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1. 发明授权

US08558158B2 Solid-state imaging device, manufacturing method and designing method thereof, and electronic device 有权
标题翻译：固态成像装置及其制造方法及其设计方法以及电子装置
公开(公告)号：US08558158B2
公开(公告)日：2013-10-15
申请号：US12915638
申请日：2010-10-29
申请人： Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
发明人： Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
IPC分类号： H01L27/148 , H01L31/0232
CPC分类号： H01L31/0232 , H01L27/14621 , H01L27/14632 , H01L27/14645 , H01L27/14685 , H01L27/14687 , H01L27/14689
摘要： A solid-state imaging device includes a semiconductor substrate, photodiodes, a first insulating film, a second insulating film, a third insulating film, and a color filter. The photodiodes are disposed on the semiconductor substrate. The first insulating film covers a multilayer wiring on the semiconductor substrate. The first insulating film comprises a material having a first refractive index lower than a refractive index of the semiconductor substrate for at least bottom surface and top surface portions of the first insulating film. The second insulating film has a second refractive index higher than the first refractive index. The third insulating film has a third refractive index higher than the second refractive index.
摘要翻译：固体摄像器件包括半导体衬底，光电二极管，第一绝缘膜，第二绝缘膜，第三绝缘膜和滤色器。光电二极管设置在半导体衬底上。第一绝缘膜覆盖半导体衬底上的多层布线。第一绝缘膜包括至少第一绝缘膜的底表面和顶表面部分具有低于半导体衬底的折射率的第一折射率的材料。第二绝缘膜具有比第一折射率高的第二折射率。第三绝缘膜具有比第二折射率高的第三折射率。

2. 发明申请

US20110108705A1 SOLID-STATE IMAGING DEVICE, MANUFACTURING METHOD AND DESIGNING METHOD THEREOF, AND ELECTRONIC DEVICE 有权
标题翻译：固态成像装置，制造方法及其设计方法及电子装置
公开(公告)号：US20110108705A1
公开(公告)日：2011-05-12
申请号：US12915638
申请日：2010-10-29
申请人： Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
发明人： Kyoko Izuha , Hiromi Okazaki , Yoshiaki Kitano
IPC分类号： H01L27/146 , H01L31/0232 , H01L31/18
CPC分类号： H01L31/0232 , H01L27/14621 , H01L27/14632 , H01L27/14645 , H01L27/14685 , H01L27/14687 , H01L27/14689
摘要： A solid-state imaging device includes: a semiconductor substrate that includes a photodiode separately provided for each of pixels disposed in a matrix on a light-receiving surface; a first insulating film formed on the semiconductor substrate so as to cover multilayer wiring formed on and in contact with the semiconductor substrate, wherein the first insulating film is formed using material of a first refractive index lower than a refractive index of the semiconductor substrate for at least bottom surface and top surface portions of the first insulating film; a second insulating film of a second refractive index higher than the first refractive index formed on the first insulating film; a third insulating film of a third refractive index higher than the second refractive index formed on the second insulating film; and a color filter formed on the third insulating film in a corresponding manner with each pixel so as to transmit light in a wavelength region of red, green, or blue.
摘要翻译：一种固态成像装置，包括：半导体基板，包括：分别设置在光接收表面上的矩阵中设置的每个像素的光电二极管; 第一绝缘膜，形成在半导体衬底上，以便覆盖在半导体衬底上形成并与其接触的多层布线，其中第一绝缘膜使用低于半导体衬底的折射率的第一折射率的材料形成，所述第一绝缘膜的最小底表面和顶表面部分; 第二绝缘膜，其具有高于形成在所述第一绝缘膜上的所述第一折射率的第二折射率; 第三绝缘膜，其具有高于形成在所述第二绝缘膜上的所述第二折射率的第三折射率; 以及以与每个像素相应的方式形成在第三绝缘膜上的滤色器，以便透射红色，绿色或蓝色的波长区域中的光。

3. 发明授权

US08847135B2 Solid-state imaging device, driving method thereof and electronic apparatus 有权
标题翻译：固态成像装置，其驱动方法和电子装置
公开(公告)号：US08847135B2
公开(公告)日：2014-09-30
申请号：US13185170
申请日：2011-07-18
申请人： Kyoko Izuha , Kouichi Harada
发明人： Kyoko Izuha , Kouichi Harada
IPC分类号： H01L27/00 , H01L27/146
CPC分类号： H04N5/3698 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14625 , H01L27/14667
摘要： A solid-state imaging device includes: a semiconductor substrate including a light receiving surface which is divided according to pixels arranged in a matrix shape and is formed with a photoelectric converting section; an electrochromic film which is formed on the semiconductor substrate on a light incident path corresponding to the photoelectric converting section, in a portion of pixels selected from the pixels, and has light transmittance changing from a first transmittance to a second transmittance according to voltage applied thereto; a lower electrode which is formed below the electrochromic film; and an upper electrode which is formed above the electrochromic film.
摘要翻译：一种固态成像装置，包括：半导体衬底，其包括根据以矩阵形状排列的像素分割并形成有光电转换部的受光面; 在从所述像素中选择的像素的一部分中，在与所述光电转换部对应的光入射路径上形成在所述半导体基板上的电致变色膜，并且根据施加到所述电致变色膜的电压具有从第一透射率向第二透射率变化的透光率 ; 形成在电致变色膜下面的下电极; 以及形成在电致变色膜上方的上电极。

4. 发明申请

US20120025061A1 SOLID-STATE IMAGING DEVICE, DRIVING METHOD THEREOF AND ELECTRONIC APPARATUS 有权
标题翻译：固态成像装置，其驱动方法和电子装置
公开(公告)号：US20120025061A1
公开(公告)日：2012-02-02
申请号：US13185170
申请日：2011-07-18
申请人： Kyoko Izuha , Kouichi Harada
发明人： Kyoko Izuha , Kouichi Harada
IPC分类号： H01L27/146 , H01L31/0232
CPC分类号： H04N5/3698 , H01L27/14603 , H01L27/14609 , H01L27/14621 , H01L27/14625 , H01L27/14667
摘要： A solid-state imaging device includes: a semiconductor substrate including a light receiving surface which is divided according to pixels arranged in a matrix shape and is formed with a photoelectric converting section; an electrochromic film which is formed on the semiconductor substrate on a light incident path corresponding to the photoelectric converting section, in a portion of pixels selected from the pixels, and has light transmittance changing from a first transmittance to a second transmittance according to voltage applied thereto; a lower electrode which is formed below the electrochromic film; and an upper electrode which is formed above the electrochromic film.
摘要翻译：一种固态成像装置，包括：半导体衬底，其包括根据以矩阵形状排列的像素分割并形成有光电转换部的受光面; 在从所述像素中选择的像素的一部分中，在与所述光电转换部对应的光入射路径上形成在所述半导体基板上的电致变色膜，并且根据施加到所述电致变色膜的电压具有从第一透射率向第二透射率变化的透光率 ; 形成在电致变色膜下面的下电极; 以及形成在电致变色膜上方的上电极。

5. 发明授权

US07925090B2 Method of determining photo mask, method of manufacturing semiconductor device, and computer program product 失效
标题翻译：确定光掩模的方法，制造半导体器件的方法以及计算机程序产品
公开(公告)号：US07925090B2
公开(公告)日：2011-04-12
申请号：US11601797
申请日：2006-11-20
申请人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
发明人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
IPC分类号： G06K9/34
CPC分类号： G03F7/70441
摘要： A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.
摘要翻译：一种确定光掩模的方法包括：为第一曝光装置指定用于光掩模的掩模图案，指定允许为第二曝光装置设置的多个曝光条件，预测要投影的掩模图案的投影图像在第二曝光装置的基板上，对于每个曝光条件，对于每个曝光条件，基于投影图像预测要在基板表面上形成的处理图案，确定处理图案是否满足对于每个曝光条件的预定条件，并且如果处理的图案满足至少一个曝光条件的预定条件，则确定光掩模适用于第二曝光装置。

6. 发明授权

US07788626B2 Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing method 有权
标题翻译：图案数据校正方法，图案检查方法，图案检查程序，光掩模制造方法和半导体器件制造方法
公开(公告)号：US07788626B2
公开(公告)日：2010-08-31
申请号：US11138407
申请日：2005-05-27
申请人： Shigeki Nojima , Satoshi Tanaka , Toshiya Kotani , Kyoko Izuha , Soichi Inoue
发明人： Shigeki Nojima , Satoshi Tanaka , Toshiya Kotani , Kyoko Izuha , Soichi Inoue
IPC分类号： G06F17/50
CPC分类号： G03F1/36
摘要： A pattern data correction method is disclosed, which comprises preparing an integrated circuit pattern, setting a tolerance to the pattern that is allowable error range when the pattern is transferred on a substrate, creating a target pattern within the tolerance, and making correction for the target pattern to make a first correction pattern under a predetermined condition.
摘要翻译：公开了一种图案数据校正方法，其包括：准备集成电路图案，在图案在衬底上传送时设定容许误差范围的容许度，在公差内产生目标图案，并对目标进行校正模式以在预定条件下进行第一校正模式。

7. 发明申请

US20070130560A1 Method of determining photo mask, method of manufacturing semiconductor device, and computer program product 失效
标题翻译：确定光掩模的方法，制造半导体器件的方法以及计算机程序产品
公开(公告)号：US20070130560A1
公开(公告)日：2007-06-07
申请号：US11601797
申请日：2006-11-20
申请人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
发明人： Toshiya Kotani , Kazuya Fukuhara , Kyoko Izuha
IPC分类号： G06F17/50
CPC分类号： G03F7/70441
摘要： A method of determining a photo mask, includes specifying a mask pattern for a photo mask for a first exposure apparatus, specifying a plurality of exposure conditions allowed to be set for a second exposure apparatus, predicting a projection image of the mask pattern to be projected on a substrate by the second exposure apparatus, for each of the exposure conditions, predicting a processed pattern to be formed on a substrate surface on the basis of the projection image, for each of the exposure conditions, determining whether or not the processed pattern meets a predetermined condition for each of the exposure conditions, and determining that the photo mask is applicable to the second exposure apparatus if the processed pattern meets the predetermined condition for at least one of the exposure conditions.
摘要翻译：一种确定光掩模的方法包括：为第一曝光装置指定用于光掩模的掩模图案，指定允许为第二曝光装置设置的多个曝光条件，预测要投影的掩模图案的投影图像在第二曝光装置的基板上，对于每个曝光条件，对于每个曝光条件，基于投影图像预测要在基板表面上形成的处理图案，确定处理图案是否满足对于每个曝光条件的预定条件，并且如果处理的图案满足至少一个曝光条件的预定条件，则确定光掩模适用于第二曝光装置。

8. 发明授权

US07108945B2 Photomask having a focus monitor pattern 失效
公开(公告)号：US07108945B2
公开(公告)日：2006-09-19
申请号：US10396309
申请日：2003-03-26
申请人： Takumichi Sutani , Kyoko Izuha , Tadahito Fujisawa , Soichi Inoue
发明人： Takumichi Sutani , Kyoko Izuha , Tadahito Fujisawa , Soichi Inoue
IPC分类号： G01F9/00
CPC分类号： G03F7/70641 , G03F1/44
摘要： A photomask has a device pattern, which has an opening portion and a mask portion, and either a focus monitor pattern or an exposure dose monitor pattern, which has an opening portion and a mask portion and which has the same plane pattern shape as at least a partial region of a device pattern. The phase difference in transmitted exposure light between the opening portion and the mask portion of the focus monitor pattern is different from that between the opening portion and the mask portion of the device pattern. The opening portion of the exposure dose monitor pattern has a different exposure dose transmittance from that of the opening portion of the device pattern.

9. 发明授权

US09786410B2 Transparent conductive film, heater, touch panel, solar battery, organic EL device, liquid crystal device, and electronic paper 有权
公开(公告)号：US09786410B2
公开(公告)日：2017-10-10
申请号：US14005976
申请日：2012-03-21
申请人： Keisuke Shimizu , Toshiyuki Kobayashi , Nozomi Kimura , Kyoko Izuha
发明人： Keisuke Shimizu , Toshiyuki Kobayashi , Nozomi Kimura , Kyoko Izuha
IPC分类号： B32B3/24 , H01B5/00 , G02F1/1343 , H05B3/14 , H01L51/44 , H01L31/0224 , G06F3/044 , G06F3/045 , H01L51/52 , H05B3/06 , C01B31/04 , B82Y30/00 , B82Y40/00 , B29D11/00 , G02F1/167 , H01M14/00 , G02F1/1333
CPC分类号： H01B5/00 , B29D11/00788 , B82Y30/00 , B82Y40/00 , C01B32/186 , C01B2204/02 , G02B2207/121 , G02F1/13338 , G02F1/133382 , G02F1/13439 , G02F2001/1676 , G02F2201/121 , G02F2202/16 , G02F2203/01 , G06F3/044 , G06F3/045 , G06F2203/04103 , H01L31/022425 , H01L31/022466 , H01L51/442 , H01L51/5209 , H01L51/5215 , H01L51/5234 , H01M14/005 , H05B3/06 , H05B3/145 , H05B2214/04 , Y02E10/549 , Y10T428/24273 , Y10T428/24479 , Y10T428/24802
摘要： There are provided a transparent conductive film, as well as a heater, a touch panel, a solar battery, an organic EL device, a liquid crystal device, and an electronic paper that are provided with the transparent conductive film, the transparent conductive film being capable of easing a decline in optical transmittance when graphene is laminated, and of achieving optical transmittance higher than an upper limit of optical transmittance of a single layer of graphene. The transparent conductive film includes a single-layered conductive graphene sheet. The single-layered conductive graphene sheet includes a first region and a second region, the first region being configured of graphene, and the second region being surrounded by the first region and having optical transmittance that is higher than optical transmittance of the first region.

10. 发明授权

US09177984B2 Solid-state imaging device and electronic apparatus having a solid-state imaging device 有权
标题翻译：固态成像装置和具有固态成像装置的电子装置
公开(公告)号：US09177984B2
公开(公告)日：2015-11-03
申请号：US13421161
申请日：2012-03-15
申请人： Kyoko Izuha , Keisuke Shimizu , Toshiyuki Kobayashi , Nozomi Kimura
发明人： Kyoko Izuha , Keisuke Shimizu , Toshiyuki Kobayashi , Nozomi Kimura
IPC分类号： H04N5/335 , H01L27/146 , H01L27/148
CPC分类号： H01L27/14621 , H01L27/14623 , H01L27/14625 , H01L27/14643 , H01L27/14685 , H01L27/14806
摘要： A solid-state imaging device includes: a substrate; a photoelectric conversion unit that is formed on the substrate and generates signal charge in correspondence with a light amount of incident light; and a transparent electrode that is formed in an upper portion of the substrate and includes a first area formed from a nano carbon material and a second area that is brought into contact with the first area and has light transmittance higher than that of the first area.
摘要翻译：固态成像装置包括：基板; 光电转换单元，其形成在所述基板上，并且与入射光的光量对应地产生信号电荷; 以及透明电极，其形成在所述基板的上部，并且包括由纳米碳材料形成的第一区域和与所述第一区域接触并且具有比所述第一区域的透光率高的透光性的第二区域。

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