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1. 发明申请

US20090039672A1 Glass run and manufacturing method thereof 审中-公开
标题翻译：玻璃的制造方法及其制造方法
公开(公告)号：US20090039672A1
公开(公告)日：2009-02-12
申请号：US12219850
申请日：2008-07-29
申请人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
发明人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
IPC分类号： B60J10/04 , B29C45/14
CPC分类号： E06B7/2312 , B29C45/14 , B29L2031/26 , B60J10/20 , B60J10/23 , B60J10/235 , B60J10/32 , B60J10/76
摘要： A glass run includes a main body portion attached to a channel portion DC provided along an inner periphery of a door frame and having an approximately U-shape in section, formed of a base bottom portion and an exterior sidewall portion and an interior sidewall portion extending from the base bottom portion and an exterior seal lip and an interior seal lip extending from almost front ends of the exterior sidewall portion and the interior sidewall portion to an inside of the main body portion. Moreover, for the glass run, by molding, integrally formed is an entire longitudinal area having a sectional shape having the main body portion and the interior and exterior seal lips and provided with an upper side portion corresponding to an upper edge portion of a door glass and a front vertical side portion and a rear vertical side portion corresponding to a front edge portion and a rear edge portion of the door glass.
摘要翻译：玻璃行程包括主体部分，其附接到沿着门框的内周设置并且具有大致U形截面的通道部分DC，所述主体部分由基底部分和外侧壁部分形成，并且内侧壁部分延伸从底部底部和外部密封唇缘以及从外部侧壁部分和内部侧壁部分的大致前端延伸到主体部分的内部的内部密封唇缘。此外，对于玻璃行程，通过成型，整体形成为具有截面形状的整个纵向区域，该纵向区域具有主体部分和内部和外部密封唇缘，并且设置有对应于门玻璃的上边缘部分的上侧部分以及对应于门玻璃的前边缘部分和后边缘部分的前垂直侧部分和后垂直侧部分。

2. 发明申请

US20080084088A1 Glass run 失效
标题翻译：玻璃跑
公开(公告)号：US20080084088A1
公开(公告)日：2008-04-10
申请号：US11905075
申请日：2007-09-27
申请人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
发明人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
IPC分类号： B60J10/00 , B60J10/08 , E05F11/54
CPC分类号： B29C66/543 , B29C37/0082 , B29C45/006 , B29C45/0081 , B29C65/58 , B29C65/606 , B29C65/7814 , B29C66/12421 , B29C66/12425 , B29C66/12443 , B29C66/1282 , B29C66/12841 , B29C66/1286 , B29C66/14 , B29C66/21 , B29C66/225 , B29C66/2274 , B29C66/2276 , B29C66/30321 , B29C66/524 , B29C66/54 , B29C66/71 , B29C66/8322 , B29K2021/003 , B29K2023/00 , B29K2023/16 , B29L2031/006 , B29L2031/26 , B60J10/235 , B60J10/35 , B60J10/76 , B29K2023/12 , B29K2023/06
摘要： A glass run includes a main body portion and a pair of seal lips. Further, the glass run is constituted by a vehicle exterior side molded member and a vehicle interior side molded member divided at a bottom portion of the main body portion. Further, the vehicle exterior side molded member and the vehicle interior side molded member include engaging portions for engaging to be integrated with each other. By integrating the vehicle exterior side molded member and the vehicle interior side molded member by the engaging portions, the vehicle exterior side molded member is restricted from being shifted to move relative to the vehicle interior side molded member in a vehicle width direction and in a longitudinal direction of the vehicle interior side molded member.
摘要翻译：玻璃行程包括主体部分和一对密封唇部。此外，玻璃行程由分隔在主体部分的底部的车辆外侧模制件和车辆内侧模制件构成。此外，车辆外侧模制构件和车辆内侧模制构件包括用于接合以彼此一体化的接合部。通过将车辆外侧模制件和车辆内侧模制件通过接合部分整合，车辆外侧模制件被限制在相对于车辆内侧模制件在车辆宽度方向和纵向方向上移动车辆内侧模压件的方向。

3. 发明授权

US07762614B2 Glass run 失效
标题翻译：玻璃跑
公开(公告)号：US07762614B2
公开(公告)日：2010-07-27
申请号：US11905075
申请日：2007-09-27
申请人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
发明人： Yoshihisa Kubo , Atsushi Sumida , Tatsuhiko Nagata , Soichiro Yamamoto , Tamotsu Watanabe , Masatoshi Hotta
IPC分类号： B60J10/02
CPC分类号： B29C66/543 , B29C37/0082 , B29C45/006 , B29C45/0081 , B29C65/58 , B29C65/606 , B29C65/7814 , B29C66/12421 , B29C66/12425 , B29C66/12443 , B29C66/1282 , B29C66/12841 , B29C66/1286 , B29C66/14 , B29C66/21 , B29C66/225 , B29C66/2274 , B29C66/2276 , B29C66/30321 , B29C66/524 , B29C66/54 , B29C66/71 , B29C66/8322 , B29K2021/003 , B29K2023/00 , B29K2023/16 , B29L2031/006 , B29L2031/26 , B60J10/235 , B60J10/35 , B60J10/76 , B29K2023/12 , B29K2023/06
摘要： A glass run includes a main body portion and a pair of seal lips. Further, the glass run is constituted by a vehicle exterior side molded member and a vehicle interior side molded member divided at a bottom portion of the main body portion. Further, the vehicle exterior side molded member and the vehicle interior side molded member include engaging portions for engaging to be integrated with each other. By integrating the vehicle exterior side molded member and the vehicle interior side molded member by the engaging portions, the vehicle exterior side molded member is restricted from being shifted to move relative to the vehicle interior side molded member in a vehicle width direction and in a longitudinal direction of the vehicle interior side molded member.
摘要翻译：玻璃行程包括主体部分和一对密封唇部。此外，玻璃行程由分隔在主体部分的底部的车辆外侧模制件和车辆内侧模制件构成。此外，车辆外侧模制构件和车辆内侧模制构件包括用于接合以彼此一体化的接合部。通过将车辆外侧模制件和车辆内侧模制件通过接合部分整合，车辆外侧模制件被限制在相对于车辆内侧模制件在车辆宽度方向和纵向方向上移动车辆内侧模压件的方向。

4. 发明授权

US08578587B2 Method of producing a weather strip 有权
标题翻译：生产天气条的方法
公开(公告)号：US08578587B2
公开(公告)日：2013-11-12
申请号：US13137078
申请日：2011-07-19
申请人： Masatoshi Hotta , Tamotsu Watanabe
发明人： Masatoshi Hotta , Tamotsu Watanabe
IPC分类号： B21B1/46
CPC分类号： B29C47/065 , B29C47/0023 , B29C47/0052 , B29C47/026 , B29L2031/26 , B60J10/16 , B60J10/17 , B60J10/33 , B60J10/80 , Y10T29/49982
摘要： A method for producing a weather strip, includes an extrusion step for extruding a non-vulcanized and non-foamed rubber into a predetermined shape, a coating step for coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of a sealing part of a non-vulcanized and non-foamed intermediate molded body that is molded by the extrusion step, and a vulcanizing and foaming step for forming a skin layer in a non-foamed state by heating and vulcanizing a surface of the treatment liquid, and forming a sponge layer by vulcanizing and foaming the non-vulcanized and non-foamed rubber that is internal from the skin layer by passing the intermediate molded body on which the treatment liquid has been coated during the coating step through a heating zone, the steps being performed when molding the extruded part.
摘要翻译：一种防风条的制造方法，其特征在于，包括将未硫化，非发泡橡胶挤压成规定形状的挤压工序，将含有简单的硫，硫化合物的处理液或者简单的硫化合物硫和硫化合物在通过挤出步骤成型的非硫化和非发泡中间体成型体的密封部分的外表面上，以及硫化和发泡步骤，用于形成非发泡状态的表皮层通过对处理液的表面进行加热和硫化，并且通过使已经涂覆有处理液的中间成型体通过使表皮层内部的未硫化和非发泡橡胶硫化和发泡而形成海绵层在通过加热区域的涂覆步骤期间，在模制挤压部件时进行这些步骤。

5. 发明申请

US20110277388A1 Weather strip and production method for the same 有权
标题翻译：天气条和生产方法相同
公开(公告)号：US20110277388A1
公开(公告)日：2011-11-17
申请号：US13137078
申请日：2011-07-19
申请人： Masatoshi Hotta , Tamotsu Watanabe
发明人： Masatoshi Hotta , Tamotsu Watanabe
IPC分类号： B60J10/08 , B29C53/00
CPC分类号： B29C47/065 , B29C47/0023 , B29C47/0052 , B29C47/026 , B29L2031/26 , B60J10/16 , B60J10/17 , B60J10/33 , B60J10/80 , Y10T29/49982
摘要： A method for producing a weather strip, includes an extrusion step for extruding a non-vulcanized and non-foamed rubber into a predetermined shape, a coating step for coating a treatment liquid containing a simple sulfur, a sulfur compound, or both of the simple sulfur and the sulfur compound on an outer surface of a sealing part of a non-vulcanized and non-foamed intermediate molded body that is molded by the extrusion step, and a vulcanizing and foaming step for forming a skin layer in a non-foamed state by heating and vulcanizing a surface of the treatment liquid, and forming a sponge layer by vulcanizing and foaming the non-vulcanized and non-foamed rubber that is internal from the skin layer by passing the intermediate molded body on which the treatment liquid has been coated during the coating step through a heating zone, the steps being performed when molding the extruded part.
摘要翻译：一种防风条的制造方法，其特征在于，包括将未硫化，非发泡橡胶挤压成规定形状的挤压工序，将含有简单的硫，硫化合物的处理液或者简单的硫化合物硫和硫化合物在通过挤出步骤成型的非硫化和非发泡中间体成型体的密封部分的外表面上，以及硫化和发泡步骤，用于形成非发泡状态的表皮层通过对处理液的表面进行加热和硫化，并且通过使已经涂覆有处理液的中间成型体通过使表皮层内部的未硫化和非发泡橡胶硫化和发泡而形成海绵层在通过加热区域的涂覆步骤期间，在模制挤压部件时进行这些步骤。

6. 发明申请

US20100009271A1 Resist patterning process and manufacturing photo mask 有权
标题翻译：抗蚀剂图案化工艺和制造光罩
公开(公告)号：US20100009271A1
公开(公告)日：2010-01-14
申请号：US12457544
申请日：2009-06-15
申请人： Takanobu Takeda , Satoshi Watanabe , Tamotsu Watanabe , Akinobu Tanaka , Keiichi Masunaga , Ryuji Koitabashi
发明人： Takanobu Takeda , Satoshi Watanabe , Tamotsu Watanabe , Akinobu Tanaka , Keiichi Masunaga , Ryuji Koitabashi
IPC分类号： G03F1/00 , G03F7/20
CPC分类号： G03F7/0392
摘要： There is disclosed a resist patterning process with a minimum line width of 65 nanometers or less may be formed by using a resist composition containing a polymer, as a base polymer of a chemically-amplified resist composition, composed of a styrene unit whose hydroxyl group is protected by an acid labile group, and an indene unit, and/or an acenaphthalene unit, wherein the polymer has the weight-average molecular weight of 4,000 to 7,000, and in particular, 4,500 to 5,500. One of the currently existing problems to be solved is the line edge roughness. To solve this problem by an acid-generator and a basic compound, there is a problem of the trade-off relationship with a resolution power. There can be provided a resist composition having a high resolution containing a base polymer such as hydroxystyrene that is protected by an acid labile group, a resist patterning process with a pattern rule of 65 nanometers or less having a reduced line edge roughness.
摘要翻译：公开了通过使用包含聚合物的抗蚀剂组合物形成最小线宽度为65纳米或更小的抗蚀剂图案化工艺，所述抗蚀剂组合物作为化学增强抗蚀剂组合物的基础聚合物，其由羟基为由酸不稳定基团和茚单元和/或苊单元保护，其中聚合物的重均分子量为4,000-7,000，特别是4,500-5,500。目前存在的问题之一是线边缘粗糙度。为了通过酸发生剂和碱性化合物来解决这个问题，存在与分辨能力的权衡关系的问题。可以提供具有高分辨率的抗蚀剂组合物，其含有由酸不稳定基团保护的羟基苯乙烯的基础聚合物，具有减少的线边缘粗糙度的图案规则为65纳米或更小的抗蚀剂图案化工艺。

7. 发明授权

US06632918B1 Method of reclaiming crosslinked rubber 有权
标题翻译：回收交联橡胶的方法
公开(公告)号：US06632918B1
公开(公告)日：2003-10-14
申请号：US09926723
申请日：2002-03-22
申请人： Mitsumasa Matsushita , Makoto Mouri , Hirotaka Okamoto , Kenzo Fukumori , Norio Sato , Masahito Fukuta , Hidenobu Honda , Katsumi Nakashima , Tamotsu Watanabe , Shigeki Otsuka , Masao Owaki
发明人： Mitsumasa Matsushita , Makoto Mouri , Hirotaka Okamoto , Kenzo Fukumori , Norio Sato , Masahito Fukuta , Hidenobu Honda , Katsumi Nakashima , Tamotsu Watanabe , Shigeki Otsuka , Masao Owaki
IPC分类号： C08F600
CPC分类号： C08J11/10 , B29B17/00 , B29B2017/0464 , B29C47/0016 , B29C47/60 , B29K2021/00 , B29K2105/04 , B29L2030/00 , C08J2321/00 , Y02W30/62 , Y02W30/625 , Y02W30/702
摘要： The object of the present invention is to provide a method of reclaiming crosslinked rubber, which can reclaim various kinds of crosslinked rubbers whose reclamation is difficult. The method of reclaiming crosslinked rubber 10 of the present invention includes a step of reclaiming crosslinked rubber by applying shear stress to the crosslinked rubber 10, wherein the maximum pressure in the reclaiming step is 1.5 MPa or more.
摘要翻译：本发明的目的是提供一种回收交联橡胶的方法，该方法可回收难以回收的各种交联橡胶。回收交联橡胶的方法 10 本发明的包括通过向交联橡胶 10 将施加剪切应力回收交联橡胶的步骤，其中回收步骤中的最大压力为1.5MPa或更高。

8. 发明授权

US08193307B2 Synthesis of photoresist polymer 有权
标题翻译：光致抗蚀剂聚合物的合成
公开(公告)号：US08193307B2
公开(公告)日：2012-06-05
申请号：US12177403
申请日：2008-07-22
申请人： Takanobu Takeda , Tamotsu Watanabe
发明人： Takanobu Takeda , Tamotsu Watanabe
IPC分类号： C08F6/00
CPC分类号： C08F6/04
摘要： A polymer for use in photoresist compositions is synthesized by effecting polymerization reaction to form a polymerization product mixture and subjecting the mixture to molecular weight fractionation by a liquid phase separation technique using a good solvent and a poor solvent. The fractionation step is iterated at least twice, and one iteration of fractionation includes adding a good solvent which is different from the good solvent added in the other iteration of fractionation.
摘要翻译：通过进行聚合反应以形成聚合产物混合物并通过液相分离技术使用良溶剂和不良溶剂对混合物进行分子量分级，合成用于光致抗蚀剂组合物的聚合物。分馏步骤重复至少两次，一次分馏反应包括加入不同于另一次分馏反应中加入的良溶剂的良溶剂。

9. 发明授权

US07914355B2 Method of manufacturing display apparatus with SAW touch sensor 失效
标题翻译：使用SAW触摸传感器制造显示装置的方法
公开(公告)号：US07914355B2
公开(公告)日：2011-03-29
申请号：US12278697
申请日：2006-02-08
申请人： Fumihiko Nakazawa , Takashi Katsuki , Yuji Takahashi , Satoshi Sato , Satoshi Sasaki , Tamotsu Watanabe , Kunizo Ogoshi , Michiko Endo
发明人： Fumihiko Nakazawa , Takashi Katsuki , Yuji Takahashi , Satoshi Sato , Satoshi Sasaki , Tamotsu Watanabe , Kunizo Ogoshi , Michiko Endo
IPC分类号： H01J9/24
CPC分类号： G06F3/0436 , G06F3/0412
摘要： First electrodes partially configuring light-emitting elements are patterned in the form of stripes on a first major surface of a transparent substrate. Next, piezoelectric elements functioning a SAW touch sensor are formed on a second major surface of the transparent substrate. Next, the light-emitting elements forming step of forming light-emitting elements on the first electrodes which are patterned in advance is sequentially executed. After the formation of the piezoelectric elements, since the step of forming the light-emitting elements is executed, the light-emitting elements can be prevented from being damaged by receiving heat in the formation of the piezoelectric elements.
摘要翻译：部分地配置发光元件的第一电极在透明衬底的第一主表面上以条纹的形式被图案化。接下来，在透明基板的第二主表面上形成起着SAW触摸传感器的压电元件的作用。接下来，依次执行在预先图案化的第一电极上形成发光元件的发光元件的形成步骤。在形成压电元件之后，由于执行形成发光元件的步骤，可以通过在压电元件的形成中受热来防止发光元件的损坏。

10. 发明授权

US07501223B2 Polymer, resist composition and patterning process using the same 有权
标题翻译：聚合物，抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US07501223B2
公开(公告)日：2009-03-10
申请号：US11902760
申请日：2007-09-25
申请人： Takanobu Takeda , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Keiichi Masunaga , Tamotsu Watanabe
发明人： Takanobu Takeda , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Keiichi Masunaga , Tamotsu Watanabe
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106
摘要： There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.
摘要翻译：公开了至少包含由以下通式（1）和（2）表示的重复单元，聚合物的质均分子量为1,000至500,000的聚合物。可以提供聚合物和抗蚀剂组合物，特别是具有比常规正性抗蚀剂组合物更高分辨率的化学放大正性抗蚀剂组合物，在诸如掩模毛坯和高蚀刻的基底上显影的抗蚀剂图案的良好的面内尺寸均匀性抵抗性。

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