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1. 发明申请

US20080028361A1 Pattern evaluation method and evaluation apparatus and pattern evaluation program 失效
标题翻译：模式评估方法和评估装置及模式评价程序
公开(公告)号：US20080028361A1
公开(公告)日：2008-01-31
申请号：US11878018
申请日：2007-07-20
申请人： Eiji Yamanaka , Masamitsu Itoh , Mitsuyo Asano , Shinji Yamaguchi
发明人： Eiji Yamanaka , Masamitsu Itoh , Mitsuyo Asano , Shinji Yamaguchi
IPC分类号： G06F17/50
CPC分类号： G03F1/84
摘要： A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.
摘要翻译：用于评估掩模图案的图案评估方法包括生成与掩模图案的评估位置相对应的期望的晶片图形数据，基于掩模图案的图像生成掩模图案轮廓数据，以及基于掩模执行光刻/模拟处理图案轮廓数据，并且当掩模图案被转印到晶片时产生预测的晶片图形数据。此外，其包括导出掩模图案轮廓数据和掩模图案数据之间的位置偏移，基于位置偏移校正期望的晶片图案数据和预测的晶片图案数据之间的位置误差，并将期望的晶片图案数据与预测的晶片图案数据进行比较具有校正位置误差的晶片图形数据。

2. 发明授权

US07313781B2 Image data correction method, lithography simulation method, image data correction system, program, mask and method of manufacturing a semiconductor device 失效
标题翻译：图像数据校正方法，光刻模拟方法，图像数据校正系统，程序，掩模和制造半导体器件的方法
公开(公告)号：US07313781B2
公开(公告)日：2007-12-25
申请号：US11138408
申请日：2005-05-27
申请人： Mitsuyo Asano , Masamitsu Itoh , Eiji Yamanaka , Shinji Yamaguchi
发明人： Mitsuyo Asano , Masamitsu Itoh , Eiji Yamanaka , Shinji Yamaguchi
IPC分类号： G06F17/50
CPC分类号： G03F1/84 , G03F1/44 , G03F1/68
摘要： An image data correction method includes preparing correction data for correcting a distortion of an image obtained by an image acquiring section, acquiring outline data of a desired pattern obtained by the image acquiring section, and correcting the outline data of the desired pattern using the correction data.
摘要翻译：图像数据校正方法包括：准备用于校正图像获取部分获得的图像失真的校正数据，获取由图像获取部分获得的期望图案的轮廓数据，并使用校正数据校正所需图案的轮廓数据。

3. 发明申请

US20050265592A1 Image data correction method, lithography simulation method, image data correction system, program , mask and method of manufacturing a semiconductor device 失效
标题翻译：图像数据校正方法，光刻模拟方法，图像数据校正系统，程序，掩模和制造半导体器件的方法
公开(公告)号：US20050265592A1
公开(公告)日：2005-12-01
申请号：US11138408
申请日：2005-05-27
申请人： Mitsuyo Asano , Masamitsu Itoh , Eiji Yamanaka , Shinji Yamaguchi
发明人： Mitsuyo Asano , Masamitsu Itoh , Eiji Yamanaka , Shinji Yamaguchi
IPC分类号： G03F1/00 , G03F1/14 , G06F17/50 , G06K9/00
CPC分类号： G03F1/84 , G03F1/44 , G03F1/68
摘要： An image data correction method includes preparing correction data for correcting a distortion of an image obtained by an image acquiring section, acquiring outline data of a desired pattern obtained by the image acquiring section, and correcting the outline data of the desired pattern using the correction data.
摘要翻译：图像数据校正方法包括：准备用于校正图像获取部分获得的图像失真的校正数据，获取由图像获取部分获得的期望图案的轮廓数据，并使用校正数据校正所需图案的轮廓数据。

4. 发明授权

US07673281B2 Pattern evaluation method and evaluation apparatus and pattern evaluation program 失效
标题翻译：模式评估方法和评估装置及模式评价程序
公开(公告)号：US07673281B2
公开(公告)日：2010-03-02
申请号：US11878018
申请日：2007-07-20
申请人： Eiji Yamanaka , Masamitsu Itoh , Mitsuyo Asano , Shinji Yamaguchi
发明人： Eiji Yamanaka , Masamitsu Itoh , Mitsuyo Asano , Shinji Yamaguchi
IPC分类号： G06F17/50
CPC分类号： G03F1/84
摘要： A pattern evaluation method for evaluating a mask pattern includes generating desired wafer pattern data corresponding to the evaluation position of a mask pattern, generating mask pattern contour data based on an image of the mask pattern, and performing a lithography/simulation process based on the mask pattern contour data and generating predicted wafer pattern data when the mask pattern is transferred to a wafer. Further, it includes deriving positional offset between the mask pattern contour data and mask pattern data, correcting a positional error between the desired wafer pattern data and the predicted wafer pattern data based on the positional offset, and comparing the desired wafer pattern data with the predicted wafer pattern data with the positional error corrected.
摘要翻译：用于评估掩模图案的图案评估方法包括生成与掩模图案的评估位置相对应的期望的晶片图形数据，基于掩模图案的图像生成掩模图案轮廓数据，以及基于掩模执行光刻/模拟处理图案轮廓数据，并且当掩模图案被转印到晶片时产生预测的晶片图形数据。此外，其包括导出掩模图案轮廓数据和掩模图案数据之间的位置偏移，基于位置偏移校正期望的晶片图案数据和预测的晶片图案数据之间的位置误差，并将期望的晶片图案数据与预测的晶片图案数据进行比较具有校正位置误差的晶片图形数据。

5. 发明申请

US20130081764A1 HEAT-EXPANDABLE REMOVABLE PRESSURE-SENSITIVE ADHESIVE TAPE OR SHEET, AND METHOD OF REMOVING THE SAME 审中-公开
标题翻译：耐热可剥离压敏胶粘带或其他方法及其拆卸方法
公开(公告)号：US20130081764A1
公开(公告)日：2013-04-04
申请号：US13632171
申请日：2012-10-01
申请人： Eiji Yamanaka , Naoaki Higuchi , Tooru Nakashima , Tatsuya Suzuki , Bart Forier , Greet Bossaert , Myriam Vandenholt
发明人： Eiji Yamanaka , Naoaki Higuchi , Tooru Nakashima , Tatsuya Suzuki , Bart Forier , Greet Bossaert , Myriam Vandenholt
IPC分类号： C09J7/02 , B32B43/00
CPC分类号： B32B43/006 , C08K9/10 , C09J5/08 , C09J7/22 , C09J7/38 , C09J2201/134 , C09J2201/36 , C09J2201/606 , C09J2203/318 , C09J2205/102 , C09J2205/11 , C09J2205/302 , C09J2433/00 , C09J2455/006 , C09J2469/006 , Y10T156/1153 , Y10T428/1405
摘要： The heat-expandable removable pressure-sensitive adhesive tape of the present invention includes at least a blowing agent-containing pressure-sensitive adhesive layer A, a microparticle-containing viscoelastic substrate B, a peelable or peel-assisting film layer C, and a pressure-sensitive adhesive layer D. A multilayer structure containing at least the peelable or peel-assisting film layer C and the pressure-sensitive adhesive layer D is arranged on at least one side of the blowing agent-containing pressure-sensitive adhesive layer A where the blowing agent-containing pressure-sensitive adhesive layer A is in direct contact with the peelable or peel-assisting film layer C. The peelable or peel-assisting film layer C can be removed from the blowing agent-containing pressure-sensitive adhesive layer A by heat treatment after storage in an atmosphere of 75° C. for 8 weeks.
摘要翻译：本发明的热膨胀性可剥离压敏粘合带至少包含含发泡剂的压敏粘合剂层A，含微粒粘弹性基材B，可剥离或剥离性膜层C和压力至少含有可剥离或剥离膜层C和压敏粘合剂层D的多层结构布置在含发泡剂的压敏粘合剂层A的至少一侧，其中，含发泡剂的压敏粘合剂层A与可剥离或剥离的薄膜层C直接接触。可剥离或剥离的薄膜层C可以通过以下方式从含发泡剂的压敏粘合剂层A中除去：在75℃的气氛中保存8周后的热处理。

6. 发明授权

US06382287B1 Pneumatic radial tires with circumferential cord belt layer having specified cord twisting structure 有权
标题翻译：具有圆周帘线带层的气动子午线轮胎具有特定的捻线结构
公开(公告)号：US06382287B1
公开(公告)日：2002-05-07
申请号：US09330173
申请日：1999-06-11
申请人： Yoshihide Kohno , Eiji Yamanaka , Toshinobu Kobayashi , Takayuki Sato
发明人： Yoshihide Kohno , Eiji Yamanaka , Toshinobu Kobayashi , Takayuki Sato
IPC分类号： B60C100
CPC分类号： B60C9/22 , B60C9/18 , B60C9/2009 , B60C2009/2242 , Y10T152/10765 , Y10T152/10783 , Y10T152/10792 , Y10T152/1081
摘要： A pneumatic radial tire for passenger cars comprises a circumferential belt layer in addition to a slant belt layer, in which specified PET, nylon, PEN or vinylon fiber cords or steel cords are used in the circumferential belt layer.
摘要翻译：用于乘用车的充气子午线轮胎除了具有倾斜带束层之外还包括周向带束层，其中在周向带束层中使用特定的PET，尼龙，PEN或维尼纶纤维帘线或钢丝帘线。

7. 发明授权

US5586320A High speed synchronous processing system for executing parallel processing of programs having loops 失效
标题翻译：用于执行具有循环的程序的并行处理的高速同步处理系统
公开(公告)号：US5586320A
公开(公告)日：1996-12-17
申请号：US337238
申请日：1994-11-04
申请人： Koh-Ichiro Hotta , Hiroshi Nagakura , Eiji Yamanaka , Hideki Nozaki
发明人： Koh-Ichiro Hotta , Hiroshi Nagakura , Eiji Yamanaka , Hideki Nozaki
IPC分类号： G06F15/16 , G06F9/44 , G06F9/52 , G06F15/177 , G06F15/80 , G06F17/16 , G06F15/167 , G06F9/46
CPC分类号： G06F8/45
摘要： A data processing system for executing a parallel processing of programs by a plurality of computers, includes a plurality of parallel processing execution units for dividing a predetermined processing into a plurality of processings and a plurality of computers for executing a parallel processing of the parallel processing execution unit. In addition, a plurality of wait-until procedure units are provided for synchronization therewith between the plurality of computers in the case of executing a parallel processing. One computer assigns a value to a synchronous variable in the course of synchronous processing between the processors, to vary the value of the synchronous variable regularly, and another computer is adapted to suspend operations using a wait-until procedure until a value of a synchronous variable surpasses a predetermined value. Thus, the invention reduces an overhead time of the synchronous processing by effectively executing a parallel processing of programs.
摘要翻译：一种用于由多台计算机执行程序的并行处理的数据处理系统，包括用于将预定处理划分为多个处理的多个并行处理执行单元和用于执行并行处理执行的并行处理的多个计算机单元。此外，在执行并行处理的情况下，提供多个等待直到过程单元用于在多个计算机之间与其同步。一台计算机在处理器之间的同步处理过程中为同步变量分配一个值，以定期改变同步变量的值，另一台计算机适用于使用等待直到过程暂停操作，直到同步变量的值超过预定值。因此，本发明通过有效地执行程序的并行处理来减少同步处理的开销时间。

8. 发明授权

US5434296A Process for producing unsaturated carbamic acid esters 失效
标题翻译：生产不饱和氨基甲酸酯的方法
公开(公告)号：US5434296A
公开(公告)日：1995-07-18
申请号：US193651
申请日：1994-02-07
申请人： Noriyuki Tsuboniwa , Eiji Yamanaka , Satoshi Urano
发明人： Noriyuki Tsuboniwa , Eiji Yamanaka , Satoshi Urano
IPC分类号： C07C269/04 , C07C269/00 , C07C269/06 , C07C271/64 , C07C261/00
CPC分类号： C07C271/64 , C07C269/00
摘要： The present invention provides a manufacturing method for unsaturated carbamic acid esters by allowing an unsaturated amide compound to react with a metallic base in an inert solvent, followed by a reaction with a halogenated formic acid ester.The invention also provides a manufacturing method of unsaturated carbamic acid esters by allowing an urethane derivative to react with a metallic base in an inert solvent, followed by a reaction with an unsaturated acid halide.
摘要翻译：本发明通过使惰性溶剂中的不饱和酰胺化合物与金属碱反应，然后与卤代甲酸酯反应来提供不饱和氨基甲酸酯的制造方法。本发明还通过使氨基甲酸酯衍生物与惰性溶剂中的金属碱反应，然后与不饱和酰卤反应，提供不饱和氨基甲酸酯的制造方法。

9. 发明授权

US08873830B2 Method for extracting contour of pattern on photo mask, contour extraction apparatus, method for guaranteeing photo mask, and method for manufacturing semiconductor device 有权
标题翻译：用于提取光掩模上的图案轮廓的方法，轮廓提取装置，用于保证光掩模的方法以及制造半导体器件的方法
公开(公告)号：US08873830B2
公开(公告)日：2014-10-28
申请号：US13427206
申请日：2012-03-22
申请人： Eiji Yamanaka
发明人： Eiji Yamanaka
IPC分类号： G06K9/00 , G06T7/00 , G03F1/86
CPC分类号： G03F1/86 , G06T7/0004 , G06T7/13 , G06T2207/10061 , G06T2207/30148
摘要： According to one embodiment, a method includes acquiring information about a two-dimensional distribution of secondary electron intensity for a measurement target pattern, extracting, by a first method, an edge position of an edge for correction value acquisition, extracting, by a second method, an edge position of the edge for correction value acquisition, acquiring a difference between the edge positions extracted by the first and second methods, as a correction value, extracting, by the second method, an edge position of a desired edge based on the information about the two-dimensional distribution, and correcting the edge position of the desired edge based on the correction value.
摘要翻译：根据一个实施例，一种方法包括获取关于测量目标图案的二次电子强度的二维分布的信息，通过第一方法提取用于校正值获取的边缘的边缘位置，通过第二方法提取，用于校正值获取的边缘的边缘位置，获取通过第一和第二方法提取的边缘位置之间的差作为校正值，基于该信息，通过第二方法提取期望边缘的边缘位置关于二维分布，并且基于校正值来校正期望边缘的边缘位置。

10. 发明申请

US20090087081A1 METHOD OF MANUFACTURING PHOTO MASK, MASK PATTERN SHAPE EVALUATION APPARATUS, METHOD OF JUDGING PHOTO MASK DEFECT CORRECTED PORTION, PHOTO MASK DEFECT CORRECTED PORTION JUDGMENT APPARATUS, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 失效
标题翻译：制造照片掩模的方法，掩模图案形状评估装置，判定照相掩模缺陷校正部分的方法，照相掩模缺陷校正部分判定装置以及制造半导体器件的方法
公开(公告)号：US20090087081A1
公开(公告)日：2009-04-02
申请号：US12252915
申请日：2008-10-16
申请人： Takashi HIRANO , Eiji Yamanaka
发明人： Takashi HIRANO , Eiji Yamanaka
IPC分类号： G06K9/00
CPC分类号： G06T7/0006 , G06T2207/30148
摘要： According to an aspect of the invention, there is provided a method comprising detecting a defect of a pattern formed on the photo mask, acquiring a pattern image of a first region on the photo mask, extracting a pattern contour from the pattern image to acquire pattern contour extracted data, producing first graphic data based on the pattern contour extracted data and a pixel size, acquiring pattern data including the first region and corresponding to a second region from design data, producing second graphic data from the pattern data, replacing the second graphic data with the first graphic data to produce third graphic data only in a region where the first graphic data is superimposed upon the second graphic data, producing transfer patterns of pattern shapes represented by the second and third graphic data, and comparing the transfer patterns to judge whether or not the defect needs to be corrected.
摘要翻译：根据本发明的一个方面，提供了一种方法，包括检测在光掩模上形成的图案的缺陷，获取光掩模上的第一区域的图案图像，从图案图像中提取图案轮廓以获取图案轮廓提取数据，基于模式轮廓提取数据和像素尺寸产生第一图形数据，从设计数据获取包括第一区域并对应于第二区域的图案数据，从图案数据生成第二图形数据，替换第二图形具有第一图形数据的数据，仅在第一图形数据叠加在第二图形数据上的区域中产生第三图形数据，产生由第二图形数据和第三图形数据表示的图案形状的转印图案，并比较转印图案以判断是否需要纠正缺陷。

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