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1. 发明申请

US20100035180A1 CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
标题翻译：化学放大正电阻组合物
公开(公告)号：US20100035180A1
公开(公告)日：2010-02-11
申请号：US12536239
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
摘要翻译：本发明提供一种化学放大阳性组合物，其包含：包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基， Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1的整数 3，n表示0〜3的整数，酸产生剂。

2. 发明授权

US07998656B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07998656B2
公开(公告)日：2011-08-16
申请号：US12536239
申请日：2009-08-05
申请人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
发明人： Masahiko Shimada , Kazuhiko Hashimoto , Satoshi Yamaguchi , Soon Shin Kim , Yoshiyuki Takata , Takashi Hiraoka
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/108 , Y10S430/111
摘要： The present invention provides a chemically amplified positive composition comprising: a resin comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom, a C1-C4 alkyl group or a C1-C4 perfluoroalkyl group, Z represents a single bond or —(CH2)k—CO—X4—, k represents an integer of 1 to 4, X1, X2, X3 and X4 each independently represents an oxygen atom or a sulfur atom, m represents an integer of 1 to 3 and n represents an integer of 0 to 3, and an acid generator.
摘要翻译：本发明提供一种化学放大阳性组合物，其包含：包含由式（I）表示的结构单元的树脂：其中R1表示氢原子，卤素原子，C1-C4烷基或C1-C4全氟烷基， Z表示单键或 - （CH 2）k -CO-X 4 - ，k表示1〜4的整数，X 1，X 2，X 3，X 4各自独立地表示氧原子或硫原子，m表示1的整数 3，n表示0〜3的整数，酸产生剂。

3. 发明申请

US20050214676A1 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US20050214676A1
公开(公告)日：2005-09-29
申请号：US11082835
申请日：2005-03-18
申请人： Kouji Toishi , Yoshiyuki Takata , Satoshi Yamaguchi
发明人： Kouji Toishi , Yoshiyuki Takata , Satoshi Yamaguchi
IPC分类号： C23F1/00 , G03C1/76 , G03F7/004 , G03F7/039
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R1 and R2 each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4 and R5 each independently represents a hydrogen or a hydroxyl.
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，并且通过酸的作用变得可溶于碱性水溶液 ; 酸发生器; 和其中R 1和R 2各自独立地表示氢或具有1至4个碳原子的烷基的式（C-1）化合物， R 4，R 4和R 5各自独立地表示氢或羟基。

4. 发明申请

US20100279226A1 RESIST PROCESSING METHOD 审中-公开
标题翻译：电阻加工方法
公开(公告)号：US20100279226A1
公开(公告)日：2010-11-04
申请号：US12810793
申请日：2008-12-22
申请人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
发明人： Mitsuhiro Hata , Yoshiyuki Takata , Satoshi Yamaguchi , Ichiki Takemoto , Takayuki Miyagawa , Yusuke Fuji
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： H01L21/0275 , G03F7/0035 , G03F7/0045 , G03F7/0046 , G03F7/0397 , G03F7/40
摘要： The present invention has the object of providing a method of manufacturing a resist pattern in which an extremely fine and highly accurate resist pattern can be formed which is obtained using the resist composition for forming a first resist pattern in a multi-patterning method such as a double patterning method. The resist processing method comprising; forming a first resist film by applying a first resist composition onto a substrate and drying, the first resist composition comprising a resin (A), a photo acid generator (B) and a cross-linking agent (C), the resin (A) having an acid-labile group, being insoluble or poorly soluble in alkali aqueous solution but of being rendered soluble in alkali aqueous solution through the action of an acid; prebaking; exposure processing; post-exposure baking; developing; hard-baking the first resist pattern; and obtaining a second resist film; pre-baking; exposure processing; post-exposure baking; developing to obtain a second resist pattern.
摘要翻译：本发明的目的是提供一种制造抗蚀剂图案的方法，其中可以形成极细和高精度的抗蚀剂图案，该抗蚀剂图案是使用多图案化方法中形成第一抗蚀剂图案的抗蚀剂组合物获得的，双重图案化方法抗蚀剂处理方法包括：通过将第一抗蚀剂组合物施加到基材上并干燥来形成第一抗蚀剂膜，所述第一抗蚀剂组合物包含树脂（A），光酸产生剂（B）和交联剂（C），树脂（A）具有酸不稳定基团，在碱性水溶液中不溶或难溶，但通过酸的作用使其溶于碱水溶液中; 预烘烤曝光处理; 曝光后烘烤; 发展; 硬烘烤第一抗蚀剂图案; 得到第二抗蚀膜; 预烘烤; 曝光处理; 曝光后烘烤; 显影以获得第二抗蚀剂图案。

5. 发明授权

US07803513B2 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07803513B2
公开(公告)日：2010-09-28
申请号：US12076529
申请日：2008-03-19
申请人： Satoshi Yamaguchi , Yoshiyuki Takata , Kaoru Araki
发明人： Satoshi Yamaguchi , Yoshiyuki Takata , Kaoru Araki
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0046 , G03F7/0397 , Y10S430/106 , Y10S430/111 , Y10S430/122
摘要： A chemically amplified resist composition comprising:(A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group etc., Q1 and Q2 each independently represent a fluorine atom etc., and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group etc., a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom etc., B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt represented by the formula (II): A′+−E (II) wherein A′+ represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and E− represents at least one organic anion selected from an anion represented by the formula (II-1): −O3SQ3 (II-1) wherein Q3 represents a C1-C10 perfluoroalkyl group, and an anion represented by the formula (II-2): wherein Q4 represents a C1-C10 perfluoroalkyl group, and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
摘要翻译：一种化学放大抗蚀剂组合物，其包含：（A）由式（I）表示的盐：其中R21表示C1-C30烃基等，Q1和Q2各自独立地表示氟原子等，A +表示至少一个选自由式（Ia）表示的阳离子的有机阳离子：其中P1，P2和P3各自独立地表示C1-C30烷基等，式（Ib）表示的阳离子：其中P4和P5各自独立地表示氢原子等，式（Ic）表示的阳离子：其中P10，P11，P12，P13，P14，P15，P16，P17，P18，P19，P20和P21各自独立地表示氢原子等，B 表示硫或氧原子，m表示0或1，（B）由式（II）表示的盐：A'+ E（II）其中A'+表示至少一种选自由上述式（Ia），（Ib）和（Ic）中，E-表示选自以下的至少一种有机阴离子由式（II-1）表示的阴离子：-O3SQ3（II-1）其中Q3表示C1-C10全氟烷基，和由式（II-2）表示的阴离子：其中Q4表示C1-C10全氟烷基和（C）含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，但通过酸作用而溶于碱水溶液中。

6. 发明授权

US07575850B2 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07575850B2
公开(公告)日：2009-08-18
申请号：US12021149
申请日：2008-01-28
申请人： Yoshiyuki Takata , Satoshi Yamamoto , Satoshi Yamaguchi
发明人： Yoshiyuki Takata , Satoshi Yamamoto , Satoshi Yamaguchi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: a resin which comprises a structural unit having an acid-labile group and a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and at least two salts selected from a salt represented by the formula (II): wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III): A′+−O3S—R23 (III) wherein R23 represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+ represents an organic counter ion.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：树脂，其包含具有酸不稳定基团的结构单元和由式（I）表示的结构单元：其中R1表示氢原子或甲基，环X表示 C 1 -C 30环烃基，其中一个-CH 2 - 被-COO-取代，并且C 3 -C 30环烃基中的至少一个氢原子可以被取代，p表示1〜4的整数，本身在碱性水溶液中不溶或难溶，但是通过酸的作用而溶于碱性水溶液中，以及选自式（II）表示的盐中的至少两种盐：其中Y1和Y2各自独立地表示氟原子或C1-C6全氟烷基，A +表示有机抗衡离子，R21表示可以被取代的C1-C30烃基，C1-C30烃基中的至少一个-CH2-可以是取代基 d与-CO-或-O-，以及由式（III）表示的盐：<？in-line-formula description =“In-line formula”end =“lead”？> A'+ - O3S-R23 （III）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R23表示C1-C8直链或支链全氟烷基，A'+表示有机抗衡离子。

7. 发明授权

US07132218B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07132218B2
公开(公告)日：2006-11-07
申请号：US11082835
申请日：2005-03-18
申请人： Kouji Toishi , Yoshiyuki Takata , Satoshi Yamaguchi
发明人： Kouji Toishi , Yoshiyuki Takata , Satoshi Yamaguchi
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： The present invention provide a chemically amplified positive resist composition comprising a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution and becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator; and a compound of the formula (C-1) wherein R1 and R2 each independently represents a hydrogen or an alkyl having 1 to 4 carbon atoms, R3, R4 and R5 each independently represents a hydrogen or a hydroxyl.
摘要翻译：本发明提供了一种化学放大型正性抗蚀剂组合物，其包含含有具有酸不稳定基团的结构单元的树脂，其本身在碱性水溶液中不溶或难溶，并且通过酸的作用变得可溶于碱性水溶液 ; 酸发生器; 和其中R 1和R 2各自独立地表示氢或具有1至4个碳原子的烷基的式（C-1）化合物， R 4，R 4和R 5各自独立地表示氢或羟基。

8. 发明授权

US07572570B2 Chemically amplified resist composition 有权
标题翻译：化学放大抗蚀剂组合物
公开(公告)号：US07572570B2
公开(公告)日：2009-08-11
申请号：US12052189
申请日：2008-03-20
申请人： Yusuke Fuji , Yoshiyuki Takata
发明人： Yusuke Fuji , Yoshiyuki Takata
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , G03F7/0046 , Y10S430/111 , Y10S430/122 , Y10S430/123
摘要： The present invention provides a chemically amplified resist composition comprising: (A) a resin which comprises (a) a structural unit having an acid-labile group, (b) a structural unit having at least one hydroxyl group, (c) a structural unit having at least one lactone structure, and (d) a structural unit represented by the formula (Ia) or (Ib): wherein R1 represents a hydrogen atom or a methyl group, R3 represents a methyl group, n represents an integer of 0 to 14, and Z represents a single bond or —[CH2]k—COO—, and (B) at least one acid generator.
摘要翻译：本发明提供一种化学放大抗蚀剂组合物，其包含：（A）树脂，其包含（a）具有酸不稳定基团的结构单元，（b）具有至少一个羟基的结构单元，（c）结构单元具有至少一个内酯结构，和（d）由式（Ia）或（Ib）表示的结构单元：其中R1表示氢原子或甲基，R3表示甲基，n表示0〜 14，Z表示单键或 - [CH 2] k-COO-，和（B）至少一种酸发生剂。

9. 发明申请

US20050031984A1 Chemical amplification type positive resist composition 审中-公开
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US20050031984A1
公开(公告)日：2005-02-10
申请号：US10694719
申请日：2003-10-29
申请人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
发明人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
IPC分类号： G03C1/76 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0397
摘要： The present invention provides a resin which comprises a structural unit of the formula (I) wherein R1 represents alkylene having 1 to 4 carbon atoms, R2 represents alkyl having 1 to 4 carbon atoms, and R3 represents hydrogen or methyl, and also prvides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.
摘要翻译：本发明提供一种树脂，其包含式（I）的结构单元，其中R 1表示具有1至4个碳原子的亚烷基，R 2表示具有1至4个碳原子的烷基，R 3表示氢或甲基，并且还提供包含上述定义的树脂和酸产生剂的化学扩增型正性抗蚀剂组合物。

10. 发明授权

US06835527B2 Chemical amplifying type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06835527B2
公开(公告)日：2004-12-28
申请号：US10105386
申请日：2002-03-26
申请人： Yoshiyuki Takata , Hiroshi Moriuma
发明人： Yoshiyuki Takata , Hiroshi Moriuma
IPC分类号： G03F7004
CPC分类号： G03F7/0048 , G03F7/0397 , Y10S430/111
摘要： A resist composition excellent in balance of performance of resolution and sensitivity as well as in solubility and, particularly, suitable for use as a positive photo resist which comprises a resin having a alicyclic lactone structure unit that is insoluble in alkali by itself but becomes soluble due to the action of an acid, a solvent containing 2-heptanone and an acid generating agent, wherein a content of 2-heptanone in the solvent is in a weight ratio of from about 5 to about 95% is provided.
摘要翻译：具有优异的分辨率和灵敏度以及溶解性的平衡性优异的抗蚀剂组合物，特别适合用作正型光致抗蚀剂，其包含具有脂环内酯结构单元的树脂，该单体本身不溶于碱，但变得易溶于对酸，含有2-庚酮和酸产生剂的溶剂的作用，其中溶剂中2-庚酮的含量为约5至约95重量％。

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