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    • 7. 发明申请
    • Exposure apparatus, and device manufacturing method
    • 曝光装置和装置制造方法
    • US20060114433A1
    • 2006-06-01
    • US11251837
    • 2005-10-18
    • Yoshikazu MiyajimaTakashi Meguro
    • Yoshikazu MiyajimaTakashi Meguro
    • G03B27/42
    • G03F7/70066G03F7/70075G03F7/709
    • Disclosed is an exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate, the exposure apparatus including comprising a light blocking system for blocking at least a portion of exposure light, a driving system for moving the light blocking system, and a reaction force absorbing system for absorbing a drive reaction force of the driving system, wherein the driving system includes a stator, and wherein the reaction force absorbing system absorbs the reaction force by moving the stator of the driving system. With this structure, adverse influence of vibratory external disturbance to be caused by a drive reaction force as the blade of the light blocking system is driven, can be reduced significantly.
    • 公开了一种曝光装置,用于通过曝光将原稿的图案曝光到基板上,所述曝光装置包括包括用于遮挡至少一部分曝光光的遮光系统,用于移动遮光系统的驱动系统,以及 用于吸收驱动系统的驱动反作用力的反作用力吸收系统,其中所述驱动系统包括定子,并且其中所述反作用力吸收系统通过移动所述驱动系统的定子来吸收所述反作用力。 利用这种结构,驱动作为遮光系统的叶片的驱动反作用力引起的振动外部干扰的不良影响可以显着降低。