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    • 2. 发明授权
    • Button hole sewing machine
    • 钮扣缝纫机
    • US5848573A
    • 1998-12-15
    • US685388
    • 1996-07-23
    • Yasuaki HiranoKazuaki IshiiMitsuhiro Tachikawa
    • Yasuaki HiranoKazuaki IshiiMitsuhiro Tachikawa
    • D05B29/00D05B3/06D05B29/06D05B65/00D05B65/02
    • D05B65/00D05B3/06D05B29/06
    • A buttonhole sewing machine includes a holding mechanism attached to a holder arm which reciprocates in a direction perpendicular to an amplitude direction of a needle. The holding mechanism includes a workpiece holder plate and constitutes a parallelogram linkage. The holding mechanism maintains a parallelogram shape even when the holder plate slants on a fold of the workpiece, and securely holds the workpiece. This buttonhole sewing machine also includes a cutting mechanism which cuts thread and braid in a short manner even when the holder plate slants. The cutting mechanism has a rotary cutter and a fixed cutter, and the fixed cutter is fixed on the holder plate while inclined from a proximal portion to a distal portion. A wire member is connected to the mobile cutter to facilitate the rotation of the rotary cutter even when the holder plate slants.
    • 扣眼缝纫机包括固定机构,该保持机构在与针的振幅方向垂直的方向上往复运动的保持臂。 保持机构包括工件保持板,构成平行四边形连杆。 即使当保持器板倾斜在工件的折叠上并且牢固地保持工件时,保持机构也保持平行四边形形状。 该扣眼缝纫机还包括切割机构,即使当夹持板倾斜时,也可以以短的方式切割线和编织物。 切割机构具有旋转切割器和固定切割器,并且固定切割器在从近端部分到远端部分倾斜的同时固定在保持器板上。 线材构件连接到移动式切割器,以便即使当保持器板倾斜时也能够旋转切割器的旋转。
    • 4. 发明授权
    • Non-volatile semiconductor memory device and erasing control method thereof
    • 非易失性半导体存储器件及其擦除控制方法
    • US07038951B2
    • 2006-05-02
    • US10866442
    • 2004-06-10
    • Yasuaki HiranoShuichiro Kouchi
    • Yasuaki HiranoShuichiro Kouchi
    • G11C16/04
    • G11C16/3477G11C16/16G11C16/3445G11C16/3459G11C16/3468
    • A non-volatile semiconductor memory device includes a memory cell array including a plurality of memory cells, wherein information is writable to each of the plurality of memory cells and information is erasable from each of the plurality of memory cells, and the plurality of memory cells are grouped into at least one memory block; and a write and erasing section for performing a program write operation to a prescribed memory cell in one memory block in a prescribed voltage condition and for performing an erasing operation with respect to the memory cells in the one memory block, wherein the write and erasing section performs a pre-erasing write operation to the memory cells in the one memory block in a voltage condition, which is different from the prescribed voltage condition, before the erasing operation is performed with respect to the memory cells in the one memory block.
    • 非挥发性半导体存储器件包括存储单元阵列,该存储单元阵列包括多个存储单元,其中信息可写入多个存储单元中的每一个,并且信息可从多个存储单元中的每一个擦除,并且多个存储单元 被分组成至少一个存储块; 以及写入和擦除部分,用于以规定的电压条件对一个存储器块中的规定的存储器单元执行程序写入操作,并且对于所述一个存储器块中的存储器单元执行擦除操作,其中写入和擦除部分 在相对于一个存储块中的存储单元执行擦除操作之前,在与规定电压条件不同的电压条件下,对一个存储块中的存储单元执行预擦除写入操作。
    • 5. 发明授权
    • Method of driving a nonvolatile semiconductor storage device
    • 驱动非易失性半导体存储装置的方法
    • US6072722A
    • 2000-06-06
    • US111664
    • 1998-07-08
    • Yasuaki Hirano
    • Yasuaki Hirano
    • G11C16/04G11C16/02G11C16/06G11C16/10G11C16/16H01L21/8247H01L27/115H01L29/788H01L29/792G11C16/00
    • G11C16/16G11C16/10
    • For programming data "0", a reference voltage Vss (e.g., 0 V) is applied to a drain and a source of a memory cell to be programmed via a corresponding main bit line, a corresponding select transistor, and a corresponding local bit line, while a second voltage Vpp (e.g., 15 V) is applied to a control gate of the memory cell via a word line connected with the memory cell. As a result, electrons are injected from the drain, source and channel region to a floating gate of the memory cell via its tunnel oxide. For erasing the memory cell, a third voltage Vds (e.g., 0-6 V) is applied to a semiconductor substrate of the memory cell and a fourth voltage Vneg (e.g., -10 V) is applied to the control gate via the word line. At this time, the third voltage is also applied to the source and drain. Alternatively, the source and drain of the memory cell are placed in a floating state. Consequently, electrons are ejected from the floating gate to the channel region via the tunnel oxide.
    • 对于编程数据“0”,将参考电压Vss(例如,0V)施加到要通过相应的主位线,相应的选择晶体管和相应的局部位线被编程的存储器单元的漏极和源极 而第二电压Vpp(例如,15V)经由与存储单元连接的字线被施加到存储器单元的控制栅极。 结果,电子从漏极,源极和沟道区域经由其隧道氧化物注入到存储器单元的浮置栅极。 为了擦除存储单元,将第三电压Vds(例如,0-6V)施加到存储单元的半导体衬底,并且通过字线将第四电压Vneg(例如,-10V)施加到控制栅极 。 此时,第三电压也施加到源极和漏极。 或者,存储器单元的源极和漏极被置于浮置状态。 因此,电子通过隧道氧化物从浮动栅极喷射到沟道区。
    • 7. 发明授权
    • Nonvolatile semiconductor memory device and method of detecting overerased cell
    • 非易失性半导体存储器件及其检测方法
    • US06714459B2
    • 2004-03-30
    • US10241752
    • 2002-09-12
    • Yasuaki Hirano
    • Yasuaki Hirano
    • G11C1604
    • G11C16/3409G11C16/28G11C16/3404
    • In a nonvolatile semiconductor memory device, overerase-verify in an erase operation is conducted in units of bit lines in a batch. A cell current of a reference cell and voltage applied to a word line of a main cell are set so as to have a detection level at which there can be one or no memory cell having a threshold voltage of 0.5 V at time of one overerase-verify operation and a leak current of an unselected memory cell can be 1 &mgr; A or lower in a normal operation. Thus, the number of verify times in the overerase-verify is reduced to shorten period of time in the overerase-verify and thereby achieve high-speed erase. Furthermore, a cell current can be reduced to achieve lower power consumption.
    • 在非易失性半导体存储器件中,在擦除操作中过度验证以批次中的位线为单位进行。 参考单元的单元电流和施加到主单元的字线的电压被设置为具有检测电平,在该检测电平处可以存在一个或不存在阈值电压为0.5V的存储单元, 验证操作,并且未选择的存储单元的泄漏电流在正常操作中可以为1μA或更低。 因此,过度验证中的验证次数减少,以缩短过度验证中的时间段,从而实现高速擦除。 此外,可以减小电池电流以实现更低的功耗。
    • 9. 发明授权
    • Nonvolatile semiconductor storage device
    • 非易失性半导体存储器件
    • US5652450A
    • 1997-07-29
    • US684585
    • 1996-07-19
    • Yasuaki Hirano
    • Yasuaki Hirano
    • G11C17/00G11C8/08G11C16/02G11C16/06G11C16/08H01L21/8247H01L27/115H01L29/788H01L29/792G11C11/34
    • H01L27/11526G11C16/08G11C8/08H01L27/11546
    • According to the present invention, a nonvolatile semiconductor storage device for applying to each word line either one of a selected voltage and a non-selected voltage, corresponding to a selection state and a non-selection state, respectively, is provided. The selection state or the non-selection state is selected in accordance with an address signal in each operational mode. The nonvolatile semiconductor storage device includes: a plurality of applied voltage decoders operating in accordance with an applied voltage selection state or an applied voltage non-selection state, a plurality of control voltage decoders, each of the control voltage decoders outputting a control voltage corresponding to either a control voltage selection state or a control voltage non-selection state and a plurality of driver circuits, each of the driver circuits being provided so as to correspond to each word line; receiving a first applied voltage, a second applied voltage and a control voltage which are output from a distinct combination of an applied voltage decoder and a control voltage decoder.
    • 根据本发明,提供了一种非易失性半导体存储装置,用于分别对每个字线施加与选择状态和非选择状态相对应的选择电压和非选择电压中的任一个。 根据每个操作模式中的地址信号选择选择状态或非选择状态。 非易失性半导体存储装置包括:根据施加的电压选择状态或施加的电压非选择状态操作的多个施加的电压解码器,多个控制电压解码器,每个控制电压解码器输出对应于 控制电压选择状态或控制电压非选择状态以及多个驱动电路,每个驱动电路被设置为对应于每个字线; 接收从施加的电压解码器和控制电压解码器的不同组合输出的第一施加电压,第二施加电压和控制电压。