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    • 7. 发明授权
    • Method for creating inductive write head with steep shoulder at notch
    • 在凹口处创建具有陡肩的感应写头的方法
    • US07083738B2
    • 2006-08-01
    • US10632631
    • 2003-07-31
    • Edward Hin Pong LeeAron PentekWen-Chien David Hsiao
    • Edward Hin Pong LeeAron PentekWen-Chien David Hsiao
    • B29D11/00H01L21/00
    • G11B5/1877G11B5/3163
    • A method for fabricating a magnetic head using a modified P1 cap process. A first pole is formed. A cap is formed above the first pole. A gap layer is formed above the cap. A second pole is formed above the gap layer. Exposed portions of the gap layer are removed. The cap and first pole are milled for creating a shoulder of the first pole tapered upwardly towards the cap. Another method for fabricating a magnetic head includes forming a first pole, forming a gap layer above the first pole, forming a second pole above the gap layer, forming a layer of photoresist above the second pole, patterning the photoresist such that the photoresist covers areas of the gap layer positioned towards the second pole, removing exposed portions of the gap layer, removing part of exposed portions of the first pole for forming steps in the first pole on opposite sides of the photoresist, removing the photoresist, and milling for creating a shoulder of the first pole tapering upwardly towards the cap.
    • 一种使用改进的P 1帽工艺制造磁头的方法。 形成第一极。 在第一极上方形成帽。 在盖上形成间隙层。 在间隙层上方形成第二极。 去除间隙层的露出部分。 铣头和第一杆被铣削以产生第一杆的肩部向上朝向帽部锥形。 制造磁头的另一方法包括形成第一极,在第一极上方形成间隙层,在间隙层上方形成第二极,在第二极上形成光致抗蚀剂层,使光致抗蚀剂覆盖区域 间隔层定位成朝向第二极,去除间隙层的暴露部分,去除第一极的暴露部分的一部分,以在光致抗蚀剂的相对侧上的第一极中形成台阶,去除光致抗蚀剂,并研磨以产生 第一杆的肩部朝向帽部向上逐渐变细。
    • 9. 发明授权
    • Methods for creating a magnetic main pole with side shield and systems thereof
    • 用于制造具有侧面屏蔽的磁性主极和其系统的方法
    • US08059367B2
    • 2011-11-15
    • US12341925
    • 2008-12-22
    • Edward Hin Pong LeeAron Pentek
    • Edward Hin Pong LeeAron Pentek
    • G11B5/127
    • G11B5/3116G11B5/3163Y10T428/1186
    • A method according to another embodiment includes forming a side shield layer of ferromagnetic material above a substrate; masking the side shield layer; milling an unmasked region of the side shield layer for forming a pole trench therein; and forming a pole layer in the pole trench. A structure according to one embodiment includes a substrate; a side shield layer of ferromagnetic material on the substrate, wherein the substrate has a region covered by the side shield layer and a region not covered by the side shield layer; a pole trench in the side shield layer and the region of the substrate not covered by the side shield layer; a layer of nonmagnetic material in the pole trench; and a pole layer in the pole trench, wherein the pole layer has a greater thickness above the region of the substrate not covered by the side shield layer than above the region of the substrate covered by the side shield layer.
    • 根据另一实施例的方法包括在基板上形成铁磁材料的侧屏蔽层; 遮蔽侧面屏蔽层; 研磨用于在其中形成极沟槽的侧屏蔽层的未掩模区域; 以及在所述极沟槽中形成极层。 根据一个实施例的结构包括基底; 在所述基板上的铁磁材料的侧屏蔽层,其中所述基板具有被所述侧屏蔽层覆盖的区域和未被所述侧屏蔽层覆盖的区域; 侧屏蔽层中的极沟槽和未被侧屏蔽层覆盖的衬底的区域; 在磁极沟中的一层非磁性材料; 以及在所述极沟槽中的极层,其中所述极层在不被所述侧屏蔽层覆盖的所述衬底的区域之上具有比在所述侧屏蔽层覆盖的衬底的区域之上更大的厚度。