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    • 1. 发明授权
    • Semiconductor light emitting device and method for manufacturing the same
    • 半导体发光器件及其制造方法
    • US08124985B2
    • 2012-02-28
    • US11815759
    • 2006-02-07
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • H01L27/15H01L29/26H01L31/12H01L33/00
    • H01L33/20H01L33/0079H01L33/60
    • There are provided a nitride semiconductor light emitting device having a structure enabling enhanced external quantum efficiency by effectively taking out light which is apt to repeat total reflection within a semiconductor lamination portion and a substrate and attenuate, and a method for manufacturing the same. A semiconductor lamination portion (6) including a first conductivity type layer and a second conductivity type layer, made of nitride semiconductor, is provided on a surface of the substrate (1) made of, for example, sapphire or the like. A first electrode (for example, p-side electrode (8)) is provided electrically connected to the first conductivity type layer (for example, p-type layer (5)) on a surface side of the semiconductor lamination portion (6), and a second electrode (for example, n-side electrode (9)) is provided electrically connected to the second conductivity type layer (for example, n-type layer (3)). A part of the semiconductor lamination portion (6) is removed at a surrounding region of a chip of the semiconductor lamination portion (6) by etching so that column portions (6a) stand side by side by leaving the semiconductor lamination portion without etching, and the n-type layer (3) expose around the column portions (6a).
    • 提供了具有通过有效地取出在半导体层叠部分和衬底内易于重复全反射的光而衰减的能够提高外部量子效率的结构的氮化物半导体发光器件及其制造方法。 在由例如蓝宝石等制成的基板(1)的表面上设置包括由氮化物半导体构成的第一导电型层和第二导电型层的半导体层叠部(6)。 第一电极(例如,p侧电极(8))在半导体层叠部分(6)的表面侧电连接到第一导电类型层(例如,p型层(5)), 并且第二电极(例如,n侧电极(9))被设置为电连接到第二导电类型层(例如,n型层(3))。 通过蚀刻在半导体层叠部(6)的芯片的周围区域去除半导体层叠部(6)的一部分,使得柱部(6a)不经蚀刻而离开半导体层叠部而并排放置,并且 n型层(3)围绕柱部(6a)露出。
    • 2. 发明申请
    • SEMICONDUCTOR LIGHT EMITTING DEVICE AND METHOD FOR MANUFACTURING THE SAME
    • 半导体发光器件及其制造方法
    • US20100019257A1
    • 2010-01-28
    • US11815759
    • 2006-02-07
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • Mitsuhiko SakaiAtsushi YamaguchiKen NakaharaMasayuki SonobeTsuyoshi Tsutsui
    • H01L33/00
    • H01L33/20H01L33/0079H01L33/60
    • There are provided a nitride semiconductor light emitting device having a structure enabling enhanced external quantum efficiency by effectively taking out light which is apt to repeat total reflection within a semiconductor lamination portion and a substrate and attenuate, and a method for manufacturing the same. A semiconductor lamination portion (6) including a first conductivity type layer and a second conductivity type layer, made of nitride semiconductor, is provided on a surface of the substrate (1) made of, for example, sapphire or the like. A first electrode (for example, p-side electrode (8)) is provided electrically connected to the first conductivity type layer (for example, p-type layer (5)) on a surface side of the semiconductor lamination portion (6), and a second electrode (for example, n-side electrode (9)) is provided electrically connected to the second conductivity type layer (for example, n-type layer (3)). A part of the semiconductor lamination portion (6) is removed at a surrounding region of a chip of the semiconductor lamination portion (6) by etching so that column portions (6a) stand side by side by leaving the semiconductor lamination portion without etching, and the n-type layer (3) expose around the column portions (6a).
    • 提供了具有通过有效地取出在半导体层叠部分和衬底内易于重复全反射的光而衰减的能够提高外部量子效率的结构的氮化物半导体发光器件及其制造方法。 在由例如蓝宝石等制成的基板(1)的表面上设置包括由氮化物半导体构成的第一导电型层和第二导电型层的半导体层叠部(6)。 第一电极(例如,p侧电极(8))在半导体层叠部分(6)的表面侧电连接到第一导电类型层(例如,p型层(5)), 并且第二电极(例如,n侧电极(9))被设置为电连接到第二导电类型层(例如,n型层(3))。 通过蚀刻在半导体层叠部(6)的芯片的周围区域去除半导体层叠部(6)的一部分,使得柱部(6a)不经蚀刻而离开半导体层叠部而并排放置,并且 n型层(3)围绕柱部(6a)露出。
    • 3. 发明授权
    • Method for manufacturing semiconductor light emitting device
    • 半导体发光元件的制造方法
    • US06197609B1
    • 2001-03-06
    • US09391625
    • 1999-09-07
    • Tsuyoshi TsutsuiMasayuki SonobeNorikazu Ito
    • Tsuyoshi TsutsuiMasayuki SonobeNorikazu Ito
    • H01L2100
    • H01L33/0095
    • Semiconductor layers forming a light emitting layer and including an n-type layer and p-type layer are formed onto a substrate, then the n-type layer is exposed by removing a part of the laminated semiconductor layers. p-side electrode and n-side electrode are then respectively formed on the p-type layer on the surface of the laminated semiconductor layers and the exposed n-type layer, respectively in an electrically connected manner, followed by dicing of the substrate from the exposed n-type layer to the substrate at portions at which breaking of the substrate is performed. Then a protection film is provided on the entire surface of the laminated semiconductor layers as to expose the p-side and n-side electrodes, and breaking of the substrate is performed at dicing portions into individual chips. Consequently, semiconductor light emitting devices can be obtained by breaking the wafer into individual chips without etching the protection film and without damaging the protection film at the time of breaking. Also, the light emitting devices can be improved.
    • 形成发光层并且包括n型层和p型层的半导体层形成在衬底上,然后通过去除一部分层叠半导体层而露出n型层。 p侧电极和n侧电极分别以电连接的方式分别形成在层叠半导体层的表面上的p型层和暴露的n型层上,接着从基板 在进行基板断裂的部分,将裸露的n型层涂覆在基板上。 然后在层叠半导体层的整个表面上设置保护膜,以露出p侧和n侧电极,并且在切割部分将基板的断裂进行到单独的芯片。 因此,半导体发光器件可以通过将晶片分解为单独的芯片而不蚀刻保护膜并且在破坏时不损坏保护膜来获得。 而且,可以改善发光器件。
    • 5. 发明授权
    • Semiconductor light emitting device and method of manufacturing the same
    • 半导体发光器件及其制造方法
    • US06191437B1
    • 2001-02-20
    • US09381285
    • 1999-09-21
    • Masayuki SonobeShunji NakataTsuyoshi TsutsuiNorikazu Itoh
    • Masayuki SonobeShunji NakataTsuyoshi TsutsuiNorikazu Itoh
    • H01L3300
    • H01L33/32H01L33/007
    • An n-type layer (3) and a p-type layer (5) which are made of a gallium nitride based compound semiconductor are provided on a substrate (1) so that a light emitting layer forming portion (10) for forming a light emitting layer is provided. A gallium nitride based compound semiconductor layer containing oxygen is used for at least one layer of the light emitting layer forming portion (10). In the case where a buffer layer (2) made of the gallium nitride based compound semiconductor or aluminum nitride is provided between the substrate (1) and the light emitting layer forming portion (10), the buffer layer (2) and/or at least one layer of the light emitting layer forming portion (10) may contain oxygen. By such a structure, crystal defects of the semiconductor layer of the light emitting layer forming portion (10) can be decreased and a luminance can highly be enhanced. Thus, it is possible to obtain a blue color type semiconductor light emitting device having a high luminance.
    • 在基板(1)上设置由氮化镓类化合物半导体构成的n型层(3)和p型层(5),使得形成光的发光层形成部(10) 提供发光层。 含有氧的氮化镓系化合物半导体层用于至少一层发光层形成部(10)。 在基板(1)和发光层形成部分(10)之间设置由氮化镓基化合物半导体或氮化铝制成的缓冲层(2)的情况下,缓冲层(2)和/或在 发光层形成部(10)的至少一层可以含有氧。 通过这样的结构,可以减少发光层形成部分(10)的半导体层的晶体缺陷,并且可以高度提高亮度。 因此,可以获得具有高亮度的蓝色型半导体发光器件。
    • 10. 发明授权
    • Method of manufacturing a semiconductor light emitting device
    • 制造半导体发光器件的方法
    • US06168962A
    • 2001-01-02
    • US09012193
    • 1998-01-23
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • H01L21302
    • H01L33/0095
    • Disclosed is a method of manufacturing a semiconductor light emitting device. Semiconductor overlying layers are formed on a substrate in a state of a wafer so that a light emitting area is provided therein. The semiconductor overlying layers includes first and second conductivity type layers. Part of the semiconductor overlying layers including the first conductivity type layer on a surface thereof is removed so as to expose part of the second conductivity type layer. Electrodes are formed, for each chip, respectively in connection with the surface of the first conductivity type layer and the surface of the exposed second conductivity type layer. The wafer is divided into individual chips. The exposed areas of the second conductivity type semiconductor layer is provided only part of a peripheral area of the chip so that the first conductivity type semiconductor layer is directly separated during dividing the wafer into individual chips. With such a method, when dividing a wafer into chips, the inefficiency of the space (etched areas do not contribute to light emission) is eliminated in etch-removing the semiconductor overlying layers at areas to be divided, thereby improving chip yield and hence reducing cost.
    • 公开了半导体发光器件的制造方法。 在晶片的状态下在基板上形成半导体覆盖层,以便在其中提供发光区域。 半导体覆盖层包括第一和第二导电类型层。 除去包括其表面上的第一导电类型的半导体覆盖层的一部分,以暴露部分第二导电类型层。 对于每个芯片,分别与第一导电类型层的表面和暴露的第二导电类型层的表面分别形成电极。 晶片分为单个芯片。 第二导电类型半导体层的暴露区域仅提供芯片的周边区域的一部分,使得在将晶片分成单个芯片期间,第一导电类型半导体层被直接分离。 通过这样的方法,当将晶片分成芯片时,在要分割的区域上的半导体覆盖层的蚀刻去除中消除了空间(蚀刻区域对光发射没有贡献)的低效率,从而提高了芯片产量并因此降低了 成本。