专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US06902622B2 Systems and methods for epitaxially depositing films on a semiconductor substrate 有权
标题翻译：在半导体衬底上外延沉积膜的系统和方法
公开(公告)号：US06902622B2
公开(公告)日：2005-06-07
申请号：US10120186
申请日：2002-04-10
申请人： Kristian E. Johnsgard , David E. Sallows , Daniel L. Messineo , Robert D. Mailho , Mark W. Johnsgard
发明人： Kristian E. Johnsgard , David E. Sallows , Daniel L. Messineo , Robert D. Mailho , Mark W. Johnsgard
IPC分类号： C23C16/44 , C23C16/455 , C23C16/458 , C23C16/46 , C30B25/08 , C30B25/14 , H01L21/00 , H01L21/205 , H01L21/687 , C23C16/00
CPC分类号： C23C16/45504 , C23C16/455 , C23C16/45519 , C23C16/45578 , C23C16/4584 , C23C16/46 , C30B25/08 , C30B25/14 , H01L21/67017 , H01L21/6715 , H01L21/68742 , H01L21/68771 , H01L21/68785
摘要： Systems and methods for epitaxial deposition. The reactor includes a hot wall process cavity enclosed by a heater system, a thermal insulation system, and chamber walls. The walls of the process cavity may comprises a material having a substantially similar coefficient thermal expansion as the semiconductor substrate, such as quartz and silicon carbide, and may include an isothermal or near isothermal cavity that may be heated to temperatures as high as 1200 degrees C. Process gases may be injected through a plurality of ports, and are capable of achieving a fine level of distribution control of the gas components, including the film source gas, dopant source gas, and carrier gas. The gas supply system includes additional methods of delivering gas to the process cavity, such as through temperature measurement devices, and through a showerhead.
摘要翻译：用于外延沉积的系统和方法。反应器包括由加热器系统，隔热系统和室壁包围的热壁工艺空腔。工艺空腔的壁可以包括具有与半导体衬底（例如石英和碳化硅）基本相似的系数热膨胀的材料，并且可以包括可被加热到高达1200℃的温度的等温或近等温腔可以通过多个端口注入工艺气体，并且能够实现气体组分（包括膜源气体，掺杂剂源气体和载气）的分布控制的精细水平。气体供应系统包括将气体输送到过程腔的附加方法，例如通过温度测量装置，以及通过喷头。

2. 发明授权

US06301434B1 Apparatus and method for CVD and thermal processing of semiconductor substrates 失效
标题翻译：用于半导体衬底的CVD和热处理的装置和方法
公开(公告)号：US06301434B1
公开(公告)日：2001-10-09
申请号：US09274815
申请日：1999-03-22
申请人： James McDiarmid , Kristian E. Johnsgard , Steven E. Parks , Mark W. Johnsgard
发明人： James McDiarmid , Kristian E. Johnsgard , Steven E. Parks , Mark W. Johnsgard
IPC分类号： F26B1900
CPC分类号： H01L21/67115 , C23C16/4404 , C23C16/481 , C23C16/488
摘要： A thermal processing system and method for processing a semiconductor substrate. A lamp system radiates through a window to heat the substrate. A dual gas manifold provides purge gas through a top showerhead to prevent deposits on the window and provides gas through a lower showerhead to deposit a material on the substrate. A thin support and a radiative cavity with thin radiation shields is used to support and insulate the substrate. A peripheral heater also heats the edges to enhance uniformity. An opaque quartz liner is used to reduce contaminants and undesired deposits and simplify cleaning.
摘要翻译：一种用于处理半导体衬底的热处理系统和方法。灯系统通过窗口辐射以加热基板。双气体歧管通过顶部淋浴头提供净化气体，以防止窗户上的沉积物，并通过下部喷头提供气体以将材料沉积在基底上。使用薄支撑和具有薄辐射屏蔽的辐射腔来支撑和绝缘基板。外围加热器还加热边缘以增强均匀性。使用不透明的石英衬垫来减少污染物和不期望的沉积物并简化清洁。

3. 发明授权

US4986838A Inlet system for gas scrubber 失效
标题翻译：气体洗涤器入口系统
公开(公告)号：US4986838A
公开(公告)日：1991-01-22
申请号：US365887
申请日：1989-06-14
申请人： Mark W. Johnsgard
发明人： Mark W. Johnsgard
IPC分类号： B01D47/06
CPC分类号： B01D47/06
摘要： An effluent gas scrubbing system is disclosed having an improved scrubber inlet system including a transition tube having a fluted lower portion for directing particulate carrying gas into the mist saturated scrubbing chamber of a gas scrubber, a fluid reservoir affixed to the upper portion of the transition tube and having a plurality of fluid supply jets tangentially positioned along internal cavity forming walls of the reservoir so as to cause the fluid within the internal cavity of the reservoir to swirl, and a readily interchangeable gas inlet pipe which is co-axially positioned within the cavity and with respect to the transition tube so as to create a transition gap between the transition tube and the inlet pipe through which a swirling flow of fluid may exit the cavity and enter the upper portion of the transition tube so as to thoroughly coat the entire length of the transition tube with fluid, and so as to provide a smooth and abrupt transition between the dry-walled inlet pipe and the wet-walled transition tube.
摘要翻译：公开了一种排气气体洗涤系统，其具有改进的洗涤器入口系统，该系统包括具有槽纹下部的过渡管，用于将颗粒携带气体引导到气体洗涤器的雾化饱和洗涤室中，固定到过渡管的上部的流体储存器并且具有多个沿储存器的内腔形成腔切向定位的流体供应喷嘴，以便使储存器的内腔内的流体旋转;以及易于互换的气体入口管，其同轴地定位在腔体内并且相对于过渡管，以便在过渡管和入口管之间产生过渡间隙，通过该过渡管可以使流动的流动流出腔并进入过渡管的上部，以彻底地涂覆整个长度的过渡管，并且在干壁入口pi之间提供平滑和突然的过渡 pe和湿壁过渡管。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式