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    • 10. 发明授权
    • Nitride-based laser diode with GaN waveguide/cladding layer
    • 氮化镓基激光二极管与GaN波导/包层
    • US07123637B2
    • 2006-10-17
    • US10394559
    • 2003-03-20
    • Michael A. KneisslDavid P. BourLinda T. RomanoChristian G. Van de Walle
    • Michael A. KneisslDavid P. BourLinda T. RomanoChristian G. Van de Walle
    • H01S5/00
    • B82Y20/00H01S5/0213H01S5/2009H01S5/2205H01S5/2231H01S5/3213H01S5/34333
    • A nitride-based laser diode structure utilizing a single GaN:Mg waveguide/cladding layer, in place of separate GaN:Mg waveguide and AlGaN:Mg cladding layers used in conventional nitride-based laser diode structures. When formed using an optimal thickness, the GaN:Mg layer produces an optical confinement that is comparable to or better than conventional structures. A thin AlGaN tunnel barrier layer is provided between the multiple quantum well and a lower portion of the GaN:Mg waveguide layer, which suppresses electron leakage without any significant decrease in optical confinement. A split-metal electrode is formed on the GaN:Mg upper waveguide structure to avoid absorption losses in the upper electrode metal. A pair of AlGaN:Si current blocking layer sections are located below the split-metal electrode sections, and separated by a gap located over the active region of the multiple quantum well.
    • 使用单个GaN:Mg波导/包覆层的氮化物基激光二极管结构代替用于常规氮化物基激光二极管结构中的单独的GaN:Mg波导和AlGaN:Mg包覆层。 当使用最佳厚度形成时,GaN:Mg层产生与传统结构相当或更好的光学约束。 在多量子阱和GaN:Mg波导层的下部之间提供薄的AlGaN隧道势垒层,其抑制电子泄漏,而不会明显减少光学限制。 在GaN:Mg上部波导结构上形成裂缝金属电极,以避免上部电极金属中的吸收损失。 一对AlGaN:Si电流阻挡层部分位于裂缝金属电极部分下方,并被位于多量子阱的有源区上方的间隙分开。