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1. 发明申请

US20100128367A1 PROJECTION OBJECTIVE FOR A MICROLITHOGRAPHY APPARATUS AND METHOD 审中-公开
标题翻译：一种微电脑设备和方法的投影目标
公开(公告)号：US20100128367A1
公开(公告)日：2010-05-27
申请号：US12403526
申请日：2009-03-13
申请人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
发明人： Mariella Beckenbach , Klaus Rief , Andreas Bertele , Benjamin Sigel , Sascha Bleidistel , Wolfgang Hummel , Andreas Frommeyer , Toralf Gruner , Jochen Schwaer , Baerbel Schwaer , Thomas Schletterer , Artur Hoegele , Armin Schoeppach
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/023 , G02B13/14 , G02B27/0068 , G03F7/70058 , G03F7/70266
摘要： A projection objective for a microlithography apparatus with improved imaging properties is provided. A manipulator for a projection objective is provided. A microlithography apparatus including a projection objective of this type and/or a manipulator of this type is provided. A method for improving the imaging properties of a projection objective is provided.
摘要翻译：提供了具有改善的成像特性的微光刻设备的投影物镜。提供了一种用于投影物镜的操纵器。提供包括这种类型的投影物镜和/或这种类型的操纵器的微光刻设备。提供了一种用于改善投影物镜的成像特性的方法。

2. 发明申请

US20050248858A1 Device for holding a beam splitter element 失效
标题翻译：用于固定分束器元件的装置
公开(公告)号：US20050248858A1
公开(公告)日：2005-11-10
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/00 , G02B7/18 , G03F7/20 , G02B5/30 , G02B7/02 , G02B27/28
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的壳体中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

3. 发明授权

US07079331B2 Device for holding a beam splitter element 失效
标题翻译：用于保持分束器元件的装置
公开(公告)号：US07079331B2
公开(公告)日：2006-07-18
申请号：US11109316
申请日：2005-04-19
申请人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
发明人： Ulrich Weber , Alexander Kohl , Hubert Holderer , Armin Schoeppach , Erwin Gaber , Winfried Kaiser , Reiner Garreis , Toralf Gruner , Chris Reed , Dragos Pariza , Mike Meehan
IPC分类号： G02B7/02 , G02B27/10 , G02B27/14 , G02B7/18 , G02F1/01
CPC分类号： G03F7/70825 , G02B7/008 , G02B7/1805 , G03F7/70891
摘要： The invention relates to a device for holding a beam splitter element having an optically active beam splitter layer in an optical imaging device, the beam splitter element being connected to at least one support element that is fastened in the housing of the imaging device. The connection between the beam splitter element and said at least one support element is designed in such a way that the position of the beam splitter layer of the beam splitter element remains nearly constant relative to the housing independently of temperatures and of thermal stresses acting upon the beam splitter element.
摘要翻译：本发明涉及一种用于在光学成像装置中保持具有光学有源分束器层的分束器元件的装置，所述分束器元件连接到紧固在成像装置的外壳中的至少一个支撑元件。分束器元件和所述至少一个支撑元件之间的连接被设计成使得分束器元件的分束器层的位置相对于壳体保持几乎恒定，而与温度和作用在分束器元件

4. 发明申请

US20090207511A1 ASSEMBLY FOR ADJUSTING AN OPTICAL ELEMENT 审中-公开
标题翻译：用于调整光学元件的组件
公开(公告)号：US20090207511A1
公开(公告)日：2009-08-20
申请号：US11914055
申请日：2006-05-09
申请人： Armin Schoeppach , Manfred Steinbach , Thomas Schletterer , Ernesto Lopez-Real
发明人： Armin Schoeppach , Manfred Steinbach , Thomas Schletterer , Ernesto Lopez-Real
IPC分类号： G02B7/02
CPC分类号： G03F7/70825 , G02B7/005 , G02B7/023 , G03F7/70258
摘要： An assembly for fixation or adjusting of an optical element (1) with, regard to an outer mount or support (4) wherein the optical element (1) is alignable with regard to a structure of the optical arrangement, particularly the objective structure or the objective barrel, having an optical axis or with regard to neighbouring mounts by means of an adjusting arrangement, is characterized in that the adjusting arrangement comprises at least an elastic means (9), particularly a spring, an elastic rod or stick, an elastic tape or an elastic gear wheel or an elastic gear box by which a force or a torque is applicable to the optical element (1). The assembly is particularly suitable for use in a microlithographic exposure apparatus. In some embodiments an intermediate ring (27) positioned between the optical element (24) and the outer mount or support (26) is used to reduce deformations.
摘要翻译：一种用于相对于外部安装件或支撑件（4）固定或调节光学元件（1）的组件，其中光学元件（1）可相对于光学装置的结构，特别是物镜结构或具有光轴或通过调节装置相对于相邻安装件的物镜筒的特征在于，所述调节装置至少包括弹性装置（9），特别是弹簧，弹性杆或杆，弹性带或弹性齿轮或弹性齿轮箱，通过该弹性齿轮箱，力或转矩适用于光学元件（1）。该组件特别适用于微光刻曝光设备。在一些实施例中，位于光学元件（24）和外部安装件或支撑件（26）之间的中间环（27）用于减小变形。

5. 发明授权

US09436101B2 Optical arrangement and microlithographic projection exposure apparatus including same 有权
标题翻译：包括其的光学布置和微光刻投影曝光设备
公开(公告)号：US09436101B2
公开(公告)日：2016-09-06
申请号：US13407466
申请日：2012-02-28
申请人： Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
发明人： Armin Schoeppach , Hans-Juergen Mann , Frank Eisert , Yim-Bun Patrick Kwan
IPC分类号： G03B27/68 , G03B27/70 , G03F7/20 , G02B17/06
CPC分类号： G03F7/70825 , G02B17/0657
摘要： An optical arrangement includes at least one optical element and a support element for the optical element. The optical element and the support element are connected together by way of at least three decoupling elements. The decoupling elements are formed monolithically with the optical element and with the support element.
摘要翻译：光学装置包括至少一个光学元件和用于光学元件的支撑元件。光学元件和支撑元件通过至少三个去耦元件连接在一起。解耦元件与光学元件和支撑元件一体地形成。

6. 发明授权

US09217936B2 Optical device having a deformable optical element 有权
标题翻译：具有可变形光学元件的光学装置
公开(公告)号：US09217936B2
公开(公告)日：2015-12-22
申请号：US13004470
申请日：2011-01-11
申请人： Manfred Steinbach , Armin Schoeppach
发明人： Manfred Steinbach , Armin Schoeppach
IPC分类号： G03F7/20 , G02B26/06 , G02B27/00
CPC分类号： G03F7/7015 , G02B26/06 , G02B27/0068 , G03F7/70266 , G03F7/70825
摘要： The disclosure relates to an optical device, in particular for microlithography. The optical device includes an optical module and a support structure that supports the optical module. The optical module includes an optical element and a holding device that holds the optical element. The holding device includes a deformation device having a plurality of active deformation units which contact the optical element and which are designed so as to impose a pre-defined deformation on the optical element. The optical module is fixed to the support structure in a replaceable manner.
摘要翻译：本公开涉及光学装置，特别是用于微光刻。光学装置包括光学模块和支撑光学模块的支撑结构。光学模块包括光学元件和保持光学元件的保持装置。保持装置包括变形装置，该变形装置具有与光学元件接触的多个主动变形单元，其被设计成在光学元件上施加预定义的变形。光学模块以可更换的方式固定在支撑结构上。

7. 发明授权

US08885143B2 Projection exposure apparatus for microlithography for the production of semiconductor components 有权
标题翻译：用于生产半导体元件的微光刻的投影曝光装置
公开(公告)号：US08885143B2
公开(公告)日：2014-11-11
申请号：US13071237
申请日：2011-03-24
申请人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
发明人： Juergen Fischer , Armin Schoeppach , Matthias Orth , Norbert Muehlberger , Thorsten Rassel , Armin Werber , Juergen Huber
IPC分类号： G03F7/20
CPC分类号： G03F7/7015 , G03F7/70266 , G03F7/70825 , G03F7/70883 , G03F7/709 , G03F7/70991
摘要： A projection exposure apparatus for microlithography for the production of semiconductor components includes at least one optical assembly with at least one optical element which can be actuated in a mechanically controlled manner is mounted in a structure. For carrying out the mechanical actuation, a control signal transmission device and/or an energy transmission device are/is provided, which introduce(s) no parasitic mechanical effects into the optical assembly at least during specific operating states of the projection exposure apparatus.
摘要翻译：用于生产半导体部件的用于微光刻的投影曝光装置包括至少一个光学组件，其具有可以以机械控制的方式被致动的至少一个光学元件安装在结构中。为了执行机械致动，至少在投影曝光设备的特定操作状态期间，提供控制信号传输装置和/或能量传输装置，其将光学组件中没有寄生机械效应引入到光学组件中。

8. 发明授权

US08854603B2 Gravitation compensation for optical elements in projection exposure apparatuses 有权
标题翻译：投影曝光装置中的光学元件的重力补偿
公开(公告)号：US08854603B2
公开(公告)日：2014-10-07
申请号：US13111492
申请日：2011-05-19
申请人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
发明人： Norbert Muehlberger , Thorsten Rassel , Armin Schoeppach , Juergen Fischer , Matthias Orth
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20
CPC分类号： G02B7/001 , G02B13/143 , G02B13/16 , G03F7/70825
摘要： A gravitation compensator for mounting optical elements in a projection exposure apparatus and a corresponding projection exposure apparatus are disclosed. The gravitation compensator at least partly compensates for the weight force of a mounted optical element and simultaneously enables a change in the position of the optical element without the compensated weight force being altered in an impermissible manner during the change in position. This applies, in particular, to high weight forces which are to be compensated. Furthermore, the gravitation compensator enables use in different atmospheres and the compensation of corresponding aging effects.
摘要翻译：公开了一种用于在投影曝光设备和相应的投影曝光设备中安装光学元件的引力补偿器。重力补偿器至少部分地补偿安装的光学元件的重量，并且同时能够改变光学元件的位置，而不会在位置改变期间以不允许的方式改变补偿的重量。这尤其适用于要补偿的高重量力。此外，引力补偿器可以在不同的环境中使用，并补偿相应的老化效应。

9. 发明申请

US20110128521A1 ACTUATORS AND MICROLITHOGRAPHY PROJECTION EXPOSURE SYSTEMS AND METHODS USING THE SAME 审中-公开
标题翻译：执行器和微观投影曝光系统及其使用方法
公开(公告)号：US20110128521A1
公开(公告)日：2011-06-02
申请号：US13009438
申请日：2011-01-19
申请人： Ulrich Weber , Stefan Hembacher , Armin Schoeppach
发明人： Ulrich Weber , Stefan Hembacher , Armin Schoeppach
IPC分类号： G03B27/54 , F16H21/44
CPC分类号： G03F7/70141 , F16H21/44 , G03F7/70258 , G03F7/70825 , H02N1/002 , H02N2/023 , Y10T74/18992
摘要： An actuator includes a housing and a rotor that can be moved in relation to the housing in the effective direction of the actuator, wherein the actuator includes an advancing unit that is connected to the rotor at least part of the time. The advancing unit includes at least one deformation unit and at least one deformer for deforming the deformation unit. The at least one deformer is suited to deform the deformation unit perpendicular to the effective direction of the actuator such that the total length of the deformation unit changes in the effective direction as a result of the deformation. The actuator can be used in a projection exposure system for semiconductor lithography.
摘要翻译：致动器包括壳体和可以在致动器的有效方向上相对于壳体移动的转子，其中致动器包括至少部分时间连接到转子的前进单元。前进单元包括至少一个变形单元和用于使变形单元变形的至少一个变形器。至少一个变形器适于使变形单元垂直于致动器的有效方向变形，使得变形单元的总长度由于变形而在有效方向上变化。致动器可用于半导体光刻的投影曝光系统。

10. 发明申请

US20090244509A1 OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGEMENT FOR REDUCING IMAGE ABERRATIONS 有权
标题翻译：光学系统具有可交换的可操作的校正装置，用于减少图像抖动
公开(公告)号：US20090244509A1
公开(公告)日：2009-10-01
申请号：US12409961
申请日：2009-03-24
申请人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
发明人： Guido Limbach , Franz Sorg , Armin Schoeppach , Ulrich Weber , Ulrich Loering , Dirk Hellweg , Peter Meyer , Stefan Xalter , Jens Kugler , Bernhard Gellrich , Stefan Hembacher , Bernhard Geuppert , Aksel Goehnermeier
IPC分类号： G03B27/54
CPC分类号： G02B7/004 , G02B27/0068 , G03F7/70191 , G03F7/70258 , G03F7/70308 , G03F7/70825
摘要： The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.
摘要翻译：本发明涉及一种光学系统，例如用于半导体光刻的投影曝光装置，包括用于减小图像像差的可操作的校正装置。在一些实施例中，系统包括被配置为减少图像像差的至少一个操纵器。操纵器可以包括至少一个可由至少一个致动器操纵的光学元件。操纵器可以与致动器一起以可变的方式形成。

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