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    • 1. 发明申请
    • Chemical vapor deposition devices and methods
    • 化学气相沉积装置及方法
    • US20060289675A1
    • 2006-12-28
    • US10467139
    • 2001-12-27
    • Miodrag OljacaTrifon TomovGeorge NeumanDoug DanielsonAndrew HuntTravis NeumullerFred FortunatoHenry LutenFrank Witbrod
    • Miodrag OljacaTrifon TomovGeorge NeumanDoug DanielsonAndrew HuntTravis NeumullerFred FortunatoHenry LutenFrank Witbrod
    • B05B1/24
    • C23C16/45595B05B1/14B05B7/066B05B7/201C23C16/453
    • Apparatus is described for rapidly coating a large area, or for rapidly producing a powder. In one embodiment, a liquid having a coating chemical is pumped from a liquid reservoir to a distribution manifold. From the distribution manifold, the liquid is carried under pressure to a geometric array, e.g., linear, of atomization nozzles. Flow equalization means are provided for equalizing the flow of the liquid delivered to each nozzle, and, preferably, means are provided for equalizing the temperature of the liquid delivered to each nozzle. The liquid, upon exiting the nozzles with the attendant pressure drop atomizes. The atomized liquid coats a substrate either in non-reacted or reacted form, or forms a powder. In a preferred embodiment, a solution of precursor chemical is reacted in a geometric array of flames produced at the nozzles, and a coating material produced in the flame coats the substrate, or a powder is formed. In another embodiment, vaporized precursor and vaporized are fed to a burner chamber having a linear exit slit. The vapor exiting the slit is burned, and material produced in a flame reaction are deposited on a substrate, or the powder formed is collected.
    • 描述了用于快速涂覆大面积或用于快速生产粉末的装置。 在一个实施例中,具有涂料化学品的液体从液体储存器泵送到分配歧管。 从分配歧管中,将液体在压力下承载到几何阵列,例如线性的雾化喷嘴。 提供流量均衡装置用于均衡输送到每个喷嘴的液体的流动,并且优选地,提供用于均衡输送到每个喷嘴的液体的温度的装置。 液体在离开喷嘴时伴随着压力降雾化。 雾化液体以未反应或反应形式涂覆基材,或形成粉末。 在优选的实施方案中,前体化学品的溶液在喷嘴处产生的几何阵列的火焰中反应,并且在火焰中产生的涂层材料涂覆基底,或形成粉末。 在另一个实施方案中,蒸发的前驱体并蒸发,被送入具有线性出口狭缝的燃烧室。 离开狭缝的蒸汽被燃烧,并且在火焰反应中产生的材料沉积在基底上,或者收集所形成的粉末。
    • 6. 发明申请
    • Hydrophobic coatings and methods
    • 疏水性涂料及方法
    • US20060228566A1
    • 2006-10-12
    • US11100451
    • 2005-04-07
    • Henry LutenJohn Bohland
    • Henry LutenJohn Bohland
    • B32B17/06C08L83/00C08G77/00
    • C03C17/30B82Y30/00B82Y40/00C09D4/00Y10T428/31612Y10T428/31663C08G77/24
    • Liquid coating solutions impart hydrophobicity to substrate surfaces (e.g., glass) and include a silane, preferably octadecyltrichlorosilane (OTS), dissolved in a liquid paraffinic solvent. Preferred liquid paraffinic solvents are normal (straight chain) liquid parrafins having between 10 to 20 carbon atoms per molecule exhibiting flash points (ASTM D93) of between about 70° C. to about 160° C., and initial boiling points (ASTM D86) of between about 185° C. to about 300° C. The OTS will be present in the hydrophobic solutions in amounts sufficient to form a hydrophobic coating on surfaces of substrates on which the solutions are applied, and most preferably will be present in amounts ranging between about 0.25 to about 2.5 molar. Applying a coating of the solution onto a substrate surface will allow the OTS for form a self-assembled monolayer thereon imparting hydrophobicity to the substrate as determined by a high contact angle of at least about 100°.
    • 液体涂料溶液赋予基材表面(例如玻璃)疏水性,并且包括溶解在液体石蜡溶剂中的硅烷,优选十八烷基三氯硅烷(OTS)。 优选的液体石蜡溶剂是每分子具有10至20个碳原子的正常(直链)液体亚克力,其表现出约70℃至约160℃的闪点(ASTM D93)和初始沸点(ASTM D86) 在约185℃至约300℃之间。OTS将以足以在其上施用溶液的基材表面上形成疏水涂层的量存在于疏水溶液中,最优选以 约0.25至约2.5摩尔。 将溶液涂覆在基材表面上将允许OTS在其上形成自组装单层,其通过至少约100°的高接触角确定对基材的疏水性。
    • 9. 发明申请
    • Hydrophobic coatings and methods
    • 疏水性涂料及方法
    • US20050175847A1
    • 2005-08-11
    • US10771514
    • 2004-02-05
    • Henry Luten
    • Henry Luten
    • B32B25/20
    • C03C17/30C03C17/42C03C2217/76Y10T428/31612Y10T428/31663
    • Substrates have a hydrophobic surface coating comprised of the reaction products of methyltrichlorsilane (MTCS) and dimethyldichlorosilane (DMDCS). Most preferably the substrate is glass. An anchor layer is most preferably formed directly onto the glass substrate surface by means of the application of a humidified reaction product of silicon tetrachloride, followed by the vapor-deposition of MTCS as a cross-linking layer. The hydrophobic layer of MTCS and DMDCS may then be applied over the cross-linking layer of MTCS. A capping layer formed of trimethylchlorosilane (TMCS) may then be vapor deposited onto the hydrophobic layer.
    • 底物具有由甲基三氯硅烷(MTCS)和二甲基二氯硅烷(DMDCS)的反应产物组成的疏水表面涂层。 最优选地,基底是玻璃。 锚定层最优选通过施加四氯化硅的加湿反应产物直接形成在玻璃基板表面上,随后将MTCS作为交联层进行气相沉积。 然后可以在MTCS的交联层上施加MTCS和DMDCS的疏水层。 然后可以将由三甲基氯硅烷(TMCS)形成的覆盖层气相沉积到疏水层上。