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    • 8. 发明授权
    • Bipolar-MOS IC with internal voltage generator and LSI device with
internal voltage generator
    • 具有内部电压发生器和具有内部电压发生器的LSI器件的双极MOS IC
    • US5153452A
    • 1992-10-06
    • US401849
    • 1989-08-30
    • Masahiro IwamuraShigeya TanakaTatsumi YamauchiIkuro MasudaTetsuo Nakano
    • Masahiro IwamuraShigeya TanakaTatsumi YamauchiIkuro MasudaTetsuo Nakano
    • H01L27/04G05F1/46G11C5/14G11C11/401G11C11/407G11C11/56H01L21/822H01L27/06
    • G11C11/565G05F1/465G11C5/147G11C16/30
    • There are provided a bipolar-MOS IC device smaller than half-micron scale, and a combination of such IC device and external circuits. The IC device has an internal voltage generating circuit for generating an internal power source by using an external power source, the voltage of the internal power source being lower than that of the external power source. The internal voltage generating circuit includes an NPN transistor formed in an N-type region or N-type island within a P-type semiconductor substrate of the IC device, and a PMOS transistor formed in the N-type island. The collector of the NPN transistor and the source of the PMOS transistor are used as external power source terminals. The drain of the PMOS transistor is connected to the base of the NPN transistor. The gate is used as a control signal terminal. The emitter of the NPN transistor is used as an internal power source output terminal. A current path from the external power source input terminal and the internal power source output terminal is accordingly formed within the N-type island isolated from the P-type substrate.
    • 提供了小于半微米级的双极MOS集成电路,以及这些IC器件和外部电路的组合。 IC器件具有内部电压产生电路,用于通过使用外部电源产生内部电源,内部电源的电压低于外部电源的电压。 内部电压产生电路包括形成在IC器件的P型半导体衬底内的N型区域或N型岛中的NPN晶体管和形成在N型岛中的PMOS晶体管。 NPN晶体管的集电极和PMOS晶体管的源极用作外部电源端子。 PMOS晶体管的漏极连接到NPN晶体管的基极。 门用作控制信号端子。 NPN晶体管的发射极用作内部电源输出端子。 因此,在与P型基板隔离的N型岛中形成从外部电源输入端子和内部电源输出端子的电流路径。