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1. 发明授权

US06270618B1 Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US06270618B1
公开(公告)日：2001-08-07
申请号：US09205800
申请日：1998-12-04
申请人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
IPC分类号： C23F102
CPC分类号： H01J37/32174 , C23C16/4405 , H01J37/32082
摘要： A plasma processing apparatus is provided which does not require replacement of a band eliminator according to a frequency used, which is capable of performing chamber cleaning without replacing a resonance circuit, and which is capable of performing plasma cleaning of the inside of the chamber without using a bellows. The plasma processing apparatus includes a resonance circuit (band eliminator) for causing series resonance with a microwave circuit formed of at least a susceptor electrode and a processing chamber in order to trap plasma between a plasma excitation electrode and the susceptor electrode when the surface of a workpiece placed on the susceptor electrode is processed by plasma generated between the plasma excitation electrode and the susceptor electrode, which are provided inside the processing chamber; and for causing parallel resonance with the microwave circuit in order to diffuse plasma inside the processing chamber when performing plasma cleaning.
摘要翻译：提供一种等离子体处理装置，其不需要根据所使用的频率来更换带除器，其能够执行腔室清洁而不更换谐振电路，并且能够在不使用腔室内进行等离子体清洁室内一个波纹管。等离子体处理装置包括用于与由至少一个基座电极和一个处理室形成的微波电路进行串联谐振的谐振电路（去波器），以便在等离子体激发电极和基座电极之间捕获等离子体时放置在基座电极上的工件通过设置在处理室内部的等离子体激发电极和基座电极之间产生的等离子体进行处理; 并且用于与微波电路并联谐振，以便在进行等离子体清洗时在等离子体清洗中扩散处理室内的等离子体。

2. 发明授权

US06155202A Plasma processing apparatus, matching box, and feeder 失效
标题翻译：等离子体处理装置，配套箱和进料器
公开(公告)号：US06155202A
公开(公告)日：2000-12-05
申请号：US199944
申请日：1998-11-25
申请人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiro Takeda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Sung Chul Kim , Koichi Fukuda , Yasuhiro Takeda , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
IPC分类号： H01J37/32 , C23C16/00 , H01J7/24 , H01J21/00
CPC分类号： H01J37/32082 , H01J37/32183
摘要： In a plasma processing apparatus, in a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode, one of the two electrodes which form a tuning capacitor also serves as the plasma excitation electrode. Alternatively, in a plasma processing apparatus, the side wall of a housing made from an electrically conductive member and accommodating a matching circuit intervening between a high-frequency power source and a plasma excitation electrode for achieving impedance matching between the high-frequency power source and the plasma excitation electrode and a feeder for supplying high-frequency electric power from the high-frequency power source to the plasma excitation electrode through the matching circuit is formed not in parallel to the feeder.
摘要翻译：在等离子体处理装置中，在高频电源和等离子体激励电极之间插入用于实现高频电源和等离子体激励电极之间的阻抗匹配的匹配电路中，形成调谐电容器的两个电极之一也用作等离子体激发电极。或者，在等离子体处理装置中，由导电构件制成的壳体的侧壁，并且容纳插入在高频电源和等离子体激励电极之间的匹配电路，以实现高频电源与高频电源之间的阻抗匹配等离子体激励电极和用于通过匹配电路从高频电源向等离子体激励电极提供高频电力的馈线形成为不与馈线并联。

3. 发明授权

US6148762A Plasma processing apparatus 失效
标题翻译：等离子体处理装置
公开(公告)号：US6148762A
公开(公告)日：2000-11-21
申请号：US246245
申请日：1999-02-08
申请人： Koichi Fukuda , Sung Chul Kim , Akira Nakano
发明人： Koichi Fukuda , Sung Chul Kim , Akira Nakano
IPC分类号： H05H1/46 , C23C16/458 , C23C16/50 , C23C16/509 , C23F4/00 , H01L21/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31 , H01L21/687 , C23C16/00
CPC分类号： H01L21/68742 , C23C16/4581 , C23C16/4586 , C23C16/5096 , H01L21/67069 , H01L21/68757 , Y10S414/135
摘要： A plasma processing apparatus for stably and uniformly performing various kinds of processing by preventing unnecessary plasma discharge in the processing comprises a susceptor pin for supporting a substance to be processed, the susceptor pin being disposed to pass through a hole formed to a susceptor, projecting from the upper surface of the susceptor when the susceptor falls and falling by its own weight when the susceptor rises so as to be buried in the hole, and a guide for guiding the rising and falling directions of the susceptor pin, wherein the susceptor pin and the guide are composed of ceramics.
摘要翻译：一种用于通过在处理中防止不必要的等离子体放电来稳定均匀地执行各种处理的等离子体处理装置包括用于支撑被处理物质的基座销，所述基座销设置成穿过形成于基座的孔，当基座上升时，基座落下并且被埋在孔中时基座的上表面，以及用于引导基座销的上升和下降方向的引导件，其中，基座销和指南由陶瓷组成。

4. 发明授权

US06349670B1 Plasma treatment equipment 失效
标题翻译：等离子处理设备
公开(公告)号：US06349670B1
公开(公告)日：2002-02-26
申请号：US09442539
申请日：1999-11-18
申请人： Akira Nakano , Koichi Fukuda , Sung Chul Kim , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Koichi Fukuda , Sung Chul Kim , Yasuhiko Kasama , Tadahiro Ohmi , Shoichi Ono
IPC分类号： C23C1600
CPC分类号： H01J37/32082 , G01R1/06772 , G01R27/02 , H01J37/32935
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster as compared with conventional plasma equipment, and the film quality is high. Metal plates AC short between a chamber wall and a shield of an electrode of the same DC potential as the chamber.
摘要翻译：本发明提供一种等离子体设备，其优点在于，与常规等离子体设备相比，阻抗较小，对频率的依赖性低，功耗效率高，成膜速度更快，膜质量高。金属板在室壁与与室相同的DC电位的电极的屏蔽之间交流短路。

5. 发明授权

US5550091A Method of sputtering a silicon nitride film 失效
标题翻译：溅射氮化硅膜的方法
公开(公告)号：US5550091A
公开(公告)日：1996-08-27
申请号：US437606
申请日：1995-05-09
申请人： Koichi Fukuda , Tomofumi Oba , Masanori Miyazaki , Hirofumi Fukui , Chisato Iwasaki , Yasuhiko Kasama , Tadahiro Ohmi , Masaru Kubota , Hitoshi Kitagawa , Akira Nakano , Osamu Yoshida
发明人： Koichi Fukuda , Tomofumi Oba , Masanori Miyazaki , Hirofumi Fukui , Chisato Iwasaki , Yasuhiko Kasama , Tadahiro Ohmi , Masaru Kubota , Hitoshi Kitagawa , Akira Nakano , Osamu Yoshida
IPC分类号： C23C14/06 , H01L21/02 , H01L21/28 , H01L21/31 , H01L21/318 , H01L21/331 , H01L21/336
CPC分类号： C23C14/0652 , H01L21/0217 , H01L21/02211 , H01L21/02274 , H01L21/28008 , H01L21/3185 , H01L28/40 , H01L29/66765
摘要： There is provided an electronic device like a TFT using a silicon nitride insulating film of a single layer structure having an excellent dielectric voltage, and a method of producing the electronic device with reliability. In the electronic device, a conductive wiring pattern is deposited on a surface of an electrically insulated substrate, and an insulating layer is formed to cover the wiring pattern and the substrate. The insulating layer is made of a silicon nitride insulating film. A contact angle .theta. between the wiring pattern and the substrate is equals 60.degree. or more, and a value Tn1/Tg of a thickness Tn1 of the silicon nitride insulating film and a thickness Tg of the wiring pattern equals 2 or more. A horizontal distance Tn2 between a rise start position, where the silicon nitride film rises because of a step of the wiring pattern and the top end of the wiring pattern, and Tn1 are in a relation where 0.6.ltoreq.Tn2/Tn1.
摘要翻译：提供了一种使用具有优异的介电电压的单层结构的氮化硅绝缘膜的TFT的电子器件，以及可靠地制造该电子器件的方法。在电子设备中，在电绝缘基板的表面上沉积导电布线图案，并且形成绝缘层以覆盖布线图案和基板。绝缘层由氮化硅绝缘膜制成。布线图案和基板之间的接触角θ等于60°以上，氮化硅绝缘膜的厚度Tn1的值Tn1 / Tg和布线图案的厚度Tg等于2以上。由于布线图案的台阶和布线图案的上端而形成的氮化硅膜的上升起始位置和Tn1之间的水平距离Tn2为0.6

6. 发明授权

US06452408B1 Impedance measurement tool 失效
标题翻译：阻抗测量工具
公开(公告)号：US06452408B1
公开(公告)日：2002-09-17
申请号：US09843062
申请日：2001-04-26
申请人： Akira Nakano , Koichi Fukuda , Tadahiro Ohmi , Shoichi Ono
发明人： Akira Nakano , Koichi Fukuda , Tadahiro Ohmi , Shoichi Ono
IPC分类号： G01R3122
CPC分类号： H01J37/32082
摘要： The invention provides a plasma equipment which is advantageous in that the suscepter impedance is small, the dependence on the frequency is low, the power consumption efficiency is high, the film forming speed is faster as compared with conventional plasma equipment, and the film quality is high. Metal plates AC short between a chamber wall and a shield of an electrode of the same DC potential as the chamber.
摘要翻译：本发明提供一种等离子体设备，其优点在于，与常规等离子体设备相比，阻抗较小，对频率的依赖性低，功耗效率高，成膜速度更快，膜质量高。金属板在室壁与与室相同的DC电位的电极的屏蔽之间交流短路。

7. 发明授权

US10764495B2 Image processing apparatus, image processing method, storage medium, system, and electronic apparatus 有权
公开(公告)号：US10764495B2
公开(公告)日：2020-09-01
申请号：US16217536
申请日：2018-12-12
申请人： Hiroyasu Uehara , Masakazu Terauchi , Masashi Miyata , Hiroshi Kano , Akira Nakano , Takeyoshi Nishimura
发明人： Hiroyasu Uehara , Masakazu Terauchi , Masashi Miyata , Hiroshi Kano , Akira Nakano , Takeyoshi Nishimura
IPC分类号： H04N5/262 , H04N5/232 , H04N5/347 , H04N5/349
摘要： An image processing apparatus includes processing circuitry. The processing circuitry is configured to detect a positional shift amount of each of a plurality of images; select a composite target image from the plurality of images based on the detected positional shift amount; and obtain a composite image based on the positional shift amount and the selected composite target image.

8. 发明授权

US09019387B2 Imaging device and method of obtaining image 有权
标题翻译：成像装置及获取图像的方法
公开(公告)号：US09019387B2
公开(公告)日：2015-04-28
申请号：US13413946
申请日：2012-03-07
申请人： Akira Nakano
发明人： Akira Nakano
IPC分类号： H04N5/232 , G06T5/50
CPC分类号： H04N5/23277 , G06T5/50 , G06T2207/10024 , G06T2207/20008 , G06T2207/20221 , G06T2207/30201 , H04N5/23219 , H04N5/23254
摘要： An imaging device including an image sensor, includes an image obtaining control unit that obtains plural continuous images of an object taken by the image sensor; a size determining unit that determines an image size of reduced images based on photographing information of at least one of the images, and generates reduced images from the images obtained by the image obtaining control unit based on the determined image size; a motion vector detection unit that detects a motion vector of the reduced images; and an image synthesis unit that synthesizes the images obtained by the image obtaining control unit based on the motion vector detected by the motion vector detection unit to obtain a synthesized image.
摘要翻译：一种包括图像传感器的成像装置，包括图像获取控制单元，其获得由图像传感器拍摄的对象的多个连续图像; 尺寸确定单元，其基于至少一个图像的拍摄信息确定缩小图像的图像尺寸，并且基于所确定的图像大小从由图像获取控制单元获得的图像生成缩小图像; 运动矢量检测单元，其检测所述缩小图像的运动矢量; 以及图像合成单元，其基于由运动矢量检测单元检测到的运动矢量来合成由图像获取控制单元获得的图像，以获得合成图像。

9. 发明授权

US07805901B2 Construction material and building 有权
标题翻译：建筑材料和建筑物
公开(公告)号：US07805901B2
公开(公告)日：2010-10-05
申请号：US11666489
申请日：2005-10-24
申请人： Muneto Yamada , Kazutaka Uekado , Akira Nakano
发明人： Muneto Yamada , Kazutaka Uekado , Akira Nakano
IPC分类号： E04B1/74
CPC分类号： E04B1/78 , E04B1/76 , E04B1/803 , E04B2001/742 , Y02A30/242 , Y02B80/12
摘要： The present invention provides a building to be constructed without any troublesome work.The building is a building comprising a construction material 12, which has a plane heat insulation material 14 in which a madreporic core material is enclosed in a vacuum and a plate structural face material 12a, and whose heat insulation material 14 and structural face material 12a are combined in a way that a plane surface of the heat insulation material 14 faces to one side of a plane surface of the structural face material 12a, and further comprising a wooden base 9b assembled on the construction material 12 and an external wall finishing material 3 fixed on the wooden base 9b.
摘要翻译：本发明提供一种建筑物，而不需要任何麻烦的工作。该建筑是一种建筑物，其包括建筑材料12，该建筑材料12具有平面绝热材料14，绝热材料14和结构面材料12a在真空中封闭有空心芯材和板结构面材料12a 以隔热材料14的平面表面朝向结构面材12a的平面的一侧的方式组合，并且还包括组装在建筑材料12上的木制底座9b和固定的外墙装饰材料3 在木制基座9b上。

10. 发明授权

US07316125B2 Insulated box body, refrigerator having the box body, and method of recycling materials for insulated box body 有权
标题翻译：绝缘箱体，带箱体的冰箱，以及隔热箱体回收材料的方法
公开(公告)号：US07316125B2
公开(公告)日：2008-01-08
申请号：US10479208
申请日：2002-05-31
申请人： Kazutaka Uekado , Masato Sasaki , Akira Nakano , Yoshiki Ohashi
发明人： Kazutaka Uekado , Masato Sasaki , Akira Nakano , Yoshiki Ohashi
IPC分类号： F25D11/02
CPC分类号： F25D23/062 , F25D2201/126 , F25D2201/14 , F25D2400/04
摘要： An insulation box unit and a refrigerator of the present invention employs i) rigid urethane foam with a 8.0 MPa-or-greater bending modulus, and a 60 kg/m3-or-lower density, and ii) a vacuum insulation material. The proper bending modulus provides the insulation box unit with a substantial strength, even in the case that the coverage of the vacuum insulation material with respect to the surface of the outer box exceeds 40%. The proper density prevents the insulation box unit from poor insulation efficiency due to undesired solid thermal conductivity. Despite of an extended use of the vacuum insulation material, the insulation box unit offers an excellent insulation efficiency and therefore accelerates energy saving. According to the recycling method of the present invention, rigid urethane foam formed of tolylene di-isocyanate composition, which was separated from refrigerator wastes, is recycled as a material of rigid urethane foam.
摘要翻译：本发明的绝缘箱单元和冰箱采用i）具有8.0MPa或更大弯曲模量和60kg / m 3以上低密度的硬质聚氨酯泡沫，ii ）真空绝缘材料。即使在真空绝热材料相对于外箱表面的覆盖范围超过40％的情况下，适当的弯曲模量也提供了具有相当强度的绝缘箱单元。适当的密度防止绝缘箱单元由于不期望的固体导热性而具有差的绝缘效率。尽管绝缘材料的使用得到了广泛的应用，绝缘箱单元提供了绝佳的绝缘效率，从而加速了节能。根据本发明的再循环方法，将与冰箱废物分离的甲苯二异氰酸酯组合物形成的硬质聚氨酯泡沫作为刚性聚氨酯泡沫材料进行再循环。

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