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1. 发明授权

US5451931A Optical smoke detector 失效
标题翻译：光学烟雾探测器
公开(公告)号：US5451931A
公开(公告)日：1995-09-19
申请号：US120947
申请日：1993-09-14
申请人： Kurt Muller , Peter Ryser , Dieter Wieser , Rino E. Kunz , Markus Rossi , Michael T. Gale
发明人： Kurt Muller , Peter Ryser , Dieter Wieser , Rino E. Kunz , Markus Rossi , Michael T. Gale
IPC分类号： G08B17/107 , G08B17/00
CPC分类号： G08B17/107 , G08B17/113
摘要： Optical smoke detectors such as extinction smoke detectors and scattered-light smoke detectors include a radiation source, a radiation detector or receiver, and a measurement volume which is in communication with ambient atmosphere and which is traversed by a light path from the radiation source to the radiation receiver. For compactness and simplicity, such an optical smoke detector is provided with a planar-optical element in the optical path. Suitable as planar-optical elements are diffractive elements, e.g., holographic-optical elements (HOE), and micro-Fresnel elements (MFE), e.g., micro-Fresnel reflectors (MFR).
摘要翻译：诸如灭火烟雾探测器和散射烟雾探测器之类的光学烟雾探测器包括辐射源，辐射探测器或接收器以及与环境大气连通的测量体积，其通过从辐射源到辐射接收器。为了紧凑和简单，这种光学烟雾探测器在光路中设置有平面光学元件。适合作为平面光学元件是衍射元件，例如全息光学元件（HOE）和微菲涅耳元件（MFE），例如微菲涅耳反射器（MFR）。

2. 发明授权

US4663524A Apparatus for measuring parameters of light spots with a moving knife-edge mask 失效
标题翻译：用移动的刀刃掩模测量光斑参数的装置
公开(公告)号：US4663524A
公开(公告)日：1987-05-05
申请号：US823017
申请日：1986-01-27
申请人： Michael T. Gale , Heinrich Meier
发明人： Michael T. Gale , Heinrich Meier
IPC分类号： G01J1/42 , H01J3/14
CPC分类号： G01J1/4257
摘要： A two-dimensional knife edge mask comprised of an array of spaced periodic rectangular opaque regions (e.g., a chrome grating pattern layer deposited on one surface of a slide) separated by transparent different given spacing stripes between adjacent rectangular regions in each of the two orthogonal dimensions thereof, is linearly moved at a fixed velocity across an incident light spot, the direction of movement being oblique to the orthogonal dimensions of the rectangular regions and the distance of movement being sufficient to traverse at least one entire spacing strips in each of the two orthogonal dimensions. A photocell (which may be secured to the other side of the slide) senses the occulted light.
摘要翻译：二维刀刃掩模由两个间隔的周期性矩形不透明区域（例如，沉积在载玻片的一个表面上的镀铬光栅图案层）阵列组成，在两个正交的每一个中的相邻矩形区域之间分开的透明不同的给定间隔条纹其尺寸以穿过入射光点的固定速度线性移动，移动方向与矩形区域的正交尺寸倾斜，并且移动距离足以穿过两者中的每一个中的至少一个整个间隔条正交尺寸。光电管（其可以固定到幻灯片的另一侧）感测到隐蔽的光。

3. 发明授权

US4523850A System for positioning a body 失效
标题翻译：用于定位身体的系统
公开(公告)号：US4523850A
公开(公告)日：1985-06-18
申请号：US434316
申请日：1982-10-14
申请人： Robert L. Covey , Michael T. Gale
发明人： Robert L. Covey , Michael T. Gale
IPC分类号： G11B3/56 , G11B21/00 , G05D1/10
CPC分类号： G11B3/56 , G11B21/00
摘要： A system for positioning a body having two opposed edges and having a first axis oriented to pass through the two edges. A beam of light oriented along a second axis orthogonal to the first axis images one or both of the edges onto all or a portion of a photodetector array which is aligned in a direction parallel to the first axis. The array is scanned to obtain a light intensity transition profile of all or part of the projected image whereby the profile has either one or two 50% intensity points. The body is then shifted until both of the 50% intensity points strike predetermined locations on the array indicating that both the edges are included in the image. The body is shifted along the first axis until the fifty percent (50%) intensity point along the transition profile strikes a predetermined location along the photodetector array. The body is also moved along the second axis until the slope of the intensity transition profile is maximized, thereby obtaining an in-focus position. The body is then translated along a third axis, substantially orthogonal to the first and the second axes, until the minimum in the intensity transition profile drops to a predetermined percent of the full intensity value.
摘要翻译：一种用于定位具有两个相对边缘并具有定向成穿过两个边缘的第一轴线的主体的系统。沿着与第一轴正交的第二轴定向的光束将一个或两个边缘映像到在与第一轴平行的方向上对齐的光电检测器阵列的全部或一部分上。扫描阵列以获得投影图像的全部或部分的光强度转变轮廓，由此轮廓具有一个或两个50％的强度点。然后移动身体，直到50％的强度点都撞击阵列上的预定位置，指示两个边缘都包括在图像中。主体沿着第一轴移动，直到沿着转换轮廓的50％（50％）强度点沿着光电检测器阵列撞击预定位置。主体也沿着第二轴线移动，直到强度转换轮廓的斜率最大化，从而获得对焦位置。然后，主体沿着与第一和第二轴基本正交的第三轴平移，直到强度转变轮廓中的最小值下降到全强度值的预定百分比。

4. 发明授权

US4585513A Method for removing glass support from semiconductor device 失效
标题翻译：从半导体器件上去除玻璃支架的方法
公开(公告)号：US4585513A
公开(公告)日：1986-04-29
申请号：US696465
申请日：1985-01-30
申请人： Michael T. Gale , Martin Ebnother , Helmut Schuetz
发明人： Michael T. Gale , Martin Ebnother , Helmut Schuetz
IPC分类号： C03C15/00 , H01L21/311 , H01L21/58 , B44C1/22 , C03C25/06
CPC分类号： H01L24/83 , C03C15/00 , H01L21/31111 , H01L24/29 , H01L2224/2919 , H01L2224/8319 , H01L2224/8385 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01033 , H01L2924/01072 , H01L2924/01074 , H01L2924/01078 , H01L2924/0665 , H01L2924/07802 , Y10S438/977
摘要： A CCD imager includes a thin semiconductor substrate having a glass support mounted in a recess in a housing with a portion of the glass support being exposed through a window opening in the bottom of the housing recess. A portion of the glass support is removed by securing a glass backing plate to the other surface of the silicon substrate, filling the housing recess with an epoxy material and applying a layer of an epoxy over the filling material and the backing plate. An etch resistance masking tape is placed across the center portion of the exposed surface of the glass support leaving the portions of the glass support at the corners of the housing opening exposed. The exposed portions of the glass support at the corners of the housing opening are pre-etched with a suitable etchant. The masking material is removed from the center portion of the glass support surface and the remaining portion of the glass support exposed through the housing opening is etched away to expose the surface of the silicon substrate.
摘要翻译： CCD成像器包括薄的半导体衬底，其具有安装在壳体中的凹部中的玻璃支撑件，其中一部分玻璃支撑件通过壳体凹部的底部中的窗口露出。玻璃支撑件的一部分通过将玻璃背板固定到硅基板的另一个表面上，用环氧树脂材料填充壳体凹槽并在填充材料和背板上施加一层环氧树脂来去除。将耐蚀刻遮蔽胶带放置在玻璃支架的暴露表面的中心部分上，将玻璃支撑件的部分暴露在外壳开口的角部处。在壳体开口的角部处的玻璃支撑件的暴露部分用合适的蚀刻剂预蚀刻。掩模材料从玻璃支撑表面的中心部分去除，并且通过外壳开口露出的玻璃支架的剩余部分被蚀刻掉以露出硅衬底的表面。

5. 发明授权

US4576439A Reflective diffractive authenticating device 失效
$Reflective diffractive authenticating device$
标题翻译：反射衍射鉴别装置
公开(公告)号：US4576439A
公开(公告)日：1986-03-18
申请号：US520824
申请日：1983-08-05
申请人： Michael T. Gale , Karl H. Knop , Martin Ebnother
发明人： Michael T. Gale , Karl H. Knop , Martin Ebnother
IPC分类号： G06K19/06 , B42D15/10 , B44F1/12 , G03F7/09 , G06K19/10 , G07F7/08 , G09F3/00 , G02B5/18 , B32B3/30
CPC分类号： B42D25/45 , B42D25/328 , B42D25/373 , B42D25/425 , G07F7/086 , G09F3/00 , B42D2033/04 , B42D2033/10 , B42D2033/32 , B42D2035/02 , B42D2035/08 , G03H1/0011 , G03H2001/0288 , G03H2250/36 , Y10S283/902
摘要： A reflective-diffractive coating layer, situated at the interface between a substrate layer and an overcoat layer of the device, is divided into a set of small, slightly separated regions. This allows a direct bond of the overcoat layer to the substrate layer within the separation areas, which direct bond provides a more secure bond than that provided by a bond of the coating layer to the substrate and overcoat layers.
摘要翻译：位于设备的基底层和覆盖层之间的界面处的反射衍射涂层被分成一组小的稍微分离的区域。这允许外涂层与分离区域内的基底层的直接结合，该直接结合提供比由涂层与基底和外涂层的粘合提供的粘合更牢固的粘合。

6. 发明授权

US4417784A Multiple image encoding using surface relief structures as authenticating device for sheet-material authenticated item 失效
标题翻译：使用表面浮雕结构的多图像编码作为片材认证项目的认证装置
公开(公告)号：US4417784A
公开(公告)日：1983-11-29
申请号：US236111
申请日：1981-02-19
申请人： Karl H. Knop , Michael T. Gale
发明人： Karl H. Knop , Michael T. Gale
IPC分类号： G02B3/00 , G06K19/16 , G07F7/08 , G09F3/00 , G02B5/18 , G09F3/03
CPC分类号： G02B3/005 , G06K19/16 , G07F7/086 , G09F3/00 , G02B3/0031 , Y10S428/916
摘要： An authenticating device comprises a transparent material, such as a plastic, having a thickness no greater than 100 micrometers embossed on one side with a lenticular array of lenslets having focal lengths substantially equal to this thickness, and embossed on the other side with a reflective relief pattern forming a periodic structure periods smaller than 100 micrometers, which periods are of a width that at least approximates that of the lenslets. The reflective relief structure of the authenticating device is secured to a viewable surface of the authenticated item sheet material and each period of the relief structure is comprised of a set of juxtaposed elements having significantly different reflective characteristics from one another.
摘要翻译：认证装置包括透明材料，例如塑料，具有不大于100微米厚度的透明材料，在一侧压花，具有基本上等于该厚度的焦距的透镜状透镜阵列，并且在另一侧上用反射浮雕形成小于100微米的周期性结构周期，该周期的宽度至少近似于小透镜的宽度。认证装置的反射性浮雕结构被固定在认证物品片材的可视表面上，并且浮雕结构的每个周期由彼此具有显着不同的反射特性的一组并置元件组成。

7. 发明授权

US4945501A Method for determining position within the measuring volume of a coordinate measuring machine and the like and system therefor 失效
标题翻译：用于确定坐标测量机等的测量体积内的位置的方法及其系统
公开(公告)号：US4945501A
公开(公告)日：1990-07-31
申请号：US338378
申请日：1989-04-12
申请人： Frederick K. Bell , Stephen N. Brown , Michael T. Gale
发明人： Frederick K. Bell , Stephen N. Brown , Michael T. Gale
IPC分类号： G01B7/008 , G01B21/04
CPC分类号： G01B7/008 , G01B21/045
摘要： Axis correction or machine charateristic data is stored (108) in memory (110) within a control or measurement processor (36) of a CMM (10) (FIG. 8). The axis correction data includes error data representing 21 different geometry errors (FIG. 4A through 4C) of the CMM. As position information is required, the measurement processor captures the actual position signal from each machine axis sensor and uses this position signal to locate (112) a set of the axis correction data which describes the machine characteristics at that position. The measurement processor then mathematically combines (114) (FIG. 9) the position signal with the subset of axis correction data to obtain a corrected position signal having a corrected set of cooridinate values which describe the probe position in a true Cartesian coordinate system.
摘要翻译：轴校正或机器特征数据（108）存储在CMM（10）（图8）的控制或测量处理器（36）内的存储器（110）中。轴校正数据包括表示CMM的21个不同几何误差（图4A至4C）的误差数据。当需要位置信息时，测量处理器捕获来自每个机器轴传感器的实际位置信号，并使用该位置信号来定位（112）描述该位置处的机器特性的一组轴校正数据。然后，测量处理器将位置信号与轴校正数据的子集数学地组合（114）（图9）以获得具有描述在真笛卡尔坐标系中的探针位置的校正的一组校正值的校正位置信号。

8. 发明授权

US4157220A Technique for recording micropicture-information on a diffractive subtractive filter embossing master 失效
$Technique for recording micropicture-information on a diffractive subtractive filter embossing master$
标题翻译：用于在衍射减法过滤器压花母版上记录微图像信息的技术
公开(公告)号：US4157220A
公开(公告)日：1979-06-05
申请号：US897027
申请日：1978-04-17
申请人： Michael T. Gale , Karl Knop
发明人： Michael T. Gale , Karl Knop
IPC分类号： G03C7/00 , G03B27/00 , G03B27/02 , G03B27/76
CPC分类号： G03C7/00
摘要： A group of separate large-size color or black-and-white pictures to be recorded on a master as very finely-screened (e.g. 10 micrometer period) micropictures in a given format, such as microfiche, are first reduced to a continuous-tone first recording at an intermediate size on a medium, such as 70 millimeter film. Then a relatively fine-screened (e.g. 40 micrometer period), high-contrast second recording, made from the first recording by contact printing, is reduced to micropicture size in the given format.
摘要翻译：首先将以一定格式（例如缩微胶片）非常细微（例如10微米）周期）微图像记录在主机上的一组单独的大尺寸彩色或黑白图像首先被还原成连续色调首先在中等尺寸的介质上记录，例如70毫米的胶片。然后，通过接触印刷由第一次记录制成的相对精细的屏幕（例如40微米的周期），高对比度的第二记录被减小到给定格式的微图像尺寸。

9. 发明授权

US4155627A Color diffractive subtractive filter master recording comprising a plurality of superposed two-level relief patterns on the surface of a substrate 失效
$Color diffractive subtractive filter master recording comprising a plurality of superposed two-level relief patterns on the surface of a substrate$
标题翻译：彩色衍射减法过滤器主记录包括在基板表面上的多个叠加的二级浮雕图案
公开(公告)号：US4155627A
公开(公告)日：1979-05-22
申请号：US862835
申请日：1977-12-21
申请人： Michael T. Gale , Hans W. Lehmann , Roland W. Widmer
发明人： Michael T. Gale , Hans W. Lehmann , Roland W. Widmer
IPC分类号： G02B5/18 , G02B5/20 , G02B27/44 , G03C7/00 , G02B27/38
CPC分类号： G02B27/4238 , G02B5/1857 , G02B5/203 , G03C7/00
摘要： Superposed fine-detail multi-level patterns (e.g., superposed diffraction gratings having specified line spacing dimensions less than 10 micrometers and specified depth dimensions less than 5 micrometers) can be fabricated by linearly adding (e.g., by evaporation) an additional two-level pattern to an existent multi-level pattern or, alternatively, by linearly subtracting (e.g., by sputter or plasma etching) an additional two-level pattern to an existent multi-level pattern.
摘要翻译：可以通过线性添加（例如，通过蒸发）附加的两级图案来制造叠加的细细多层图案（例如，具有小于10微米的特定线间隔尺寸和特定深度尺寸小于5微米的叠置衍射光栅）或者通过线性地减去（例如，通过溅射或等离子体蚀刻）附加的两电平图案到现有的多电平图案。

10. 发明授权

US4668080A Method and apparatus for forming large area high resolution patterns 失效
标题翻译：用于形成大面积高分辨率图案的方法和装置
公开(公告)号：US4668080A
公开(公告)日：1987-05-26
申请号：US803006
申请日：1985-11-29
申请人： Michael T. Gale , Hans P. Kleinknecht , Karl H. Knop
发明人： Michael T. Gale , Hans P. Kleinknecht , Karl H. Knop
IPC分类号： G02F1/1362 , G03F7/20 , G03B27/48 , G03B27/50 , G03B27/70
CPC分类号： G03F7/70283 , G03F7/2002 , G03F7/70383 , G03F7/70791 , G02F2001/13625
摘要： A high resolution periodic pattern is formed in a layer of a photosensitive material by means of a beam of light and a lenticular array formed of a plurality of lenslets. The lenticular array is positioned over the layer and the beam of light is directed through the lenticular array onto the layer. The beam of light is scanned across the lenticular array to pass through the individual lenslets which defines the light into a fine beam and thereby exposes a small area of the layer. The beam is shaped to achieve a periodic pattern in the layer as the beam scans across the layer. By moving the layer in synchronism with the scanning, a two dimensional array of the pattern can be obtained.
摘要翻译：通过由多个透镜形成的光束和透镜阵列在感光材料层中形成高分辨率周期图案。透镜阵列位于层上，光束被引导通过透镜阵列到层上。光束被扫描穿过双凸透镜阵列以通过各个小透镜，其将光限定为精细光束，从而暴露该层的小面积。光束被成形为当光束扫过该层时在层中实现周期性图案。通过与扫描同步地移动层，可以获得图案的二维阵列。

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