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    • 1. 发明申请
    • Magnetic write head having a shield that extends below the leading edge of the write pole
    • 磁写头具有在写柱的前缘下方延伸的屏蔽
    • US20080100959A1
    • 2008-05-01
    • US11588961
    • 2006-10-27
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • G11B5/127
    • G11B5/11G11B5/315
    • A magnetic write head for perpendicular magnetic recording that has a write pole and a trailing or side shield that has a leading edge that extends to or beyond the leading edge of write pole, thereby ensuring complete side magnetic shielding. The write head can be formed by forming the write pole on a non-magnetic substrate that is constructed of a material that can be readily removed by reactive ion etching (RIE). The write pole can be formed by depositing a layer of magnetic write pole material over the substrate and then forming a mask over the magnetic write pole material. An ion mill can be performed to define the write pole, and then a reactive ion etch can be performed to notch the substrate, so that when a non-magnetic shield gap material is deposited it will be below or at the bottom of the write pole. Then a magnetic shield material can be deposited to form a shield having a leading edge that extends beyond the leading edge of the write pole.
    • 一种用于垂直磁记录的磁写头,具有写磁极和后屏蔽或侧屏蔽,其具有延伸到或超过写极的前沿的前沿,从而确保完全的侧磁屏蔽。 写头可以通过在由可以通过反应离子蚀刻(RIE)容易地去除的材料构成的非磁性衬底上形成写极来形成。 可以通过在衬底上沉积一层磁性写入磁极材料,然后在磁性写入磁极材料上形成掩模来形成写入极。 可以执行离子磨以限定写入极,然后可以执行反应离子蚀刻以蚀刻衬底,使得当非磁性屏蔽间隙材料沉积时,它将在写入极的下方或底部 。 然后,可以沉积磁屏蔽材料以形成具有延伸超过写柱的前缘的前缘的屏蔽。
    • 2. 发明授权
    • Magnetic write head having a shield that extends below the leading edge of the write pole
    • 磁写头具有在写柱的前缘下方延伸的屏蔽
    • US07715147B2
    • 2010-05-11
    • US11588961
    • 2006-10-27
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • Michael FeldbaumQuang LeAron PentekSue Siyang Zhang
    • G11B5/187G11B5/11
    • G11B5/11G11B5/315
    • A magnetic write head for perpendicular magnetic recording that has a write pole and a trailing or side shield that has a leading edge that extends to or beyond the leading edge of write pole, thereby ensuring complete side magnetic shielding. The write head can be formed by forming the write pole on a non-magnetic substrate that is constructed of a material that can be readily removed by reactive ion etching (RIE). The write pole can be formed by depositing a layer of magnetic write pole material over the substrate and then forming a mask over the magnetic write pole material. An ion mill can be performed to define the write pole, and then a reactive ion etch can be performed to notch the substrate, so that when a non-magnetic shield gap material is deposited it will be below or at the bottom of the write pole. Then a magnetic shield material can be deposited to form a shield having a leading edge that extends beyond the leading edge of the write pole.
    • 一种用于垂直磁记录的磁写头,具有写磁极和后屏蔽或侧屏蔽,其具有延伸到或超过写极的前沿的前沿,从而确保完全的侧磁屏蔽。 写头可以通过在由可以通过反应离子蚀刻(RIE)容易地去除的材料构成的非磁性衬底上形成写极来形成。 可以通过在衬底上沉积一层磁性写入磁极材料,然后在磁性写入磁极材料上形成掩模来形成写入极。 可以执行离子磨以限定写入极,然后可以执行反应离子蚀刻以蚀刻衬底,使得当非磁性屏蔽间隙材料沉积时,它将在写入极的下方或底部 。 然后,可以沉积磁屏蔽材料以形成具有延伸超过写柱的前缘的前缘的屏蔽。
    • 3. 发明授权
    • Methods for fabricating read sensor for magnetic heads with reduced read track width
    • 用于制造磁头读取传感器的方法,读取磁道宽度减小
    • US07037847B2
    • 2006-05-02
    • US10856679
    • 2004-05-28
    • Quang LeSue Siyang Zhang
    • Quang LeSue Siyang Zhang
    • H01L21/302H01L21/461
    • C23C16/44G11B5/3163G11B5/3169H01L21/3146
    • The fabrication of the read head sensor components where chemical mechanical polishing (CMP) stop layer is deposited above the sensor layers, a first reactive ion etch (RIE) layer and a second RIE layer are deposited, where the second RIE layer is etchable with a different ion species than the first RIE layer. A stencil layer is then deposited and patterned to create an etching stencil having the desired magnetic read track width of the sensor. An RIE step is then conducted in which the second RIE layer is etched. An RIE step for the first RIE layer is then conducted with a different ion species. Thereafter, the sensor layers are milled where the remaining portions of the first and second RIE layers act as a milling mask. A CMP assisted liftoff step is then conducted in which the remaining portions of the ion milling mask are removed.
    • 沉积化学机械抛光(CMP)停止层沉积在传感器层上方,第一反应离子蚀刻(RIE)层和第二RIE层的读取头传感器部件的制造,其中第二RIE层可以用 不同的离子种类比第一个RIE层。 然后沉积和图案化模板层以产生具有传感器的期望磁读取磁道宽度的蚀刻模版。 然后进行RIE步骤,其中蚀刻第二RIE层。 然后用不同的离子种类进行第一RIE层的RIE步骤。 此后,将第一和第二RIE层的剩余部分用作铣削掩模的传感器层进行研磨。 然后进行CMP辅助剥离步骤,其中除去离子铣削掩模的剩余部分。