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    • 10. 发明授权
    • Gallium nitride-based compound semiconductor device
    • 氮化镓系化合物半导体器件
    • US07700940B2
    • 2010-04-20
    • US10521544
    • 2003-07-01
    • Shiro SakaiTomoya Sugahara
    • Shiro SakaiTomoya Sugahara
    • H01L33/00
    • H01L33/32B82Y20/00H01L33/06
    • An LED emitting light of wavelength mainly 375 nm or below. The LED includes a GaN layer (16), an n-clad layer (20), an AlInGaN buffer layer (22), a light emitting layer (24), a p-clad layer (26), a p-electrode (30), and an n-electrode (32) arranged on a substrate (10). The light emitting layer (24) has a multi-layer quantum well structure (MQW) in which an InGaN well layer and an AlInGaN barrier layer are superimposed. The quantum well structure increases the effective band gap of the InGaN well layer and reduces the light emitting wavelength. Moreover, by using the AlInGaN buffer layer (22) as the underlying layer of the light emitting layer (24), it is possible to effectively inject electrons into the light emitting layer (24), thereby increasing the light emitting efficiency.
    • 发射波长主要为375nm或以下的LED的LED。 LED包括GaN层(16),n覆盖层(20),AlInGaN缓冲层(22),发光层(24),p覆盖层(26),p电极(30) )和布置在基板(10)上的n电极(32)。 发光层(24)具有叠层InGaN阱层和AlInGaN阻挡层的多层量子阱结构(MQW)。 量子阱结构增加了InGaN阱层的有效带隙并降低了发光波长。 此外,通过使用AlInGaN缓冲层(22)作为发光层(24)的下层,可以有效地将电子注入到发光层(24)中,从而提高发光效率。