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1. 发明授权

US06900564B2 Electric power steering system 有权
标题翻译：电动助力转向系统
公开(公告)号：US06900564B2
公开(公告)日：2005-05-31
申请号：US10172949
申请日：2002-06-18
申请人： Masanori Kobayashi , Takeo Iino , Akihiko Shiina , Katsutoshi Nishimura , Ken-ichiroh Aoto , Yoshio Itou , Masashi Uota , Shoji Shibamura , Tetsuya Murakami , Hiroyuki Shigemura
发明人： Masanori Kobayashi , Takeo Iino , Akihiko Shiina , Katsutoshi Nishimura , Ken-ichiroh Aoto , Yoshio Itou , Masashi Uota , Shoji Shibamura , Tetsuya Murakami , Hiroyuki Shigemura
IPC分类号： B62D5/04 , H02K7/08 , H02K7/116
CPC分类号： F16H57/021 , B62D5/0409 , F16H55/24 , F16H2057/0213 , F16H2057/0221 , H02K7/081
摘要： An electric power steering system is provided, which comprises a steering assist electric motor, and a reduction gear mechanism for reducing a rotation speed of a rotatable shaft of the electric motor. The reduction gear mechanism comprises a worm shaft driven by the rotatable shaft, and a worm wheel driven by the warm shaft. The electric power steering system further comprises a joint for coupling the rotatable shaft to the worm shaft for transmission of a driving force. Longitudinally biasing means is provided in association with the joint for longitudinally biasing the worm shaft.
摘要翻译：提供了一种电动助力转向系统，其包括转向辅助电动机和用于降低电动机的可旋转轴的转速的减速齿轮机构。减速机构包括由可旋转轴驱动的蜗杆轴和由暖轴驱动的蜗轮。电动助力转向系统还包括用于将可旋转轴联接到蜗杆轴以传递驱动力的接头。纵向偏置装置与接头相关联地设置以纵向偏置蜗杆轴。

2. 发明授权

US08074531B2 Electric power steering apparatus 有权
标题翻译：电动助力转向装置
公开(公告)号：US08074531B2
公开(公告)日：2011-12-13
申请号：US11652652
申请日：2007-01-12
申请人： Ryousuke Yamazaki , Hiroyuki Shigemura , Shingo Ougita , Wataru Yamada
发明人： Ryousuke Yamazaki , Hiroyuki Shigemura , Shingo Ougita , Wataru Yamada
IPC分类号： F16H35/00 , F16H55/18
CPC分类号： B62D5/0409 , F16C19/06 , F16C27/04 , F16C2326/24 , F16H55/24 , F16H2057/0213 , F16H2057/0222 , Y10T74/19623 , Y10T74/19828
摘要： An electric power steering apparatus comprises a transmission mechanism having a drive gear and a driven gear. One end of the drive gear is supported by a bearing hole in a housing through a bearing and a curved plate spring. The curved plate spring comprises a main body surrounding the bearing and at least one crank-shaped elastic tongue supported by at least one of ends of the main body. A recess formed on an inner peripheral surface of the bearing hole has a bottom and a pair of inner wall surfaces opposed to each other in the circumferential direction of the bearing hole. A relief portion for avoiding contact with a connection portion of the elastic tongue is formed between at least one of the inner wall surfaces and the inner peripheral surface of the bearing hole. A boundary between the relief portion and the inner peripheral surface of the bearing hole is engaged with the main body of the curved plate spring, to restrict the movement of the main body in the circumferential direction.
摘要翻译：电动助力转向装置包括具有驱动齿轮和从动齿轮的变速机构。驱动齿轮的一端通过轴承和弯曲板簧由壳体中的轴承孔支撑。弯曲板簧包括围绕轴承的主体和由主体的至少一个端部支撑的至少一个曲柄形弹性舌片。在轴承孔的内周面形成的凹部具有在轴承孔的圆周方向上彼此相对的底部和一对内壁面。在所述内壁面和所述轴承孔的内周面的至少一个之间形成有用于避免与所述弹性舌的连接部接触的释放部。浮雕部和轴承孔的内周面之间的边界与弯曲板簧的主体接合，以限制主体在圆周方向上的移动。

3. 发明申请

US20070163374A1 Electric power steering apparatus 有权
标题翻译：电动助力转向装置
公开(公告)号：US20070163374A1
公开(公告)日：2007-07-19
申请号：US11652652
申请日：2007-01-12
申请人： Ryousuke Yamazaki , Hiroyuki Shigemura , Shingo Ougita , Wataru Yamada
发明人： Ryousuke Yamazaki , Hiroyuki Shigemura , Shingo Ougita , Wataru Yamada
IPC分类号： F16H55/18
CPC分类号： B62D5/0409 , F16C19/06 , F16C27/04 , F16C2326/24 , F16H55/24 , F16H2057/0213 , F16H2057/0222 , Y10T74/19623 , Y10T74/19828
摘要： An electric power steering apparatus comprises a transmission mechanism having a drive gear and a driven gear. One end of the drive gear is supported by a bearing hole in a housing through a bearing and a curved plate spring. The curved plate spring comprises a main body surrounding the bearing and at least one crank-shaped elastic tongue supported by at least one of ends of the main body. A recess formed on an inner peripheral surface of the bearing hole has a bottom and a pair of inner wall surfaces opposed to each other in the circumferential direction of the bearing hole. A relief portion for avoiding contact with a connection portion of the elastic tongue is formed between at least one of the inner wall surfaces and the inner peripheral surface of the bearing hole. A boundary between the relief portion and the inner peripheral surface of the bearing hole is engaged with the main body of the curved plate spring, to restrict the movement of the main body in the circumferential direction.
摘要翻译：电动助力转向装置包括具有驱动齿轮和从动齿轮的变速机构。驱动齿轮的一端通过轴承和弯曲板簧由壳体中的轴承孔支撑。弯曲板簧包括围绕轴承的主体和由主体的至少一个端部支撑的至少一个曲柄形弹性舌片。在轴承孔的内周面形成的凹部具有在轴承孔的圆周方向上彼此相对的底部和一对内壁面。在所述内壁面和所述轴承孔的内周面的至少一个之间形成有用于避免与所述弹性舌的连接部接触的释放部。浮雕部和轴承孔的内周面之间的边界与弯曲板簧的主体接合，以限制主体在圆周方向上的移动。

4. 发明授权

US08488866B2 Method of inspecting mask pattern and mask pattern inspection apparatus 有权
标题翻译：检查掩模图案和掩模图案检查装置的方法
公开(公告)号：US08488866B2
公开(公告)日：2013-07-16
申请号：US12708041
申请日：2010-02-18
申请人： Tsuneo Terasawa , Toshihiko Tanaka , Hiroyuki Shigemura , Hajime Aoyama , Osamu Suga
发明人： Tsuneo Terasawa , Toshihiko Tanaka , Hiroyuki Shigemura , Hajime Aoyama , Osamu Suga
IPC分类号： G06K9/00
CPC分类号： G01N21/9501 , B82Y10/00 , B82Y40/00 , G01N21/956 , G03F1/24 , G03F1/84 , G03F7/70941 , G06T7/0006 , G06T2207/30148
摘要： A inspection image data of the chip A is captured and the data representing the amount of correction of flare corresponded to the chip A is appropriately loaded from the map storage block. Next, a inspection image of the chip A′ is captured, and the data representing the amount of correction of flare corresponded to the chip A′ is loaded from the flare map storage block as the amount of shifting of the edge of the contour of the pattern. The amount of correction is converted, by a correction data generation block which is a correction data generator, into the amount of geometrical correction of pattern which provides correction data. In the comparison block, the images of the geometry of two chips are compared and corrected on the amount of correction of flare generated by a correction data generation block, to thereby judge whether defect is found or not.
摘要翻译：捕获芯片A的检查图像数据，并且从地图存储块适当地加载表示对应于芯片A的闪光的校正量的数据。接下来，捕获芯片A'的检查图像，并且表示与芯片A'相对应的闪光量的校正量的数据从闪光图存储块加载为轮廓的边缘的移位量模式。通过作为校正数据生成器的校正数据生成块将修正量转换为提供校正数据的图案的几何校正量。在比较块中，对由校正数据生成块生成的闪光的校正量进行比较和修正两个芯片的几何图像，从而判断是否存在缺陷。

5. 发明申请

US20090233188A1 REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF INSPECTING REFLECTIVE MASK, AND METHOD FOR MANUFACTURING THE SAME 有权
标题翻译：反射掩模层，反射掩模，检测反射掩模的方法及其制造方法
公开(公告)号：US20090233188A1
公开(公告)日：2009-09-17
申请号：US12395800
申请日：2009-03-02
申请人： Tsuyoshi Amano , Hiroyuki Shigemura
发明人： Tsuyoshi Amano , Hiroyuki Shigemura
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： A main object of the invention is to provide a reflective mask for EUV lithography, which may detect an alignment mark by transmission. The invention achieves the object by providing a reflective mask comprising a substrate, a multilayer formed on one side of the substrate, an intermediate layer formed on the multilayer, an absorber formed in pattern on the substrate on which the multilayer and the intermediate layer are formed, and a conductive layer formed on the other side of the substrate, wherein the pattern of the absorber constitutes a circuit pattern and an alignment mark, and in an alignment region where the alignment mark is provided, the other side of the substrate is exposed.
摘要翻译：本发明的主要目的是提供一种用于EUV光刻的反射掩模，其可通过透射来检测对准标记。本发明通过提供一种反射掩模，通过提供一种反射掩模来实现，该反射掩模包括基板，形成在基板的一侧上的多层，形成在多层上的中间层，形成在其上形成有多层和中间层的基板上的图案的吸收体以及形成在所述基板的另一侧的导电层，其中所述吸收体的图案构成电路图案和对准标记，并且在设置有所述对准标记的取向区域中，所述基板的另一侧露出。

6. 发明授权

US07947415B2 Reflective mask blank, reflective mask, method of inspecting reflective mask, and method for manufacturing the same 有权
标题翻译：反光罩，反光罩，反光罩检查方法及其制造方法
公开(公告)号：US07947415B2
公开(公告)日：2011-05-24
申请号：US12395800
申请日：2009-03-02
申请人： Tsuyoshi Amano , Hiroyuki Shigemura
发明人： Tsuyoshi Amano , Hiroyuki Shigemura
IPC分类号： G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F9/7076
摘要： A main object of the invention is to provide a reflective mask for EUV lithography, which may detect an alignment mark by transmission. The invention achieves the object by providing a reflective mask comprising a substrate, a multilayer formed on one side of the substrate, an intermediate layer formed on the multilayer, an absorber formed in pattern on the substrate on which the multilayer and the intermediate layer are formed, and a conductive layer formed on the other side of the substrate, wherein the pattern of the absorber constitutes a circuit pattern and an alignment mark, and in an alignment region where the alignment mark is provided, the other side of the substrate is exposed.
摘要翻译：本发明的主要目的是提供一种用于EUV光刻的反射掩模，其可通过透射来检测对准标记。本发明通过提供一种反射掩模，通过提供一种反射掩模来实现，该反射掩模包括基板，形成在基板的一侧上的多层，形成在多层上的中间层，形成在其上形成有多层和中间层的基板上的图案的吸收体以及形成在所述基板的另一侧的导电层，其中所述吸收体的图案构成电路图案和对准标记，并且在设置有所述对准标记的取向区域中，所述基板的另一侧露出。

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