专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 再颁专利

USRE44216E1 Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
标题翻译：用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查
公开(公告)号：USRE44216E1
公开(公告)日：2013-05-14
申请号：US12604821
申请日：2009-10-23
申请人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
发明人： Michael Totzeck , Heiko Feldmann , Toralf Gruner , Karl-Heinz Schuster , Joern Greif-Wuestenbecker , Thomas Scheruebl , Wolfgang Harnisch , Norbert Rosenkranz , Ulrich Matejka
IPC分类号： G02B23/00
CPC分类号： G03F7/70566 , G02B5/3025 , G02B21/0016 , G03F7/70666 , Y10S359/90
摘要： An optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing.
摘要翻译：用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量，被传送到评估单元进行进一步处理。

2. 发明授权

US08970951B2 Mask inspection microscope with variable illumination setting 有权
标题翻译：具有可变照明设置的面膜检查显微镜
公开(公告)号：US08970951B2
公开(公告)日：2015-03-03
申请号：US13391996
申请日：2010-08-28
申请人： Ulrich Matejka , Holger Seitz , Norbert Rosenkranz , Mario Laengle
发明人： Ulrich Matejka , Holger Seitz , Norbert Rosenkranz , Mario Laengle
IPC分类号： G02B21/06 , G02B21/08 , G02B5/00 , G03F1/84
CPC分类号： G02B21/086 , G02B5/005 , G03F1/84
摘要： During mask inspection it is necessary to identify defects which also occur during wafer exposure. Therefore, the aerial images generated in the resist and on the detector have to be as far as possible identical. In order to achieve an equivalent image generation, during mask inspection the illumination and, on the object side, the numerical aperture are adapted to the scanner used. The invention relates to a mask inspection microscope for variably setting the illumination. It serves for generating an image of the structure (150) of a reticle (145) arranged in an object plane in a field plane of the mask inspection microscope. It comprises a light source (5) that emits projection light, at least one illumination beam path (3, 87, 88), and a diaphragm for generating a resultant intensity distribution of the projection light in a pupil plane (135) of the illumination beam path (3, 87, 88) that is optically conjugate with respect to the object plane. According to the invention, the diaphragm is embodied in such a way that the resultant intensity distribution of the projection light has at least one further intensity value between a minimum and a maximum intensity value.
摘要翻译：在面罩检查期间，有必要识别在晶片曝光期间也会发生的缺陷。因此，在抗蚀剂和检测器上产生的空中图像必须尽可能相同。为了实现等效图像生成，在掩模检查期间，照明和物体侧的数值孔径适用于所使用的扫描仪。本发明涉及一种用于可变地设定照明的掩模检查显微镜。其用于生成布置在掩模检查显微镜的场平面中的物平面中的掩模版（145）的结构（150）的图像。它包括发射投影光的光源（5），至少一个照明光束路径（3,87,88）和用于产生投影光在照明光瞳面（135）中的合成强度分布的光阑光束路径（3,87,88），其相对于物平面光学共轭。根据本发明，隔膜的实施方式是使投影光的合成强度分布在最小和最大强度值之间具有至少一个另外的强度值。

3. 发明授权

US08730474B2 Method and apparatus for measuring of masks for the photo-lithography 有权
标题翻译：用于光刻的掩模的测量方法和装置
公开(公告)号：US08730474B2
公开(公告)日：2014-05-20
申请号：US12933226
申请日：2009-03-19
申请人： Thomas Scheruebl , Holger Seitz , Ulrich Matejka , Axel Zibold , Rigo Richter
发明人： Thomas Scheruebl , Holger Seitz , Ulrich Matejka , Axel Zibold , Rigo Richter
IPC分类号： G01B11/00 , G01B11/14 , G01N21/00 , G01B11/04 , G01B11/08 , G06K9/00
CPC分类号： G03F1/84 , G03F7/70625 , G03F7/70666 , G03F7/70775
摘要： The invention relates to a method and an apparatus for measuring masks for photolithography. In this case, structures to be measured on the mask on a movable mask carrier are illuminated and imaged as an aerial image onto a detector, the illumination being set in a manner corresponding to the illumination in a photolithography scanner during a wafer exposure. A selection of positions at which the structures to be measured are situated on the mask is predetermined, and the positions on the mask in the selection are successively brought to the focus of an imaging optical system, where they are illuminated and in each case imaged as a magnified aerial image onto a detector, and the aerial images are subsequently stored. The structure properties of the structures are then analyzed by means of predetermined evaluation algorithms. The accuracy of the setting of the positions and of the determination of structure properties is increased in this case.
摘要翻译：本发明涉及一种用于测量光刻掩模的方法和装置。在这种情况下，在可移动掩模载体上的掩模上测量的结构被照射并作为空间图像成像到检测器上，在晶片曝光期间以与光刻扫描器中的照明相对应的方式设置照明。要测量的结构位于掩模上的位置的选择是预定的，并且选择中的掩模上的位置被连续地带到成像光学系统的焦点，在那里它们被照亮，并且在每种情况下被成像为将放大的航空图像放置在检测器上，随后存储航空图像。然后通过预定的评估算法分析结构的结构特性。在这种情况下，位置的设定和结构特性的确定的准确性增加。

4. 发明授权

US09207544B2 Method for simulating an aerial image 有权
标题翻译：模拟航空图像的方法
公开(公告)号：US09207544B2
公开(公告)日：2015-12-08
申请号：US13495490
申请日：2012-06-13
申请人： Ulrich Matejka
发明人： Ulrich Matejka
IPC分类号： G03F1/36 , G03B27/54 , G03F7/20
CPC分类号： G03F7/705
摘要： An aerial image is generated by imaging an object with the use of an imaging optic, the object being illuminated by an illuminating optic by using a light source emitting illuminating radiation, the illuminating optic having a pupil plane. A first data set is defined to represent the object, a second data set is defined to represent the intensity distribution of the illuminating radiation in the pupil plane of the light source, and the aerial image is calculated from the first and the second data set, in which the resolution of the second data set varies according to the intensity or according to the location of the pupil plane. A microscope includes an imaging optic for imaging an object, a detector for capturing an aerial image of the object, and a processing unit for simulating aerial images generated by the microscope.
摘要翻译：通过使用成像光学元件对物体进行成像来生成空间图像，该物体通过使用发射照明辐射的光源由照明光学器件照亮，所述照明光学器件具有瞳孔平面。第一数据组被定义为表示对象，第二数据集被定义为表示光源的光瞳平面中的照明辐射的强度分布，并且从第一和第二数据集计算空中图像，其中第二数据集的分辨率根据强度或根据瞳孔平面的位置而变化。显微镜包括用于成像对象的成像光学元件，用于捕获物体的空间图像的检测器，以及用于模拟由显微镜产生的航空图像的处理单元。

5. 发明申请

US20120320183A1 Method For Simulating An Aerial Image 有权
标题翻译：空中图像模拟方法
公开(公告)号：US20120320183A1
公开(公告)日：2012-12-20
申请号：US13495490
申请日：2012-06-13
申请人： Ulrich Matejka
发明人： Ulrich Matejka
IPC分类号： H04N7/18
CPC分类号： G03F7/705
摘要： An aerial image is generated by imaging an object with the use of an imaging optic, the object being illuminated by an illuminating optic by using a light source emitting illuminating radiation, the illuminating optic having a pupil plane. A first data set is defined to represent the object, a second data set is defined to represent the intensity distribution of the illuminating radiation in the pupil plane of the light source, and the aerial image is calculated from the first and the second data set, in which the resolution of the second data set varies according to the intensity or according to the location of the pupil plane. A microscope includes an imaging optic for imaging an object, a detector for capturing an aerial image of the object, and a processing unit for simulating aerial images generated by the microscope.
摘要翻译：通过使用成像光学元件对物体进行成像来生成空间图像，该物体通过使用发射照明辐射的光源由照明光学器件照亮，所述照明光学器件具有瞳孔平面。第一数据组被定义为表示对象，第二数据集被定义为表示光源的光瞳平面中的照明辐射的强度分布，并且从第一和第二数据集计算空中图像，其中第二数据集的分辨率根据强度或根据瞳孔平面的位置而变化。显微镜包括用于成像对象的成像光学元件，用于捕获物体的空间图像的检测器，以及用于模拟由显微镜产生的航空图像的处理单元。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式