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    • 5. 发明授权
    • Method for treating substrates
    • 处理底物的方法
    • US5427627A
    • 1995-06-27
    • US179653
    • 1994-01-05
    • Michael J. CanestaroDonald G. McBrideLouis J. Konrad, IIIRonald J. Moore
    • Michael J. CanestaroDonald G. McBrideLouis J. Konrad, IIIRonald J. Moore
    • C23F1/08B05C3/12B05C3/18B05C5/02C23G3/00H05K3/00H05K3/06H05K3/18H05K3/26H05K3/42B08B3/02
    • B05C3/18B05C3/125H05K3/0085
    • A device for applying fluid to a substrate which includes a head member having first and second opposed portions adapted for being fixedly positioned relative to each other. The device is particularly suited for treating a substrate as the substrate moves between the first and second portions. Each portion may in turn include a first channel located at a predetermined distance from the substrate for having a first fluid impinge on the substrate at a first velocity. Additionally, each portion may include a weir adjacent the first channel for having fluid pass thereover at an accelerated rate and thus at a greater velocity than the first fluid, this weir being located at a lesser distance than the first channel. Fluid inlet means is coupled to the respective portions to provide the fluid thereto at desired velocities. Significantly, a fluid blocking means (e.g., an elongated bar) is also included as part of the structure for maintaining the fluids at pre-established levels.
    • 一种用于向衬底施加流体的装置,其包括具有适于相对于彼此固定定位的第一和第二相对部分的头部构件。 当衬底在第一和第二部分之间移动时,该器件特别适用于处理衬底。 每个部分还可以包括位于距衬底预定距离的第一通道,以使第一流体以第一速度冲击在衬底上。 另外,每个部分可以包括邻近第一通道的堰,用于使流体以加速的速度传递到其上,因此以比第一流体更大的速度传递,该堰位于比第一通道更小的距离处。 流体入口装置联接到相应的部分,以期望的速度向其提供流体。 重要的是,还包括流体阻塞装置(例如,细长条)作为用于将流体保持在预先确定的水平的结构的一部分。
    • 7. 发明授权
    • Fluid treatment device
    • 流体处理装置
    • US5294259A
    • 1994-03-15
    • US884818
    • 1992-05-18
    • Michael J. CanestaroDonald G. McBrideLouis J. Konrad, IIIRonald J. Moore
    • Michael J. CanestaroDonald G. McBrideLouis J. Konrad, IIIRonald J. Moore
    • C23F1/08B05C3/12B05C3/18B05C5/02C23G3/00H05K3/00H05K3/06H05K3/18H05K3/26H05K3/42B05C3/02
    • B05C3/18B05C3/125H05K3/0085
    • A device for applying fluid to a substrate which includes a head member having first and second opposed portions adapted for being fixedly positioned relative to each other. The device is particularly suited for treating a substrate as the substrate moves between the first and second portions. Each portion may in turn include a first channel located at a predetermined distance from the substrate for having a first fluid impinge on the substrate at a first velocity. Additionally, each portion may include a weir adjacent the first channel for having fluid pass thereover at an accelerated rate and thus at a greater velocity than the first fluid, this weir being located at a lesser distance than the first channel. Fluid inlet means is coupled to the respective portions to provide the fluid thereto at desired velocities. Significantly, a fluid blocking means (e.g., an elongated bar) is also included as part of the structure for maintaining the fluids at pre-established levels.
    • 一种用于向衬底施加流体的装置,其包括具有适于相对于彼此固定定位的第一和第二相对部分的头部构件。 当衬底在第一和第二部分之间移动时,该器件特别适用于处理衬底。 每个部分还可以包括位于距衬底预定距离的第一通道,以使第一流体以第一速度冲击在衬底上。 另外,每个部分可以包括与第一通道相邻的堰,用于使流体以加速的速度通过,因此以比第一流体更大的速度传递,该堰位于比第一通道更小的距离处。 流体入口装置联接到相应的部分,以期望的速度向其提供流体。 重要的是,还包括流体阻塞装置(例如,细长条)作为用于将流体保持在预先确定的水平的结构的一部分。