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    • 1. 发明申请
    • Pattern evaluation method and evaluation apparatus and pattern evaluation program
    • 模式评估方法和评估装置及模式评价程序
    • US20080028361A1
    • 2008-01-31
    • US11878018
    • 2007-07-20
    • Eiji YamanakaMasamitsu ItohMitsuyo AsanoShinji Yamaguchi
    • Eiji YamanakaMasamitsu ItohMitsuyo AsanoShinji Yamaguchi
    • G06F17/50
    • G03F1/84
    • A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.
    • 用于评估掩模图案的图案评估方法包括生成与掩模图案的评估位置相对应的期望的晶片图形数据,基于掩模图案的图像生成掩模图案轮廓数据,以及基于掩模执行光刻/模拟处理 图案轮廓数据,并且当掩模图案被转印到晶片时产生预测的晶片图形数据。 此外,其包括导出掩模图案轮廓数据和掩模图案数据之间的位置偏移,基于位置偏移校正期望的晶片图案数据和预测的晶片图案数据之间的位置误差,并将期望的晶片图案数据与预测的晶片图案数据进行比较 具有校正位置误差的晶片图形数据。
    • 4. 发明授权
    • Pattern evaluation method and evaluation apparatus and pattern evaluation program
    • 模式评估方法和评估装置及模式评价程序
    • US07673281B2
    • 2010-03-02
    • US11878018
    • 2007-07-20
    • Eiji YamanakaMasamitsu ItohMitsuyo AsanoShinji Yamaguchi
    • Eiji YamanakaMasamitsu ItohMitsuyo AsanoShinji Yamaguchi
    • G06F17/50
    • G03F1/84
    • A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.
    • 用于评估掩模图案的图案评估方法包括生成与掩模图案的评估位置相对应的期望的晶片图形数据,基于掩模图案的图像生成掩模图案轮廓数据,以及基于掩模执行光刻/模拟处理 图案轮廓数据,并且当掩模图案被转印到晶片时产生预测的晶片图形数据。 此外,其包括导出掩模图案轮廓数据和掩模图案数据之间的位置偏移,基于位置偏移校正期望的晶片图案数据和预测的晶片图案数据之间的位置误差,并将期望的晶片图案数据与预测的晶片图案数据进行比较 具有校正位置误差的晶片图形数据。
    • 7. 发明授权
    • High speed synchronous processing system for executing parallel
processing of programs having loops
    • 用于执行具有循环的程序的并行处理的高速同步处理系统
    • US5586320A
    • 1996-12-17
    • US337238
    • 1994-11-04
    • Koh-Ichiro HottaHiroshi NagakuraEiji YamanakaHideki Nozaki
    • Koh-Ichiro HottaHiroshi NagakuraEiji YamanakaHideki Nozaki
    • G06F15/16G06F9/44G06F9/52G06F15/177G06F15/80G06F17/16G06F15/167G06F9/46
    • G06F8/45
    • A data processing system for executing a parallel processing of programs by a plurality of computers, includes a plurality of parallel processing execution units for dividing a predetermined processing into a plurality of processings and a plurality of computers for executing a parallel processing of the parallel processing execution unit. In addition, a plurality of wait-until procedure units are provided for synchronization therewith between the plurality of computers in the case of executing a parallel processing. One computer assigns a value to a synchronous variable in the course of synchronous processing between the processors, to vary the value of the synchronous variable regularly, and another computer is adapted to suspend operations using a wait-until procedure until a value of a synchronous variable surpasses a predetermined value. Thus, the invention reduces an overhead time of the synchronous processing by effectively executing a parallel processing of programs.
    • 一种用于由多台计算机执行程序的并行处理的数据处理系统,包括用于将预定处理划分为多个处理的多个并行处理执行单元和用于执行并行处理执行的并行处理的多个计算机 单元。 此外,在执行并行处理的情况下,提供多个等待直到过程单元用于在多个计算机之间与其同步。 一台计算机在处理器之间的同步处理过程中为同步变量分配一个值,以定期改变同步变量的值,另一台计算机适用于使用等待直到过程暂停操作,直到同步变量的值 超过预定值。 因此,本发明通过有效地执行程序的并行处理来减少同步处理的开销时间。