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1. 发明申请

US20090315413A1 MOTOR APPARATUS, MANUFACTURING METHOD, EXPOSURE APPARATUS, AND DEVICE FABRICATION METHOD 有权
标题翻译：电动机装置，制造方法，曝光装置和装置制造方法
公开(公告)号：US20090315413A1
公开(公告)日：2009-12-24
申请号：US12481871
申请日：2009-06-10
申请人： Satoshi Iwatani , Yoshikazu Miyajima
发明人： Satoshi Iwatani , Yoshikazu Miyajima
IPC分类号： H02K41/03 , H02K15/12 , G03B27/58 , G03F7/20
CPC分类号： G03F7/70758 , G03B27/58 , H02K1/246 , H02K15/12 , H02K41/03 , H02K2201/18 , Y10T29/49009
摘要： The present invention provides a motor apparatus which includes a movable portion including a coil and a tooth-like salient pole, and a platen opposed to the movable portion, and moves the movable portion and the platen relative to each other by using a magnetic field generated by supplying a current to the coil, wherein the platen includes a base material having a surface on which convex portions and first concave portions are periodically arranged, a first thermally sprayed layer formed on the surface of the base material by thermal spraying such that second concave portions are formed inside the first concave portions, and a resin filled in the second concave portions.
摘要翻译：本发明提供一种电动机装置，其具有包括线圈和齿状凸极的可动部以及与可动部相对的台板，通过使用产生的磁场使可动部和压板相对移动通过向所述线圈供给电流，所述压板包括基体材料，所述基材具有周期性地布置有凸部和所述第一凹部的表面，通过热喷涂形成在所述基材的表面上的第一热喷涂层，部分形成在第一凹部内部，树脂填充在第二凹部中。

2. 发明授权

US07426013B2 Exposure apparatus and device fabrication method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07426013B2
公开(公告)日：2008-09-16
申请号：US11376995
申请日：2006-03-15
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03B27/42 , G03B27/68 , G03B27/54 , G02B7/182
CPC分类号： G03F7/706 , G03B27/42 , G03F7/70258 , G03F7/70825 , G03F7/70833
摘要： An exposure apparatus illuminates a pattern on an original form, introduces light from the pattern to a plate, and exposes the plate. The exposure apparatus includes at least one optical element, and forcing member that applies a force to the at least one optical element in a non-contact manner.
摘要翻译：曝光装置以原始形式照亮图案，将来自图案的光引入板，并使板曝光。曝光装置包括至少一个光学元件，以及以非接触方式向至少一个光学元件施加力的强制构件。

3. 发明授权

US07423724B2 Exposure apparatus and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07423724B2
公开(公告)日：2008-09-09
申请号：US11387682
申请日：2006-03-24
申请人： Noriyasu Hasegawa , Tatsuya Hayashi , Yoshikazu Miyajima
发明人： Noriyasu Hasegawa , Tatsuya Hayashi , Yoshikazu Miyajima
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70933 , G03F7/70916
摘要： An exposure apparatus exposes a substrate to light via a reticle in a vacuum. A projection optical system projects a pattern of the reticle onto the substrate, a stage holds the substrate and moves, and first and second partitions define an exhaust space between a first space accommodating at least a part of the projection optical system and a stage space accommodating the stage. The first partition includes a first opening to make the light pass between the first space and the exhaust space, and the second partition includes a second opening to make the light pass between the exhaust space and the stage space. A first supply system supplies fluid into the stage space, and a first exhaust system recovers fluid from the stage space through the second opening and the exhaust space. A pressure in the exhaust space is lower than those in the first space and the stage space.
摘要翻译：曝光装置在真空中通过掩模版将基板曝光。投影光学系统将掩模版的图案投影到基板上，台架保持基板并移动，第一和第二隔板在容纳投影光学系统的至少一部分的第一空间和容纳舞台。第一分隔件包括使第一空间和排气间隔之间的光通过的第一开口，第二分隔件包括第二开口，以在排气空间与台架空间之间形成光。第一供应系统将液体供应到载物台空间中，第一排气系统通过第二开口和排气空间从载物台空间回收流体。排气空间中的压力低于第一空间和台架空间中的压力。

4. 发明授权

US07345737B2 Exposure method and apparatus having a projection optical system in which a projection gap is filled with liquid 失效
标题翻译：具有投影光学系统的曝光方法和装置，其中突出间隙充满液体
公开(公告)号：US07345737B2
公开(公告)日：2008-03-18
申请号：US10935076
申请日：2004-09-08
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70733 , G03B27/58 , G03F7/70341
摘要： An exposure apparatus for exposing a substrate to light via a pattern of a reticle. The apparatus includes a first substrate stage configured to hold a substrate chuck and the substrate on the substrate chuck and to move in a measurement area, a measurement unit arranged in the measurement area and configured to measure the held substrate to obtain information for positioning the substrate in an exposure area, a second substrate stage configured to hold the substrate chuck and the measured substrate on the substrate chuck, to move in the exposure area, and to position the measured substrate based on the obtained information, a projection optical system arranged in the exposure area and configured to project the pattern onto the positioned substrate while a gap between the projection optical system and the positioned substrate is filled with liquid, a conveyance unit configured to convey the substrate chuck and the measured substrate from the first substrate stage to the second substrate stage, and a supply unit arranged between the measurement area and the exposure area and configured to supply the liquid on the measured substrate.
摘要翻译：一种曝光装置，用于通过标线图案使基板曝光。该设备包括：第一基板台，被配置为将基板卡盘和基板保持在基板卡盘上并在测量区域中移动，测量单元布置在测量区域中，并且被配置为测量保持的基板以获得用于定位基板的信息在曝光区域中，第二基板台被配置为将基板卡盘和测量的基板保持在基板卡盘上，以在曝光区域中移动，并且基于获得的信息来定位测量的基板;布置在该曝光区域中的投影光学系统曝光区域，并配置为在将投影光学系统和定位基板之间的间隙填充有液体的情况下将图案投影到定位的基板上;传送单元，被配置为将基板卡盘和测量的基板从第一基板台传送到第二基板台衬底台，以及布置在测量区域和曝光区域之间的供应单元并且被配置为在所测量的基板上提供液体。

5. 发明授权

US07321418B2 Stage apparatus, exposure apparatus, and device manufacturing method 失效
标题翻译：舞台装置，曝光装置和装置的制造方法
公开(公告)号：US07321418B2
公开(公告)日：2008-01-22
申请号：US11249700
申请日：2005-10-13
申请人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
发明人： Yasuhito Sasaki , Yoshikazu Miyajima , Naosuke Nishimura , Hideo Tanaka , Toshihiko Nishida
IPC分类号： G03B27/58 , G03B27/42 , G03B27/32 , H02K41/00
CPC分类号： G03F7/70766
摘要： A stage apparatus includes a base, a stage movable on the base in first and second directions, a first member movable relative to the base in the first direction, and a second member movable relative to the base in the second direction. The first member is placed on the second member. With this arrangement, drive reaction-forces generated due to movement of the stage can be canceled by moving the first and second members, resulting in a smaller space needed for accommodating a canceling mechanism.
摘要翻译：舞台装置包括基座，可在第一和第二方向上在基座上移动的台架，可在第一方向上相对于基座移动的第一构件，以及可相对于基座沿第二方向移动的第二构件。第一个成员放置在第二个成员上。通过这种布置，可以通过移动第一和第二构件来消除由于台的移动产生的驱动反作用力，导致容纳取消机构所需的较小的空间。

6. 发明授权

US07253878B2 Exposure apparatus and device fabrication method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07253878B2
公开(公告)日：2007-08-07
申请号：US11407251
申请日：2006-04-20
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03B27/42 , G21K5/00 , G02B7/182
CPC分类号： G03F7/706 , G03F7/70258
摘要： An exposure apparatus includes a reflective element for reflecting and introducing light from a light source to a plate, at least one first driver for providing the reflective element with a force and/or a displacement in at least one directions, and at least one second driver for providing the reflective element with a force and/or a displacement in at least one directions, wherein the first and second drives are connected in series to each other.
摘要翻译：曝光装置包括用于将光从光源反射和引入到板的反射元件，至少一个用于在至少一个方向上提供反射元件和/或位移的第一驱动器，以及至少一个第二驱动器用于在至少一个方向上提供反射元件的力和/或位移，其中第一和第二驱动器彼此串联连接。

7. 发明授权

US07253877B2 Exposure apparatus, and device manufacturing method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07253877B2
公开(公告)日：2007-08-07
申请号：US11251837
申请日：2005-10-18
申请人： Yoshikazu Miyajima , Takashi Meguro
发明人： Yoshikazu Miyajima , Takashi Meguro
IPC分类号： G03B27/42 , G03B27/72
CPC分类号： G03F7/70066 , G03F7/70075 , G03F7/709
摘要： An exposure apparatus for projecting, by exposure, a pattern of an original onto a substrate. The apparatus includes a light blocking device for blocking at least a portion of exposure light. The light blocking device includes two plate-like members which are disposed in a vertical direction with a clearance kept therebetween, and two plate-like members which are disposed in a horizontal direction with a clearance kept therebetween. The apparatus further includes a driving member for moving the light blocking device, wherein the driving member includes the stator, and a reaction force absorbing device for absorbing a drive reaction force of the driving member. The reaction force absorbing device absorbs the reaction force by moving the stator of the driving member.
摘要翻译：一种曝光装置，用于通过曝光将原稿的图案投射到基板上。该装置包括用于阻挡至少一部分曝光光的遮光装置。遮光装置包括沿垂直方向设置并保持间隙的两个板状构件和沿水平方向设置并间隙保持的两个板状构件。该装置还包括用于移动遮光装置的驱动构件，其中驱动构件包括定子，以及用于吸收驱动构件的驱动反作用力的反作用力吸收装置。反作用力吸收装置通过移动驱动构件的定子来吸收反作用力。

8. 发明授权

US07236230B2 Exposure apparatus and device fabrication method 失效
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07236230B2
公开(公告)日：2007-06-26
申请号：US10827851
申请日：2004-04-20
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03B27/42 , G02B7/02
CPC分类号： G03F7/70975 , G03F7/70825 , G03F7/70833
摘要： A support apparatus includes an optical element, a first support member that supports the optical element, and a second support member that contacts the optical element or the first support member and positions the optical element, wherein the optical element is removably attached to the second support member, or the optical element and the first support member are removably attached to the second support member.
摘要翻译：支撑装置包括光学元件，支撑光学元件的第一支撑构件和接触光学元件或第一支撑构件并定位光学元件的第二支撑构件，其中光学元件可移除地附接到第二支撑件构件或光学元件和第一支撑构件可移除地附接到第二支撑构件。

9. 发明授权

US07212277B2 Substrate holding technique 失效
标题翻译：基材保持技术
公开(公告)号：US07212277B2
公开(公告)日：2007-05-01
申请号：US10941962
申请日：2004-09-16
申请人： Yoshikazu Miyajima , Hideo Tanaka
发明人： Yoshikazu Miyajima , Hideo Tanaka
IPC分类号： G03B27/62 , G03B27/58 , H01F7/20
CPC分类号： G03F7/707 , G03F7/70716 , H01F7/206
摘要： An object holding apparatus including a chuck for holding an object, a holder configured to hold the chuck, a generator provided in the holder and configured to generate a field related to an attraction force, a member provided in the chuck and configured to be attracted by the generator in accordance with the field, and a support configured to support one of the generator and the member. The support is configured to allow the one to move toward the other and away from the other, and the support includes a leaf spring.
摘要翻译：一种物体保持装置，包括用于保持物体的卡盘，被构造成保持卡盘的保持器，设置在保持器中并被配置为产生与吸引力相关的场的发生器的发生器，设置在卡盘中的构件，根据现场的发电机，以及被配置为支撑发电机和所述部件中的一个的支撑件。支撑件被构造成允许该支撑件朝着另一个移动并远离另一个，并且支撑件包括板簧。

10. 发明授权

US07130016B2 Exposure apparatus and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US07130016B2
公开(公告)日：2006-10-31
申请号：US11048762
申请日：2005-02-03
申请人： Yoshikazu Miyajima
发明人： Yoshikazu Miyajima
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/70808 , G03B27/52 , G03F7/70933
摘要： An exposure apparatus includes a plurality of chambers which respectively have openings and are connected to each other to be able to communicate with each other through the openings, and a suppressing system which suppresses a gas from flowing into at least one of the plurality of chambers through the openings after disconnection of the plurality of chambers. The one of the plurality of chambers has a projection, another one of the plurality of chambers has a recess, and the one chamber and the other chamber are connected to each other as the projection is fitted in the recess.
摘要翻译：曝光装置包括分别具有开口并且彼此连接以能够通过开口彼此连通的多个室，以及抑制气体流入多个室中的至少一个室的抑制系统，多个室的断开后的开口。多个室中的一个具有突起，多个室中的另一个具有凹部，并且当突起装配在凹部中时，一个室和另一个室彼此连接。

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