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1. 发明授权

US06777511B2 Process for producing poly (meth) acrylates having reduced metal content 有权
标题翻译：制备金属含量降低的聚（甲基）丙烯酸酯的方法
公开(公告)号：US06777511B2
公开(公告)日：2004-08-17
申请号：US09956890
申请日：2001-09-21
申请人： Koshiro Ochiai , Akira Kamabuchi
发明人： Koshiro Ochiai , Akira Kamabuchi
IPC分类号： C08F606
CPC分类号： C08F6/02 , C08L33/00
摘要： An industrially excellent process for producing a poly(meth)acrylate having a reduced metal content which comprises contacting a mixture of a poly(meth)acrylate and an organic solvent with an acidic aqueous solution, such as an aqueous solution obtained by dissolving a polyprotic carboxylic acid having about 2 to 12 carbon atoms in water, is provided, and, by this invention, contents of metals such as sodium, potassium, iron and the like can be remarkably reduced.
摘要翻译：一种工业上优异的具有降低的金属含量的聚（甲基）丙烯酸酯的制备方法，其包括使聚（甲基）丙烯酸酯和有机溶剂的混合物与酸性水溶液接触，所述酸性水溶液例如通过将多元羧酸提供了在水中具有约2至12个碳原子的酸，并且通过本发明，可以显着降低诸如钠，钾，铁等的金属的含量。

2. 发明授权

US06258507B1 Photoresist compositions 有权
标题翻译：光刻胶组合物
公开(公告)号：US06258507B1
公开(公告)日：2001-07-10
申请号：US09276715
申请日：1999-03-26
申请人： Koshiro Ochiai , Nobuhito Fukui
发明人： Koshiro Ochiai , Nobuhito Fukui
IPC分类号： G03C173
CPC分类号： G03F7/039 , Y10S430/106 , Y10S430/115
摘要： A photoresist composition which is particularly useful as a chemical amplification type photoresist is provided, wherein the photoresist composition contains a resin having a structural unit represented by the following formula (I): wherein R1, R2 ad R3 each independently represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms; R4 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms or an alkoxy group having 1 to 4 carbon atoms and R5 represents a hydrogen atom, alkyl group or aryl group, or R4 and R5 join together to form a ring, which may be heterocyclic; and R6 represents a hydrogen atom, an alkyl group having 1 to 4 carbon atoms, an alkoxy group having 1 to 4 carbon atoms or a hydroxyl group.
摘要翻译：提供特别可用作化学放大型光致抗蚀剂的光致抗蚀剂组合物，其中光致抗蚀剂组合物含有具有由下式（I）表示的结构单元的树脂：其中R1，R2和R3各自独立地表示氢原子或具有1-4个碳原子的烷基; R 4表示氢原子，碳原子数1〜4的烷基或碳原子数1〜4的烷氧基，R 5表示氢原子，烷基或芳基，或者，R 4，R 5连接在一起形成环，可以是杂环的; R6表示氢原子，碳原子数1〜4的烷基，碳原子数1〜4的烷氧基或羟基。

3. 发明授权

US07144674B2 Positive resist composition 有权
标题翻译：正抗蚀剂组成
公开(公告)号：US07144674B2
公开(公告)日：2006-12-05
申请号：US10390903
申请日：2003-03-19
申请人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
发明人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
IPC分类号： G03C1/73 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0397 , Y10S430/106
摘要： The present invention provides a positive resist composition comprising (A) at least one resin selected from the group consisting of {circle around (1)} resin which is itself insoluble or poorly soluble in an alkali aqueous solution but cause a chemical change by the action of an acid to become soluble in an alkali aqueous solution with a proviso that the resin is not novolak resin and {circle around (2)} alkali-soluble resin, (B) novolak resin containing protective group which can be dissociated by the action of an acid and (C) an acid generator.
摘要翻译：本发明提供了一种正型抗蚀剂组合物，其包含（A）至少一种选自以下的树脂：圆周（1个树脂本身不溶于或难溶于碱水溶液，但通过酸溶解在碱性水溶液中，条件是树脂不是酚醛清漆树脂和{圆周（2碱溶性树脂，（B）含有保护基的酚醛清漆树脂，其可以通过酸的作用解离和（ C）酸产生器。

4. 发明申请

US20050031984A1 Chemical amplification type positive resist composition 审中-公开
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US20050031984A1
公开(公告)日：2005-02-10
申请号：US10694719
申请日：2003-10-29
申请人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
发明人： Yoshiyuki Takata , Youngjoon Lee , Koshiro Ochiai
IPC分类号： G03C1/76 , G03F7/038 , G03F7/039
CPC分类号： G03F7/0397
摘要： The present invention provides a resin which comprises a structural unit of the formula (I) wherein R1 represents alkylene having 1 to 4 carbon atoms, R2 represents alkyl having 1 to 4 carbon atoms, and R3 represents hydrogen or methyl, and also prvides a chemical amplification type positive resist composition comprising a resin defined above and an acid generator.
摘要翻译：本发明提供一种树脂，其包含式（I）的结构单元，其中R 1表示具有1至4个碳原子的亚烷基，R 2表示具有1至4个碳原子的烷基，R 3表示氢或甲基，并且还提供包含上述定义的树脂和酸产生剂的化学扩增型正性抗蚀剂组合物。

5. 发明授权

US6153349A Photo resist composition 有权
标题翻译：光刻胶组合物
公开(公告)号：US6153349A
公开(公告)日：2000-11-28
申请号：US307036
申请日：1999-05-07
申请人： Koji Ichikawa , Nobuhito Fukui , Koshiro Ochiai
发明人： Koji Ichikawa , Nobuhito Fukui , Koshiro Ochiai
IPC分类号： H01L21/027 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/11
摘要： A photoresist composition comprising a resin having structural units represented by the following formulas (I), (II) and (III): ##STR1## wherein R.sup.1, R.sup.2, R.sup.3, R.sup.11, R.sup.12, R.sup.13, R.sup.21, R.sup.22 and R.sup.23 each independently represents hydrogen or an alkyl; one of R.sup.14, R.sup.15 and R.sup.16 represents an aliphatic hydrocarbon residue and the rest each independently represents hydrogen or an aliphatic hydrocarbon residue, or two or three of R.sup.14, R.sup.15 and R.sup.16 form a hydrocarbon ring; and R represents a group cleavable by an action of an acid; and the photoresist composition affords excellent resolution, excellent profile and wide focus margin even on a substrate provided with an organic anti-reflective film.
摘要翻译：一种光致抗蚀剂组合物，其包含具有由下式（I），（II）和（III）表示的结构单元的树脂：其中R1，R2，R3，R11，R12，R13，R21，R22和R23各自独立地表示氢或烷基; R14，R15和R16之一表示脂族烃残基，其余各自独立地表示氢或脂族烃残基，或者R14，R15和R16中的两个或三个形成烃环; 并且R表示可通过酸的作用而切割的基团; 并且即使在具有有机抗反射膜的基板上，光致抗蚀剂组合物也提供优异的分辨率，优异的轮廓和宽的聚焦余量。

6. 发明授权

US06762007B2 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US06762007B2
公开(公告)日：2004-07-13
申请号：US10390924
申请日：2003-03-19
申请人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
发明人： Katsuhiko Namba , Masumi Suetsugu , Koshiro Ochiai
IPC分类号： G03C173
CPC分类号： G03F7/0392 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/115
摘要： The present invention provides a chemical amplification type positive resist composition comprising (A) resin having a phenol skeleton wherein the phenol skeleton has protective group which can be dissociated by the action of an acid, the phenol skeleton itself is insoluble or poorly soluble in an alkali aqueous solution and the phenol skeleton becomes soluble in an alkali aqueous solution after dissociation of the protective group, (B) resin obtained by protecting a part of hydroxyl group in poly(p-hydroxystyrene) with pivaloyl group and (C) an acid generator.
摘要翻译：本发明提供一种化学增幅型正性抗蚀剂组合物，其包含（A）具有苯酚骨架的树脂，其中所述酚骨架具有可通过酸的作用解离的保护基，所述苯酚骨架本身不溶或难溶于碱水溶液和苯酚骨架在保护基解离后溶解在碱性水溶液中，（B）通过用新戊酰基保护聚（对羟基苯乙烯）中的一部分羟基得到的树脂和（C）酸发生剂。

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