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1. 发明申请

US20070154824A1 METHOD AND PROGRAM FOR CALCULATING EXPOSURE DOSE AND FOCUS POSITION IN EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 失效
标题翻译：用于计算曝光装置中曝光剂量和聚焦位置的方法和程序以及装置制造方法
公开(公告)号：US20070154824A1
公开(公告)日：2007-07-05
申请号：US11618137
申请日：2006-12-29
申请人： Koichi Sentoku , Hideki Ina , Koji Mikami , Yoshiaki Sugimura , Hiroto Yoshii , Tomoyuki Miyashita
发明人： Koichi Sentoku , Hideki Ina , Koji Mikami , Yoshiaki Sugimura , Hiroto Yoshii , Tomoyuki Miyashita
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70641 , G03F7/70625
摘要： A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.
摘要翻译：用于计算经由原稿曝光基板的曝光装置中的曝光剂量和聚焦位置的偏移量的方法包括以下步骤：使用曝光装置获得在基板上形成的图案的形状的信息，计算偏移量在包含在图案形状的信息和临界尺寸的参考值之间的临界尺寸之间，基于图案形状的信息计算焦点位置的偏移量，以及计算曝光剂量的偏移量基于偏移量和焦点位置的偏移。

2. 发明授权

US07771905B2 Method and program for calculating exposure dose and focus position in exposure apparatus, and device manufacturing method 失效
标题翻译：用于计算曝光装置中的曝光剂量和聚焦位置的方法和程序以及装置制造方法
公开(公告)号：US07771905B2
公开(公告)日：2010-08-10
申请号：US11618137
申请日：2006-12-29
申请人： Koichi Sentoku , Hideki Ina , Koji Mikami , Yoshiaki Sugimura , Hiroto Yoshii , Tomoyuki Miyashita
发明人： Koichi Sentoku , Hideki Ina , Koji Mikami , Yoshiaki Sugimura , Hiroto Yoshii , Tomoyuki Miyashita
IPC分类号： G03F9/00
CPC分类号： G03F7/70641 , G03F7/70625
摘要： A method for calculating an offset of an exposure dose and a focus position in an exposure apparatus that exposes a substrate via an original includes the steps of obtaining information of a shape of a pattern formed on the substrate using the exposure apparatus, calculating a shift amount between a critical dimension contained in the information of the shape of the pattern and a reference value of the critical dimension, and calculating an offset of the focus position based on the information of the shape of the pattern, and calculating the offset of the exposure dose based on the shift amount and the offset of the focus position.
摘要翻译：用于计算经由原稿曝光基板的曝光装置中的曝光剂量和聚焦位置的偏移量的方法包括以下步骤：使用曝光装置获得在基板上形成的图案的形状的信息，计算偏移量在包含在图案形状的信息和临界尺寸的参考值之间的临界尺寸之间，基于图案形状的信息计算焦点位置的偏移量，以及计算曝光剂量的偏移量基于偏移量和焦点位置的偏移。

3. 发明申请

US20090231562A1 EFFECTIVE LIGHT SOURCE SHAPE DATABASE GENERATION METHOD, OPTICAL IMAGE CALCULATION METHOD, RECORDING MEDIUM, EXPOSURE METHOD, AND DEVICE FABRICATION METHOD 有权
标题翻译：有效的光源形状数据库生成方法，光学图像计算方法，记录介质，曝光方法和装置制造方法
公开(公告)号：US20090231562A1
公开(公告)日：2009-09-17
申请号：US12369472
申请日：2009-02-11
申请人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
发明人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
IPC分类号： G03B27/72
CPC分类号： G03F7/70108 , G03F7/70091 , G03F7/70508
摘要： The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.
摘要翻译：本发明提供了一种生成有效光源形状的数据库的方法，包括生成步骤，生成表示与可设置于照明光学系统的多个条件对应的有效光源形状的初始数据库的生成步骤，设定任意的测量步骤照明光学系统的条件和有效光源形状的测量;计算步骤，当对照明光学系统设定多个条件和有效光源形状时，计算有效光源形状之间的差异量在初始数据库中，以及校正步骤，用差异量校正包含在初始数据库中的有效光源形状，并将校正的有效光源形状编译成实际的数据库。

4. 发明授权

US08582083B2 Effective light source shape database generation method, optical image calculation method, recording medium, exposure method, and device fabrication method 有权
标题翻译：有效的光源形状数据库生成方法，光学图像计算方法，记录介质，曝光方法和器件制造方法
公开(公告)号：US08582083B2
公开(公告)日：2013-11-12
申请号：US12369472
申请日：2009-02-11
申请人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
发明人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
IPC分类号： G03B27/54
CPC分类号： G03F7/70108 , G03F7/70091 , G03F7/70508
摘要： The present invention provides a method of generating a database of effective light source shapes including a generation step of generating an initial database representing an effective light source shapes corresponding to a plurality of conditions settable for an illumination optical system, a measurement step of setting an arbitrary condition for the illumination optical system, and measuring an effective light source shape, a calculation step of calculating a difference amount between an effective light source shape when each of the plurality of conditions is set for the illumination optical system and the effective light source shape included in the initial database, and a correction step of correcting the effective light source shapes included in the initial database using the difference amounts and compiling the corrected effective light source shapes into an actual database.
摘要翻译：本发明提供了一种生成有效光源形状的数据库的方法，包括生成步骤，生成表示与可设置于照明光学系统的多个条件对应的有效光源形状的初始数据库的生成步骤，设定任意的测量步骤照明光学系统的条件和有效光源形状的测量;计算步骤，当对照明光学系统设定多个条件和有效光源形状时，计算有效光源形状之间的差异量在初始数据库中，以及校正步骤，用差异量校正包含在初始数据库中的有效光源形状，并将校正的有效光源形状编译成实际的数据库。

5. 发明授权

US07642022B2 Parameter determination method, exposure method, device fabrication method, and storage medium 有权
标题翻译：参数确定方法，曝光方法，装置制造方法和存储介质
公开(公告)号：US07642022B2
公开(公告)日：2010-01-05
申请号：US12401343
申请日：2009-03-10
申请人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
发明人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70125 , G03F7/705
摘要： The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist.
摘要翻译：本发明提供了一种通过使用光学模拟器来确定光学参数和工艺参数的参数确定方法，所述光学模拟器基于传送a的曝光装置的光学参数来计算在施加在衬底上的抗蚀剂上形成的抗蚀剂图像基板上的掩模图案，以及基于表示与抗蚀剂有关的信息的处理参数和关于对抗蚀剂进行的处理的信息来计算要在基板上形成的处理图像的处理模拟器。

6. 发明申请

US20090233194A1 PARAMETER DETERMINATION METHOD, EXPOSURE METHOD, DEVICE FABRICATION METHOD, AND STORAGE MEDIUM 有权
标题翻译：参数确定方法，曝光方法，装置制造方法和存储介质
公开(公告)号：US20090233194A1
公开(公告)日：2009-09-17
申请号：US12401343
申请日：2009-03-10
申请人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
发明人： Hiroto Yoshii , Kouichirou Tsujita , Koji Mikami
IPC分类号： G03F7/20
CPC分类号： G03F7/70441 , G03F1/36 , G03F7/70125 , G03F7/705
摘要： The present invention provides a parameter determination method of determining an optical parameter and a process parameter by using an optical simulator which calculates a resist image to be formed on a resist applied on a substrate, based on the optical parameter of an exposure apparatus which transfers a pattern of a mask onto the substrate, and a process simulator which calculates a process image to be formed on the substrate, based on the process parameter representing information concerning the resist and information concerning a process to be performed on the resist.
摘要翻译：本发明提供了一种通过使用光学模拟器来确定光学参数和工艺参数的参数确定方法，所述光学模拟器基于传送a的曝光装置的光学参数来计算在施加在衬底上的抗蚀剂上形成的抗蚀剂图像基板上的掩模图案，以及基于表示与抗蚀剂有关的信息的处理参数和关于对抗蚀剂进行的处理的信息来计算要在基板上形成的处理图像的处理模拟器。

7. 发明授权

US08930286B2 Information processing apparatus, processing method therefor, and non-transitory computer-readable storage medium 有权
标题翻译：信息处理装置，其处理方法和非暂时性计算机可读存储介质
公开(公告)号：US08930286B2
公开(公告)日：2015-01-06
申请号：US13281115
申请日：2011-10-25
申请人： Hiroto Yoshii
发明人： Hiroto Yoshii
IPC分类号： G06F15/18 , G06N99/00
CPC分类号： G06N99/005
摘要： An information processing apparatus creates, for each of a plurality of nodes, a query to be executed for a learning pattern input to the node; inputs a plurality of learning patterns to a root node of the plurality of nodes; executes, for the learning pattern input to each node, the query created for the node; determines whether the query has been effectively executed for the individual learning pattern input to each node; distributes and inputs, to a lower node of each node, an individual learning pattern for which it has been determined in the determining that the query was effectively executed in the node; deletes a learning pattern for which it has been determined in the determining that the query was not effectively executed in each node; and stores an attribute of the learning pattern input to a terminal node of the plurality of nodes in association with the node.
摘要翻译：信息处理装置针对多个节点中的每一个创建要对输入到节点的学习模式执行的查询; 将多个学习模式输入到所述多个节点的根节点; 执行为每个节点输入的学习模式，为该节点创建的查询; 确定是否对每个节点输入的各个学习模式有效执行查询; 在每个节点的下级节点分配和输入在确定查询在该节点中被有效地执行的已被确定的单独学习模式; 在确定每个节点中没有有效执行查询的情况下，删除已经确定的学习模式; 并将所述学习模式输入的属性存储到与所述节点相关联的所述多个节点的终端节点。

8. 发明授权

US08211647B2 Probe, probe set, probe-immobilized carrier, and genetic testing method 有权
标题翻译：探针，探针组，探针固定载体和基因检测方法
公开(公告)号：US08211647B2
公开(公告)日：2012-07-03
申请号：US11935773
申请日：2007-11-06
申请人： Toshifumi Fukui , Hiroto Yoshii , Hideto Kuribayashi
发明人： Toshifumi Fukui , Hiroto Yoshii , Hideto Kuribayashi
IPC分类号： C12Q1/68 , C12M1/34 , C07H21/04
CPC分类号： C12Q1/689 , Y10S435/81 , Y10T436/145555
摘要： A nucleic acid probe for classification of pathogenic bacterial species is capable of collectively detecting bacterial strains of the same species and differentially detecting them from other bacterial species. Any one of the base sequences of SEQ ID NOS. 84 to 86 and complementary or modified sequences thereof or a combination of at least two of them is used for detecting the gene of an infectious disease pathogenic bacterium.
摘要翻译：用于分类病原菌种的核酸探针能够共同检测相同物种的细菌菌株并将其与其它细菌物种差异检测。 SEQ ID NOS的碱基序列中的任一个。 84〜86及其互补或修饰的序列或其至少两个的组合用于检测感染性疾病致病菌的基因。

9. 发明申请

US20120020558A1 METHOD FOR ESTIMATING ATTRIBUTE OF OBJECT, APPARATUS THEREOF, AND STORAGE MEDIUM 有权
标题翻译：用于估计对象属性，其设备和存储介质的方法
公开(公告)号：US20120020558A1
公开(公告)日：2012-01-26
申请号：US13186882
申请日：2011-07-20
申请人： Hiroto Yoshii
发明人： Hiroto Yoshii
IPC分类号： G06K9/46 , G06K9/00
CPC分类号： G06K9/3233 , G06K9/4604 , G06K9/6202 , G06T7/74
摘要： An information processing method includes detecting a partial area configuring a target object from an input image, evaluating appropriateness of the detection result, voting with respect to the target object based on the detection result and the evaluation result, and identifying an attribute of the target object based on the voting result.
摘要翻译：一种信息处理方法，包括：从输入图像中检测构成目标对象的部分区域，基于所述检测结果和所述评价结果，评价所述检测结果的适当性，对所述目标对象进行投票，以及识别所述目标对象的属性根据投票结果。

10. 发明授权

US07943313B2 Probe, probe set, probe-immobilized carrier, and genetic testing method 有权
标题翻译：探针，探针组，探针固定载体和基因检测方法
公开(公告)号：US07943313B2
公开(公告)日：2011-05-17
申请号：US11935695
申请日：2007-11-06
申请人： Toshifumi Fukui , Hiroto Yoshii , Hideto Kuribayashi
发明人： Toshifumi Fukui , Hiroto Yoshii , Hideto Kuribayashi
IPC分类号： C12Q1/68 , C12P19/34 , C07H21/02 , C07H21/04
CPC分类号： C12Q1/689 , B01J2219/00608 , Y10T436/145555
摘要： A nucleic acid probe for classification of pathogenic bacterial species is capable of collectively detecting bacterial strains of the same species and differentially detecting them from other bacterial species. Any one of the base sequences of SEQ ID NOS. 70 to 72 and complementary or modified sequences thereof or a combination of at least two of them is used for detecting the gene of an infectious disease pathogenic bacterium.
摘要翻译：用于分类病原菌种的核酸探针能够共同检测相同物种的细菌菌株并将其与其它细菌物种差异检测。 SEQ ID NOS的碱基序列中的任一个。 70〜72及其互补或修饰的序列或其至少两个的组合用于检测感染性疾病致病菌的基因。

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