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1. 发明授权

US08741540B2 Hard mask composition, method of forming a pattern, and semiconductor integrated circuit device including the pattern 有权
标题翻译：硬掩模组合物，形成图案的方法和包括图案的半导体集成电路器件
公开(公告)号：US08741540B2
公开(公告)日：2014-06-03
申请号：US13241389
申请日：2011-09-23
申请人： Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
发明人： Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
IPC分类号： G03F7/00 , G03F7/004 , G03F7/11 , G03F7/40
CPC分类号： G03F7/094
摘要： A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2:
摘要翻译：硬掩模组合物，形成图案的方法和半导体集成电路器件，所述硬掩模组合物包括溶剂; 和含芳香环的化合物，所述含芳香环的化合物包括由以下化学式1表示的部分和由以下化学式2表示的部分中的至少一个：

2. 发明申请

US20120168894A1 HARD MASK COMPOSITION, METHOD OF FORMING A PATTERN, AND SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE INCLUDING THE PATTERN 有权
标题翻译：硬掩模组合物，形成图案的方法和包括图案的半导体集成电路装置
公开(公告)号：US20120168894A1
公开(公告)日：2012-07-05
申请号：US13241389
申请日：2011-09-23
申请人： Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
发明人： Min-Soo Kim , Hwan-Sung Cheon , Jee-Yun Song , Young-Min Kim , Cheol-Ho Lee , Chung-Heon Lee
IPC分类号： H01L21/306 , H01L27/02 , C09D161/06
CPC分类号： G03F7/094
摘要： A hard mask composition, a method of forming a pattern, and a semiconductor integrated circuit device, the hard mask composition including a solvent; and an aromatic ring-containing compound, the aromatic ring-containing compound including at least one of a moiety represented by the following Chemical Formula 1 and a moiety represented by the following Chemical Formula 2:
摘要翻译：硬掩模组合物，形成图案的方法和半导体集成电路器件，所述硬掩模组合物包括溶剂; 和含芳香环的化合物，所述含芳香环的化合物包括由以下化学式1表示的部分和由以下化学式2表示的部分中的至少一个：

4. 发明申请

US20150008212A1 MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MONOMER, AND PATTERN FORMING METHOD USING HARDMASK COMPOSITION 有权
标题翻译： HARDMASK组合物的单体，包括单体的HARDMASK组合物和使用HARDMASK组合物的图案形成方法
公开(公告)号：US20150008212A1
公开(公告)日：2015-01-08
申请号：US14365751
申请日：2012-11-21
申请人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
发明人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
IPC分类号： C07C39/14 , B05D3/06 , B05D1/00 , B05D3/02 , C09D173/00 , B05D3/00
CPC分类号： C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
摘要翻译：公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物和形成图案的方法。

5. 发明授权

US09665003B2 Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns 有权
公开(公告)号：US09665003B2
公开(公告)日：2017-05-30
申请号：US14263323
申请日：2014-04-28
申请人： Yoo-Jeong Choi , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Hyun-Ji Song , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Seung-Hee Hong
发明人： Yoo-Jeong Choi , Yun-Jun Kim , Go-Un Kim , Young-Min Kim , Hea-Jung Kim , Joon-Young Moon , Yo-Choul Park , Yu-Shin Park , You-Jung Park , Hyun-Ji Song , Seung-Wook Shin , Yong-Woon Yoon , Chung-Heon Lee , Seung-Hee Hong
IPC分类号： G03F7/09 , G03F7/40 , G03F7/11 , G03F7/30 , G03F7/16 , G03F7/36
CPC分类号： G03F7/094 , G03F7/09 , G03F7/091 , G03F7/11 , G03F7/162 , G03F7/30 , G03F7/36 , G03F7/40
摘要： A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,

6. 发明授权

US09359276B2 Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition 有权
标题翻译：用于硬掩模组合物的单体，包括单体的硬掩模组合，以及使用硬掩模组合物的图案形成方法
公开(公告)号：US09359276B2
公开(公告)日：2016-06-07
申请号：US14365751
申请日：2012-11-21
申请人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
发明人： Yoo-Jeong Choi , Hyo-Young Kwon , Youn-Jin Cho , Yun-Jun Kim , Young-Min Kim , Yong-Woon Yoon , Chung-Heon Lee
IPC分类号： C07C39/14 , C07C39/12 , G03F7/11 , G03F7/09 , G03F7/004 , G03F7/075 , G03F7/30 , G03F7/36 , B05D1/00 , B05D3/00 , B05D3/02 , B05D3/06 , C09D173/00
CPC分类号： C07C39/14 , B05D1/005 , B05D3/007 , B05D3/0254 , B05D3/06 , C07C39/12 , C07C2603/50 , C07C2603/54 , C09D173/00 , G03F7/004 , G03F7/0752 , G03F7/094 , G03F7/11 , G03F7/30 , G03F7/36
摘要： Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
摘要翻译：公开了由化学式1表示的硬掩模组合物的单体，包含单体的硬掩模组合物和形成图案的方法。

7. 发明授权

US09799885B2 Binder for secondary battery exhibiting excellent adhesion force 有权
公开(公告)号：US09799885B2
公开(公告)日：2017-10-24
申请号：US13808446
申请日：2011-07-05
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M6/22 , H01M4/62 , H01M4/131 , C08F220/14 , C08F220/18 , H01M10/0525 , C08F212/08 , C08F220/26 , C08F222/10 , C08F220/44
CPC分类号： H01M4/622 , C08F212/08 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/44 , C08F222/1006 , H01M4/131 , H01M10/0525
摘要： Provided is a binder for secondary battery electrodes comprising polymer particles obtained by polymerizing three or more kinds of monomers wherein the polymer particles have a mean particle diameter of 0.3 μm to 0.7 μm. The binder exhibits superior adhesion force to electrode current collectors and excellent support force to the active material and basically improves safety of electrodes, thus providing a secondary battery with superior cycle characteristics.

8. 发明授权

US09413011B2 Binder for secondary battery exhibiting excellent adhesion force 有权
标题翻译：二次电池粘合剂具有优异的粘附力
公开(公告)号：US09413011B2
公开(公告)日：2016-08-09
申请号：US13805875
申请日：2011-07-13
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M4/62 , H01M4/131 , H01M4/133 , C08F220/18 , H01M10/0525
CPC分类号： H01M4/622 , C08F2220/1825 , H01M4/131 , H01M4/133 , H01M10/0525 , Y02E60/122 , C08F212/08 , C08F220/06 , C08F222/1006
摘要： Provided is a binder for secondary battery electrodes comprising a polymer obtained by polymerizing three or more kinds of monomers with a reactive emulsifying agent. The binder reduces moisture impregnation, improves dispersibility and enhances adhesive force, thus providing a secondary battery with superior safety and cycle characteristics.
摘要翻译：提供一种二次电池电极用粘合剂，其包含通过使三种或更多种单体与反应性乳化剂聚合而获得的聚合物。粘合剂减少水分浸渍，提高分散性和增强粘合力，从而提供具有优异安全性和循环特性的二次电池。

9. 发明授权

US09005823B2 Electrolyte for rechargeable lithium battery and rechargeable lithium battery including the same 有权
标题翻译：可充电锂电池和可充电锂电池的电解液包括相同
公开(公告)号：US09005823B2
公开(公告)日：2015-04-14
申请号：US13241133
申请日：2011-09-22
申请人： Duck-Chul Hwang , Eun-Gi Shim , Jong-Hyun Lee , Jong-Su Kim , Young-Min Kim
发明人： Duck-Chul Hwang , Eun-Gi Shim , Jong-Hyun Lee , Jong-Su Kim , Young-Min Kim
IPC分类号： H01M6/16 , H01M4/13 , H01M4/58 , H01M10/0567 , H01M4/36 , H01M4/38 , H01M4/48 , H01M4/587 , H01M10/052
CPC分类号： H01M10/0567 , H01M4/362 , H01M4/386 , H01M4/483 , H01M4/587 , H01M10/052
摘要： An electrolyte for a rechargeable lithium battery includes a non-aqueous organic solvent, a lithium salt, and an additive. The additive includes a gamma butyrolactone compound substituted with at least one F atom at the α-position.
摘要翻译：用于可再充电锂电池的电解质包括非水有机溶剂，锂盐和添加剂。添加剂包括在α-位被至少一个F原子取代的γ-丁内酯化合物。

10. 发明申请

US20140031289A1 POLY(ORGANOPHOSPHAZENE) CONTAINING DEGRADATION CONTROLLABLE IONIC GROUP, PREPARATION METHOD THEREOF AND USE THEREOF 审中-公开
标题翻译：含有降解可控离子基团的聚（有机磷），其制备方法及其用途
公开(公告)号：US20140031289A1
公开(公告)日：2014-01-30
申请号：US13569737
申请日：2012-08-08
申请人： Soo-Chang SONG , Young-Min Kim
发明人： Soo-Chang SONG , Young-Min Kim
IPC分类号： C08G79/02 , A61K47/34
CPC分类号： C08G79/025 , A61K47/34
摘要： The present invention relates to a thermosensitive phosphazene-based polymer having a degradation controllable ionic group, a use thereof, and a use thereof as a material for delivering bioactive substances. The phosphazene-based polymer according to the present invention has the thermosensitivity of showing the temperature-dependent sol-gel phase transition. Thus, it forms a gel phase at the body temperature when it is injected into the body to make it easy to control the release of bioactive substances such as drugs, and has the functional groups capable of making chemical bonds such as ionic bond, covalent bond, coordinate bond, etc. with drugs and thus is excellent in bearing the drugs. Since it can control the degradation rate depending on the kind of ionic group, it can selectively control the release time depending on the characteristics of drugs. Furthermore, it has an excellent biocompatibility and thus is very useful as a material for delivery of bioactive substances such as drugs, etc.
摘要翻译：本发明涉及具有降解可控离子基团的热敏磷腈基聚合物，其用途及其用作输送生物活性物质的材料的用途。根据本发明的磷腈基聚合物具有显示温度依赖性溶胶 - 凝胶相变的热敏性。因此，当其注入体内时，其在体温下形成凝胶相，以便容易地控制生物活性物质如药物的释放，并且具有能够进行化学键的官能团，例如离子键，共价键，配合药物等，因此具有优异的耐药性。由于可以根据离子基团的种类控制降解速率，因此可根据药物的特性选择性地控制释放时间。此外，它具有优异的生物相容性，因此作为用于递送生物活性物质如药物等的材料是非常有用的。

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