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1. 发明申请

US20060028706A1 Polarizer device for generating a defined spatial distribution of polarization states 审中-公开
标题翻译：用于产生限定的偏振态空间分布的偏振器装置
公开(公告)号：US20060028706A1
公开(公告)日：2006-02-09
申请号：US11174489
申请日：2005-07-06
申请人： Michael Totzeck , Heiko Feldman , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Ulrich Stroessner , Thomas Scheruebl , Wolfgang Harnisch
发明人： Michael Totzeck , Heiko Feldman , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Ulrich Stroessner , Thomas Scheruebl , Wolfgang Harnisch
IPC分类号： G02B26/00
CPC分类号： G03F7/70108 , G02B5/3041 , G02B5/3091 , G02B27/286 , G02B27/288 , G03F7/70566
摘要： A polarizer device, for converting an entry light beam into an exit light beam with a defined spatial distribution of polarization states, has an angle varying input device for receiving the entry light beam and for generating a first light beam with a predeterminable first angular distribution of light rays; an angle-selectively active polarization influencing device for receiving the first light beam and for converting the first light beam into a second light beam according to a defined angle function of the polarization state variation; and an angle varying output device for receiving the second light beam and for generating the exit light beam with a second angular distribution from the second light beam. In particular, polarization states with a radial or tangential polarization can be provided cost-effectively in this way.
摘要翻译：一种用于将入射光束转换成具有限定的偏振状态空间分布的出射光束的偏振器装置具有角度变化输入装置，用于接收入射光束并用于产生具有可预先确定的第一角度分布的第一光束光线角度选择性有源极化影响装置，用于接收第一光束并根据偏光状态变化的限定角函数将第一光束转换成第二光束; 以及角度变化的输出装置，用于接收第二光束并用于从第二光束产生具有第二角度分布的出射光束。特别地，可以以这种方式成本有效地提供具有径向或切向极化的极化状态。

2. 发明授权

US07286284B2 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：US07286284B2
公开(公告)日：2007-10-23
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译：用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。

3. 再颁专利

USRE44216E1 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：USRE44216E1
公开(公告)日：2013-05-14
申请号：US12604821
申请日：2009-10-23
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译：用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。

4. 发明申请

US20060012873A1 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：US20060012873A1
公开(公告)日：2006-01-19
申请号：US10917626
申请日：2004-08-13
申请人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
发明人： Michael Totzeck , Heiko Feldmann , Toralf Grunder , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Stroessner
IPC分类号： G02B21/06
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.
摘要翻译：本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

5. 发明授权

US06894837B2 Imaging system for an extreme ultraviolet (EUV) beam-based microscope 失效
标题翻译：用于极紫外（EUV）光束显微镜的成像系统
公开(公告)号：US06894837B2
公开(公告)日：2005-05-17
申请号：US10626130
申请日：2003-07-24
申请人： Hans-Juergen Dobschal , Thomas Scheruebl , Robert Brunner , Norbert Rosenkranz , Joern Greif-Wuestenbecker
发明人： Hans-Juergen Dobschal , Thomas Scheruebl , Robert Brunner , Norbert Rosenkranz , Joern Greif-Wuestenbecker
IPC分类号： G21K1/06 , G21K7/00 , G02B21/00
CPC分类号： G21K1/06 , G21K7/00
摘要： Imaging system for a microscope based on extreme ultraviolet (EUV) radiation. The present invention is directed to a reflective imaging system for an x-ray microscope for examining and object in an object plane, wherein the object is illuminated by rays of a wavelength of less than 100 nm, particularly less than 30 nm, and is imaged in a magnified manner in an image plane. In the imaging system, according to the invention, for a microscope based on extreme ultraviolet (EUV) radiation with wavelengths in the range of less than 100 nm, with a magnification of 0.1× to 1000× and a structural length of less than 5 m, at least one of the imaging optical elements 2 and 3 in the beam path has a diffractive-reflective structure which is arranged on a spherical or plane area and has a non-rotationally symmetric, asymmetric shape. The arrangement according to the invention provides an imaging system which avoids the disadvantages of the prior art and ensures a high imaging quality. The manufacturing cost remains reasonable due to the exclusive use of spherical mirrors.
摘要翻译：基于极紫外（EUV）辐射的显微镜成像系统。本发明涉及一种用于检查和物体在物平面中的X射线显微镜的反射成像系统，其中物体被小于100nm，特别是小于30nm的波长的光照射，并被成像在图像平面中以放大的方式。在成像系统中，根据本发明，对于具有波长在小于100nm，具有0.1x至1000x的放大倍数和小于5μm的结构长度的基于极紫外（EUV）辐射的显微镜，光束路径中的成像光学元件2和3中的至少一个具有布置在球形或平面区域上并具有非旋转对称的不对称形状的衍射反射结构。根据本发明的装置提供了一种避免现有技术的缺点并确保高成像质量的成像系统。由于专门使用球面镜，制造成本仍然是合理的。

6. 发明授权

US08718354B2 Method for analyzing masks for photolithography 有权
标题翻译：分析光刻掩模的方法
公开(公告)号：US08718354B2
公开(公告)日：2014-05-06
申请号：US12934423
申请日：2009-04-09
申请人： Ulrich Stroessner , Thomas Scheruebl
发明人： Ulrich Stroessner , Thomas Scheruebl
IPC分类号： G06K9/00 , G06F17/50
CPC分类号： G03F7/70666 , G03F7/705 , G03F7/70608
摘要： The invention relates to a method for analyzing masks for photolithography. In this method, an aerial image of the mask for a first focus setting is generated and stored in an aerial image data record. The aerial image data record is transferred to an algorithm that simulates a photolithographic wafer exposure on the basis of this data record. In this case, the simulation is carried out for a plurality of mutually different energy doses. Then, at a predetermined height from the wafer surface, contours which separate regions with photoresist from those regions without photoresist are in each case determined. The result, that is to say the contours, are stored for each of the energy doses in each case in a contour data record with the energy dose as a parameter. Finally, the contour data records are combined to form a three-dimensional multicontour data record with the reciprocal of the energy dose as a third dimension, and, on the basis of the transitions from zero to values different than zero in the contours, a three-dimensional profile of the reciprocal of the energy dose depending on the position on the mask is generated. This profile, the so-called effective aerial image, is output or stored or automatically evaluated. The same can also occur with sections through said profile.
摘要翻译：本发明涉及一种用于分析光刻掩模的方法。在该方法中，生成用于第一焦点设置的掩模的空间图像并将其存储在空中图像数据记录中。将空间图像数据记录转移到基于该数据记录模拟光刻晶片曝光的算法。在这种情况下，对多个相互不同的能量剂量进行模拟。然后，在距离晶片表面的预定高度处，在各种情况下都确定了将光致抗蚀剂区域与没有光致抗蚀剂的区域分开的轮廓。在能量剂量作为参数的轮廓数据记录中，在每种情况下，为每个能量剂量存储结果，也就是说轮廓。最后，轮廓数据记录被组合以形成具有作为第三维度的能量剂量的倒数的三维多轨道数据记录，并且基于在轮廓中从零到不同于零的值的过渡，三产生根据掩模上的位置的能量剂量的倒数的三维轮廓。该配置文件，即所谓的有效航空图像，被输出或存储或自动评估。通过所述剖面也可能发生同样的情况。

7. 发明授权

US07525115B2 Arrangement for inspecting objects, especially masks in microlithography 有权
标题翻译：用于检查物体的布置，特别是微光刻中的掩模
公开(公告)号：US07525115B2
公开(公告)日：2009-04-28
申请号：US10554048
申请日：2004-04-20
申请人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
发明人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
IPC分类号： G01N23/04 , G01N21/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84
摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.
摘要翻译：用于检查物体的装置，特别是在微光刻中的掩模，其设置在真空室中。该装置包括用于将从物体发射的照射辐射转换成更高波长的辐射的转换器。用于记录图像的传感器设置在真空室的外部并且被布置为从真空室到转换器的传感器的光学界面，或者将图像透镜的至少一部分布置成在真空室中的窗口。

8. 发明申请

US20110229010A1 METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR OF ONE OF THE SECTIONS OF AN OBJECT THAT IS EXPOSED SECTION BY SECTION 有权
标题翻译：用于测量部分暴露部分的部分之一的相对本地位置错误的方法和装置
公开(公告)号：US20110229010A1
公开(公告)日：2011-09-22
申请号：US13130600
申请日：2009-11-28
申请人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
发明人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
IPC分类号： G06K9/00
CPC分类号： G03F7/70633 , B82Y10/00 , B82Y40/00 , G03F1/84 , G03F7/70616 , H01J37/3174
摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
摘要翻译：提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c）校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差测量标记的误差。

9. 发明授权

US08731273B2 Method and device for measuring the relative local position error of one of the sections of an object that is exposed section by section 有权
标题翻译：用于测量被逐个暴露的对象的一个部分的相对局部位置误差的方法和装置
公开(公告)号：US08731273B2
公开(公告)日：2014-05-20
申请号：US13130600
申请日：2009-11-28
申请人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
发明人： Michael Arnz , Dirk Beyer , Wolfgang Harnisch , Thomas Scheruebl
IPC分类号： G06K9/40 , G01N21/00
CPC分类号： G03F7/70633 , B82Y10/00 , B82Y40/00 , G03F1/84 , G03F7/70616 , H01J37/3174
摘要： A method for measuring the relative local position error of one of the sections of an object that is exposed section by section, in particular of a lithography mask or of a wafer, is provided, each exposed section having a plurality of measurement marks, wherein a) a region of the object which is larger than the one section is imaged in magnified fashion and is detected as an image, b) position errors of the measurement marks contained in the detected image are determined on the basis of the detected image, c) corrected position errors are derived by position error components which are caused by the magnified imaging and detection being extracted from the determined position errors of the measurement marks, d) the relative local position error of the one section is derived on the basis of the corrected position errors of the measurement marks.
摘要翻译：提供了一种用于测量逐段暴露的物体的一个部分（特别是光刻掩模或晶片）的相对局部位置误差的方法，每个暴露部分具有多个测量标记，其中）以放大的方式成像大于该部分的对象的区域，并且被检测为图像，b）基于检测到的图像确定检测图像中包含的测量标记的位置误差，c）校正位置误差是通过由放大的成像和检测引起的位置误差分量从确定的测量标记的位置误差中提取导出的，d）基于校正位置导出一个部分的相对局部位置误差测量标记的误差。

10. 发明申请

US20060262306A1 Arrangement for inspecting objects, especially masks in microlithography 有权
公开(公告)号：US20060262306A1
公开(公告)日：2006-11-23
申请号：US10554048
申请日：2004-04-20
申请人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
发明人： Hans-Juergen Dobschal , Wolfgang Harnisch , Thomas Scheruebl , Nobert Rosenkranz , Ralph Semmler
IPC分类号： G01N21/00
CPC分类号： B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84
摘要： Apparatus for inspecting objects especially masks in microlithography that are disposed in a vacuum chamber. The apparatus includes a converter for converting illuminating radiation emitted from the object into a radiation of a higher wavelength. A sensor for recording images is disposed outside the vacuum chamber and arranged as an optical interface from the vacuum chamber to the sensor of the converter or at least one part of an image lens is arranged as a window in the vacuum chamber.

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