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1. 发明申请

US20100048077A1 COMPOSITION OF ACRYLIC PRESSURE-SENSITIVE ADHESIVE AND SURFACE FINISHING MATERIAL COMPRISING THE SAME 有权
标题翻译：丙烯酸压敏粘合剂和表面处理材料的组合物
公开(公告)号：US20100048077A1
公开(公告)日：2010-02-25
申请号：US12544520
申请日：2009-08-20
申请人： Chang-bum Ko , Young-min Kim , Kong-ju Song , Kum-hyoung Lee
发明人： Chang-bum Ko , Young-min Kim , Kong-ju Song , Kum-hyoung Lee
IPC分类号： B32B27/04 , B32B27/36 , C08L33/06
CPC分类号： C09J133/068 , C08L2201/02 , Y10T428/264 , Y10T428/2848 , Y10T428/2891 , Y10T442/2754
摘要： An acrylic pressure-sensitive adhesive composition according to the present invention comprises: acrylic copolymer (A) formed by copolymerizing i) alkyl (meth) acrylic acid ester monomer wherein the carbon atom of alkyl group is 2 to 14, ii) monomer having a functional group capable of crosslinking, iii) methyl (meth)acrylate monomer, iv) vinyl acetate monomer, v) glycidyl (meth)acrylate, and vi) crosslinking agent having 5 to 15 of alkyleneoxide groups and at least two acrylate group or vinyl group; and flame retardant (B). The acrylic pressure-sensitive adhesive composition improves the adhesive property and the dispersion of the flame retardant by controlling the crosslinking structure of the acrylic copolymer, such that a surface finishing material comprising the same can have the excellent adhesion and fireproof.
摘要翻译：根据本发明的丙烯酸类压敏粘合剂组合物包括：通过使i）烷基的碳原子数为2〜14的（甲基）丙烯酸酯单体的共聚而形成的丙烯酸共聚物（A），ii）具有能够交联的官能团，iii）（甲基）丙烯酸甲酯单体，iv）乙酸乙烯酯单体，v）（甲基）丙烯酸缩水甘油酯，和vi）具有5至15个环氧烷基团和至少两个丙烯酸酯基团或乙烯基团的交联剂 ; 和阻燃剂（B）。丙烯酸类压敏粘合剂组合物通过控制丙烯酸共聚物的交联结构来改善粘合性和阻燃剂的分散性，使得包含该丙烯酸共聚物的表面处理材料可以具有优异的粘附性和耐火性。

2. 发明授权

US09799885B2 Binder for secondary battery exhibiting excellent adhesion force 有权
公开(公告)号：US09799885B2
公开(公告)日：2017-10-24
申请号：US13808446
申请日：2011-07-05
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M6/22 , H01M4/62 , H01M4/131 , C08F220/14 , C08F220/18 , H01M10/0525 , C08F212/08 , C08F220/26 , C08F222/10 , C08F220/44
CPC分类号： H01M4/622 , C08F212/08 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/44 , C08F222/1006 , H01M4/131 , H01M10/0525
摘要： Provided is a binder for secondary battery electrodes comprising polymer particles obtained by polymerizing three or more kinds of monomers wherein the polymer particles have a mean particle diameter of 0.3 μm to 0.7 μm. The binder exhibits superior adhesion force to electrode current collectors and excellent support force to the active material and basically improves safety of electrodes, thus providing a secondary battery with superior cycle characteristics.

3. 发明授权

US09413011B2 Binder for secondary battery exhibiting excellent adhesion force 有权
标题翻译：二次电池粘合剂具有优异的粘附力
公开(公告)号：US09413011B2
公开(公告)日：2016-08-09
申请号：US13805875
申请日：2011-07-13
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M4/62 , H01M4/131 , H01M4/133 , C08F220/18 , H01M10/0525
CPC分类号： H01M4/622 , C08F2220/1825 , H01M4/131 , H01M4/133 , H01M10/0525 , Y02E60/122 , C08F212/08 , C08F220/06 , C08F222/1006
摘要： Provided is a binder for secondary battery electrodes comprising a polymer obtained by polymerizing three or more kinds of monomers with a reactive emulsifying agent. The binder reduces moisture impregnation, improves dispersibility and enhances adhesive force, thus providing a secondary battery with superior safety and cycle characteristics.
摘要翻译：提供一种二次电池电极用粘合剂，其包含通过使三种或更多种单体与反应性乳化剂聚合而获得的聚合物。粘合剂减少水分浸渍，提高分散性和增强粘合力，从而提供具有优异安全性和循环特性的二次电池。

4. 发明授权

US08822028B2 Acrylic pressure sensitive adhesive and method of preparing the same 有权
标题翻译：丙烯酸压敏粘合剂及其制备方法
公开(公告)号：US08822028B2
公开(公告)日：2014-09-02
申请号：US12831375
申请日：2010-07-07
申请人： Kong-ju Song , Young-min Kim , Chang-bum Ko , Kum-hyoung Lee
发明人： Kong-ju Song , Young-min Kim , Chang-bum Ko , Kum-hyoung Lee
IPC分类号： C09J133/04 , C09J133/06 , C09J133/08 , C09J133/18 , C09J133/20 , C08F236/02 , C08F236/20 , C09J4/00 , C09J7/02
CPC分类号： C09J7/0217 , C09J4/00 , C09J7/385 , C09J133/08 , C09J2201/606 , Y10T428/2848 , Y10T428/2891
摘要： Provided is a removable acrylic pressure sensitive adhesive comprising (A) 70-96.5 weight % of (meth)acrylic acid ester monomer having C1-C14 alkyl group; (B) 0.5-27 weight % of one or more functional group containing monomers selected from the group consisting of carboxyl group containing monomer, hydroxyl group containing monomer, epoxy group containing monomer, vinyl ester group containing monomer and cyano group containing monomer; and (C) 0.6-3 weight % of a cross linking agent having 5-13 alkylene oxide groups and acrylate group or vinyl group in 100 weight % of the monomers and the cross linking agent, and the adhesive of the present invention is a water based adhesive and pro-environmental, and demonstrates excellent adhesiveness at room temperature and under aging atmosphere and excellent dimensional stability as well, so that it can be widely used for various pressure sensitive adhesive sheets for outdoor/indoor advertisement, automobile, printing, decorating, etc.
摘要翻译：提供一种可除去的丙烯酸类压敏粘合剂，其包含（A）70-96.5重量％的具有C 1 -C 14烷基的（甲基）丙烯酸酯单体; （B）0.5-27重量％的选自含羧基的单体，含羟基的单体，含环氧基的单体，含乙烯基酯基的单体和含氰基单体的一种或多种含官能团的单体; 和（C）在100重量％的单体和交联剂中具有5-13个烯化氧基团和丙烯酸酯基或乙烯基的交联剂的0.6-3重量％，本发明的粘合剂是水并且在室温和老化气氛下表现出优异的粘合性，并且具有优异的尺寸稳定性，因此可广泛用于户外/室内广告，汽车，印刷，装饰等各种压敏粘合片，等等

5. 发明申请

US20130209876A1 Binder For Secondary Battery Exhibiting Excellent Adhesion Force 有权
标题翻译：二次电池粘合剂具有优良的粘合力
公开(公告)号：US20130209876A1
公开(公告)日：2013-08-15
申请号：US13808446
申请日：2011-07-05
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M4/62
CPC分类号： H01M4/622 , C08F212/08 , C08F220/14 , C08F220/18 , C08F220/26 , C08F220/44 , C08F222/1006 , H01M4/131 , H01M10/0525
摘要： Provided is a binder for secondary battery electrodes comprising polymer particles obtained by polymerizing three or more kinds of monomers wherein the polymer particles have a mean particle diameter of 0.3 μm to 0.7 μm. The binder exhibits superior adhesion force to electrode current collectors and excellent support force to the active material and basically improves safety of electrodes, thus providing a secondary battery with superior cycle characteristics.
摘要翻译：提供了一种二次电池电极用粘合剂，其包含通过聚合三种或更多种单体获得的聚合物颗粒，其中聚合物颗粒的平均粒径为0.3μm至0.7μm。粘合剂对电极集电体表现出优异的附着力和对活性材料的优异的支撑力，并且基本上提高了电极的安全性，从而提供了具有优异的循环特性的二次电池。

6. 发明申请

US20130216906A1 BINDER FOR SECONDARY BATTERY EXIBITING EXCELLENT ADHESION FORCE 有权
标题翻译：用于二次电池的粘合剂优良的粘合力
公开(公告)号：US20130216906A1
公开(公告)日：2013-08-22
申请号：US13805875
申请日：2011-07-13
申请人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
发明人： MinAh Kang , Young-Min Kim , Chang Bum Ko , Ok Sun Kim
IPC分类号： H01M4/62
CPC分类号： H01M4/622 , C08F2220/1825 , H01M4/131 , H01M4/133 , H01M10/0525 , Y02E60/122 , C08F212/08 , C08F220/06 , C08F222/1006
摘要： Provided is a binder for secondary battery electrodes comprising a polymer obtained by polymerizing three or more kinds of monomers with a reactive emulsifying agent. The binder reduces moisture impregnation, improves dispersibility and enhances adhesive force, thus providing a secondary battery with superior safety and cycle characteristics.
摘要翻译：提供一种二次电池电极用粘合剂，其包含通过使三种或更多种单体与反应性乳化剂聚合而获得的聚合物。粘合剂减少水分浸渍，提高分散性和增强粘合力，从而提供具有优异安全性和循环特性的二次电池。

7. 发明申请

US20120187333A1 ADJUVANT FOR CONTROLLING POLISHING SELECTIVITY AND CHEMICAL MECHANICAL POLISHING SLURRY COMPRISING THE SAME 有权
标题翻译：用于控制抛光选择性和化学机械抛光浆料的添加剂
公开(公告)号：US20120187333A1
公开(公告)日：2012-07-26
申请号：US13420815
申请日：2012-03-15
申请人： Gi Ra Yi , Jong Pil Kim , Jung Hee Lee , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
发明人： Gi Ra Yi , Jong Pil Kim , Jung Hee Lee , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
IPC分类号： C09K13/00
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.
摘要翻译：公开了一种用于同时抛光阳离子充电材料和阴离子充电材料的助剂，其中助剂包含聚电解质盐，该聚电解质盐包含：（a）重均分子量为2,000〜50,000的线性聚电解质与接枝型聚电解质，其重均分子量为1,000〜20,000，包含骨架和侧链; 和（b）基本材料。还公开了包含上述助剂和磨料颗粒的CMP（化学机械抛光）浆料。包含线性聚电解质与接枝型聚电解质的混合物的佐剂使得可以使用单独的线性聚电解质与CMP浆料相比提高抛光选择性，并且通过控制线性聚电解质与接枝型聚电解质。

8. 发明授权

US08147711B2 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry 有权
标题翻译：用于控制抛光选择性和化学机械抛光浆料的辅助剂
公开(公告)号：US08147711B2
公开(公告)日：2012-04-03
申请号：US12086155
申请日：2006-12-08
申请人： Jung Hee Lee , Jong Pil Kim , Gi Ra Yi , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
发明人： Jung Hee Lee , Jong Pil Kim , Gi Ra Yi , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
IPC分类号： C09K13/00
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors.
摘要翻译：公开了用于在与阴离子充电材料同时研磨阳离子充电材料时控制抛光选择性的佐剂。还公开了包含佐剂的CMP浆料。助剂包括：（a）在阳离子充电材料上形成吸附层的聚电解质，以增加阴离子充电材料的抛光选择性; （b）基本材料; 和（c）氟系化合物。当将用于控制根据本发明的CMP浆料的抛光选择性的佐剂应用于CMP工艺时，可以增加氧化硅层的抛光选择性，以获得CMP浆料的均匀粒度，以稳定化在外力下的粘度并且在抛光过程中最小化微细纹的产生。因此，根据本发明的用于CMP浆料的助剂可以在制造非常大规模的集成半导体期间提高可靠性和生产率。

9. 发明申请

US20090267020A1 Adjuvant for Controlling Polishing Selectivity and Chemical Mechanical Polishing Slurry 有权
标题翻译：控制抛光选择性和化学机械抛光浆料的辅助剂
公开(公告)号：US20090267020A1
公开(公告)日：2009-10-29
申请号：US12086155
申请日：2006-12-08
申请人： Jung Hee Lee , Jong Pil Kim , Gi Ra Yi , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
发明人： Jung Hee Lee , Jong Pil Kim , Gi Ra Yi , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
IPC分类号： C09K3/14
CPC分类号： C09G1/02 , C09K3/1409 , C09K3/1463 , H01L21/31053
摘要： Disclosed is an adjuvant for controlling polishing selectivity when polishing a cationically charged material simultaneously with an anionically charged material. CMP slurry comprising the adjuvant is also disclosed. The adjuvant comprises: (a) a polyelectrolyte that forms an adsorption layer on the cationically charged material in order to increase the polishing selectivity of the anionically charged material; (b) a basic material; and (c) a fluorine-based compound. when the adjuvant for controlling polishing selectivity of CMP slurry according to the present invention is applied to a CMP process, it is possible to increase the polishing selectivity of a silicon oxide layer, to obtain a uniform particle size of CMP slurry, to stabilize variations in viscosity under an external force and to minimize generation of microscratches during a polishing process. Therefore, the adjuvant for CMP slurry according to the present invention can improve reliability and productivity during the fabrication of very large scale integrated semiconductors.
摘要翻译：公开了用于在与阴离子充电材料同时研磨阳离子充电材料时控制抛光选择性的佐剂。还公开了包含佐剂的CMP浆料。助剂包括：（a）在阳离子充电材料上形成吸附层的聚电解质，以增加阴离子充电材料的抛光选择性; （b）基本材料; 和（c）氟系化合物。当将用于控制根据本发明的CMP浆料的抛光选择性的佐剂应用于CMP工艺时，可以增加氧化硅层的抛光选择性，以获得CMP浆料的均匀粒度，以稳定化在外力下的粘度并且在抛光过程中最小化微细纹的产生。因此，根据本发明的用于CMP浆料的助剂可以在制造非常大规模的集成半导体期间提高可靠性和生产率。

10. 发明授权

US08652967B2 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same 有权
标题翻译：用于控制抛光选择性的辅助剂和包含其的化学机械抛光浆料
公开(公告)号：US08652967B2
公开(公告)日：2014-02-18
申请号：US13420815
申请日：2012-03-15
申请人： Gi Ra Yi , Jong Pil Kim , Jung Hee Lee , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
发明人： Gi Ra Yi , Jong Pil Kim , Jung Hee Lee , Kwang Ik Moon , Chang Bum Ko , Soon Ho Jang , Seung Beom Cho , Young Jun Hong
IPC分类号： H01L21/302
CPC分类号： C09K3/1463 , C09G1/02 , H01L21/31053
摘要： Disclosed is an adjuvant for use in simultaneous polishing of a cationically charged material and an anionically charged material, wherein the adjuvant comprises a polyelectrolyte salt containing: (a) a mixture of a linear polyelectrolyte having a weight average molecular weight of 2,000˜50,000 with a graft type polyelectrolyte that has a weight average molecular weight of 1,000˜20,000 and comprises a backbone and a side chain; and (b) a basic material. CMP (chemical mechanical polishing) slurry comprising the above adjuvant and abrasive particles is also disclosed. The adjuvant comprising a mixture of a linear polyelectrolyte with a graft type polyelectrolyte makes it possible to increase polishing selectivity as compared to CMP slurry using the linear polyelectrolyte alone, and to obtain a desired range of polishing selectivity by controlling the ratio of the linear polyelectrolyte to the graft type polyelectrolyte.
摘要翻译：公开了一种用于同时抛光阳离子电荷材料和阴离子充电材料的佐剂，其中助剂包含聚电解质盐，其包含：（a）重均分子量为2,000〜50,000的线性聚电解质与接枝型聚电解质，其重均分子量为1,000〜20,000，包含骨架和侧链; 和（b）基本材料。还公开了包含上述助剂和磨料颗粒的CMP（化学机械抛光）浆料。包含线性聚电解质与接枝型聚电解质的混合物的佐剂使得可以使用单独的线性聚电解质与CMP浆料相比提高抛光选择性，并且通过控制线性聚电解质与接枝型聚电解质。

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