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    • 2. 发明授权
    • Nozzle assembly
    • 喷嘴总成
    • US06338439B1
    • 2002-01-15
    • US09470138
    • 1999-12-22
    • Lakhi Nandlal GoenkaMarc Alan StraubJay D Baker
    • Lakhi Nandlal GoenkaMarc Alan StraubJay D Baker
    • B05B1700
    • B05B7/1495B05B7/1486
    • A nozzle assembly 10 including a first inlet aperture 12 which receives material 14 which is to be selectively emitted from assembly 10. Assembly 10 includes an outlet aperture 16 having several apertures 18, 20, 22, 24, and 26 which are respectively separated by substantially identical elements 28, 30, 32, and 34. Elements 28-34 cooperatively form a plurality of passages or channels 40-50 through assembly 10. A centrally disposed channel 44 is relatively narrower than the other channels 40, 42, 46, and 50, and channels 42, 46 are relatively narrower than outermost channels 46, 50, thereby causing material 14 to be emitted at a substantially similar and/or uniform velocity at each point or location within outlet aperture 16.
    • 喷嘴组件10包括第一入口孔12,其容纳待从组件10选择性地发射的材料14.组件10包括具有多个孔18,20,22,24和26的出口孔16,孔口18,20,22,24和26分别由基本上 相同的元件28,30,32和34.元件28-34通过组件10协同地形成多个通道或通道40-50.居中设置的通道44比其他通道40,42,46和50相对较窄 ,并且通道42,46比最外面的通道46,50相对较窄,从而使材料14在出口孔16内的每个点或位置以基本上相似和/或均匀的速度发射。
    • 3. 发明授权
    • Nozzle assembly
    • 喷嘴总成
    • US06328226B1
    • 2001-12-11
    • US09470136
    • 1999-12-22
    • Lakhi Nandlal GoenkaMarc Alan Straub
    • Lakhi Nandlal GoenkaMarc Alan Straub
    • B05B128
    • B05B7/0075B05B7/0416
    • A nozzle 10 including a member 12 which selectively receives a first material 18 and a second material 22, and which selectively atomizes the second material 22 by use of the first material 18. The nozzle 10 further includes a diffuser member 50 which receives the atomized second material 22 and which diffuses the received and atomized second material 22 while substantially, concomitantly, and tangentially applying the first material 18 to the diffused second material 22, thereby allowing the atomized second material 22 to be desirably deposited upon a target location 7 and/or object 9.
    • 喷嘴10包括选择性地容纳第一材料18和第二材料22并且通过使用第一材料18选择性地雾化第二材料22的构件12.喷嘴10还包括扩散器构件50,其接收雾化的第二 材料22,并且在基本上伴随地并且相切地将第一材料18施加到扩散的第二材料22的同时扩散接收和雾化的第二材料22,从而允许雾化的第二材料22被期望地沉积在目标位置7和/或 对象9。
    • 7. 发明授权
    • Interposer for mounting semiconductor dice on substrates
    • 用于将半导体裸片安装在基板上的插入器
    • US06303992B1
    • 2001-10-16
    • US09347542
    • 1999-07-06
    • Cuong Van PhamFrank Burke DiPiazzaJay DeAvis BakerMarc Alan StraubVivek Amir Jairazbhoy
    • Cuong Van PhamFrank Burke DiPiazzaJay DeAvis BakerMarc Alan StraubVivek Amir Jairazbhoy
    • H01L2348
    • H01L23/473H01L2224/16225
    • An interposer 10 for electrically coupling a semiconductor die 50 to a substrate 70, comprising: an interposer body 12 made of a dielectric material and having a contact surface 14 and an opposed bonding surface 16; a plurality of contact pads 18 arranged about the periphery of the contact surface 14; a plurality of bonding pads 20 arranged across generally the entire area of the bonding surface 16; and a plurality of electrically conductive conduits 22 disposed generally within the interposer body, such that each conduit 22 connects a respective one of the contact pads 18 with a respective one of the bonding pads 20. The interposer 10 may also include: a sealed cooling channel 28 defined within the interposer body 12; a fluid medium 30 generally filling the cooling channel 28; and a piezoelectric element 26 attached to the interposer body such that the piezoelectric element communicates with the cooling channel 28 and the fluid medium 30, the piezoelectric element being operatively coupled to at least two of the electrically conductive conduits 22.
    • 一种用于将半导体管芯50电耦合到衬底70的插入器10,包括:由介电材料制成并具有接触表面14和相对的接合表面16的插入体本体12; 布置在接触表面14周围的多个接触垫18; 布置在接合表面16的整个区域的多个接合焊盘20; 以及大体上设置在插入体内部的多个导电管道22,使得每个导管22将相应的一个接触焊盘18与相应的一个接合焊盘20连接。插入器10还可以包括:密封的冷却通道 28; 通常填充冷却通道28的流体介质30; 以及压电元件26,其连接到中介体,使得压电元件与冷却通道28和流体介质30连通,压电元件可操作地耦合到至少两个导电导管22。