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    • 1. 发明授权
    • Semiconductor laser device
    • 半导体激光器件
    • US07738524B2
    • 2010-06-15
    • US11494444
    • 2006-07-28
    • Masanao OchiaiKoji Yuasa
    • Masanao OchiaiKoji Yuasa
    • H01S5/00
    • H01S5/028B82Y20/00H01S5/0282H01S5/0287H01S5/16H01S5/34333
    • A semiconductor laser device, which has a protective film at an end surface thereof, is adaptable to demands for higher outputs or shorter wavelengths. The semiconductor laser device according to the present invention includes a dielectric film on at least one end surface of an optical resonator, in which the dielectric film includes a first dielectric layer and a second dielectric layer comprised of the same elements and disposed in sequence from the end surface side of the semiconductor, the first dielectric layer including a layer made of a single crystal material and the second dielectric layer including a layer made of an amorphous material.
    • 在其端面具有保护膜的半导体激光器件适用于要求更高输出或更短波长的要求。 根据本发明的半导体激光器件包括在光学谐振器的至少一个端面上的电介质膜,其中介电膜包括第一介电层和由相同元件组成的第二介电层,并且从第 所述第一电介质层包括由单晶材料制成的层,所述第二电介质层包括由非晶材料制成的层。
    • 6. 发明申请
    • Nitride semiconductor laser element
    • 氮化物半导体激光元件
    • US20060256825A1
    • 2006-11-16
    • US10563811
    • 2004-07-09
    • Hiroaki MatsumuraMasanao Ochiai
    • Hiroaki MatsumuraMasanao Ochiai
    • H01S5/00H01S3/04
    • H01S5/20H01S5/028H01S5/32341
    • A nitride semiconductor laser device comprises a nitride semiconductor substrate (101); a nitride semiconductor lamination structure that has an n-type semiconductor layer (102), an active layer (104) and a p-type semiconductor layer (103) laminated on or above the nitride semiconductor substrate (101), and has a stripe-shaped waveguide region for laser light; and end surface protective films (110) on the both end surfaces substantially perpendicular to the waveguide region. In the nitride semiconductor laser device, the nitride semiconductor substrate (101) has a luminescent radiation region (112) that absorbs light emitted from the active layer (104) and emits luminescent radiation with a wavelength longer than the wavelength of the emitted light, and the end surface protective films (110) have a high reflectivity for the wavelength of the luminescent radiation from the luminescent radiation region (112). Accordingly, a nitride semiconductor laser device that does not improperly operate and has excellent FFP is provided.
    • 氮化物半导体激光器件包括氮化物半导体衬底(101); 具有层叠在氮化物半导体基板(101)上或上方的n型半导体层(102),有源层(104)和p型半导体层(103)的氮化物半导体层叠结构体, 激光光波导区域; 和在基本上垂直于波导区域的两个端面上的端面保护膜(110)。 在氮化物半导体激光装置中,氮化物半导体基板(101)具有吸收从有源层(104)发射的光并发射长于发光的波长的发光的发光的发光区域(112), 端面保护膜(110)对于来自发光辐射区域(112)的发光辐射的波长具有高反射率。 因此,提供了不正确操作且具有优异FFP的氮化物半导体激光器件。
    • 8. 发明授权
    • Nitride semiconductor laser element
    • 氮化物半导体激光元件
    • US07609737B2
    • 2009-10-27
    • US10563811
    • 2004-07-09
    • Hiroaki MatsumuraMasanao Ochiai
    • Hiroaki MatsumuraMasanao Ochiai
    • H01S3/04
    • H01S5/20H01S5/028H01S5/32341
    • A nitride semiconductor laser device comprises a nitride semiconductor substrate (101); a nitride semiconductor lamination structure that has an n-type semiconductor layer (102), an active layer (104) and a p-type semiconductor layer (103) laminated on or above the nitride semiconductor substrate (101), and has a stripe-shaped waveguide region for laser light; and end surface protective films (110) on the both end surfaces substantially perpendicular to the waveguide region. In the nitride semiconductor laser device, the nitride semiconductor substrate (101) has a luminescent radiation region (112) that absorbs light emitted from the active layer (104) and emits luminescent radiation with a wavelength longer than the wavelength of the emitted light, and the end surface protective films (110) have a high reflectivity for the wavelength of the luminescent radiation from the luminescent radiation region (112). Accordingly, a nitride semiconductor laser device that does not improperly operate and has excellent FFP is provided.
    • 氮化物半导体激光器件包括氮化物半导体衬底(101); 具有层叠在氮化物半导体基板(101)上或上方的n型半导体层(102),有源层(104)和p型半导体层(103)的氮化物半导体层叠结构体, 激光光波导区域; 和在基本上垂直于波导区域的两个端面上的端面保护膜(110)。 在氮化物半导体激光装置中,氮化物半导体基板(101)具有吸收从有源层(104)发射的光并发射比发光的波长长的发光的发光的发光区域(112), 端面保护膜(110)对于来自发光辐射区域(112)的发光辐射的波长具有高反射率。 因此,提供了不正确操作且具有优异FFP的氮化物半导体激光器件。