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    • 5. 发明授权
    • Semiconductor processing furnace tube and alignment jig
    • 半导体加工炉管和对准夹具
    • US5022853A
    • 1991-06-11
    • US513555
    • 1990-04-24
    • Eric PowellNavjot Chhabra
    • Eric PowellNavjot Chhabra
    • C30B31/16
    • C30B31/16
    • Disclosed is a quartz tube for a furnace for processing semiconductor wafers. The furnace comprises:an elongated hollow body having opposed first and second ends and a longitudinal axis;an injector opening being formed in the first end, the injector opening including sidewalls which are spaced to slidably receive an elongated gas injector assembly through the opening; andan alignment jig received within the hollow body inwardly adjacent the first end and injector opening, the alignment jig including support means for engaging and aligning a gas injector with the injector opening to support a gas injector to emit gas substantially along the longitudinal tube body axis.
    • 公开了一种用于处理半导体晶片的炉的石英管。 该炉包括:细长的中空体,其具有相对的第一和第二端以及纵向轴线; 喷射器开口形成在所述第一端中,所述喷射器开口包括侧壁,所述侧壁间隔开以通过所述开口可滑动地容纳细长气体喷射器组件; 以及对准夹具,其在中空体内容纳在第一端和喷射器开口内部,该对准夹具包括用于使气体注射器与喷射器开口接合和对准的支撑装置,以支撑气体喷射器,以基本沿着纵管体轴线 。
    • 9. 发明授权
    • On chip decoupling capacitor
    • 片上去耦电容
    • US5304506A
    • 1994-04-19
    • US29088
    • 1993-03-10
    • Stephen R. PorterNavjot Chhabra
    • Stephen R. PorterNavjot Chhabra
    • H01L21/02H01L21/70
    • H01L28/40
    • The present invention discloses an on chip decoupling capacitor structure having a first decoupling capacitor with one electrode formed in the conductively doped silicon substrate and a second electrode made of conductively doped polysilicon. The second electrode is a common electrode to a second decoupling capacitor overlying and thereby coupled in parallel to said first decoupling capacitor. The second capacitor's first electrode is the common electrode and its second electrode is made of conductively doped polysilicon. The electrodes made of the conductively doped polysilicon may be further enhanced by forming a silicided material, such as tungsten silicide, thereon. The decoupling capacitors' dielectric can be formed from high dielectric constant materials, such as TEOS, oxide, nitride or any combination thereof. The second decoupling capacitor could be fabricated over field oxide and used as a single capacitor having a first and second conductively doped polysilicon electrodes (either silicided or non-silicided) with a capacitor dielectric sandwiched in between.
    • 本发明公开了一种片上去耦电容器结构,其具有在导电掺杂硅衬底中形成的一个电极的第一去耦电容器和由导电掺杂多晶硅制成的第二电极。 第二电极是与第一去耦电容器并联并由此并联到第一去耦电容器的第二去耦电容器的公共电极。 第二电容器的第一电极是公共电极,其第二电极由导电掺杂的多晶硅制成。 由导电掺杂多晶硅制成的电极可以通过在其上形成诸如硅化钨的硅化物材料进一步增强。 去耦电容器的电介质可以由高介电常数材料形成,例如TEOS,氧化物,氮化物或其任何组合。 第二去耦电容器可以在场氧化物上制造,并且用作具有第一和第二导电掺杂多晶硅电极(硅化或非硅化)的单个电容器,其间夹有电容器电介质。