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    • 3. 发明授权
    • Display device and method of manufacturing the same
    • 显示装置及其制造方法
    • US08049222B2
    • 2011-11-01
    • US12582867
    • 2009-10-21
    • Woo-Sung SohnMin-Wook Park
    • Woo-Sung SohnMin-Wook Park
    • H01L29/04
    • G02F1/1333G02F2001/133354H01L27/1288
    • A display device includes first and second substrates, and first and second alignment keys. The first and second substrates have first and second display regions and first and second peripheral regions, respectively. The first alignment key is disposed in the first peripheral region of the first substrate. The first alignment key includes a first pattern and a second pattern. The second alignment key is disposed in the second peripheral region of the second substrate such that the second alignment key faces the first alignment key. As a result, first alignment key may be formed through a procedure of forming the pixel electrode. Therefore, there exists no deviation between the first alignment key and the pixel electrode and the first alignment key may be easily detected because of the first pattern that is opaque, so that misalignment is prevented.
    • 显示装置包括第一和第二基板以及第一和第二对准键。 第一和第二基板分别具有第一和第二显示区域以及第一和第二外围区域。 第一对准键设置在第一基板的第一周边区域中。 第一对准键包括第一图案和第二图案。 第二对准键设置在第二基板的第二周边区域中,使得第二对准键面向第一对准键。 结果,可以通过形成像素电极的过程来形成第一对准键。 因此,由于第一图案是不透明的,所以第一对准键和像素电极之间不存在偏差,并且可以容易地检测第一对准键,从而防止了未对准。
    • 6. 发明申请
    • CONTACT FOR SEMICONDUCTOR AND DISPLAY DEVICES
    • 联系半导体和显示设备
    • US20070296885A1
    • 2007-12-27
    • US11854059
    • 2007-09-12
    • Jang-Soo KimHyang-Shik KongMin-Wook ParkSang-Jin Jeon
    • Jang-Soo KimHyang-Shik KongMin-Wook ParkSang-Jin Jeon
    • H01L21/4763G02F1/136H01L23/52
    • G02F1/13458G02F1/136227G02F1/136286G02F2001/136236H01L27/124H01L27/1244H01L27/1288H01L29/66765
    • A device and corresponding method of fabrication thereof are disclosed, where the device provides a contact for semiconductor and display devices, the device including a substrate, a first wiring line assembly formed on the substrate, an under-layer formed on the first wiring line assembly, an organic insulating layer formed on the under-layer such that the organic insulating layer covers the under-layer, a pattern on the organic insulating layer for contact holes to expose the under-layer, etched contact holes formed in the under-layer in correspondence with the pattern such that the underlying first wiring line assembly is exposed to the outside, a cured organic insulating layer formed on the under-layer, and a second wiring line assembly formed on the organic insulating layer such that the second wiring line assembly is connected to the first wiring line assembly through the etched contact holes, and the corresponding method of fabrication including forming a first wiring line assembly on a substrate, forming an under-layer on the first wiring line assembly, forming an organic insulating layer such that the organic insulating layer covers the under-layer patterning the organic insulating layer to thereby form contact holes exposing the under-layer, etching the under-layer exposed through the contact holes such that the underlying first wiring line assembly is exposed to the outside, curing the organic insulating layer, and forming a second wiring line assembly on the organic insulating layer such that the second wiring line assembly is connected to the first wiring line assembly through the contact holes.
    • 公开了一种器件及其相应的制造方法,其中器件为半导体和显示器件提供接触,该器件包括衬底,形成在衬底上的第一布线组件,形成在第一布线组件上的底层 形成在下层上的有机绝缘层,使得有机绝缘层覆盖下层,在有机绝缘层上形成用于接触孔的图案,以暴露下层中形成的下层的蚀刻接触孔, 与图案对应,使得下面的第一布线组件暴露于外部,形成在下层上的固化的有机绝缘层和形成在有机绝缘层上的第二布线组件,使得第二布线组件是 通过蚀刻的接触孔连接到第一布线组件,以及相应的制造方法,包括形成第一布线组件 在第一布线组件上形成底层,形成有机绝缘层,使得有机绝缘层覆盖图案化有机绝缘层的下层,从而形成暴露下层,蚀刻的接触孔 所述下层通过所述接触孔暴露,使得所述下面的第一布线组件暴露于外部,固化所述有机绝缘层,以及在所述有机绝缘层上形成第二布线组合件,使得所述第二布线组件被连接 通过接触孔到第一布线组件。
    • 8. 发明申请
    • Mask for manufacturing a display substrate capable of improving image quality
    • 用于制造能够提高图像质量的显示基板的掩模
    • US20070026586A1
    • 2007-02-01
    • US11494085
    • 2006-07-26
    • Hyuk-Jin KimMin-Wook ParkIn-Woo Kim
    • Hyuk-Jin KimMin-Wook ParkIn-Woo Kim
    • H01L21/84
    • H01L27/1288G02F2001/13625G03F1/00G03F7/0007G03F7/70791H01L27/1214
    • A mask for forming a display substrate capable of improving color reproducibility by avoiding color spots and color shifts is presented. The mask includes a first sub-mask, a second sub-mask, a first overlapping portion and a second overlapping portion. The first sub-mask includes color reticles to form color pixels in a first active region of a display substrate. The second sub-mask includes color reticles to form color pixels in a second active region of the display substrate. The first overlapping portion is on a portion of the first sub-mask that overlaps the second sub-mask. The color reticles in the first overlapping portion are arranged at a different density from the rest of the first sub-mask. The second overlapping portion is on a portion of the second sub-mask that overlaps the first sub-mask. The color reticles in the second overlapping portion are arranged at a substantially same density as the first overlapping portion. Therefore, image display quality is improved.
    • 提出了一种用于形成能够通过避免颜色斑点和颜色偏移而改善颜色再现性的显示基板的掩模。 掩模包括第一子掩模,第二子掩模,第一重叠部分和第二重叠部分。 第一子掩模包括在显示基板的第一有源区域中形成彩色像素的彩色掩模版。 第二子掩模包括在显示基板的第二有源区域中形成彩色像素的色标线。 第一重叠部分在与第二子掩模重叠的第一子掩模的一部分上。 第一重叠部分中的着色掩模版布置成与第一子掩模的其余部分不同的密度。 第二重叠部分在与第一子掩模重叠的第二子掩模的一部分上。 第二重叠部分中的着色掩模版以与第一重叠部分基本相同的密度排列。 因此,图像显示质量得到改善。