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    • 6. 发明申请
    • Method for manufacturing solar cell and solar cell, and method for manufacturing semiconductor device
    • 太阳能电池和太阳能电池的制造方法以及半导体装置的制造方法
    • US20090020158A1
    • 2009-01-22
    • US11918719
    • 2006-04-11
    • Hiroyuki OhtsukaMasatoshi TakahashiNaoki IshikawaShigenori SaisuToyohiro UeguriSatoyuki OjimaTakenori WatabeTakeshi AkatsukaTsutomu Onishi
    • Hiroyuki OhtsukaMasatoshi TakahashiNaoki IshikawaShigenori SaisuToyohiro UeguriSatoyuki OjimaTakenori WatabeTakeshi AkatsukaTsutomu Onishi
    • H01L31/00H01L21/22B32B9/00
    • H01L21/2254H01L31/022425H01L31/0682H01L31/18H01L31/1804Y02E10/547Y02P70/521
    • The present invention is a method for manufacturing a solar cell by forming a p-n junction in a semiconductor substrate having a first conductivity type, wherein, at least: a first coating material containing a dopant and an agent for preventing a dopant from scattering, and a second coating material containing a dopant, are coated on the semiconductor substrate having the first conductivity type so that the second coating material may be brought into contact with at least the first coating material; and, a first diffusion layer formed by coating the first coating material, and a second diffusion layer formed by coating the second coating material the second diffusion layer having a conductivity is lower than that of the first diffusion layer are simultaneously formed by a diffusion heat treatment; a solar cell manufactured by the method; and a method for manufacturing a semiconductor device. It is therefore possible to provide the method for manufacturing the solar cell, which can manufacture the solar cell whose photoelectric conversion efficiency is improved at low cost and with a simple and easy method by suppressing surface recombination in a portion other than an electrode of a light-receiving surface and recombination within an emitter while obtaining ohmic contact; the solar cell manufactured by the method; and the method for manufacturing the semiconductor device.
    • 本发明是一种通过在具有第一导电类型的半导体衬底中形成pn结来制造太阳能电池的方法,其中至少包括:含有掺杂剂的第一涂层材料和用于防止掺杂剂散射的试剂,以及 包含掺杂剂的第二涂层材料涂覆在具有第一导电类型的半导体衬底上,使得第二涂层材料可以与至少第一涂层材料接触; 并且通过涂覆第一涂料形成的第一扩散层和通过涂覆第二涂料形成的第二扩散层,具有导电性的第二扩散层比第一扩散层的第二扩散层低,通过扩散热处理同时形成 ; 通过该方法制造的太阳能电池; 以及半导体装置的制造方法。 因此,可以提供制造太阳能电池的方法,该太阳能电池可以以低成本制造光电转换效率提高的太阳能电池,并且通过简单且容易的方法,通过抑制光的电极以外的部分的表面复合 - 接收表面并在发射体内复合,同时获得欧姆接触; 该方法制造的太阳能电池; 以及半导体装置的制造方法。
    • 8. 发明授权
    • Solar cell and its manufacturing method
    • 太阳能电池及其制造方法
    • US07355114B2
    • 2008-04-08
    • US10472115
    • 2002-03-19
    • Satoyuki OjimaHiroyuki OhtsukaMasatoshi TakahashiTakenori Watabe
    • Satoyuki OjimaHiroyuki OhtsukaMasatoshi TakahashiTakenori Watabe
    • H01L31/0248H01L31/068
    • H01L31/068H01L31/022433H01L31/02363H01L31/035281H01L31/03529H01L31/1804Y02E10/547Y02P70/521
    • An OECO solar cell using a semiconductor single crystal substrate having a plurality of grooves, wherein a minimum groove depth h of each groove always satisfies the relation of h≧W1tan θ where θ represents an angle between a line connecting the lower end, along the thickness-wise direction of the semiconductor single crystal substrate, of an electrode formed in the groove and the upper end of the inner side face of the same groove having no electrode formed thereon, and a reference line normal to the thickness-wise direction, and W1 represents a distance between both opening edges of the groove; wherein the semiconductor single crystal substrate has thickness decreasing from a first side of a first main surface to a second side opposed to the first side; and wherein the plurality of grooves have a depth distribution of being deepest at a thickest position of the substrate, and a gradually becoming shallower towards a thinnest position of the substrate.
    • 使用具有多个凹槽的半导体单晶基板的OECO太阳能电池,其中每个凹槽的最小凹槽深度h总是满足h> = W 1tanθ的关系,其中θ表示 连接沿着半导体单晶基板的厚度方向的下端,形成在槽中的电极和形成在其上的没有电极的同一槽的内侧面的上端的线,以及参考线 垂直于厚度方向,W 1 1表示槽的两个开口边缘之间的距离; 其中所述半导体单晶衬底具有从第一主表面的第一侧到与所述第一侧相对的第二侧的厚度; 并且其中所述多个凹槽具有在所述基底的最厚位置处最深的深度分布,并且朝向所述基底的最薄位置逐渐变浅。