道，并且能够沿着轨道路径移动以承载沿着运送通道支撑在其上的晶片W;设置在运送通道的上游端的送入传送单元110，设置在运送通道的下游端的送出传送单元111 用于将显影剂倾倒到晶片W上的显影剂倾倒嘴151，用于将清洗液注入晶片W的清洗喷嘴152以及用于将气体吹向晶片W的气体喷嘴15.显影剂倾倒喷嘴151 清洁喷嘴152和气体喷嘴154沿着沿着上游和d之间的输送通道承载晶片W的方向依次排列承载通道的自身端。

7. 发明申请

US20120015307A1 COATING AND DEVELOPING APPARATUS AND METHOD, AND STORAGE MEDIUM 有权
标题翻译：涂料和开发设备和方法以及储存介质
公开(公告)号：US20120015307A1
公开(公告)日：2012-01-19
申请号：US13182572
申请日：2011-07-14
申请人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA
发明人： Nobuaki MATSUOKA , Akira MIYATA , Shinichi HAYASHI , Suguru ENOKIDA
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： H01L21/67178 , G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021 , H01L21/67184 , H01L21/67225 , H01L21/6723
摘要： In one embodiment, a coating and developing apparatus is provided with transfer units, provided between a stack of early-stage processing unit blocks and a stack of later-stage processing unit blocks to transfer a substrate between the transport mechanisms of laterally-adjacent unit blocks, and a vertically-movable auxiliary transfer mechanism for transporting a substrate between the transfer units. A stack of first developing unit blocks is stacked on the stack of early-stage processing unit blocks, and a stack of second developing unit blocks is stacked on the stack of later-stage processing unit blocks.
摘要翻译：在一个实施例中，涂覆和显影装置设置有转移单元，其设置在一堆早期处理单元块和一堆后期处理单元块之间，用于在横向相邻单元块的传送机构之间传送基板以及用于在转印单元之间输送基板的可垂直移动的辅助转印机构。一堆第一显影单元块堆叠在早期处理单元块的堆叠上，并且第二显影单元块的堆叠堆叠在后级处理单元块的堆叠上。

8. 发明申请

US20080267619A1 DEVELOPING APPARATUS, DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：开发设备，开发方法，涂装和开发系统和存储介质
公开(公告)号：US20080267619A1
公开(公告)日：2008-10-30
申请号：US12105701
申请日：2008-04-18
申请人： Nobuaki MATSUOKA
发明人： Nobuaki MATSUOKA
IPC分类号： G03D5/00
CPC分类号： G03D5/00
摘要： A developing apparatus includes two rotating members 41 and 42 respectively having parallel horizontal axes of rotation and disposed longitudinally opposite to each other, a carrying passage forming mechanism 4 extended between the rotating members 41 and 42 to form a carrying passage, and capable of moving along an orbital path to carry a wafer W supported thereon along the carrying passage, a sending-in transfer unit 31 disposed at the upstream end of the carrying passage, a sending-out transfer unit 32 disposed at the downstream end of the carrying passage, a developer pouring nozzle 71 for pouring a developer onto the wafer W, a cleaning nozzle 72 for pouring a cleaning liquid onto the wafer W, and a gas nozzle 74 for blowing a gas against the wafer W. The developer pouring nozzle 71, the cleaning nozzle 72 and the gas nozzle 74 are arranged in that order in a direction in which the wafer W is carried along the carrying passage between the upstream and the downstream end of the carrying passage.
摘要翻译：显影装置包括分别具有平行的水平旋转轴线和彼此纵向相对布置的两个旋转构件41和42，在旋转构件41和42之间延伸的承载通道形成机构4，以形成承载通道，并且能够沿着携带沿着输送通道支撑在其上的晶片W的轨道，设置在运送通道的上游端的送入传送单元31，设置在运送通道的下游端的送出传送单元32，用于将显影剂倾倒到晶片W上的显影剂倾倒嘴71，用于将清洗液注入到晶片W上的清洁喷嘴72和用于将气体吹向晶片W的气体喷嘴74.显影剂倾倒嘴71，清洁喷嘴 72和气体喷嘴74沿着沿着车辆的上游和下游端之间的输送通道承载晶片W的方向依次布置通行证

9. 发明申请

US20080241403A1 COATING AND DEVELOPING SYSTEM, COATING AND DEVELOPING METHOD AND STORAGE MEDIUM 有权
标题翻译：涂料与开发系统，涂料和开发方法和储存介质
公开(公告)号：US20080241403A1
公开(公告)日：2008-10-02
申请号：US12058252
申请日：2008-03-28
申请人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
发明人： Nobuaki MATSUOKA , Takahiro Hashimoto , Katsuhiro Tsuchiya , Shinichi Hayashi , Yasushi Hayashida
IPC分类号： B05D3/00 , B05C13/00 , B05C11/00
CPC分类号： H01L21/67178 , H01L21/67745
摘要： A coating and developing system has a first processing block, a second processing block, and a transfer block interposed between the first and the second processing block. A first direct carrying means carries substrates from a carrier block to the transfer block. The transfer block distributes the substrates to respective film forming unit blocks of the first and the second processing block. Substrates on which films have been formed by the first and the second processing block are collected temporarily in the transfer block. A second direct carrying means carries the substrate collected in the transfer block from the transfer block to an interface block. Use of the first and the second processing block can improve the throughput of the coating and developing system. Since a carrying route from the carrier block to the first processing block, and a carrying route from the carrier block to the second processing block are the same, a carrying program is easy to create.
摘要翻译：涂覆和显影系统具有第一处理块，第二处理块和介于第一和第二处理块之间的传输块。第一直接承载装置将衬底从承载块运送到转移块。传送块将基板分配到第一和第二处理块的各个成膜单元块。由第一处理块和第二处理块形成了膜的基板被临时收集在转印块中。第二直接传送装置将从传送块收集的基板传送到接口块。使用第一和第二处理块可以提高涂层和显影系统的生产量。由于从承载块到第一处理块的承载路由和从承载块到第二处理块的承载路由相同，所以携带程序容易创建。

10. 发明申请

US20110086316A1 COATING AND DEVELOPING APPARATUS AND COATING AND DEVELOPING METHOD 有权
标题翻译：涂料与开发设备及涂料与开发方法
公开(公告)号：US20110086316A1
公开(公告)日：2011-04-14
申请号：US12896957
申请日：2010-10-04
申请人： Nobuaki MATSUOKA
发明人： Nobuaki MATSUOKA
IPC分类号： G03F7/20 , B05C13/00 , B05C11/00
CPC分类号： G03F7/16 , G03F7/162 , G03F7/30 , G03F7/3021
摘要： Disclosed is a coating and developing apparatus including (a) a first liquid process module to sequentially perform a first liquid process by a first chemical liquid, and a second liquid process by the first chemical liquid again; (b) a buffer module to sequentially store the respective substrates which have been subjected to the first liquid process and have not yet been subjected to the second liquid process; and (c) a second liquid process module to sequentially perform a third liquid process by a second chemical liquid. In particular, the third liquid process to be performed on a first substrate of the substrate group is started before the first liquid process performed on a last substrate of the substrate group is ended, in such a manner that right after the first liquid process is performed on the last substrate, the second liquid process is to be performed on the first substrate.
摘要翻译：公开了一种涂料和显影装置，其包括：（a）第一液体处理模块，用于依次通过第一化学液体执行第一液体处理，并且再次通过第一化学液体进行第二液体处理; （b）缓冲器模块，用于顺序地存储已经经受第一液体处理并且尚未经受第二液体处理的各个基板; 和（c）第二液体处理模块，用于通过第二化学液体依次执行第三液体处理。特别地，在基板组的最后一个基板上执行的第一液体处理结束之前，在基板组的第一基板上执行的第三液体处理开始，使得在执行第一液体处理之后在最后的基板上，第二液体处理将在第一基板上进行。

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