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    • 5. 发明授权
    • Method of manufacturing a semiconductor light emitting device
    • 制造半导体发光器件的方法
    • US06168962A
    • 2001-01-02
    • US09012193
    • 1998-01-23
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • Norikazu ItohShunji NakataYukio ShakudaMasayuki SonobeTsuyoshi Tsutsui
    • H01L21302
    • H01L33/0095
    • Disclosed is a method of manufacturing a semiconductor light emitting device. Semiconductor overlying layers are formed on a substrate in a state of a wafer so that a light emitting area is provided therein. The semiconductor overlying layers includes first and second conductivity type layers. Part of the semiconductor overlying layers including the first conductivity type layer on a surface thereof is removed so as to expose part of the second conductivity type layer. Electrodes are formed, for each chip, respectively in connection with the surface of the first conductivity type layer and the surface of the exposed second conductivity type layer. The wafer is divided into individual chips. The exposed areas of the second conductivity type semiconductor layer is provided only part of a peripheral area of the chip so that the first conductivity type semiconductor layer is directly separated during dividing the wafer into individual chips. With such a method, when dividing a wafer into chips, the inefficiency of the space (etched areas do not contribute to light emission) is eliminated in etch-removing the semiconductor overlying layers at areas to be divided, thereby improving chip yield and hence reducing cost.
    • 公开了半导体发光器件的制造方法。 在晶片的状态下在基板上形成半导体覆盖层,以便在其中提供发光区域。 半导体覆盖层包括第一和第二导电类型层。 除去包括其表面上的第一导电类型的半导体覆盖层的一部分,以暴露部分第二导电类型层。 对于每个芯片,分别与第一导电类型层的表面和暴露的第二导电类型层的表面分别形成电极。 晶片分为单个芯片。 第二导电类型半导体层的暴露区域仅提供芯片的周边区域的一部分,使得在将晶片分成单个芯片期间,第一导电类型半导体层被直接分离。 通过这样的方法,当将晶片分成芯片时,在要分割的区域上的半导体覆盖层的蚀刻去除中消除了空间(蚀刻区域对光发射没有贡献)的低效率,从而提高了芯片产量并因此降低了 成本。